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公开(公告)号：US5656229A
公开(公告)日：1997-08-12
申请号：US459806
申请日：1995-06-02
申请人： Akikazu Tanimoto , Kiyoshi Motegi , Yukako Komaru
发明人： Akikazu Tanimoto , Kiyoshi Motegi , Yukako Komaru
CPC分类号： B23K26/0823 , G03F9/70
摘要： A method and apparatus whereby a thin film layer, e.g., a resist covering at least selected patterns formed on a surface of a substrate, e.g., a wafer is removed from a limited localized portion at a predetermined position relative to each of the patterns, such as, an alignment mark portion of the pattern in response to the irradiation of an energy beam. The substrate is positioned on a turn table and the position of a selected portion of the pattern is detected on the turn table. In accordance with the detected position of the selected portion and design coordinate position information of the pattern, the position of the localized portion requiring removal of the thin film layer is determined by means of a polar coordinate system based on a center of rotation of the turn table so that in accordance with the determined polar coordinate values the energy beam is irradiated on the thin film layer of the localized portion.
摘要翻译： 一种方法和装置，其中薄膜层，例如覆盖至少选定的图案的抗蚀剂的抗蚀剂，例如晶片的表面上，例如晶片，相对于每个图案在预定位置处从有限的局部部分移除， 作为响应于能量束的照射的图案的对准标记部分。 基板位于转台上，并且在转台上检测图案的选定部分的位置。 根据所选择的部分的检测位置和图案的设计坐标位置信息，需要去除薄膜层的局部部分的位置通过基于转弯旋转中心的极坐标系来确定 使得根据确定的极坐标值，能量束被照射在局部部分的薄膜层上。
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公开(公告)号：US5597590A
公开(公告)日：1997-01-28
申请号：US563349
申请日：1995-11-28
申请人： Akikazu Tanimoto , Kiyoshi Motegi , Yukako Komaru
发明人： Akikazu Tanimoto , Kiyoshi Motegi , Yukako Komaru
CPC分类号： B23K26/0823 , G03F9/70
摘要： A method and apparatus whereby a thin film layer, e.g., a resist covering at least selected patterns formed on a surface of a substrate, e.g., a wafer is removed from a limited localized portion at a predetermined position relative to each of the patterns, such as, an alignment mark portion of the pattern in response to the irradiation of an energy beam. The substrate is positioned on a turn table and the position of a selected portion of the pattern is detected on the turn table. In accordance with the detected position of the selected portion and design coordinate position information of the pattern, the position of the localized portion requiring removal of the thin film layer is determined by means of a polar coordinate system based on a center of rotation of the turn table so that in accordance with the determined polar coordinate values the energy beam is irradiated on the thin film layer of the localized portion.
摘要翻译： 一种方法和装置，其中薄膜层，例如覆盖至少选定的图案的抗蚀剂的抗蚀剂，例如晶片的表面上，例如晶片，相对于每个图案在预定位置处从有限的局部部分移除， 作为响应于能量束的照射的图案的对准标记部分。 基板位于转台上，并且在转台上检测图案的选定部分的位置。 根据所选择的部分的检测位置和图案的设计坐标位置信息，需要去除薄膜层的局部部分的位置通过基于转弯旋转中心的极坐标系来确定 使得根据确定的极坐标值，能量束被照射在局部部分的薄膜层上。
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公开(公告)号：US08384877B2
公开(公告)日：2013-02-26
申请号：US11808230
申请日：2007-06-07
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板 投影光学系统的像平面附近。
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公开(公告)号：US08169592B2
公开(公告)日：2012-05-01
申请号：US12153354
申请日：2008-05-16
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a position at which the surface of the member faces the optical element. The apparatus also includes a cleaning system which cleans the surface of the member.
摘要翻译： 曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。 该装置还包括具有表面并可移动到构件的表面面向光学元件的位置的构件。 该装置还包括清洁构件表面的清洁系统。
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5.发明申请公开(公告)号：US20090011368A1
公开(公告)日：2009-01-08
申请号：US11884891
申请日：2006-02-23
CPC分类号： G03F7/70408 , G02B5/1838 , G02B5/1866 , G02B13/143 , G02B27/4222 , G02B27/4272 , G02B27/4277 , G03B27/42 , G03F7/70283 , G03F7/7035
摘要： An object is to provide a high-resolution and economical exposure method suitable for use in formation of a fine pattern for making up an electronic device. Two diffraction gratings (P1, P2) are located in series in an optical path; the two diffraction gratings (P1, P2) and a wafer or the like (W) for making up an electronic device are arranged with a predetermined spacing; a light-dark pattern of interference fringes generated by the diffraction gratings (P1, P2) is transferred onto the wafer or the like (W) to effect exposure. The exposure is done while changing a positional relation between the wafer or the like (W) and the diffraction gratings (P1, P2) according to need.
