摘要:
Urethanes are prepared by oxidative carbonylation of at least one amino compound in the presence of carbon monoxide, oxygen and organic, at least one hydroxyl-group-carrying compound. The carbonylation is carried out in the absence of halogen-containing promoters. The carbonylation is also carried out in the presence of a metal complex catalyst which contains neutral bidentate N-chelate ligands of the (N˜N) type, two monoanionic N,O-chelate ligands of the general type (N˜O)− or tetradentate dianionic chelate ligands (O˜N˜N˜O)2−.
摘要:
The invention relates to a method for producing urethanes or ureas or mixtures of urethanes and ureas by oxidative carbonylation of organic amines in the presence of carbon monoxide, oxygen and a catalyst, where the catalyst used is a transition metal complex containing the structural feature: [Mn+(O˜N˜O)2−](n−2)+(L)m(Z−)n−2 and the method is carried out under halogen-free reaction conditions. The invention further relates to transition metal complexes containing said structural feature and also to the use of such transition metal complexes as catalysts in the production of urethanes or ureas or mixtures of urethanes and ureas.
摘要:
The invention relates to a method for producing urethanes or ureas or mixtures of urethanes and ureas by oxidative carbonylation of organic amines in the presence of carbon monoxide, oxygen and a catalyst, where the catalyst used is a transition metal complex containing the structural feature: [Mn+(O˜N˜O)2−](n-2)+(L)m(Z−)n-2 and the method is carried out under halogen-free reaction conditions. The invention further relates to transition metal complexes containing said structural feature and also to the use of such transition metal complexes as catalysts in the production of urethanes or ureas or mixtures of urethanes and ureas.
摘要:
The invention relates to a method for producing N-aryl carbamates (urethanes) and N-aryl isocyanates. According to said method, aromatic nitro compounds are subjected to a reductive carbonylation in the presence of carbon dioxide and organic compounds that bear hydroxyl groups and the carbonylation is carried out in the presence of metal complexing catalysts. Anionic N,O-chelate ligands of the general formulae [M(N˜O)−2] and [M(O˜N˜N˜O)2−], containing a divalent or trivalent transition metal of groups 5-11 are used for the catalysts.
摘要:
The invention relates to chelate-stabilized homleptic triaryl compounds based on phenylphosphoranes, to methods for preparing same and to the use thereof as catalysts. According to the invention, the object is achieved by homleptic rare earth triaryl complexes of the general formula (I), where SE=Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb or Lu; X=O, CRR′; R1, R2=phenyl; R, R′=mutually independently H, alkyl with n=10 C atoms, phenyl or trimethylsilyl.
摘要:
The present invention describes homoleptic, ortho-metalated, chelate-stabilized benzylamine complexes of the rare-earth metals. The rare-earth metals are selected from Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu. In the complexes according to the present invention, at least one benzylic proton of the benzylamine ligand is replaced by an alkyl or aryl group. Such complexes are preferred in which both benzylic protons of the benzylamine ligand are replaced by an alkyl- or aryl group. The complexes according to the present invention are produced by reaction of chelate-stabilized rare-earth metal halides with ortho-lithiated aryl ligands at room temperature under inert gas atmosphere. The complexes according to the present invention are thermally stable and suitable for being used as catalysts for the hydroamination of olefins.
摘要:
The present invention relates to specific, novel tantalum and niobium compounds which can serve as starting materials for the preparation of chemical vapour deposition (CVD) precursors.
摘要:
Tantalum and niobium compounds having the general formula (I) and their use for the chemical vapour deposition process are described: wherein M stands for Nb or Ta, R1 and R2 C1 to C12 alkyl, C5 to C12 cycloalkyl, C6 to C10 aryl radicals, 1-alkenyl, 2-alkenyl, 3-alkenyl, triorganosilyl radicals —SiR3, or amino radicals NR2 R3 is C1 to C8 alkyl, C5 to C10 cycloalkyl, C6 to C14 aryl radical, or SiR3 or NR2, R4 denotes Cl, Br, I, NIH—R5 where R5 is C1 to C8 alkyl, C5 to C10 cycloalkyl or C6 to C10 aryl radical, or O—R6 where R6=optionally substituted C1 to C11 alkyl, C5 to C10 cycloalkyl, C6 to C10 aryl radical, or —SiR3, or BH4, or an allyl radical, or an indenyl radical, or an benzyl radical, or an cyclopentadienyl radical, or —NIR—NR′R″ (hydrazido(-1), wherein R, R′ and R″ have the aforementioned meaning of R, or CH2SiMe3, pseudohalide, or silylamide —N(SiMe3)2, and R7 and R8 are H, C1 to C12 alkyl, C5 to C12 cycloalkyl or C6 to C10 aryl radicals.
摘要:
The invention relates to η5:η1-cyclopentadienylidene-phosphorane constrained geometry complexes of rare earth metals, abbreviated to η5:η1-CpPC-CGC, method for production and use of same. The η5:η1-CpPC-CGCs correspond to the general formula (1), wherein SE=Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb or Lu; X=independently of one another, a mono-anionic diorganoamido-, bistrimethylsilylamido-, halogenido-, alkyl-, aryl-, alkoxo-, aryloxo- or alkylaluminate (AlR4−) substituent; L=neutral ligand (PR3, NR3, pyridine), solvent molecule (THF, ether, DMF, DMSO, HMPT, tetrahydropyran THP, tetrahydrothiofuran THT); R=alkyl with up to 1-10 C atoms or mono- or polycyclical aryl with 6 to 20 C atoms; R1, R4=independently of one another H or methyl; R2, R3=independently of one another, H or methyl or tertiary butyl or together a substituted cycloalkyl group; R5, R6=methyl, n-butyl, tertiary butyl or phenyl; R7, R8=independently of one another H, trimethylsilyl, alkyl with 1-10 C atoms or mono- or polycyclical aryl with 6 to 20 C atoms, and m=0, 1, 2 or 3.
摘要翻译:本发明涉及& 5>稀土金属的1-环戊二烯基 - 正磷烷约束几何配合物,缩写为& e> 1-CpPC-CGC,其生产和使用方法。 其中SE = Sc,Y,La,Ce,Pr,Nd,Pm,Sm,Eu,Gd,Tb,Dy,Ho等于通式(1) Er,Tm,Yb或Lu; X =彼此独立,单阴离子二有机基酰胺基,双三甲基甲硅烷基氨基 - ,卤代 - ,烷基 - ,芳基 - ,烷氧基 - ,芳氧基 - 或烷基铝酸盐(AlR 4 - )取代基; L =中性配体(PR3,NR3,吡啶),溶剂分子(THF,醚,DMF,DMSO,HMPT,四氢吡喃THP,四氢噻呋喃THT); R =具有至多1-10个C原子的烷基或具有6至20个C原子的单环或多环芳基; R1,R4 =彼此独立地为H或甲基; R2,R3彼此独立地为H或甲基或叔丁基或一起取代的环烷基; R 5,R 6 =甲基,正丁基,叔丁基或苯基; R 7,R 8彼此独立地为H,三甲基甲硅烷基,具有1-10个C原子的烷基或具有6至20个C原子的单环或多环芳基,m = 0,1,2或3。