公开(公告)号：US07829353B2

公开(公告)日：2010-11-09

申请号：US11586782

申请日：2006-10-26

申请人： Ali Shajii ,  Siddharth P. Nagarkatti ,  Matthew Mark Besen ,  William R. Clark ,  Daniel Alexander Smith ,  Bora Akgerman

发明人： Ali Shajii ,  Siddharth P. Nagarkatti ,  Matthew Mark Besen ,  William R. Clark ,  Daniel Alexander Smith ,  Bora Akgerman

IPC分类号： H01L21/00

CPC分类号： C23C16/45544 ,  C23C16/45527 ,  C23C16/45557 ,  C23C16/52 ,  Y10S438/935

摘要： A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer connected to the chamber, an input device for providing a desired mass to be delivered, and a controller connected to the valves, the pressure transducer and the input device. The controller is programmed to receive the desired mass from the input device, close the second valve and open the first valve, receive chamber pressure measurements from the pressure transducer, and close the inlet valve when pressure within the chamber reaches a predetermined level. The controller is then programmed to wait a predetermined waiting period to allow the gas inside the chamber to approach a state of equilibrium, then open the outlet valve at time=t0, and close the outlet valve at time=t* when the mass of gas discharged equals the desired mass.

摘要翻译： 一种用于输送期望质量的气体的系统，包括腔室，控制流入腔室的第一阀门，控制流出腔室的第二阀门，连接到腔室的压力传感器，用于提供期望质量的输入装置 以及连接到阀门，压力传感器和输入装置的控制器。 控制器被编程为从输入装置接收期望的质量，关闭第二阀并打开第一阀，从压力传感器接收室压力测量值，并且当腔室内的压力达到预定水平时关闭入口阀。 然后将控制器编程为等待预定的等待时间，以允许室内的气体达到平衡状态，然后在时间= t0时打开出口阀，并且当气体质量在时间= t *时关闭出口阀 放电等于所需质量。

公开(公告)号：US07628860B2

公开(公告)日：2009-12-08

申请号：US10822358

申请日：2004-04-12

申请人： Ali Shajii ,  Siddharth P. Nagarkatti ,  Matthew Mark Besen ,  William R. Clark ,  Daniel Alexander Smith ,  Bora Akgerman

发明人： Ali Shajii ,  Siddharth P. Nagarkatti ,  Matthew Mark Besen ,  William R. Clark ,  Daniel Alexander Smith ,  Bora Akgerman

IPC分类号： C23C16/455 ,  C23C16/52 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

CPC分类号： C23C16/45544 ,  C23C16/45527 ,  C23C16/45557 ,  C23C16/52 ,  Y10S438/935

摘要： A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer connected to the chamber, an input device for providing a desired mass to be delivered, and a controller connected to the valves, the pressure transducer and the input device. The controller is programmed to receive the desired mass from the input device, close the second valve and open the first valve, receive chamber pressure measurements from the pressure transducer, and close the inlet valve when pressure within the chamber reaches a predetermined level. The controller is then programmed to wait a predetermined waiting period to allow the gas inside the chamber to approach a state of equilibrium, then open the outlet valve at time=t0, and close the outlet valve at time=t* when the mass of gas discharged equals the desired mass.

公开(公告)号：US07615120B2

公开(公告)日：2009-11-10

申请号：US11588042

申请日：2006-10-26

申请人： Ali Shajii ,  Siddharth P. Nagarkatti ,  Matthew Mark Besen ,  William R. Clark ,  Daniel Alexander Smith ,  Bora Akgerman

发明人： Ali Shajii ,  Siddharth P. Nagarkatti ,  Matthew Mark Besen ,  William R. Clark ,  Daniel Alexander Smith ,  Bora Akgerman

IPC分类号： C23C16/455 ,  C23C16/52 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

CPC分类号： C23C16/45544 ,  C23C16/45527 ,  C23C16/45557 ,  C23C16/52 ,  Y10S438/935

摘要： A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer connected to the chamber, an input device for providing a desired mass to be delivered, and a controller connected to the valves, the pressure transducer and the input device. The controller is programmed to receive the desired mass from the input device, close the second valve and open the first valve, receive chamber pressure measurements from the pressure transducer, and close the inlet valve when pressure within the chamber reaches a predetermined level. The controller is then programmed to wait a predetermined waiting period to allow the gas inside the chamber to approach a state of equilibrium, then open the outlet valve at time=t0, and close the outlet valve at time=t* when the mass of gas discharged equals the desired mass.

