-
公开(公告)号：US08501025B2
公开(公告)日：2013-08-06
申请号：US13045024
申请日：2011-03-10
IPC分类号： C03C15/00
CPC分类号： H01L21/67017 , B44C1/227 , H01L21/02063 , H01L21/67028 , H01L21/67051 , H01L21/67126 , H01L21/6719 , H01L21/76814
摘要： A substrate treatment apparatus is provided, which includes: a seal chamber including a chamber body having an opening, a lid member provided rotatably with respect to the chamber body and configured to close the opening, and a first liquid seal structure which liquid-seals between the lid member and the chamber body, the seal chamber having an internal space sealed from outside; a lid member rotating unit which rotates the lid member; a substrate holding/rotating unit which holds and rotates a substrate in the internal space of the seal chamber; and a treatment liquid supplying unit which supplies a treatment liquid to the substrate rotated by the substrate holding/rotating unit.
摘要翻译： 提供了一种基板处理装置，其包括：密封室，包括具有开口的室主体，相对于所述室主体可旋转地设置并构造成关闭所述开口的盖构件，以及第一液体密封结构， 所述盖构件和所述室主体，所述密封室具有从外部密封的内部空间; 盖构件旋转单元，其旋转盖构件; 基板保持/旋转单元，其在所述密封室的内部空间中保持并旋转基板; 以及处理液供给部，其向由所述基板保持旋转部旋转的基板供给处理液。
-
公开(公告)号：US09293352B2
公开(公告)日：2016-03-22
申请号：US13590215
申请日：2012-08-21
申请人： Akio Hashizume , Yuya Akanishi
发明人： Akio Hashizume , Yuya Akanishi
IPC分类号： H01L21/311 , H01L21/67 , H01L21/02 , H01L21/306
CPC分类号： H01L21/67028 , H01L21/0206 , H01L21/02381 , H01L21/02488 , H01L21/02532 , H01L21/02658 , H01L21/306
摘要： In a substrate processing apparatus (1), a silicon oxide film on a main surface of a substrate (9) is removed in an oxide film removing part (4) and then a silylation material is applied to the main surface, to thereby perform a silylation process in a silylation part (6). It is thereby possible to lengthen the Q time from the removal of the silicon oxide film to the formation of the silicon germanium film and reduce the temperature for prebaking in the formation of the silicon germanium film.
摘要翻译： 在基板处理装置（1）中，在氧化膜除去部（4）中除去基板（9）的主表面上的氧化硅膜，然后将甲硅烷基化材料施加到主表面，从而进行 在甲硅烷基化部分（6）中的甲硅烷基化过程。 从而可以延长Q时间从去除氧化硅膜到形成硅锗膜，并降低在形成硅锗膜时预烘烤的温度。
-
公开(公告)号：US07418970B2
公开(公告)日：2008-09-02
申请号：US10740711
申请日：2003-12-18
IPC分类号： B08B3/00
CPC分类号： H01L21/67034 , Y10S134/902
摘要： A substrate processing apparatus includes a container in which a heating plate, a discharge nozzle for discharging a vapor of organic solvent, and a discharge nozzle for supplying a process gas and a cooling gas are provided. A pump in communication with an exhaust outlet of the container exhausts an atmosphere from the container to reduce pressure in the container. Therefore, the substrate processing apparatus is capable of performing (1) the process of drying a substrate in a reduced-pressure atmosphere by the use of the vapor of organic solvent, and (2) the process of drying the substrate in the reduced-pressure atmosphere by heating, to thereby efficiently dry the substrate.
