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    Spectroscopic ellipsometer without rotating components
    1.
    发明授权
    Spectroscopic ellipsometer without rotating components 有权
    光学椭偏仪无旋转元件

    公开(公告)号：US06753961B1

    公开(公告)日：2004-06-22

    申请号：US09956356

    申请日：2001-09-18

    申请人： Adam E. Norton ,  Kenneth C. Johnson ,  Fred E. Stanke ,  Abdurrahman Sezginer

    发明人： Adam E. Norton ,  Kenneth C. Johnson ,  Fred E. Stanke ,  Abdurrahman Sezginer

    IPC分类号： G01J400

    CPC分类号： G01J3/447 ,  G01J4/00 ,  G01N21/211 ,  G01N21/274 ,  G01N2021/213

    摘要： A spectroscopic ellipsometer having a multiwavelength light source, spectrometer (or wavelength-scanning monochromator and photodetector), a polarizer and polarization analyzer, and one or more objectives in the illumination and collection light paths, further comprises a stationary polarization modulator that modulates the light polarization versus wavelength. Modulator can be an optically active crystal rotating the linear polarization plane by a different angle for each wavelength or a non-achromatic waveplate retarder that varies the relative phase delay of the polarization components periodically over wavelength. The measured spectrum can be used to characterize selected features or parameters of a sample, e.g. by comparison with one or more theoretical spectra.

    摘要翻译： 具有多波长光源，光谱仪（或波长扫描单色仪和光电检测器），偏振器和偏振分析器以及照明和采集光路中的一个或多个目标的光谱椭偏仪还包括调制光偏振的固定偏振调制器 对波长。 调制器可以是旋转线性偏振平面对于每个波长旋转不同角度的光学活性晶体，或者是在波长周期性地改变偏振分量的相对相位延迟的非消色差波片延迟器。 测量的光谱可用于表征所选择的特征或样品的参数，例如。 通过与一个或多个理论光谱进行比较。

    Overlay alignment metrology using diffraction gratings
    2.
    发明授权
    Overlay alignment metrology using diffraction gratings 有权

    公开(公告)号：US07042569B2

    公开(公告)日：2006-05-09

    申请号：US10917219

    申请日：2004-08-12

    申请人： Abdurrahman Sezginer ,  Kenneth C. Johnson ,  Fred E. Stanke

    发明人： Abdurrahman Sezginer ,  Kenneth C. Johnson ,  Fred E. Stanke

    IPC分类号： G01B11/00

    CPC分类号： G03F7/70633 ,  H01L22/34 ,  H01L2223/54453

    摘要： Alignment accuracy between two or more patterned layers is measured using a metrology target comprising substantially overlapping diffraction gratings formed in a test area of the layers being tested. An optical instrument illuminates all or part of the target area and measures the optical response. The instrument can measure transmission, reflectance, and/or ellipsometric parameters as a function of wavelength, polar angle of incidence, azimuthal angle of incidence, and/or polarization of the illumination and detected light. Overlay error or offset between those layers containing the test gratings is determined by a processor programmed to calculate an optical response for a set of parameters that include overlay error, using a model that accounts for diffraction by the gratings and interaction of the gratings with each others' diffracted field. The model parameters might also take account of manufactured asymmetries. The calculation may involve interpolation of pre-computed entries from a database accessible to the processor. The calculated and measured responses are iteratively compared and the model parameters changed to minimize the difference.

    Overlay alignment metrology using diffraction gratings
    3.
    发明授权
    Overlay alignment metrology using diffraction gratings 有权
    使用衍射光栅覆盖对准测量

    公开(公告)号：US06819426B2

    公开(公告)日：2004-11-16

    申请号：US10074561

    申请日：2002-02-12

    申请人： Abdurrahman Sezginer ,  Kenneth C. Johnson ,  Fred E. Stanke

    发明人： Abdurrahman Sezginer ,  Kenneth C. Johnson ,  Fred E. Stanke

    IPC分类号： G01B1100

    CPC分类号： G03F7/70633 ,  H01L22/34 ,  H01L2223/54453

    摘要： Alignment accuracy between two or more patterned layers is measured using a metrology target comprising substantially overlapping diffraction gratings formed in a test area of the layers being tested. An optical instrument illuminates all or part of the target area and measures the optical response. The instrument can measure transmission, reflectance, and/or ellipsometric parameters as a function of wavelength, polar angle of incidence, azimuthal angle of incidence, and/or polarization of the illumination and detected light. Overlay error or offset between those layers containing the test gratings is determined by a processor programmed to calculate an optical response for a set of parameters that include overlay error, using a model that accounts for diffraction by the gratings and interaction of the gratings with each others' diffracted field. The model parameters might also take account of manufactured asymmetries. The calculation may involve interpolation of pre-computed entries from a database accessible to the processor. The calculated and measured responses are iteratively compared and the model parameters changed to minimize the difference.