摘要翻译： 目的是提供一种适合用于形成用于构成电子设备的精细图案的高分辨率和经济的曝光方法。 两个衍射光栅（P1，P2）串联在光路中; 用于构成电子设备的两个衍射光栅（P1，P2）和晶片等（W）以预定间隔布置; 由衍射光栅（P1，P2）产生的干涉条纹的暗暗图案被转印到晶片等（W）上以进行曝光。 在根据需要改变晶片等（W）和衍射光栅（P1，P2）之间的位置关系的同时进行曝光。
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公开(公告)号：US20070247600A1
公开(公告)日：2007-10-25
申请号：US11767425
申请日：2007-06-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板 投影光学系统的像平面附近。
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公开(公告)号：US20070064210A1
公开(公告)日：2007-03-22
申请号：US11603078
申请日：2006-11-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板 投影光学系统的像平面附近。
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8.发明授权Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same 失效利用能够沿相反方向移动的多个掩模和物体台的曝光装置和方法，以及使用其的装置的制造方法公开(公告)号：US06894763B2
公开(公告)日：2005-05-17
申请号：US10424815
申请日：2003-04-29
CPC分类号： G03F7/7005 , G03F7/70225 , G03F7/70275 , G03F7/70358 , G03F7/70716 , G03F7/70733 , G03F7/70808
摘要： A mask stage RS1 and a substrate stage WS1 are synchronously moved, and a mask stage RS2 and a substrate stage RS2 are synchronously moved, in a state in which a mask on the mask stage RS1 and a mask on the mask stage RS2 are irradiated with illumination light beams from illumination optical systems IOP1, IOP2 respectively. The reaction force on a base board due to the movement of the stages can be canceled to suppress the vibration of an exposure apparatus by moving the mask stage RS1 and the mask stage RS2 in mutually opposite directions. The throughput can be improved by performing alignment operation on substrate stages WS3, WS4 concurrently with the exposure operation.
摘要翻译： 在掩模台RS 1上的掩模和掩模上的掩模的状态下，同步移动掩模载台RS 1和基板载台WS 1，并且掩模载台RS 2和基板载台RS 2同步移动 分别用来自照明光学系统IOP1，IOP2的照明光束照射舞台RS 2。 通过使掩模载台RS 1和掩模载台RS 2相互相反的方向移动，可以抵消由于级的移动导致的基板上的反作用力，以抑制曝光装置的振动。 通过在曝光操作中同时进行基板台WS 3，WS 4的对准操作，能够提高通过量。
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公开(公告)号：US06713747B2
公开(公告)日：2004-03-30
申请号：US10207832
申请日：2002-07-31
申请人： Akikazu Tanimoto
发明人： Akikazu Tanimoto
IPC分类号： G01J132
CPC分类号： G03F7/70058 , G03F7/70358 , G03F7/70558
摘要： A scanning exposure apparatus and method uses an optical member to change an intensity distribution of exposure light in an illumination region.
摘要翻译： 扫描曝光装置和方法使用光学部件来改变照明区域中的曝光光的强度分布。
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10.发明授权
公开(公告)号：US5906901A
公开(公告)日：1999-05-25
申请号：US580886
申请日：1995-12-29
申请人： Akikazu Tanimoto
发明人： Akikazu Tanimoto
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70425 , G03F7/70358 , G03F9/70
摘要： In a lithographic process for fabrication of integrated circuit chips, a projection exposure machine is used to print a mask pattern onto each of a plurality of shot areas defined on a substrate, where an alignment method for establishing alignment between each shot area on the substrate and the mask pattern is performed. The alignment method comprises the step of forming on the substrate a regular pattern which comprises a plurality of pattern elements regularly distributed over the plurality of shot areas, and the step of performing an alignment operation based on the position of the regular pattern so as to establish alignment between each of the plurality of shot areas and the mask pattern. An exposure apparatus may be used to form the regular pattern on the substrate. The exposure apparatus comprises a light source for emitting a primary light beam, a beam-splitting optical system for splitting the primary light beam into a plurality of secondary light beams which are coherent with each other, and an objective optical system for modifying each secondary light beam into a substantially plane wave light beam, and for illuminating a region of a photoresist-coated substrate with the secondary light beams at different incident angles, the region of the substrate extending over a plurality of shot areas defined on the substrate, wherein the region is exposed to a regular pattern of light of interference fringes produced on the substrate from the plurality of secondary light beams.
摘要翻译： 在用于制造集成电路芯片的光刻工艺中，使用投影曝光机将掩模图案印刷到限定在基板上的多个照射区域中的每一个上，其中用于在基板上的每个照射区域之间建立对准的对准方法和 执行掩模图案。 对准方法包括在基板上形成规则图案的步骤，该规则图案包括规则分布在多个拍摄区域上的多个图案元素，以及基于规则图案的位置执行对准操作的步骤，以便建立 多个拍摄区域中的每一个与掩模图案之间的对准。 可以使用曝光装置在基板上形成规则图案。 曝光装置包括用于发射主光束的光源，用于将主光束分离成彼此相干的多个次级光束的分束光学系统，以及用于修改每个二次光的物镜光学系统 射入基本上平面的波长光束中，并且用不同入射角的二次光束照射光致抗蚀剂涂覆的基底的区域，衬底的区域延伸在限定在衬底上的多个注射区域上，其中区域 暴露于从多个次级光束在基板上产生的干涉条纹的规则图案。
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