摘要翻译： 基板处理装置包括：容器，其中设置有加热板，用于排出有机溶剂的蒸气的排出喷嘴和用于供给处理气体和冷却气体的排出喷嘴。 与容器的排气口连通的泵从容器排出气氛以减小容器中的压力。 因此，基板处理装置能够通过使用有机溶剂的蒸气来进行（1）在减压气氛中干燥基板的工序，（2）在减压下干燥基板的工序 通过加热，从而有效地干燥基板。
-
公开(公告)号：US08883653B2
公开(公告)日：2014-11-11
申请号：US13353962
申请日：2012-01-19
申请人： Akio Hashizume
发明人： Akio Hashizume
IPC分类号： H01L21/302 , H01L21/461 , H01L21/311 , H01L21/3105 , H01L21/67 , H01L21/687 , H01L21/02
CPC分类号： B05C9/06 , B05C11/00 , B05C13/00 , B05C15/00 , C01B21/0687 , H01L21/02164 , H01L21/0217 , H01L21/3105 , H01L21/31111 , H01L21/31116 , H01L21/67028 , H01L21/67063 , H01L21/67115 , H01L21/67126 , H01L21/6719 , H01L21/67207 , H01L21/68742
摘要： An inventive substrate treatment method includes a silylation step of supplying a silylation agent to a substrate, and an etching step of supplying an etching agent to the substrate after the silylation step. The method may further include a repeating step of repeating a sequence cycle including the silylation step and the etching step a plurality of times. The cycle may further include a rinsing step of supplying a rinse liquid to the substrate after the etching step. The cycle may further include a UV irradiation step of irradiating the substrate with ultraviolet radiation after the etching step. The method may further include a pre-silylation or post-silylation UV irradiation step of irradiating the substrate with the ultraviolet radiation before or after the silylation step.
摘要翻译： 本发明的基板处理方法包括向基板供给甲硅烷化剂的甲硅烷化步骤，以及在甲硅烷化步骤之后向基板供给蚀刻剂的蚀刻步骤。 该方法可以进一步包括多次重复包括甲硅烷化步骤和蚀刻步骤的序列循环的重复步骤。 该循环可以进一步包括在蚀刻步骤之后将漂洗液体供应到基底的冲洗步骤。 该循环可以进一步包括在蚀刻步骤之后用紫外线照射衬底的UV照射步骤。 该方法可进一步包括在甲硅烷化步骤之前或之后用紫外线照射基质的预甲硅烷基化或甲硅烷基化后UV照射步骤。
-
公开(公告)号：US20060099339A1
公开(公告)日：2006-05-11
申请号：US11272600
申请日：2005-11-11
申请人： Akio Hashizume
发明人： Akio Hashizume
CPC分类号： H01L21/67051
摘要： A substrate treatment method is disclosed, which can effectively reduce the amount of charges accumulated on a substrate due to treatment of the substrate with a water-containing liquid. The method comprises the steps of: supplying a water-containing liquid to a substrate held generally horizontally by a substrate holding/rotating mechanism while rotating the substrate at a first rotation speed; and removing charges from the substrate after the water supplying step by performing a puddle process for a predetermined period by retaining a liquid film of a predetermined liquid on a surface of the substrate held generally horizontally by the substrate holding/rotating mechanism with the substrate being rotated at a second rotation speed lower than the first rotation speed or kept in a non-rotating state without further supplying the predetermined liquid to the liquid film.
摘要翻译： 公开了一种基板处理方法，其可以有效地减少由于用含水液体处理基板而积累在基板上的电荷量。 该方法包括以下步骤：在基板保持/旋转机构基本水平地保持基板的同时以第一转速旋转基板; 并且在供水步骤之后通过在基板保持/旋转机构大致水平地保持基板旋转的基板的表面上保持预定液体的液体膜，通过在预定时间段内进行水泥处理来从基板上去除电荷 在低于第一转速的第二转速下或保持在非旋转状态，而不进一步向液膜供应预定液体。
-
公开(公告)号：US4788883A
公开(公告)日：1988-12-06
申请号：US119442
申请日：1987-11-12
申请人： Akio Hashizume
发明人： Akio Hashizume
CPC分类号： F16H33/02 , F16F15/22 , Y10T74/2111 , Y10T74/2183 , Y10T74/2184
摘要： The rotor of a driving device comprises an output shaft with transmission wheels fixed on the output shaft. The rotor is provided with a plurality of rotor bodies and a transmission device which is interlocked with the transmission wheels. Each rotor body is equipped with a plurality of rotating body parts on a support shaft in a free rotatable manner. Balance bodies are attached to these rotating body parts through pins located at eccentric positions of these balance bodies in a manner to provide free rotation. Crank bodies, driven by the rotating bodies, are freely-rotatably equipped on the support shafts. Where the output shaft rotates by an input from an external source, the rotating bodies also rotate at the same time. In addition, the balance bodies also rotate in association with the rotation of these rotating bodies. Therefore, the crank bodies prevent a state that parts of the balance bodies protrude outwardly from the rotating bodies. Thus, the inertial force of the rotating bodies is ensured.
