Photoresist composition
    2.
    发明授权
    Photoresist composition 有权
    光刻胶组成

    公开(公告)号:US08524440B2

    公开(公告)日:2013-09-03

    申请号:US12983729

    申请日:2011-01-03

    IPC分类号: G03F7/26

    摘要: The present invention provides a photoresist composition comprisinga resin which comprises a structural unit represented by the formula (I): wherein Q1 and Q2 independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion, and a compound represented by the formula (D′): wherein R51, R52, R53 and R54 independently represent a C1-C20 alkyl group etc., and A11 represents a C1-C36 saturated cyclic hydrocarbon group which may have one or more substituents and which may contain one or more heteroatoms.

    摘要翻译: 本发明提供了包含树脂的光致抗蚀剂组合物,其包含式(I)表示的结构单元:其中Q1和Q2独立地表示氟原子等,U表示C1-C20二价烃基等,X 1表示 - O-CO-等,A +表示有机抗衡离子,由式(D')表示的化合物:其中R51,R52,R53和R54独立地表示C1-C20烷基等,A11表示 可以具有一个或多个取代基且可以含有一个或多个杂原子的C 1 -C 36饱和环烃基。

    PHOTORESIST COMPOSITION
    3.
    发明申请
    PHOTORESIST COMPOSITION 审中-公开
    光电组合物

    公开(公告)号:US20110059400A1

    公开(公告)日:2011-03-10

    申请号:US12875627

    申请日:2010-09-03

    IPC分类号: G03F7/004 G03F7/20 C07C61/135

    摘要: The present invention provides a photoresist composition comprisinga resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I′): wherein R51, R52, R53 and R54 independently each represent a C1-C8 alkyl group, and A11 represents a C3-C36 divalent saturated cyclic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents or a C6-C20 divalent aromatic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents.

    摘要翻译: 本发明提供一种光致抗蚀剂组合物,其包含树脂,其包含衍生自具有酸不稳定基团的化合物的结构单元,其在碱性水溶液中不溶或难溶于碱性水溶液,但通过 酸,酸产生剂和由式(I')表示的化合物:其中R51,R52,R53和R54各自独立地表示C1-C8烷基,A11表示可以含有(C 1 -C 8)烷基的C 3 -C 36二价饱和环状烃基 一个或多个杂原子并且具有一个或多个取代基或可含有一个或多个杂原子且具有一个或多个取代基的C 6 -C 20二价芳族烃基。

    Photoresist composition
    5.
    发明授权

    公开(公告)号:US10377692B2

    公开(公告)日:2019-08-13

    申请号:US12875627

    申请日:2010-09-03

    摘要: A photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I′): wherein R51, R52, R53 and R54 independently each represent a C1-C8 alkyl group, and A11 represents a C3-C36 divalent saturated cyclic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents or a C6-C20 divalent aromatic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents.

    PHOTORESIST COMPOSITION
    6.
    发明申请
    PHOTORESIST COMPOSITION 有权
    光电组合物

    公开(公告)号:US20110165513A1

    公开(公告)日:2011-07-07

    申请号:US12983729

    申请日:2011-01-03

    IPC分类号: G03F7/004 G03F7/20

    摘要: The present invention provides a photoresist composition comprisinga resin which comprises a structural unit represented by the formula (I): wherein Q1 and Q2 independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion, and a compound represented by the formula (D′): wherein R51, R52, R53 and R54 independently represent a C1-C20 alkyl group etc., and A11 represents a C1-C36 saturated cyclic hydrocarbon group which may have one or more substituents and which may contain one or more heteroatoms.

    摘要翻译: 本发明提供了包含树脂的光致抗蚀剂组合物,其包含式(I)表示的结构单元:其中Q1和Q2独立地表示氟原子等,U表示C1-C20二价烃基等,X 1表示 - O-CO-等,A +表示有机抗衡离子,由式(D')表示的化合物:其中R51,R52,R53和R54独立地表示C1-C20烷基等,A11表示 可以具有一个或多个取代基且可以含有一个或多个杂原子的C 1 -C 36饱和环烃基。

    Hair styling method
    7.
    发明申请
    Hair styling method 审中-公开
    发型方法

    公开(公告)号:US20050227206A1

    公开(公告)日:2005-10-13

    申请号:US11148473

    申请日:2005-06-09

    摘要: A hair-styling form includes strips attached thereto, each strip having a length of hair. The form is divided into multiple regions, and the strips are pasted on each region. The strip is made of a plain paper, cardboard, or plastic sheet and indicates information of at least one of hair length, permanent wave, or hair color requested by a customer.

    摘要翻译: 头发造型形式包括连接到其上的条带,每个条带具有一定长度的头发。 形式分为多个区域,每个区域都贴上条带。 该条由普通纸,纸板或塑料片制成,并指示客户要求的头发长度,永久波或头发颜色中的至少一种的信息。