摘要翻译： 一种用于输送期望质量的气体的系统，包括腔室，控制流入腔室的第一阀门，控制流出腔室的第二阀门，连接到腔室的压力传感器，用于提供期望质量的输入装置 以及连接到阀门，压力传感器和输入装置的控制器。 控制器被编程为从输入装置接收期望的质量，关闭第二阀并打开第一阀，从压力传感器接收室压力测量值，并且当腔室内的压力达到预定水平时关闭入口阀。 然后将控制器编程为等待预定的等待时间，以允许室内的气体达到平衡状态，然后在时间= t0时打开出口阀，并且当气体质量在时间= t *时关闭出口阀 放电等于所需质量。

公开(公告)号：US20070039549A1

公开(公告)日：2007-02-22

申请号：US11588042

申请日：2006-10-26

申请人： Ali Shajii ,  Siddharth Nagarkatti ,  Matthew Mark Besen ,  William Clark ,  Daniel Alexander Smith ,  Bora Akgerman

发明人： Ali Shajii ,  Siddharth Nagarkatti ,  Matthew Mark Besen ,  William Clark ,  Daniel Alexander Smith ,  Bora Akgerman

IPC分类号： H01L21/306 ,  C23C16/00

CPC分类号： C23C16/45544 ,  C23C16/45527 ,  C23C16/45557 ,  C23C16/52 ,  Y10S438/935

摘要： A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer connected to the chamber, an input device for providing a desired mass to be delivered, and a controller connected to the valves, the pressure transducer and the input device. The controller is programmed to receive the desired mass from the input device, close the second valve and open the first valve, receive chamber pressure measurements from the pressure transducer, and close the inlet valve when pressure within the chamber reaches a predetermined level. The controller is then programmed to wait a predetermined waiting period to allow the gas inside the chamber to approach a state of equilibrium, then open the outlet valve at time=t0, and close the outlet valve at time=t* when the mass of gas discharged equals the desired mass.

公开(公告)号：US20140096908A1

公开(公告)日：2014-04-10

申请号：US13649103

申请日：2012-10-10

申请人： Ali Shajii ,  Richard Gottscho ,  Souheil Benzerrouk ,  Andrew Cowe ,  Siddharth P. Nagarkatti ,  William R. Entley

发明人： Ali Shajii ,  Richard Gottscho ,  Souheil Benzerrouk ,  Andrew Cowe ,  Siddharth P. Nagarkatti ,  William R. Entley

IPC分类号： H01J37/32

CPC分类号： H01J37/32431 ,  H01J37/321 ,  H01J37/32669

摘要： A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.

摘要翻译： 处理室包括处理室顶部中的多个等离子体源。 每个等离子体源是包括初级绕组和多个铁氧体的环形等离子体源。 还描述了等离子体处理系统。 还描述了等离子体处理的方法。

公开(公告)号：US09155181B2

公开(公告)日：2015-10-06

申请号：US12852352

申请日：2010-08-06

申请人： Ali Shajii ,  Richard Gottscho ,  Souheil Benzerrouk ,  Andrew Cowe ,  Siddharth P. Nagarkatti ,  William R. Entley

发明人： Ali Shajii ,  Richard Gottscho ,  Souheil Benzerrouk ,  Andrew Cowe ,  Siddharth P. Nagarkatti ,  William R. Entley

IPC分类号： H01L21/306 ,  C23C16/00 ,  H05H1/46 ,  H01J37/32

CPC分类号： H05H1/46 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/3266 ,  H01J37/32669 ,  H01J37/32816 ,  H01J2237/334 ,  H05H2001/4652 ,  H05H2001/4682

摘要： A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.