-
公开(公告)号：US07959820B2
公开(公告)日：2011-06-14
申请号：US11548855
申请日：2006-10-12
申请人： Akio Hashizume
发明人： Akio Hashizume
IPC分类号： C03C15/00
CPC分类号： H01L21/67051 , H01L21/6708
摘要： According to the substrate processing method of the invention, a jet of droplets generated from a gas and a heated processing liquid is supplied to the surface of a substrate. A resist stripping liquid to strip off the resist from the surface of the substrate is then supplied to the surface of the substrate.
摘要翻译： 根据本发明的基板处理方法，将从气体和加热处理液体产生的液滴射流供给到基板的表面。 然后将从基板表面剥离抗蚀剂的抗蚀剂剥离液供给到基板的表面。
-
公开(公告)号：US07422641B2
公开(公告)日：2008-09-09
申请号：US10286873
申请日：2002-10-30
IPC分类号： B08B3/02
CPC分类号： H01L21/67051 , B01F3/04007 , B01F3/04985 , B01F5/0471 , B08B3/02 , Y10S134/902
摘要： A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During cleaning, it follows that both nozzles discharge detergents while keeping relative layout relation. Therefore, the discharged cleaning mist and rinsing deionized water do not interfere with each other before reaching the substrate but the used detergents are entirely horizontally splashed and recovered in a cup. Thus, the cleaning mist is prevented from scattering and adhering to the periphery.
-
公开(公告)号：US07314529B2
公开(公告)日：2008-01-01
申请号：US11026246
申请日：2004-12-29
IPC分类号： B08B3/00
CPC分类号： H01L21/67051 , B01F3/04007 , B01F3/04985 , B01F5/0471 , B08B3/02 , Y10S134/902
摘要： A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During cleaning, it follows that both nozzles discharge detergents while keeping relative layout relation. Therefore, the discharged cleaning mist and rinsing deionized water do not interfere with each other before reaching the substrate but the used detergents are entirely horizontally splashed and recovered in a cup. Thus, the cleaning mist is prevented from scattering and adhering to the periphery.
摘要翻译： 排出清洁雾的柔软喷雾喷嘴垂直定向并固定在臂上。 将排出冲洗去离子水的冲洗喷嘴用于抑制阻塞物的冲洗喷嘴垂直地固定到距离软喷雾嘴规定距离的臂上。 在清洁过程中，两个喷嘴排出洗涤剂，同时保持相对的布局关系。 因此，排出的清洁雾和冲洗去离子水在到达基底之前不会相互干扰，但是所用的洗涤剂完全水平地溅在杯中并回收。 因此，防止清洁雾散射并附着在周边。
-
公开(公告)号：US07838206B2
公开(公告)日：2010-11-23
申请号：US11758389
申请日：2007-06-05
申请人： Akio Hashizume
发明人： Akio Hashizume
IPC分类号： G03F7/26
CPC分类号： B08B3/08 , G03F7/422 , H01L21/31133 , H01L21/6708
摘要： A substrate processing method according to the present invention is to be applied for stripping and removing, from the surface of a substrate, a resist no longer required. According to the substrate processing method, a resist stripping liquid is supplied to the center portion of the surface of a substrate held by a substrate holding unit. An organic solvent liquid is supplied to the peripheral edge portion of the surface of the substrate held by the substrate holding unit.
摘要翻译： 根据本发明的基板处理方法应用于从基板的表面剥离和除去不再需要的抗蚀剂。 根据基板处理方法，将抗蚀剂剥离液体供给到由基板保持单元保持的基板的表面的中心部分。 将有机溶剂液体供给到由基板保持单元保持的基板的表面的周缘部。
-
-
-
-
-
-
-
-
-
搜索结果
16 条记录 (耗时 0.021 秒)
