公开(公告)号：US6065499A

公开(公告)日：2000-05-23

申请号：US217677

申请日：1998-12-21

申请人： Alexander F. Pless ,  Gary J. Rosen ,  Allan D. Weed ,  Ernest E. Allen ,  Victor M. Benveniste ,  Perry J. I. Justesen

发明人： Alexander F. Pless ,  Gary J. Rosen ,  Allan D. Weed ,  Ernest E. Allen ,  Victor M. Benveniste ,  Perry J. I. Justesen

IPC分类号： H01L21/265 ,  F16J3/04 ,  F16L51/02 ,  F16L11/00 ,  F16L11/16

CPC分类号： F16L51/025 ,  H01J37/16 ,  H01J37/3171

摘要： An improved bellows assembly (18) is provided for use in, for example, an ion implanter (10). The bellows assembly comprises a first mounting portion (56) located at one end of the bellows assembly for fixedly mounting the bellows assembly to a first vacuum chamber (16); a second mounting portion (52) located at an opposite end of the bellows assembly for slidably mounting the bellows assembly to a second vacuum chamber (15); and a steel bellows (54) located between the first and second mounting portions. The bellows extends generally along a longitudinal axis (64) and is expansible and contractible along this axis. The second mounting portion permits radial slidable movement of the bellows assembly with respect to the second chamber in a first plane substantially perpendicular to this axis. The second mounting portion comprises at least one sliding seal subassembly (80) for maintaining the vacuum, and a support ring (78) and a slide plate (82) located on opposite ends of the sliding seal subassembly. The slide plate and the sliding seal subassembly provide a slidable vacuum-tight mating surface therebetween.

摘要翻译： 改进的波纹管组件（18）被提供用于例如离子注入机（10）。 波纹管组件包括位于波纹管组件一端的第一安装部分（56），用于将波纹管组件固定地安装到第一真空室（16）上; 位于波纹管组件的相对端的第二安装部分（52），用于将波纹管组件可滑动地安装到第二真空室（15）; 和位于第一和第二安装部之间的钢质波纹管（54）。 波纹管大致沿着纵向轴线（64）延伸并且沿该轴线可膨胀和收缩。 第二安装部分允许波纹管组件在基本上垂直于该轴线的第一平面中相对于第二腔室径向滑动运动。 第二安装部分包括用于维持真空的至少一个滑动密封子组件（80）以及位于滑动密封子组件的相对端上的支撑环（78）和滑动板（82）。 滑板和滑动密封子组件在其间提供可滑动的真空密封配合表面。

公开(公告)号：US20110041764A1

公开(公告)日：2011-02-24

申请号：US12939002

申请日：2010-11-03

申请人： Aaron Webb ,  Adam Brailove ,  Joseph Yudovsky ,  Nir Merry ,  Andrew Constant ,  Efrain Quiles ,  Michael R. Rice ,  Gary J. Rosen ,  Vinay K. Shah

发明人： Aaron Webb ,  Adam Brailove ,  Joseph Yudovsky ,  Nir Merry ,  Andrew Constant ,  Efrain Quiles ,  Michael R. Rice ,  Gary J. Rosen ,  Vinay K. Shah

IPC分类号： H01L21/677 ,  C23C16/00

CPC分类号： C23C16/54 ,  C23C16/4583 ,  H01L21/67173 ,  H01L21/67742 ,  H01L21/67757 ,  H01L21/67769 ,  Y10S414/14

摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.

摘要翻译： 用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。 在一个实施例中，处理平台包括大气转移区域，至少一个具有缓冲室和分段平台的分批处理室，以及设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，其包括多个 基板处理刀片。 平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。 在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。 盒式处理机器人可以是线性致动器或旋转台。

公开(公告)号：US20070295274A1

公开(公告)日：2007-12-27

申请号：US11426563

申请日：2006-06-26

申请人： Aaron Webb ,  Adam Brailove ,  Joseph Yudovsky ,  Nir Merry ,  Andrew Constant ,  Efrain Quiles ,  Michael R. Rice ,  Gary J. Rosen ,  Vinay K. Shah

发明人： Aaron Webb ,  Adam Brailove ,  Joseph Yudovsky ,  Nir Merry ,  Andrew Constant ,  Efrain Quiles ,  Michael R. Rice ,  Gary J. Rosen ,  Vinay K. Shah

IPC分类号： C23C16/00

CPC分类号： C23C16/54 ,  C23C16/4583 ,  H01L21/67173 ,  H01L21/67742 ,  H01L21/67757 ,  H01L21/67769 ,  Y10S414/14

摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.

摘要翻译： 用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。 在一个实施例中，处理平台包括大气传送区域，具有缓冲室和分段平台的至少一个批处理室和设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，该基板传送臂包括多个 基板处理刀片。 平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。 在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。 盒式处理机器人可以是线性致动器或旋转台。

公开(公告)号：US09057146B2

公开(公告)日：2015-06-16

申请号：US12862187

申请日：2010-08-24

申请人： Gary J. Rosen ,  Frank Sinclair ,  Alexander Soskov ,  James S. Buff

发明人： Gary J. Rosen ,  Frank Sinclair ,  Alexander Soskov ,  James S. Buff

IPC分类号： B22D46/00 ,  B22D21/00 ,  G01B7/06 ,  B22D2/00 ,  C30B11/00 ,  B22D11/12 ,  B22D11/14 ,  C30B15/00 ,  C30B29/06 ,  C30B35/00 ,  C30B29/64 ,  C30B29/08 ,  C30B29/40 ,  C30B29/36

CPC分类号： C30B11/00 ,  B22D11/1206 ,  B22D11/143 ,  C30B15/00 ,  C30B29/06 ,  C30B29/08 ,  C30B29/36 ,  C30B29/406 ,  C30B29/64 ,  C30B35/00 ,  G01B7/105 ,  G01B7/107 ,  Y10T117/1004 ,  Y10T117/1008 ,  Y10T117/1032 ,  Y10T117/1044 ,  Y10T117/1048 ,  Y10T117/1068 ,  Y10T117/1088

摘要： A sheet of a material is disposed in a melt of the material. The sheet is formed using a cooling plate in one instance. An exciting coil and sensing coil are positioned downstream of the cooling plate. The exciting coil and sensing coil use eddy currents to determine a thickness of the solid sheet on top of the melt.