摘要翻译： 等离子体源包括环等离子体室，围绕环等离子体室的外部的初级绕组和多个铁氧体，其中环等离子体室穿过每个铁氧体。 还描述了用于产生等离子体的系统和方法。

公开(公告)号：US08999104B2

公开(公告)日：2015-04-07

申请号：US12852364

申请日：2010-08-06

申请人： Ali Shajii ,  Richard Gottscho ,  Souheil Benzerrouk ,  Andrew Cowe ,  Siddharth P. Nagarkatti ,  William R. Entley

发明人： Ali Shajii ,  Richard Gottscho ,  Souheil Benzerrouk ,  Andrew Cowe ,  Siddharth P. Nagarkatti ,  William R. Entley

IPC分类号： C23F1/00 ,  H01J37/32

CPC分类号： H01J37/32449 ,  H01J37/32422 ,  H01J37/3266 ,  H01J37/32669 ,  H01J37/32816 ,  H01J2237/334

摘要： A plasma source includes multiple ring plasma chambers, multiple primary windings, multiple ferrites and a control system. Each one of the primary windings is wrapped around an exterior one of the ring plasma chambers. Each one of the plurality of the ring plasma chamber passes through a respective portion of the plurality of ferrites. The control system is coupled to each of the ring plasma chambers. A system and method for generating and using a plasma are also described.

摘要翻译： 等离子体源包括多个环等离子体室，多个初级绕组，多个铁氧体和一个控制系统。 每个初级绕组缠绕在环形等离子体室的外部一个周围。 多个环形等离子体室中的每一个穿过多个铁氧体的相应部分。 控制系统耦合到每个环形等离子体室。 还描述了用于产生和使用等离子体的系统和方法。

公开(公告)号：US07072743B2

公开(公告)日：2006-07-04

申请号：US10796693

申请日：2004-03-09

申请人： Ali Shajii ,  Siddharth P. Nagarkatti

发明人： Ali Shajii ,  Siddharth P. Nagarkatti

IPC分类号： G05D7/00 ,  G05D11/00

CPC分类号： G05D7/0664 ,  C23C16/45561 ,  C23C16/52 ,  Y10T137/0363 ,  Y10T137/2524

摘要： A system for dividing a single flow into two or more secondary flows of desired ratios, including an inlet adapted to receive the single flow, at least two secondary flow lines connected to the inlet, an input device adapted to receive at least one desired ratio of flow, at least one in-situ process monitor providing measurements of products produced by each of the flows lines, and a controller connected to the input device and the in-situ process monitor. The controller is programmed to receive the desired ratio of flow through the input device, receive the product measurements from the in-situ process monitor, and calculate a corrected ratio of flow based upon the desired ratio of flow and the product measurements. If the product measurements are not equal, then the corrected ratio of flow will be different than the desired ratio of flow.

摘要翻译： 一种用于将单个流分成两个或更多个期望比例的二次流的系统，包括适于接收单个流的入口，连接到入口的至少两个二次流线，适于接收至少一个期望比例的输入装置 至少一个原位过程监视器，其提供由每个流水线产生的产品的测量值，以及连接到输入设备和原位过程监控器的控制器。 控制器被编程为接收通过输入设备的期望流量比，从原位过程监控器接收产品测量值，并且基于所需的流量比和产品测量值来计算校正的流量比。 如果产品测量值不相等，则校正后的流量比将不同于所需的流量比。

公开(公告)号：US10283325B2

公开(公告)日：2019-05-07

申请号：US13649103

申请日：2012-10-10

申请人： Ali Shajii ,  Richard Gottscho ,  Souheil Benzerrouk ,  Andrew Cowe ,  Siddharth P. Nagarkatti ,  William R. Entley

发明人： Ali Shajii ,  Richard Gottscho ,  Souheil Benzerrouk ,  Andrew Cowe ,  Siddharth P. Nagarkatti ,  William R. Entley

IPC分类号： H01J37/32

摘要： A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.

公开(公告)号：US08692466B2

公开(公告)日：2014-04-08

申请号：US12394904

申请日：2009-02-27

申请人： Souheil Benzerrouk ,  Siddharth P. Nagarkatti ,  Andrew Cowe ,  Ali Shajii ,  Jesse E. Ambrosina ,  Ken Tran ,  Xing Chen

发明人： Souheil Benzerrouk ,  Siddharth P. Nagarkatti ,  Andrew Cowe ,  Ali Shajii ,  Jesse E. Ambrosina ,  Ken Tran ,  Xing Chen

IPC分类号： H01J7/24

CPC分类号： H01J37/32009 ,  H01J37/321

摘要： Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed.

摘要翻译： 描述了用于在反应性气体发生器中点燃和/或维持等离子体的方法和装置，包括计算机程序产品。 从点火电源向等离子体点火电路供电。 测量等离子体点火电路的预点火信号。 基于所测量的预先点火信号和可调节的预点火控制信号来调节提供给等离子体点火电路的功率。 经过一段时间后，调节可调节点火控制信号。