摘要:
A graphics processing method and devices using the same is provided. The method includes receiving a plurality of texels arranged in a tiled format and rearranging, by a graphics processing unit (GPU), texels into a sequential format. In a tiled format, texels may be arranged in tiles, at least one tile including M×N texels. In the sequential format, the texels may be arranged in a scan line order of a display.
摘要:
A snap ring for fishing implements is provided. The snap ring includes a hook-like body having an opening on a portion thereof, a rotary shaft coupled on one side to a portion of the body such that the rotary shaft is rotatable around the opening, a hollow guide into which the rotary shaft is fitted and slides along, and a guide spring provided between the rotary shaft and the guide to elastically support the guide against the rotary shaft.
摘要:
Disclosed is an apparatus for agitating a liquid hardener used for improving soft ground. The apparatus comprises a storage tank section formed with an introduction part and having storage tanks in which mixing impellers are arranged, and transparent indicator tubes which are communicated with the storage tanks each; an agitation tank section positioned underneath the storage tank section and having agitation tanks, supply valves which are installed on the agitation tanks, and agitation impellers which are respectively arranged in the agitation tanks; a liquid mixture supply section having connection pipes which are connected to the storage tanks, a supply pipe which is connected to the connection pipes, and distribution pipes which are connected to the supply pipe; and a cleaning water tank section positioned in front of the agitation tank section and having a plurality of cleaning water tanks.
摘要:
A method for fabricating a semiconductor device in which channel resistance is prevented from occurring due to impurity ion diffusion and gate resistance is reduced, thereby improving the speed characteristic of the device. The method for forming a dual gate of a semiconductor device includes the steps of forming a polysilicon layer on a semiconductor substrate; selectively forming an impurity ion layer of a first conductive type and an impurity ion layer of a second conductive type on a lower surface to the polysilicon layer; polishing the polysilicon layer; forming a low resistance metal layer on the polished polysilicon layer; forming a first gate electrode and a second gate electrode by an etching process using a gate mask; and forming source/drain regions of the first conductive type in the substrate at both sides of the first gate electrode and source/drain regions of the second conductive type in the substrate at both sides of the second gate electrode.
摘要:
A machine moves shoe strobels to a camera or scanner where images of the strobels are captured. Using the images, a computing device instructs a printer how to mark guidelines on the strobels that signify one or more strobel sewing lines for different shoes models and shoe sizes. Cross-sectional lines may also be printed on the strobels to aid in error-checking guideline marking. Unmarked strobels are stacked in a loading compartment, sometimes in pairs—e.g., right and left shoe strobels. The unmarked strobels are transferred to a conveyor that brings the strobels to the camera or scanner and the printer. After guidelines and/or cross-sectional lines are added to the strobels, the marked strobels are stacked in a compartments housing other marked strobels.
摘要:
A semiconductor device isolation structure includes a trench formed in a substrate vertically from the major surface of the substrate, a trench plug for filling the trench, and a buried insulation region formed under the trench adjacent thereto, and a method of the same includes the steps of forming a trench in a substrate and vertically from the major surface of the substrate, selectively implanting oxide ions under the trench of the substrate, and forming a trench plug so as to fill the trench.
摘要:
A method of controlling combustion of a diesel engine may include a vibration measuring step of measuring engine vibrations, a measurement region setting step of setting a range where an LPP (location of peak pressure) is predicted from measured vibration data, a frequency transforming step of transforming a vibration signal to a frequency response function, a frequency integrating step of integrating the transformed frequency response function, an LPP detecting step of selecting a location of peak pressure from integrated frequency response function, an estimated value determining step of selecting LPP offset and SOC (start of combustion) offset by using the detected LPP, an error determining step of determining LPP value error and SOC value error by comparing the estimated LPP value and the estimated SOC value with a target LPP value and a target SOC value, and a combustion correcting step of correcting and controlling combustion by the determined errors.
摘要:
A fabrication method for a semiconductor device capable of adjusting a thickness of each portion of gate insulating film at both sides of a gate, which includes the steps of: providing a semiconductor substrate having a first region and a second region; forming a gate insulating film on the substrate; forming a conductive layer on the gate insulating film and patterning the conductive layer, for thereby forming a first gate and a second gate on the first and second regions, respectively; forming impurity areas in the first region at both sides of the first gate in order to reduce the velocity of oxidation; applying a re-oxidation process to the gate insulating film, for thereby forming each portion of the gate insulating film at both sides of the first gate thinner than each portion of the gate insulating film at both sides of the second gate; and respectively forming a source/drain region at both sides of the first and second gates.
摘要:
Semiconductor device and method for fabricating the same, is disclosed, which can maintain a threshold voltage constant despite of decreased channel width, the device including a first, and a second conductive type wells in a substrate, a first, and a second gate insulating films on the first, and the second conductive type wells, a first gate electrode on the first gate insulating film, the first gate electrode being doped with a second conductive type except for edges of the first gate electrode in a channel width direction counter doped with a first conductive type, a second gate electrode on the second gate insulating film, the second gate electrode being doped with a first conductive type except for edges of the second gate electrode in a channel width direction counter doped with a second conductive type, and isolating regions formed between the first, and second conductive type wells, the first, and second gate insulating films, and the first, and second gate electrodes.