公开(公告)号：US6086699A

公开(公告)日：2000-07-11

申请号：US79112

申请日：1998-05-14

申请人： Akira Nakashima ,  Atsushi Tonai ,  Ryo Muraguchi ,  Michio Komatsu ,  Katsuyuki Machida ,  Hakaru Kyuragi ,  Kazuo Imai

发明人： Akira Nakashima ,  Atsushi Tonai ,  Ryo Muraguchi ,  Michio Komatsu ,  Katsuyuki Machida ,  Hakaru Kyuragi ,  Kazuo Imai

IPC分类号： H01L21/3205 ,  B05D1/28 ,  H01L21/00 ,  H01L21/31 ,  H01L21/316 ,  H01L21/768 ,  B32B33/00 ,  B05D5/00 ,  B05D7/24 ,  B05D7/26

CPC分类号： H01L21/6715 ,  B05D1/28 ,  H01L21/67132

摘要： Disclosed is a thin film-forming apparatus comprising a coating liquid feed means 6 for feeding a thin film-forming coating liquid onto a surface of a transfer roll 2, a transfer means 4 including the transfer roll 2 a surface of which is coated with the thin film-forming coating liquid fed from the coating liquid feed means to form a transfer thin film 8, and a substrate conveying means 16 for continuously conveying a substrate 9 under the transfer roll, a surface of said substrate 9 to be provided with a thin film, wherein the transfer means is so fabricated that the transfer roll surface having the transfer thin film thereon is closely contacted with the surface of the substrate conveyed by the substrate conveying means, to transfer the transfer thin film formed on the transfer roll surface to the substrate surface. Also disclosed is a thin film-forming method using the thin film-forming apparatus. By the apparatus and the method, formation of a planar thin film on a substrate such as a semiconductor wafer can be carried out continuously, stably and at a low cost, and quality lowering of the thin film and property change thereof with time caused by adherence of impurities to the thin film or contamination of the thin film with impurities are avoidable. Moreover, the apparatus and the method are applicable to large-sized substrates.

摘要翻译： 公开了一种薄膜形成装置，其包括用于将薄膜形成涂布液供给到转印辊2的表面上的涂布液供给装置6，包括转印辊2的转印装置4，转印辊2的表面涂覆有 从涂布液供给装置供给的薄膜形成用涂布液，形成转印薄膜8，以及用于在转印辊下连续输送基板9的基板输送机构16，所述基板9的表面设置有薄的 膜，其中转印装置被制造成使得其上具有转印薄膜的转印辊表面与由基板输送装置输送的基板的表面紧密接触，以将形成在转印辊表面上的转印薄膜转印到 基材表面。 还公开了使用该薄膜形成装置的薄膜形成方法。 通过该装置和方法，可以连续，稳定地且低成本地在诸如半导体晶片的基板上形成平面薄膜，并且随着粘附时间的推移，薄膜的质量降低及其性能变化 杂质对薄膜的污染或杂质污染薄膜是可以避免的。 此外，该装置和方法适用于大尺寸基板。

公开(公告)号：US06340641B1

公开(公告)日：2002-01-22

申请号：US09297343

申请日：1999-04-29

申请人： Ryo Muraguchi ,  Akira Nakashima ,  Atsushi Tonai ,  Michio Kimatsu ,  Katsuyuki Machida ,  Hakaru Kyuragi ,  Kazuo Imai

发明人： Ryo Muraguchi ,  Akira Nakashima ,  Atsushi Tonai ,  Michio Kimatsu ,  Katsuyuki Machida ,  Hakaru Kyuragi ,  Kazuo Imai

IPC分类号： H01L2131

CPC分类号： B05D1/286 ,  G11B5/8404

摘要： The present invention provides a method of easily planarizing the uneven surface of a substrate having an uneven surface. This method comprises the steps of forming a coating film containing spherical fine particles on a surface of a smooth substrate; sticking the surface of the smooth substrate provided with the coating film containing spherical fine particles to the uneven surface of a substrate having an uneven surface; and transferring the coating film containing spherical fine particles to the uneven surface of the substrate so that the uneven surface is planarized.