    摘要翻译： 使用包括在被测试层的测试区域中形成的基本上重叠的衍射光栅的测量目标来测量两个或更多个图案化层之间的对准精度。 光学仪器照亮目标区域的全部或部分，并测量光学响应。 仪器可以测量作为波长，极角入射角，入射方位角和/或照明和检测光的偏振的函数的透射率，反射率和/或椭偏参数。 包含测试光栅的那些层之间的叠加误差或偏移量被编程为使用考虑光栅衍射的模型和光栅与彼此的相互作用计算包括重叠误差的一组参数的光学响应的​​处理器来确定 '衍射场 模型参数也可能考虑到制造的不对称性。 该计算可以包括从处理器可访问的数据库插入预先计算的条目。 迭代比较计算和测量的响应，改变模型参数以最小化差异。

    Database interpolation method for optical measurement of diffractive microstructures
    4.
    发明授权
    Database interpolation method for optical measurement of diffractive microstructures 失效
    衍射微观结构的光学测量数据库插值方法

    公开(公告)号：US06768967B2

    公开(公告)日：2004-07-27

    申请号：US09927177

    申请日：2001-08-10

    申请人： Kenneth C. Johnson ,  Fred E. Stanke

    发明人： Kenneth C. Johnson ,  Fred E. Stanke

    IPC分类号： G01B1106

    CPC分类号： G02B5/18 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956

    摘要： A database interpolation method is used to rapidly calculate a predicted optical response characteristic of a diffractive microstructure as part of a real-time optical measurement process. The interpolated optical response is a continuous and (in a preferred embodiment) smooth function of measurement parameters, and it matches the theoretically-calculated optical response at the database-stored interpolation points.

    摘要翻译： 数据库插值方法用于快速计算衍射微结构的预测光学响应特性，作为实时光学测量过程的一部分。 内插的光学响应是连续的（在优选实施例中）测量参数的平滑功能，并且它与在数据库存储的插值点处的理论计算的光学响应相匹配。

    Method of measuring meso-scale structures on wafers
    5.
    发明授权
    Method of measuring meso-scale structures on wafers 有权
    测量晶圆上的中尺度结构的方法

    公开(公告)号：US06806105B2

    公开(公告)日：2004-10-19

    申请号：US10621218

    申请日：2003-07-16

    申请人： Kenneth C. Johnson ,  Fred E. Stanke

    发明人： Kenneth C. Johnson ,  Fred E. Stanke

    IPC分类号： H01L2166

    CPC分类号： H01L21/67 ,  G01B11/0625 ,  G01B11/30 ,  G01N21/211 ,  H01L22/12

    摘要： A method of measuring at least one parameter associated with a portion of a sample having formed thereon one or more structures with at least two zones each having an associated zone reflectance property. The method includes the steps of illuminating the zones with broadband light, and measuring at least one reflectance property of light reflected from the at least two zones. The measurement includes a substantial portion of non-specularly scattered light, thereby increasing the quality of the measurement. The method further includes the step of fitting a parameterized model to the measured reflectance property. The parameterized model mixes the zone reflectance properties of the zones to account for partially coherent light interactions between the two zones.

    Method of measuring meso-scale structures on wafers
    7.
    发明授权
    Method of measuring meso-scale structures on wafers 有权

    公开(公告)号：US06340602B1

    公开(公告)日：2002-01-22

    申请号：US09735286

    申请日：2001-02-12

    申请人： Kenneth C. Johnson ,  Fred E. Stanke

    发明人： Kenneth C. Johnson ,  Fred E. Stanke

    IPC分类号： H01L2100

    CPC分类号： H01L21/67 ,  G01B11/0625 ,  G01B11/30 ,  G01N21/211 ,  H01L22/12

    摘要： A method of measuring at least one parameter associated with a portion of a sample having formed thereon one or more structures with at least two zones each having an associated zone reflectance property. The method includes the steps of illuminating the zones with broadband light, and measuring at least one reflectance property of light reflected from the at least two zones. The measurement includes a substantial portion of non-specularly scattered light, thereby increasing the quality of the measurement. The method further includes the step of fitting a parameterized model to the measured reflectance property. The parameterized model mixes the zone reflectance properties of the zones to account for partially coherent light interactions between the two zones.

    Small-spot spectrometry instrument with reduced polarization and multiple-element depolarizer therefor
    9.
    发明授权
    Small-spot spectrometry instrument with reduced polarization and multiple-element depolarizer therefor 失效
    具有减少极化的小点光谱仪器和多元素去极化器

    公开(公告)号：US07248362B2

    公开(公告)日：2007-07-24

    申请号：US11599906

    申请日：2006-11-15

    申请人： Adam E. Norton ,  Kenneth C. Johnson ,  Fred E. Stanke

    发明人： Adam E. Norton ,  Kenneth C. Johnson ,  Fred E. Stanke

    IPC分类号： G01J3/28

    CPC分类号： G01J3/02 ,  G01J3/0224 ,  G01J3/0243 ,  G01J3/28 ,  G01N21/21 ,  G01N21/31 ,  G01N21/956 ,  G01N2021/213 ,  G02B5/3083 ,  G02B27/28 ,  G02B27/286 ,  G02B27/288 ,  G03F7/70625 ,  G03F7/70991

    摘要： A small-spot imaging, spectrometry instrument for measuring properties of a sample has a polarization-scrambling element, such as a birefringent plate depolarizer, incorporated between the polarization-introducing components of the system, such as the beamsplitter, and the microscope objective of the system. The plate depolarizer varies polarization with wavelength, and may be a Lyot depolarizer with two plates, or a depolarizer with more than two plates (such as a three-plate depolarizer). Sinusoidal perturbation in the resulting measured spectrum can be removed by data processing techniques or, if the depolarizer is thick or highly birefringent, the perturbation may be narrower than the wavelength resolution of the instrument.

    摘要翻译： 用于测量样品性质的小点成像光谱仪器具有结合在系统的偏振引导部件（例如分束器）之间的偏振加扰元件，例如双折射板去偏振器，以及显微镜物镜 系统。 板去极化器可以使波长偏振，并且可以是具有两个板的Lyot去极化器或具有多于两个板（例如三板去极化器）的去极化器。 可以通过数据处理技术去除所得测量光谱中的正弦扰动，或者如果消偏振器是厚的或高度双折射的，则扰动可能比仪器的波长分辨率窄。