Interdigital deflection sensor for microcantilevers
    1.
    发明授权
    Interdigital deflection sensor for microcantilevers 失效
    用于微型悬臂的交叉偏转传感器

    公开(公告)号:US5908981A

    公开(公告)日:1999-06-01

    申请号:US708446

    申请日:1996-09-05

    摘要: A deflection sensor for a microcantilever includes two sets of interdigitated fingers, one (reference) set being attached to the substrate from which the microcantilever extends and the other (movable) set being attached to the tip of the microcantilever. Together the interdigitated fingers form an optical phase grating. The deflection of the microcantilever is measured by directing a light beam against the optical phase grating and detecting the intensity of the reflected light in the first (or other) component of the resulting diffraction pattern. As the microcantilever deflects, the reference and movable fingers move relative to one another creating large variations in the intensity of the zeroth and first order components of the diffraction pattern. To eliminate "1/f" noise the deflection of the microcantilever can be measured using an AC signal.

    摘要翻译: 用于微悬臂梁的偏转传感器包括两组交叉指状物,一个(参考)组附接到基体上,微型悬臂从该基底延伸,另一组(可移动)组附接到微悬臂梁的尖端。 交叉指状物一起形成光学相位光栅。 通过将光束引导到光学相位光栅并检测所得衍射图案的第一(或其它)分量中的反射光的强度来测量微悬臂梁的偏转。 当微悬臂梁偏转时,参考和可动指状物相对于彼此移动,从而产生衍射图案的第零级和第一级分量的强度的大变化。 为了消除“1 / f”噪声,可以使用AC信号测量微悬臂梁的偏转。

    Method for making nitride cantilevers devices
    2.
    发明授权
    Method for making nitride cantilevers devices 失效
    制造氮化物悬臂装置的方法

    公开(公告)号:US6156216A

    公开(公告)日:2000-12-05

    申请号:US152746

    申请日:1998-09-14

    摘要: A method for making a silicon stylus protruding through a nitride layer is used to fabricate nitride micro-apertures, silicon styluses supported by nitride cantilever arms and charge sensitive silicon styluses supported by nitride cantilever arms. The method uses an anisotropic dry etch to define the apertures of the nitride micro-apertures and the apexes of the silicon styluses. Nitride apertures made by this method are useful for supporting micro-electronics and micro-optical devices. Surface probing devices with silicon styluses supported by nitride cantilever arms have applications in AFM and STM and are particularly useful in applications that require an electrical connection between the silicon stylus and external circuitry through the cantilever arm.

    摘要翻译: 用于制造穿过氮化物层的硅触针的方法用于制造氮化物微孔,由氮化物悬臂支撑的硅触针和由氮化物悬臂支撑的电荷敏感硅探针。 该方法使用各向异性干蚀刻来限定氮化硅微孔和硅探针的顶点的孔。 通过该方法制造的氮化物孔径对于支持微电子和微型光学器件是有用的。 具有由氮化物悬臂支撑的硅触针的表面探测装置在AFM和STM中具有应用,并且在需要通过悬臂的硅触针和外部电路之间的电连接的应用中特别有用。

    Scanning probe potentiometer
    3.
    发明授权
    Scanning probe potentiometer 失效
    扫描探头电位器

    公开(公告)号:US6002131A

    公开(公告)日:1999-12-14

    申请号:US47887

    申请日:1998-03-25

    摘要: A system for scanning and measuring a surface charge of a sample immersed in a conductive medium, such as an aqueous electrolytic solution or a gel, or positioned on a conducting plate. The system has a semiconductor with a probing surface clad in a charge-sensitive layer. The probing surface moves over the sample during scanning while a bias voltage V.sub.BIAS is applied to create a depletion layer in the semiconductor and to induce the system to alter a measurable electrical property. The electrical property is monitored with the aid of a measuring device and the measurement is correlated to the sample's surface charge. In a preferred embodiment the semiconductor is a part of a cantilever structure of the type having a probing tip and the probing surface is located on the apex of the probing tip thereby enabling examination of the topology and surface charge of the sample concurrently.