摘要翻译： 将一片材料设置在材料的熔体中。 在一种情况下，使用冷却板形成片材。 励磁线圈和传感线圈位于冷却板的下游。 励磁线圈和感测线圈使用涡流来确定熔体顶部的固体片的厚度。

公开(公告)号：US07833351B2

公开(公告)日：2010-11-16

申请号：US11426563

申请日：2006-06-26

申请人： Aaron Webb ,  Adam Brailove ,  Joseph Yudovsky ,  Nir Merry ,  Andrew Constant ,  Efrain Quiles ,  Michael R. Rice ,  Gary J. Rosen ,  Vinay K. Shah

发明人： Aaron Webb ,  Adam Brailove ,  Joseph Yudovsky ,  Nir Merry ,  Andrew Constant ,  Efrain Quiles ,  Michael R. Rice ,  Gary J. Rosen ,  Vinay K. Shah

IPC分类号： C23F1/00 ,  H01L21/306

CPC分类号： C23C16/54 ,  C23C16/4583 ,  H01L21/67173 ,  H01L21/67742 ,  H01L21/67757 ,  H01L21/67769 ,  Y10S414/14

摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.

摘要翻译： 用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。 在一个实施例中，处理平台包括大气传送区域，具有缓冲室和分段平台的至少一个批处理室和设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，该基板传送臂包括多个 基板处理刀片。 平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。 在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。 盒式处理机器人可以是线性致动器或旋转台。

公开(公告)号：US07311779B2

公开(公告)日：2007-12-25

申请号：US10680359

申请日：2003-10-06

申请人： Son T. Nguyen ,  Gary J. Rosen ,  Ian A. Pancham

发明人： Son T. Nguyen ,  Gary J. Rosen ,  Ian A. Pancham

IPC分类号： B05C11/02 ,  B05C5/00 ,  B05B7/16 ,  C23C16/00

CPC分类号： H01L21/67167 ,  C23C18/1619 ,  C23C18/1669 ,  C23C18/1676 ,  C23C18/168 ,  H01L21/288 ,  H01L21/67109 ,  H01L21/67248

摘要： Embodiments of the invention provide a fluid processing method and apparatus. The apparatus includes a substrate support assembly positioned in a processing volume, a disk shaped member positioned in the processing volume in parallel orientation with a substrate supported on the substrate support assembly, a fluid outlet positioned in a central location of the disk shaped member, and a plurality of turbolators positioned on an upper surface of the disk shaped member, the turbolators being configured to generate a uniform turbulent flow of fluid traveling from the fluid outlet to a perimeter of the substrate. The method includes flowing a heated processing fluid over a plurality of turbolators that are positioned under a substrate being processed to control the temperature of the substrate during processing.

摘要翻译： 本发明的实施例提供一种流体处理方法和装置。 该装置包括位于处理体积中的基板支撑组件，与支撑在基板支撑组件上的基板平行地定位在处理体积中的圆盘形构件，位于盘形构件的中心位置的流体出口，以及 多个涡轮机，其定位在所述盘形构件的上表面上，所述涡轮机构造成产生从所述流体出口行进到所述基板周边的均匀的流体流动。 该方法包括使加热的处理流体流过位于被处理的基底下方的多个涡轮机，以在加工期间控制基板的温度。

公开(公告)号：US07223308B2

公开(公告)日：2007-05-29

申请号：US10680325

申请日：2003-10-06

申请人： Ian A. Pancham ,  Son T. Nguyen ,  Gary J. Rosen

发明人： Ian A. Pancham ,  Son T. Nguyen ,  Gary J. Rosen

IPC分类号： B05C13/00 ,  B05C11/00 ,  C23C16/00

CPC分类号： H01L21/67109 ,  C23C18/1628 ,  C23C18/1678

摘要： A method and apparatus for controlling a substrate temperature during an electroless deposition process. The apparatus includes a deposition cell configured to support a substrate at a position above a fluid distribution member. A heated fluid is dispensed from the fluid distribution member and contacts the backside of the substrate, thus heating the substrate. The fluid is dispensed from apertures configured to maintain a constant temperature across the substrate surface. The method includes flowing a heated fluid through a diffusion member against a backside of the substrate in a configuration that is configured to generate a constant processing temperature across the front side or processing side of the substrate.

摘要翻译： 一种用于在无电沉积工艺期间控制衬底温度的方法和装置。 该装置包括沉积单元，该沉积单元构造成在流体分配构件上方的位置处支撑基板。 加热的流体从流体分配构件分配并接触基底的背面，从而加热基底。 从被配置成在衬底表面上保持恒定温度的孔分配流体。 该方法包括使加热的流体通过扩散构件以基板的背面流动的形式，该结构被构造成在衬底的前侧或处理侧产生恒定的处理温度。