公开(公告)号：US09947562B2

公开(公告)日：2018-04-17

申请号：US13016742

申请日：2011-01-28

申请人： AiHua Chen ,  Ryoji Todaka ,  Gerald Yin

发明人： AiHua Chen ,  Ryoji Todaka ,  Gerald Yin

IPC分类号： H01L21/67 ,  C23C16/458

CPC分类号： H01L21/6719 ,  C23C16/458 ,  C23C16/4582 ,  C23C16/4583 ,  C23C16/4584

摘要： A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece.

公开(公告)号：US20070032097A1

公开(公告)日：2007-02-08

申请号：US11441291

申请日：2006-05-24

申请人： AiHua Chen ,  Ryoji Todaka ,  Gerald Yin

发明人： AiHua Chen ,  Ryoji Todaka ,  Gerald Yin

IPC分类号： H01L21/00

CPC分类号： H01L21/6719 ,  C23C16/458 ,  C23C16/4582 ,  C23C16/4583 ,  C23C16/4584

摘要： A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece.

摘要翻译： 公开了一种用于半导体工件和相关方法的处理装置，其包括具有内部空腔的处理室，并且其中设置有多个可旋转的处理站，并且其中可旋转的处理站各自处理半导体工件。

公开(公告)号：US08715418B2

公开(公告)日：2014-05-06

申请号：US11440747

申请日：2006-05-24

申请人： AiHua Chen

发明人： AiHua Chen

IPC分类号： C23C16/00 ,  H01L21/68

CPC分类号： H01L21/6719 ,  H01L21/67742

摘要： A semiconductor processing system and related methodology is disclosed and which includes a processing chamber having an internal cavity and a transfer port; a transfer chamber which is positioned adjacent to the processing chamber; and a transfer apparatus having at least two extendible arms which are positioned within the transfer chamber, and wherein each of the extendible arms carry a semiconductor work piece into and out of the processing chamber by way of the transfer port, and wherein the at least two extendible arms are selectively vertically moveable, and further are each selectively moveable in the direction of the transfer port.

摘要翻译： 公开了一种半导体处理系统和相关方法，其包括具有内部空腔和转移端口的处理室; 位于处理室附近的传送室; 以及传送装置，其具有位于所述传送室内的至少两个可延伸臂，并且其中每个所述可延伸臂通过所述传送端口将半导体工件运送到和离开所述处理室，并且其中所述至少两个 可伸缩臂选择性地可垂直移动，并且还可以在传送端口的方向上选择性地移动。

公开(公告)号：US20110305544A1

公开(公告)日：2011-12-15

申请号：US13016742

申请日：2011-01-28

申请人： AiHua Chen ,  Ryoji Todaka ,  Gerald Yin

发明人： AiHua Chen ,  Ryoji Todaka ,  Gerald Yin

IPC分类号： H01L21/67 ,  H05B3/06

CPC分类号： H01L21/6719 ,  C23C16/458 ,  C23C16/4582 ,  C23C16/4583 ,  C23C16/4584

摘要： A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece.

摘要翻译： 公开了一种用于半导体工件和相关方法的处理装置，其包括具有内部空腔的处理室，并且其中设置有多个可旋转的处理站，并且其中可旋转的处理站各自处理半导体工件。

公开(公告)号：US07658800B2

公开(公告)日：2010-02-09

申请号：US11602568

申请日：2006-11-20

申请人： AiHua Chen ,  Shulin Wang ,  Henry Ho ,  Gerald Yin ,  Qing Lv ,  Li Fu

发明人： AiHua Chen ,  Shulin Wang ,  Henry Ho ,  Gerald Yin ,  Qing Lv ,  Li Fu

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： C23C16/45565 ,  C23C16/45574

摘要： A semiconductor work piece processing reactor is described and which includes a processing chamber defining a deposition region; a pedestal which supports and moves a semiconductor work piece to be processed within the deposition region of the processing chamber; and a gas distribution assembly mounted within the processing chamber and which defines first and second reactive gas passageways which are separated from each other, and which deliver two reactant gases to a semiconductor work piece which is positioned near the gas distribution assembly.

摘要翻译： 描述了半导体工件处理反应器，其包括限定沉积区域的处理室; 基座，其在所述处理室的所述沉积区域内支撑并移动待处理的半导体工件; 以及气体分配组件，其安装在所述处理室内并且限定彼此分离的第一和第二反应气体通道，并且将两个反应气体输送到位于所述气体分配组件附近的半导体工件。

公开(公告)号：US20080092815A1

公开(公告)日：2008-04-24

申请号：US11602568

申请日：2006-11-20

申请人： AiHua Chen ,  Shulin Wang ,  Henry Ho ,  Gerald Yin ,  Qing Lv ,  Li Fu

发明人： AiHua Chen ,  Shulin Wang ,  Henry Ho ,  Gerald Yin ,  Qing Lv ,  Li Fu

IPC分类号： C23F1/00 ,  C23C16/00

CPC分类号： C23C16/45565 ,  C23C16/45574

摘要： A semiconductor work piece processing reactor is described and which includes a processing chamber defining a deposition region; a pedestal which supports and moves a semiconductor work piece to be processed within the deposition region of the processing chamber; and a gas distribution assembly mounted within the processing chamber and which defines first and second reactive gas passageways which are separated from each other, and which deliver two reactant gases to a semiconductor work piece which is positioned near the gas distribution assembly.

摘要翻译： 描述了半导体工件处理反应器，其包括限定沉积区域的处理室; 基座，其在所述处理室的所述沉积区域内支撑并移动待处理的半导体工件; 以及气体分配组件，其安装在处理室内并且限定彼此分离的第一和第二反应气体通道，并将两个反应气体输送到位于气体分配组件附近的半导体工件。

公开(公告)号：US20070031236A1

公开(公告)日：2007-02-08

申请号：US11440747

申请日：2006-05-24

申请人： AiHua Chen

发明人： AiHua Chen

IPC分类号： H01L21/68

CPC分类号： H01L21/6719 ,  H01L21/67742

摘要： A semiconductor processing system and related methodology is disclosed and which includes a processing chamber having an internal cavity and a transfer port; a transfer chamber which is positioned adjacent to the processing chamber; and a transfer apparatus having at least two extendible arms which are positioned within the transfer chamber, and wherein each of the extendible arms carry a semiconductor work piece into and out of the processing chamber by way of the transfer port, and wherein the at least two extendible arms are selectively vertically moveable, and further are each selectively moveable in the direction of the transfer port.

摘要翻译： 公开了一种半导体处理系统和相关方法，其包括具有内部空腔和转移端口的处理室; 位于处理室附近的传送室; 以及传送装置，其具有位于所述传送室内的至少两个可延伸臂，并且其中每个所述可延伸臂通过所述传送端口将半导体工件运送到和离开所述处理室，并且其中所述至少两个 可伸缩臂选择性地可垂直移动，并且还可以在传送端口的方向上选择性地移动。