    摘要翻译: 一种用于扫描和测量浸渍在诸如电解质水溶液或凝胶的导电介质中的样品的表面电荷或定位在导电板上的系统。 该系统具有包含在电荷敏感层中的探测表面的半导体。 探测表面在扫描期间移动到样品上方,同时施加偏置电压VBIAS以在半导体中产生耗尽层并诱导系统改变可测量的电性能。 借助于测量装置监测电气特性,测量与样品的表面电荷相关。 在优选实施例中,半导体是具有探测尖端的类型的悬臂结构的一部分,并且探测表面位于探测尖端的顶点上,从而能够同时检查样品的拓扑和表面电荷。

    Direct DNA sequencing with a transcription protein and a nanometer scale electrometer
    4.
    发明授权
    Direct DNA sequencing with a transcription protein and a nanometer scale electrometer 失效
    用转录蛋白和纳米级静电计进行直接DNA测序

    公开(公告)号:US06770472B2

    公开(公告)日:2004-08-03

    申请号:US09993338

    申请日:2001-11-13

    IPC分类号: C12M134

    摘要: The present invention provides an apparatus and method for nucleotide or DNA sequencing by monitoring the molecular charge configuration as the DNA moves through a protein that is capable of transcribing the DNA. The apparatus and method provides a nanoscale electrometer that immobilizes the protein. The protein receives the DNA and transcribes the DNA. The nanoscale electrometer is a sensitive device that is capable of sensing and measuring the electronic charge that is released during the transcription process. The apparatus and method of the present invention further provides monitoring means that are attached to the nanoscale electrometer to monitor the electronic charge configuration as the DNA moves through the protein. Once the electronic charge configuration is established, a correlation is computed, using computing means, between the electronic charge configuration and a nucleotide signature of the DNA.

    摘要翻译: 本发明提供了一种用于核苷酸或DNA测序的装置和方法,该装置和方法通过在DNA通过能够转录DNA的蛋白质移动时监测分子电荷构型。 该装置和方法提供固定蛋白质的纳米级静电计。 蛋白质接受DNA并转录DNA。 纳米级静电计是能够感测和测量在转录过程中释放的电子电荷的敏感器件。 本发明的装置和方法还提供了监测装置,其连接到纳米级静电计,以在DNA通过蛋白质移动时监测电子电荷构型。 一旦建立了电子充电配置,就使用计算装置在电子电荷配置和DNA的核苷酸特征之间计算相关性。

    Bimorph spirals for uncooled photothermal spectroscopy
    5.
    发明授权
    Bimorph spirals for uncooled photothermal spectroscopy 失效
    双相双螺旋线用于未冷却的光热光谱

    公开(公告)号:US06307202B1

    公开(公告)日:2001-10-23

    申请号:US09332540

    申请日:1999-06-14

    IPC分类号: G01J510

    CPC分类号: G01J5/40

    摘要: A bimorph spiral which exhibits a shape-altering response to thermal radiation and is dimensioned to have a focussing effect on light, such as a visible light, by acting as a quasi-Fresnel element. The focussing effect varies as the shape of the bimorph spiral changes due to absorption of thermal radiation. An array of such bimorph spirals can be used for efficient, high-resolution and rapid uncooled photothermal spectroscopy.

    摘要翻译: 具有对热辐射形状改变的响应的双压电晶片螺旋,并且通过充当准菲涅尔元件的尺寸设计成具有对光(例如可见光)的聚焦效应。 聚焦效应随着双压电晶片的形状由于热辐射的吸收而变化。 这种双压电晶片阵列可用于高效,高分辨率和快速非冷却光热光谱。

    Harmonic cantilevers and imaging methods for atomic force microscopy
    6.
    发明授权
    Harmonic cantilevers and imaging methods for atomic force microscopy 有权
    用于原子力显微镜的谐波悬臂和成像方法

