POROUS METALLIC MEMBRANE
    4.
    发明申请
    POROUS METALLIC MEMBRANE 有权
    多孔金属膜

    公开(公告)号:US20150343390A1

    公开(公告)日:2015-12-03

    申请号:US14654768

    申请日:2013-12-23

    Abstract: The present disclosure relates to a method of forming a metallic layer having pores extending therethrough, the method comprising the steps of: (a) contacting a cathode substrate with an electrolyte solution comprising at least one cation; reducing the cation to deposit the metallic layer on a surface of the cathode substrate; and (c) generating a plurality of non-conductive regions on the cathode substrate surface during reducing step (b); wherein the deposition of the metallic layer is substantially prevented on the non-conductive regions on the cathode substrate surface to thereby form pores extending through the deposited metallic layer. The present disclosure further provides a metallic porous membrane fabricated by the disclosed process.

    Abstract translation: 本发明涉及一种形成具有延伸穿过其中的孔的金属层的方法,所述方法包括以下步骤:(a)使阴极基底与包含至少一种阳离子的电解质溶液接触; 减少阳极以将金属层沉积在阴极衬底的表面上; 和(c)在还原步骤(b)期间在阴极衬底表面上产生多个非导电区域; 其中基本上防止在阴极衬底表面上的非导电区域上金属层的沉积,从而形成延伸穿过沉积的金属层的孔。 本公开还提供了通过所公开的方法制造的金属多孔膜。

Patent Agency Ranking