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    Compact ampoule thermal management system
    1.
    发明授权
    Compact ampoule thermal management system 有权
    紧凑型安瓿热管理系统

    公开(公告)号：US09279604B2

    公开(公告)日：2016-03-08

    申请号：US13902310

    申请日：2013-05-24

    Applicant: APPLIED MATERIALS, INC.

    Inventor： David K. Carlson ,  Errol Antonio C. Sanchez ,  Kenric Choi ,  Marcel E. Josephson ,  Dennis Demars ,  Emre Cuvalci ,  Mehmet Tugrul Samir

    IPC: F25B21/02 ,  C23C16/448

    CPC classification number: F25B21/02 ,  C23C16/448 ,  C23C16/4482

    Abstract: Methods and apparatus for thermal management of a precursor for use in substrate processing are provided herein. In some embodiments, an apparatus for thermal management of a precursor for use in substrate processing may include a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material; one or more thermoelectric devices coupled to the body proximate the opening; a heat sink coupled to the one or more thermoelectric devices; and a fan disposed proximate to a back side of the heat sink to provide a flow of air to the heat sink.

    Abstract translation: 本文提供了用于基板处理的前体的热管理方法和装置。 在一些实施例中，用于对基板处理中使用的前体进行热管理的设备可以包括具有开口尺寸的开口的主体，该开口的尺寸适于容纳设置在其中的液体或固体前体的存储容器，所述主体由导热材料制成; 一个或多个耦合到靠近开口的本体的热电装置; 耦合到所述一个或多个热电装置的散热器; 以及靠近所述散热器的后侧设置的风扇，以向所述散热器提供空气流。

    Finned rotor cover
    4.
    发明授权
    Finned rotor cover 有权

    公开(公告)号：US11004704B2

    公开(公告)日：2021-05-11

    申请号：US15921819

    申请日：2018-03-15

    Applicant: Applied Materials, Inc.

    Inventor： Lara Hawrylchak ,  Chaitanya A. Prasad ,  Emre Cuvalci

    IPC: H01L21/67 ,  H01L21/324 ,  H01L21/687

    Abstract: Embodiments described herein generally relate to a processing apparatus having a cover piece that participates in preheating a process gas. In one implementation, the cover piece includes an annulus. The annulus has an inner wall with a first height, an outer wall with a second height, and a top surface. The second height is greater than the first height. The cover piece also includes an inner lip disposed adjacent the inner wall, and a plurality of fins disposed on the top surface of the annulus. The cover piece and the plurality of fins are an opaque quartz material. The cover piece provides for more efficient heating of process gases, is composed of a material capable of withstanding process conditions while providing for more efficient and uniform processing, and has a low CTE reducing particle contamination due to excessive expansion during processing.

    ROTOR COVER
    6.
    发明申请
    ROTOR COVER 审中-公开

    公开(公告)号：US20180254206A1

    公开(公告)日：2018-09-06

    申请号：US15913496

    申请日：2018-03-06

    Applicant: Applied Materials, Inc.

    Inventor： Lara Hawrylchak ,  Chaitanya A. Prasad ,  Emre Cuvalci

    IPC: H01L21/67 ,  F01L9/04 ,  B04B7/04 ,  H01L21/02

    CPC classification number: H01L21/67109 ,  B04B7/04 ,  F01L9/04 ,  H01L21/02312 ,  H01L21/67017 ,  H01L21/67115 ,  H01L21/67248 ,  H01L21/68735 ,  H01L21/68792

    Abstract: Implementations described herein generally relate to a processing apparatus having a rotor cover for preheating the process gas. The apparatus includes a chamber body having a side wall and a bottom wall defining an interior processing region. The chamber also includes a substrate support disposed in the interior processing region of the chamber body, a ring support, and a rotor cover. The rotor cover is disposed on a ring support. The rotor cover is an opaque quartz material. The rotor cover advantageously provides for more efficient heating of process gases, is composed of a material capable of withstanding process conditions while providing for more efficient and uniform processing, and has a low CTE reducing particle contamination due to excessive expansion during processing.

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