    公开(公告)号:US07451638B1

    公开(公告)日:2008-11-18

    申请号:US11187991

    申请日:2005-07-22

    IPC分类号: H01J37/00

    摘要: A harmonic cantilever for use in an atomic force microscope includes a cantilever arm and a probe tip. The cantilever arm has a shape selected to tune the fundamental resonance frequency or a resonance frequency of a selected higher order mode so that the fundamental and higher-order resonance frequencies have an integer ratio or near integer ratio. In one embodiment, the cantilever arm can be shaped to tune the fundamental resonance frequency. Alternately, the cantilever arm can include a geometric feature for tuning the resonance frequency of the fundamental mode or the selected higher order mode. An imaging method using the harmonic cantilever is disclosed whereby signals at the higher harmonics are measured to determine the material properties of a sample. In other embodiment, a cantilever includes a probe tip positioned at a location of minimum displacement of unwanted harmonics for suppressing signals associated with the unwanted harmonics.

    摘要翻译: 用于原子力显微镜的谐波悬臂包括悬臂和探针尖。 悬臂臂具有选择的形状来调谐基本共振频率或所选高阶模式的谐振频率,使得基波和高次谐振频率具有整数比或接近整数比。 在一个实施例中,悬臂可以成形为调谐基本共振频率。 或者,悬臂可以包括用于调谐基本模式或选择的较高阶模式的谐振频率的几何特征。 公开了使用谐波悬臂的成像方法,其中测量高次谐波的信号以确定样品的材料性质。 在另一个实施例中,悬臂包括位于最小位移处的不需要的谐波的探针尖端,用于抑制与不需要的谐波相关联的信号。

    Method of forming small aperture
    7.
    发明授权
    Method of forming small aperture 失效
    形成小孔径的方法

    公开(公告)号:US5858256A

    公开(公告)日:1999-01-12

    申请号:US679687

    申请日:1996-07-11

    摘要: A thick column is formed by masking and etching a substrate, and the column is thinned to a very small diameter (e.g., .ltoreq.5 nm) by oxidizing the column and removing the oxide layer. A metal layer is deposited on the surface of the substrate, and the column and substrate are etched to form a pit. The backside of the substrate is etched to form an aperture surrounded by the metal layer. Alternatively, the metal layer is removed and a dopant layer is implanted into the substrate, followed by the etching of the backside, leaving an aperture surrounded by the dopant layer. In a second alternative, the oxidized column is broken from the substrate, and the backside is etched, leaving an aperture surrounded by an oxide layer. These processes can be used to fabricate apertures of very small and reproducible dimensions for such instruments as near field scanning optical microscopes and scanning ion conductance microscopes.

    摘要翻译: 通过掩蔽和蚀刻衬底形成厚的柱,并且通过氧化柱并除去氧化物层将柱变薄到非常小的直径(例如,

    Harmonic cantilevers and imaging methods for atomic force microscopy
    8.
    发明授权
    Harmonic cantilevers and imaging methods for atomic force microscopy 失效
    用于原子力显微镜的谐波悬臂和成像方法

    公开(公告)号:US06935167B1

    公开(公告)日:2005-08-30

    申请号:US10801394

    申请日:2004-03-15

    摘要: A harmonic cantilever for use in a tapping-mode atomic force microscope includes a cantilever arm and a probe tip. The cantilever arm has a shape selected to tune the fundamental resonance frequency or a resonance frequency of a selected higher order mode so that the fundamental and higher-order resonance frequencies have an integer ratio or near integer ratio. In one embodiment, the cantilever arm can be shaped to tune the fundamental resonance frequency. Alternately, the cantilever arm can include a geometric feature for tuning the resonance frequency of the fundamental mode or the selected higher order mode. An imaging method using the harmonic cantilever is disclosed whereby signals at the higher harmonics are measured to determine the material properties of a sample. In other embodiment, a cantilever includes a probe tip positioned at a location of minimum displacement of unwanted harmonics for suppressing signals associated with the unwanted harmonics.