摘要翻译： 本发明提供一种容易平坦化具有不平坦表面的基板的凹凸表面的方法。 该方法包括在平滑基材的表面上形成含有球状微粒的涂膜的步骤; 将具有含有球状微粒的涂膜的光滑基板的表面粘附到具有不平坦表面的基板的凹凸表面上; 并将含有球状微粒的涂膜转印到基板的不平坦表面上，使得凹凸表面平坦化。

公开(公告)号：US5972780A

公开(公告)日：1999-10-26

申请号：US911845

申请日：1997-08-15

申请人： Katsuyuki Machida ,  Hakaru Kyuragi ,  Hideo Akiya ,  Kazuo Imai

发明人： Katsuyuki Machida ,  Hakaru Kyuragi ,  Hideo Akiya ,  Kazuo Imai

IPC分类号： B29C43/56 ,  B32B37/18 ,  H05K3/20 ,  H01L21/30 ,  H01L21/46

CPC分类号： B29C43/56 ,  B32B37/00 ,  H05K3/20 ,  B29C2043/561 ,  B29C43/32 ,  B32B2309/68 ,  B32B37/025 ,  B32B37/18 ,  Y10T156/12 ,  Y10T156/1343 ,  Y10T156/1705

摘要： A thin film forming apparatus includes a specimen holder on which a substrate for thin film formation is placed, a transfer plate opposing the specimen holder, on which a sheet film having a thin film formed on a surface is placed, a thin film forming chamber comprising the specimen holder and the transfer plate, a pressure unit for moving at least one of the specimen holder and the transfer plate and pressing the specimen holder against the transfer plate for a predetermined time while the substrate and the thin film formed on the sheet film are in contact with each other, a heating unit for heating the substrate at a predetermined temperature, and an exhausting unit for vacuum-exhausting the thin film forming chamber.

摘要翻译： 一种薄膜形成装置，包括：试样保持体，配置有用于形成薄膜的基板;与该试样支架相对的转印板，在其上放置表面形成有薄膜的薄膜，薄膜形成室， 样品架和转印板，用于移动样本保持架和转印板中的至少一个的压力单元，并且在基板和形成在薄膜上的薄膜的同时将样本架抵靠转印板按压预定时间 彼此接触，用于在预定温度下加热基板的加热单元和用于真空排出薄膜形成室的排气单元。

公开(公告)号：US6092578A

公开(公告)日：2000-07-25

申请号：US026119

申请日：1998-02-19

申请人： Katsuyuki Machida ,  Hakaru Kyuragi ,  Hideo Akiya ,  Kazuo Imai

发明人： Katsuyuki Machida ,  Hakaru Kyuragi ,  Hideo Akiya ,  Kazuo Imai

IPC分类号： B29C43/56 ,  B32B37/18 ,  H05K3/20 ,  B32B35/00 ,  H01L21/30

CPC分类号： B29C43/56 ,  B32B37/00 ,  H05K3/20 ,  B29C2043/561 ,  B29C43/32 ,  B32B2309/68 ,  B32B37/025 ,  B32B37/18 ,  Y10T156/12 ,  Y10T156/1343 ,  Y10T156/1705

摘要： A thin film forming apparatus includes a specimen holder on which a substrate for thin film formation is placed, a transfer plate opposing the specimen holder, on which a sheet film having a thin film formed on a surface is placed, a thin film forming chamber comprising the specimen holder and the transfer plate, a pressure unit for moving at least one of the specimen holder and the transfer plate and pressing the specimen holder against the transfer plate for a predetermined time while the substrate and the thin film formed on the sheet film are in contact with each other, a heating unit for heating the substrate at a predetermined temperature, and an exhausting unit for vacuum-exhausting the thin film forming chamber.

摘要翻译： 一种薄膜形成装置，包括：试样保持体，配置有用于形成薄膜的基板;与该试样支架相对的转印板，在其上放置表面形成有薄膜的薄膜，薄膜形成室， 样品架和转印板，用于移动样本保持架和转印板中的至少一个的压力单元，并且在基板和形成在薄膜上的薄膜的同时将样本架抵靠转印板按压预定时间 彼此接触，用于在预定温度下加热基板的加热单元和用于真空排出薄膜形成室的排气单元。

公开(公告)号：US5376590A

公开(公告)日：1994-12-27

申请号：US5670

申请日：1993-01-19

申请人： Katsuyuki Machida ,  Katsumi Murase ,  Nobuhiro Shimoyama ,  Toshiaki Tsuchiya ,  Junichi Takahashi ,  Kazushige Minegishi ,  Yasuo Takahashi ,  Hideo Namatsu ,  Kazuo Imai

发明人： Katsuyuki Machida ,  Katsumi Murase ,  Nobuhiro Shimoyama ,  Toshiaki Tsuchiya ,  Junichi Takahashi ,  Kazushige Minegishi ,  Yasuo Takahashi ,  Hideo Namatsu ,  Kazuo Imai

