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    Multi-directional scanning of movable member and ion beam monitoring arrangement therefor
    8.
    发明授权
    Multi-directional scanning of movable member and ion beam monitoring arrangement therefor 有权
    可移动构件的多方向扫描和离子束监测装置

    公开(公告)号：US06956223B2

    公开(公告)日：2005-10-18

    申请号：US10119290

    申请日：2002-04-10

    申请人： Theodore H. Smick ,  Frank D. Roberts ,  Marvin Farley ,  Geoffrey Ryding ,  Takao Sakase ,  Adrian Murrell ,  Peter Edwards ,  Bernard Harrison

    发明人： Theodore H. Smick ,  Frank D. Roberts ,  Marvin Farley ,  Geoffrey Ryding ,  Takao Sakase ,  Adrian Murrell ,  Peter Edwards ,  Bernard Harrison

    IPC分类号： H01J37/04 ,  H01J37/18 ,  H01J37/317 ,  H01L21/265 ,  H01L21/68 ,  B05C5/00

    CPC分类号： H01J37/20 ,  H01J37/18 ,  H01J37/3171 ,  H01J2237/20 ,  H01J2237/2006 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20228 ,  H01J2237/20278 ,  H01L21/682 ,  H01L21/6835

    摘要： Semiconductor processing apparatus is disclosed which provides for movement of a scanning arm 60 of a substrate or wafer holder 180, in at least two generally orthogonal directions (so-called X-Y scanning). Scanning in a first direction is longitudinally through an aperture 55 in a vacuum chamber wall. The arm 60 is reciprocated by one or more linear motors 90A, 90B. The arm 60 is supported relative to a slide 100 using gimballed air bearings so as to provide cantilever support for the arm relative to the slide 100. A compliant feedthrough 130 into the vacuum chamber for the arm 60 then acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faraday 450 is attached to the arm 60 adjacent the substrate holder 180 to allow beam profiling to be carried out both prior to and during implant. The Faraday 450 can instead or additionally be mounted adjacent the rear of the substrate holder or at 90° to it to allow beam profiling to be carried out prior to implant, with the substrate support reversed or horizontal and out of the beam line.

    摘要翻译： 公开了半导体处理装置，其提供基板或晶片保持器180的扫描臂60在至少两个大致正交的方向（所谓的X-Y扫描）上的移动。 沿着第一方向进行的扫描纵向地穿过真空室壁中的孔口55。 臂60由一个或多个线性电动机90A，90B往复运动。臂60相对于滑块100被支撑，使用支撑的空气轴承，以便相对于滑块100为臂提供悬臂支撑。 进入用于臂60的真空室中的柔性馈通件130然后用作真空密封和引导件，但本身不需要提供轴承支撑件。 法拉第450附接到靠近基板保持器180的臂60，以允许在植入之前和期间执行光束轮廓。 法拉第450可以替代地或附加地安装在靠近衬底保持器的后部或与其相邻的90°处，以允许在植入之前执行光束轮廓，其中衬底支撑件反向或水平并且离开光束线。