Methods for thinning semiconductor substrates that employ support structures formed on the substrates
    2.
    发明授权
    Methods for thinning semiconductor substrates that employ support structures formed on the substrates 有权
    减薄采用在基板上形成的支撑结构的半导体衬底的方法

    公开(公告)号:US07713841B2

    公开(公告)日:2010-05-11

    申请号:US10666742

    申请日:2003-09-19

    IPC分类号: H01L21/46

    摘要: A support structure for use with a semiconductor substrate in thinning, or backgrinding, thereof, as well as during post-thinning processing of the semiconductor substrate includes a portion which extends substantially along and around an outer periphery of the semiconductor substrate to impart the thinned semiconductor substrate with rigidity. The support structure may be configured as a ring or as a member which substantially covers an active surface of the semiconductor substrate and forms a protective structure over each semiconductor device carried by the active surface. Assemblies that include the support structure and a semiconductor substrate are also within the scope of the present invention, as are methods for forming the support structures and thinning and post-thinning processes that include use of the support structures.

    摘要翻译: 在半导体衬底的薄化或后研磨以及后稀化处理期间与半导体衬底一起使用的支撑结构包括基本上沿半导体衬底的外周延伸并且围绕半导体衬底的外周延伸的部分,以使薄化半导体 基板具有刚性。 支撑结构可以被配置为环或作为基本上覆盖半导体衬底的有源表面并且在由有源表面承载的每个半导体器件上形成保护结构的构件。 包括支撑结构和半导体衬底的组件也在本发明的范围内,形成支撑结构的方法和包括使用支撑结构的减薄和后变薄工艺也是如此。