IPC分类号： H01L21/3105 ,  H01L21/316 ,  H01L21/768 ,  H01L23/532 ,  H01L21/02

CPC分类号： H01L21/02126 ,  H01L21/02129 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/022 ,  H01L21/02211 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/3105 ,  H01L21/31608 ,  H01L21/76801 ,  H01L21/76814 ,  H01L21/76826 ,  H01L21/76828 ,  H01L21/76829 ,  H01L21/76832 ,  H01L21/76834 ,  H01L23/5329 ,  H01L2924/0002

摘要： A semiconductor device includes an interlevel film constituted by a first dielectrics film containing dangling bonds and a bonded group of Si and hydrogen, and a second dielectrics film formed on the first dielectrics film.

摘要翻译： 半导体器件包括由包含悬挂键的第一电介质膜和Si和氢的键合基团构成的层间膜和形成在第一介电膜上的第二电介质膜。

公开(公告)号：US5512513A

公开(公告)日：1996-04-30

申请号：US296025

申请日：1994-08-25

申请人： Katsuyuki Machida ,  Katsumi Murase ,  Nobuhiro Shimoyama ,  Toshiaki Tsuchiya ,  Junichi Takahashi ,  Kazushige Minegishi ,  Yasuo Takahashi ,  Hideo Namatsu ,  Kazuo Imai

发明人： Katsuyuki Machida ,  Katsumi Murase ,  Nobuhiro Shimoyama ,  Toshiaki Tsuchiya ,  Junichi Takahashi ,  Kazushige Minegishi ,  Yasuo Takahashi ,  Hideo Namatsu ,  Kazuo Imai

IPC分类号： H01L21/3105 ,  H01L21/316 ,  H01L21/768 ,  H01L23/532 ,  H01L21/44

CPC分类号： H01L21/02126 ,  H01L21/02129 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/022 ,  H01L21/02211 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/3105 ,  H01L21/31608 ,  H01L21/76801 ,  H01L21/76814 ,  H01L21/76826 ,  H01L21/76828 ,  H01L21/76829 ,  H01L21/76832 ,  H01L21/76834 ,  H01L23/5329 ,  H01L2924/0002

摘要： A semiconductor device includes an interlevel film constituted by a first dielectrics film containing dangling bonds and a bonded group of Si and hydrogen, and a second dielectrics film formed on the first dielectrics film.

摘要翻译： 半导体器件包括由包含悬挂键的第一电介质膜和Si和氢的键合基团构成的层间膜和形成在第一介电膜上的第二电介质膜。

公开(公告)号：US5811872A

公开(公告)日：1998-09-22

申请号：US594947

申请日：1996-01-31

申请人： Katsuyuki Machida ,  Katsumi Murase ,  Nobuhiro Shimoyama ,  Toshiaki Tsuchiya ,  Junichi Takahashi ,  Kazushige Minegishi ,  Yasuo Takahashi ,  Hideo Namatsu ,  Kazuo Imai

发明人： Katsuyuki Machida ,  Katsumi Murase ,  Nobuhiro Shimoyama ,  Toshiaki Tsuchiya ,  Junichi Takahashi ,  Kazushige Minegishi ,  Yasuo Takahashi ,  Hideo Namatsu ,  Kazuo Imai

IPC分类号： H01L21/3105 ,  H01L21/316 ,  H01L21/768 ,  H01L23/532 ,  H01L23/58

CPC分类号： H01L21/02126 ,  H01L21/02129 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/022 ,  H01L21/02211 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/3105 ,  H01L21/31608 ,  H01L21/76801 ,  H01L21/76814 ,  H01L21/76826 ,  H01L21/76828 ,  H01L21/76829 ,  H01L21/76832 ,  H01L21/76834 ,  H01L23/5329 ,  H01L2924/0002

摘要： A semiconductor device includes an interlevel film constituted by a first dielectrics film containing dangling bonds and a bonded group of Si and hydrogen, and a second dielectrics film formed on the first dielectrics film.

