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公开(公告)号：US20230298850A1
公开(公告)日：2023-09-21
申请号：US18320157
申请日：2023-05-18
IPC分类号： H01J37/22 , H01J37/28 , H01J37/244
CPC分类号： H01J37/222 , H01J37/28 , H01J37/244 , H01J2237/2817 , H01J2237/24592 , H01J2237/1534
摘要： Disclosed herein is an inspection tool and a method for identifying defects in a sample. The method includes steps of scanning a first area of a sample with a first detector-beam and scanning a second area of the sample with a second detector-beam, then receiving first and second signals that are derived from the first and second detector-beams. The first and second signals are compared to determine whether a defect is present in the sample.
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2.发明公开公开(公告)号：US20240331968A1
公开(公告)日：2024-10-03
申请号：US18742934
申请日：2024-06-13
IPC分类号： H01J37/147 , H01J37/09 , H01J37/10 , H01J37/244 , H01J37/28
CPC分类号： H01J37/1471 , H01J37/09 , H01J37/10 , H01J37/244 , H01J37/28 , H01J2237/0453 , H01J2237/24578
摘要： A charged-particle apparatus generates a plurality of sub-beams from a source beam of charged particles and direct the sub-beams downbeam toward a sample position. The charged-particle apparatus comprises a charged particle source, an aperture array, and a charged particle optical component. The charged-particle source comprises an emitter to emit a source beam of charged particles along a divergent path. The aperture array is positioned in the divergent path so the aperture array generates sub-beams from the source beam. The charged-particle-optical component acts on the source beam upbeam of the aperture array. The charged-particle-optical component comprises a multipole and/or a charged-particle lens. The multipole operates on the source beam to vary the position of the divergent path at the aperture array. The multipole may vary a cross-sectional shape of the divergent path at the aperture array. The charged-particle-optical lens compensates for variations in distance between the emitter and the aperture array.
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公开(公告)号：US20240339294A1
公开(公告)日：2024-10-10
申请号：US18743011
申请日：2024-06-13
发明人： Marijke SCOTUZZI , Albertus Victor Gerardus MANGNUS , Yan REN , Erwin Paul SMAKMAN , Jurgen VAN SOEST
IPC分类号： H01J37/317 , H01J37/147 , H01J37/22 , H01J37/244 , H01J37/28
CPC分类号： H01J37/3177 , H01J37/1474 , H01J37/226 , H01J37/244 , H01J37/28
摘要： A charged-particle optical apparatus configured to project a multi-beam of charged particles, the apparatus comprising: a charged particle device switchable between (i) an operational configuration in which the device is configured to project the multi-beam to a sample along an operational beam path extending from a source of the multi-beam to the sample and (ii) a monitoring configuration in which the device is configured to project the multi-beam to a detector along a monitoring beam path extending from the source to the detector; wherein the monitoring beam path diverts from the inspection beam path part way along the operational beam path.
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公开(公告)号：US20220213593A1
公开(公告)日：2022-07-07
申请号：US17600493
申请日：2020-03-20
发明人： Tamara DRUZHININA , Jim Vincent OVERKAMP , Alexey Olegovich POLYAKOV , Teis Johan COENEN , Evgenia KURGANOVA , Ionel Mugurel CIOBICA , Alexander Ludwig KLEIN , Albertus Victor Gerardus MANGNUS , Marijke SCOTUZZI , Bastiaan Maurice VAN DEN BROEK
摘要： Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated during a deposition process, the irradiation being such as to locally drive the deposition process in the selected portion to form a layer of deposited material in a pattern defined by the selected portion. The deposited material is annealed to modify the deposited material.
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5.发明公开公开(公告)号：US20240339292A1
公开(公告)日：2024-10-10
申请号：US18748758
申请日：2024-06-20
IPC分类号： H01J37/244 , H01J37/10 , H01J37/28
CPC分类号： H01J37/244 , H01J37/10 , H01J37/28
摘要： There is provided a charged particle device for a charged particle inspection apparatus for projecting an array of sub-beams towards a sample, the charged particle device comprising: a charged particle optical element and a detector. The charged particle optical element has an up-beam surface having a plurality of openings to generate an array of sub-beams from a charged particle beam. In the charged particle optical element are defined: sub-beam apertures and monitoring apertures. The sub-beam aperture extend through the charged particle element for paths of the array of sub-beams towards a sample. The monitoring aperture extends through the charged particle element. The detector is in the monitoring aperture. At least part of the detector is down-beam of the up-beam surface. The detector measures a parameter of a portion of the charged particle beam incident on the detector.
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公开(公告)号：US20230324318A1
公开(公告)日：2023-10-12
申请号：US18327847
申请日：2023-06-01
发明人： Yan REN , Erwin SLOT , Albertus Victor, Gerardus MANGNUS , Marijke SCOTUZZI , Erwin Paul SMAKMAN
IPC分类号： G01N23/2251 , H01J37/244 , H01J37/09 , H01J37/12 , H01J37/147
CPC分类号： G01N23/2251 , H01J37/244 , H01J37/09 , H01J37/12 , H01J37/1472 , G01N2223/303 , H01J2237/2448 , H01J2237/0453 , H01J37/20
摘要： A charged-particle tool configured to generate a plurality of sub-beams from a beam of charged particles and direct the sub-beams downbeam toward a sample position, the tool charged-particle tool comprising at least three charged-particle-optical components; a detector module; and a controller. Thea detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode. The charged-particle-optical components include: a charged-particle source configured to emit a beam of charged particles and a beam generator configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.
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公开(公告)号：US20230280662A1
公开(公告)日：2023-09-07
申请号：US18023708
申请日：2021-08-17
CPC分类号： G03F7/706841 , G03F7/70133
摘要： Methods of performing metrology. In one arrangement a substrate has a layer. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with a beam of radiation and a distribution of radiation in a pupil plane is detected to obtain measurement data. The measurement data is processed to obtain metrology information about the target portion of the layer. The illuminating, detecting and processing are performed for plural different target portions of the layer to obtain metrology information for the plural target portions of the layer.
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