公开(公告)号：US20170253625A1

公开(公告)日：2017-09-07

申请号：US15598450

申请日：2017-05-18

申请人： ADEKA CORPORATION

发明人： Hiroki SATO ,  Junji UEYAMA

IPC分类号： C07F17/00 ,  C23C16/40 ,  C07F11/00 ,  C23C16/44 ,  C23C16/18 ,  C23C16/455

CPC分类号： C07F17/00 ,  C07F11/00 ,  C23C16/18 ,  C23C16/405 ,  C23C16/44 ,  C23C16/45525

摘要： In the method of the present invention for producing a thin film, including introducing, onto a substrate, a vapor that has been obtained by vaporizing a thin-film-forming material including a molybdenum imide compound represented by the following formula (I) and that includes the molybdenum imide compound; and then forming a thin film including molybdenum on the substrate by decomposing and/or chemically reacting the molybdenum imide compound. (In the formula, R1 though R10 each represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and R11 represents a linear or branched alkyl group having 1 to 8 carbon atoms.)

公开(公告)号：US20240317967A1

公开(公告)日：2024-09-26

申请号：US18262521

申请日：2022-01-25

申请人： ADEKA CORPORATION

发明人： Takeshi ENDO ,  Yasuyuki MORI ,  Ken-ichi TAMASO ,  Ryo OGAWA ,  Junji UEYAMA

IPC分类号： C08K5/3415 ,  C08G59/50

CPC分类号： C08K5/3415 ,  C08G59/5073

摘要： A curing resin composition well balanced in curing properties and storage stability. The composition contains (A) an epoxy resin, (B) a curing agent, and (C) at least one of imide compounds represented by formulae (1-1), (1-2), and (1-3), wherein R11 represents an optionally substituted alkyl group with 1 to 10 carbon atoms, etc.; R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group with 1 to 10 carbon atoms, etc.; and R12 and R13 each independently represent a hydrogen atom, an optionally substituted alkyl group with 1 to 10 carbon atoms, etc.

公开(公告)号：US20240109869A1

公开(公告)日：2024-04-04

申请号：US18262337

申请日：2022-01-25

申请人： ADEKA CORPORATION

发明人： Takeshi ENDO ,  Yasuyuki MORI ,  Ippei OKANO ,  Ryo OGAWA ,  Junji UEYAMA

IPC分类号： C07D403/06 ,  C08G59/50 ,  H01B1/12

CPC分类号： C07D403/06 ,  C08G59/5073 ,  H01B1/121

摘要： Disclosed is a charge transfer complex capable of obtaining a curable resin composition having an excellent balance between curability and storage stability when used as an epoxy-resin curing agent. The charge transfer complex has an imidazole moiety as an electron donor moiety. The charge transfer complex may be an assembly wherein electrons included in a compound (a) having an imidazole moiety are accepted by a compound (b) having an electron acceptor moiety, or may be a compound having an imidazole moiety and an electron acceptor moiety in its molecule, and the electron acceptor moiety accepts electrons included in the imidazole moiety.

公开(公告)号：US20170253624A1

公开(公告)日：2017-09-07

申请号：US15598398

申请日：2017-05-18

申请人： ADEKA CORPORATION

发明人： Hiroki SATO ,  Junji UEYAMA

IPC分类号： C07F17/00 ,  C23C16/40 ,  C07F11/00 ,  C23C16/44 ,  C23C16/18 ,  C23C16/455

CPC分类号： C07F17/00 ,  C07F11/00 ,  C23C16/18 ,  C23C16/405 ,  C23C16/44 ,  C23C16/45525

摘要： In the method of the present invention for producing a thin film, including introducing, onto a substrate, a vapor that has been obtained by vaporizing a thin-film-forming material including a molybdenum imide compound represented by the following formula (I) and that includes the molybdenum imide compound; and then forming a thin film including molybdenum on the substrate by decomposing and/or chemically reacting the molybdenum imide compound. (In the formula, R1 though R10 each represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and R11 represents a linear or branched alkyl group having 1 to 8 carbon atoms.)

公开(公告)号：US20150371859A1

公开(公告)日：2015-12-24

申请号：US14823293

申请日：2015-08-11

申请人： ADEKA CORPORATION

发明人： Hiroki SATO ,  Junji UEYAMA

IPC分类号： H01L21/28 ,  H01L29/51 ,  H01L29/49 ,  H01L21/285 ,  H01L21/768

CPC分类号： H01L21/28194 ,  C07F11/005 ,  C23C16/40 ,  C23C16/405 ,  C23C16/45553 ,  H01L21/28556 ,  H01L21/76841 ,  H01L29/4966 ,  H01L29/517 ,  Y02E10/541 ,  Y02P70/521

摘要： Disclosed is a method for manufacturing a molybdenum oxide-containing thin film, involving vaporizing a starting material for forming a thin film containing a compound represented by the following general formula (I) to give vapor containing a molybdenum amide compound, introducing the obtained vapor onto a substrate, and further introducing an oxidizing gas to cause decomposition and/or a chemical reaction to form a thin film on the substrate. In the formula, R1 and R2 each represents a straight or branched alkyl group having 1 to 4 carbon atom(s), R3 represents a t-butyl group or a t-amyl group, y represents 0 or 2, x is 4 when y is 0, or x is 2 when y is 2, wherein R1 and R2 that are plurally present may be the same or different.

摘要翻译： 公开了一种含有氧化钼的薄膜的制造方法，其中，将含有下述通式（I）表示的化合物的薄膜形成原料汽化，得到含有钼酰胺化合物的蒸气，将得到的蒸气导入到 并且进一步引入氧化气体以引起分解和/或化学反应以在衬底上形成薄膜。 式中，R 1，R 2分别表示碳原子数为1〜4的直链或支链烷基，R 3表示叔丁基或叔戊基，y表示0或2，y表示y 当y为2时，x为2，或者多个存在的R 1和R 2可以相同或不同。