摘要翻译： 半导体器件包括由包含悬挂键的第一电介质膜和Si和氢的键合基团构成的层间膜和形成在第一介电膜上的第二电介质膜。

公开(公告)号：US5674771A

公开(公告)日：1997-10-07

申请号：US34906

申请日：1993-03-22

申请人： Katsuyuki Machida ,  Kazuo Imai ,  Hideo Yoshino ,  Yoshiharu Ozaki ,  Kenji Miura

发明人： Katsuyuki Machida ,  Kazuo Imai ,  Hideo Yoshino ,  Yoshiharu Ozaki ,  Kenji Miura

IPC分类号： H01L21/02 ,  H01L21/70

CPC分类号： H01L28/40

摘要： A structure of a capacitor includes a first metal interconnection layer, a dielectric film, and a second metal interconnection layer. The dielectric film is formed on the first metal interconnection layer. The second metal interconnection layer is formed on the dielectric film. The dielectric film is a dielectric film formed by bias-ECR plasma CVD.

摘要翻译： 电容器的结构包括第一金属互连层，电介质膜和第二金属互连层。 电介质膜形成在第一金属互连层上。 第二金属互连层形成在电介质膜上。 电介质膜是通过偏置ECR等离子体CVD形成的电介质膜。

公开(公告)号：US20050174336A1

公开(公告)日：2005-08-11

申请号：US11051289

申请日：2005-02-04

申请人： Naomi Nakayama ,  Kazuo Imai ,  Yoshiaki Yamaguchi ,  Isamu Saito

发明人： Naomi Nakayama ,  Kazuo Imai ,  Yoshiaki Yamaguchi ,  Isamu Saito

IPC分类号： G06F3/045 ,  G06F3/00 ,  G06F3/01 ,  G09G5/00

CPC分类号： G06F3/016 ,  G06F3/045

摘要： A pair of piezoelectric substrates, the length of which is shorter than the length of one side in the longitudinal direction of the operation panel or the supporting board, is respectively fixed to one side from the diagonal position along the longitudinal direction. At the time of detecting an inputting operation, a drive voltage is applied and the entire operation panel or the supporting board is vibrated. Even when the four corners of the operation panel or the supporting board are supported by the housing for accommodating the tablet apparatus or supported by the display device so that the vibration of the four corners is restricted, since either of the pair of piezoelectric substrates, which becomes a vibration source, a feeling of inputting operation can be transmitted to an operator by the vibration, the amplitude of which is not less than a predetermined value, irrespective of the inputting operation position.

摘要翻译： 长度比操作面板或支撑板的长度方向上的一侧的长度短的一对压电基板分别从纵向的对角线位置固定在一侧。 在检测到输入操作时，施加驱动电压，整个操作面板或支撑板振动。 即使当操作面板或支撑板的四个角由用于容纳平板设备的壳体或由显示装置支撑的壳体支撑，使得四个角的振动受到限制时，由于一对压电基板中的任一个 成为振动源，不管输入操作位置如何，可以通过振幅不小于预定值的振动将操作感觉发送给操作者。

公开(公告)号：US6115738A

公开(公告)日：2000-09-05

申请号：US948071

申请日：1997-10-09

申请人： Toshio Yamaguchi ,  Kazuo Imai ,  Masatoshi Haraguchi

发明人： Toshio Yamaguchi ,  Kazuo Imai ,  Masatoshi Haraguchi

IPC分类号： G06F15/16 ,  G06F15/167

CPC分类号： G06F15/161 ,  Y10S707/99943

摘要： In a multi-computer system having a plurality of computers, an input/output device configuration definition table and an input/output device configuration reference table are adapted to be collectively managed. A configuration management program manages the configuration definition of all input/output devices of a plurality of computers by using the input/output device configuration definition table, and generates a changed data file when an input/output device configuration is changed. Dynamic system alteration is effected by changing the contents of the input/output device configuration reference table stored in a shared memory, in accordance with the changed data file. The input/output device configuration definition table and the input/output device configuration reference table each have an input/output device information part and an input/output device connection information part arranged in a matrix form to allow addition/deletion of an input/output device and a computer.

摘要翻译： 在具有多个计算机的多计算机系统中，输入/输出设备配置定义表和输入/输出设备配置参考表适于被集中管理。 配置管理程序通过使用输入/输出设备配置定义表来管理多个计算机的所有输入/输出设备的配置定义，并且当输入/输出设备配置改变时生成改变的数据文件。 根据改变的数据文件，通过改变存储在共享存储器中的输入/输出设备配置参考表的内容来实现动态系统改变。 输入/输出设备配置定义表和输入/输出设备配置参考表各自具有以矩阵形式布置的输入/输出设备信息部分和输入/输出设备连接信息部分，以允许添加/删除输入/输出设备 设备和电脑。