    摘要翻译: 用于攻丝模​​式原子力显微镜的谐波悬臂包括悬臂和探针尖。 悬臂臂具有选择的形状来调谐基本共振频率或所选高阶模式的谐振频率,使得基波和高次谐振频率具有整数比或接近整数比。 在一个实施例中,悬臂可以成形为调谐基本共振频率。 或者,悬臂可以包括用于调谐基本模式或选择的较高阶模式的谐振频率的几何特征。 公开了使用谐波悬臂的成像方法,其中测量高次谐波的信号以确定样品的材料性质。 在另一个实施例中,悬臂包括位于最小位移处的不需要的谐波的探针尖端,用于抑制与不需要的谐波相关联的信号。

    Dual cantilever scanning probe microscope
    9.
    发明授权
    Dual cantilever scanning probe microscope 失效
    双悬臂扫描探针显微镜

    公开(公告)号:US06028305A

    公开(公告)日:2000-02-22

    申请号:US47239

    申请日:1998-03-25

    摘要: This microscope apparatus comprises two probes. The first probe is configured to interact with and measure characteristics of surfaces within an effective measurement distance of the first probe. This probe could be contact type, non-contact type, constant force mode, or constant height mode. A combination of actuation devices positions the first probe over a surface of a sample. The surface is scanned at high speeds in search of a target area. When a target area is found, a scanner moves the sample so that a second contact type probe with a sharp tip is positioned over the target area. The second probe is activated and the target area is scanned at low speeds and high resolution. The first and second probes are part of the same probe assembly. The probe assembly of the present invention does not require probe replacement as frequently as current assemblies because the sharp tip is used only at low speeds and high resolution configurations. Thus, the sharp tip wears slower than it would if the sharp tip was used to find the target feature as well.

    摘要翻译: 该显微镜装置包括两个探针。 第一探针被配置为与第一探针的有效测量距离内的表面相互作用并测量表面的特征。 该探头可以是接触式,非接触型,恒力模式或恒定高度模式。 致动装置的组合将第一探针定位在样品的表面上。 高速扫描表面以寻找目标区域。 当找到目标区域时,扫描器移动样本,使得具有尖锐尖端的第二接触型探针位于目标区域上方。 第二个探针被激活,目标区域以低速和高分辨率扫描。 第一和第二探针是相同探针组件的一部分。 本发明的探头组件不需要像现有组件那样频繁地进行探头更换,因为尖端仅在低速和高分辨率配置下使用。 因此,尖锐的尖端磨损比如果尖锐的尖端用于找到目标特征时的磨损更慢。

    Method of etching a pattern on a substrate using a scanning probe
microscope
    10.
    发明授权
    Method of etching a pattern on a substrate using a scanning probe microscope 失效
    使用扫描探针显微镜对基板上的图案进行蚀刻的方法

    公开(公告)号:US5618760A

    公开(公告)日:1997-04-08

    申请号:US311763

    申请日:1994-09-23

    摘要: A scanning probe microscope is used to pattern a layer of resist, and the pattern is transferred to a substrate. First, an underlayer formed of, for example, polyimide and a top layer formed of, for example, amorphous silicon are deposited on the substrate. A pattern is formed on the top layer using the tip of the cantilever in a scanning probe microscope. The pattern may consist of an oxide formed by an electric field at the cantilever tip. The top layer is then etched using the pattern as a mask and using an etchant that is selective against the underlayer. The underlayer is then etched using an etchant that is selective against the top layer and substrate. The substrate is etched with an etchant that removes the top layer but is selective against the underlayer. Finally, the underlayer is removed.

    摘要翻译: 使用扫描探针显微镜对抗蚀剂层进行图案化,并将图案转印到基底上。 首先,由例如聚酰亚胺和由例如非晶硅形成的顶层形成的底层沉积在基板上。 在扫描探针显微镜中使用悬臂的尖端在顶层上形成图案。 该图案可以由在悬臂尖端处的电场形成的氧化物组成。 然后使用图案作为掩模蚀刻顶层,并使用对底层有选择性的蚀刻剂。 然后使用对顶层和衬底选择性的蚀刻剂来蚀刻底层。 用蚀刻剂蚀刻衬底,除去顶层,但是对底层是选择性的。 最后,底层被去除。