公开(公告)号：US20080074629A1

公开(公告)日：2008-03-27

申请号：US11527729

申请日：2006-09-27

申请人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Wijckmans

发明人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Wijckmans

IPC分类号： G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70833

摘要： A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.

摘要翻译： 公开了一种光刻设备，其包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，以及被构造成保持衬底的衬底台。 此外，光刻设备包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上，投影系统通过弹性安装件安装到光刻设备的参考元件，以减少高频振动从 投影系统的参考元件和用于抵消衬底台和支撑件相对于投影系统的位置误差的控制系统。

公开(公告)号：US08908144B2

公开(公告)日：2014-12-09

申请号：US11527729

申请日：2006-09-27

申请人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans

发明人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/709 ,  G03F7/70833

摘要： A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.

摘要翻译： 公开了一种光刻设备，其包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，以及构造成保持衬底的衬底台。 此外，光刻设备包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上，投影系统通过弹性安装件安装到光刻设备的参考元件，以减少高频振动从 投影系统的参考元件和用于抵消衬底台和支撑件相对于投影系统的位置误差的控制系统。

公开(公告)号：US07116399B2

公开(公告)日：2006-10-03

申请号：US10844570

申请日：2004-05-13

申请人： Wilhelmus Josephus Box ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Josephus Jacobus Smits ,  Marc Wilhelmus Maria Van Der Wijst

发明人： Wilhelmus Josephus Box ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Josephus Jacobus Smits ,  Marc Wilhelmus Maria Van Der Wijst

IPC分类号： G03B27/42 ,  G03B27/54 ,  G02B7/02

CPC分类号： G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70991

摘要： A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.

摘要翻译： 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。

公开(公告)号：US07307262B2

公开(公告)日：2007-12-11

申请号：US11019524

申请日：2004-12-23

申请人： Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Robertus Johannes Marinus De Jongh ,  Jacob Kleijn ,  Bastiaan S H Jansen ,  Marc Van Der Wijst

发明人： Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Robertus Johannes Marinus De Jongh ,  Jacob Kleijn ,  Bastiaan S H Jansen ,  Marc Van Der Wijst

IPC分类号： G21G5/00

CPC分类号： G03F7/709 ,  G03F7/70266 ,  G03F7/70825

摘要： A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.

摘要翻译： 光刻设备包括包括可移动光学元件的投影系统。 可移动光学元件能够通过其位移来影响由投影系统投射的辐射束的位置量。 提供控制装置以驱动光学元件致动器来影响可移动光学元件的位置量，从而影响由投影系统投射的辐射束的位置量。 控制装置适于移动可移动光学元件以将投影系统相对于基板投射的辐射束定位，或者校正由任何类型的扰动引起的由投影系统投影的辐射束的位置量 在投影系统上。

公开(公告)号：US06967756B2

公开(公告)日：2005-11-22

申请号：US10834834

申请日：2004-04-30

申请人： Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken

发明人： Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken

IPC分类号： G02B5/10 ,  G02B7/185 ,  G02B26/08 ,  G03F7/20 ,  G03F7/22 ,  H01L21/027 ,  G02B7/182 ,  G02B26/00

CPC分类号： G03F7/70141 ,  G02B7/185 ,  G02B26/0825 ,  G03F7/70258 ,  G03F7/70266

摘要： A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.

摘要翻译： 光刻投影设备包括在辐射系统中的有源反射器，该辐射系统提供辐射的投影光束和/或投影系统。 主动反射器包括主体构件，反射多层和至少一个可控制的致动器，用于调节反射多层的表面图形，其中致动器沿平行于所述反射多层的表面图形的方向施加显着的力分量。 致动器可操作以将扭矩施加到所述反射器。

公开(公告)号：US06750949B2

公开(公告)日：2004-06-15

申请号：US10193688

申请日：2002-07-12

申请人： Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken ,  Josephus Jacobus Smits ,  Antonius Johannes Josephus Van Dijsseldonk ,  Johannes Hubertus Josephina Moors ,  Albrecht Hof ,  Günter Maul ,  Michael Mühlbeyer ,  Klaus Mehlkopp

发明人： Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken ,  Josephus Jacobus Smits ,  Antonius Johannes Josephus Van Dijsseldonk ,  Johannes Hubertus Josephina Moors ,  Albrecht Hof ,  Günter Maul ,  Michael Mühlbeyer ,  Klaus Mehlkopp

IPC分类号： G03B2742

CPC分类号： G03F7/70258 ,  G02B7/008 ,  G02B7/02 ,  G03F7/70833

摘要： A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.

摘要翻译： 根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。 框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料（例如玻璃陶瓷）制成的支撑部分。

公开(公告)号：US06765712B2

公开(公告)日：2004-07-20

申请号：US09902490

申请日：2001-07-11

申请人： Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roeloff Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken

发明人： Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roeloff Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken

IPC分类号： G02B2600

CPC分类号： G03F7/70141 ,  G02B7/185 ,  G02B26/0825 ,  G03F7/70258 ,  G03F7/70266

摘要： A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.

摘要翻译： 光刻投影设备包括在辐射系统中的有源反射器，该辐射系统提供辐射的投影光束和/或投影系统。 主动反射器包括主体构件，反射多层和至少一个可控制的致动器，用于调节反射多层的表面图形，其中致动器沿平行于所述反射多层的表面图形的方向施加显着的力分量。 致动器可操作以将扭矩施加到所述反射器。

公开(公告)号：US08570489B2

公开(公告)日：2013-10-29

申请号：US12741960

申请日：2008-11-07

申请人： Jan Bernard Plechelmus Van Schoot ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan ,  Diederik Jan Maas

发明人： Jan Bernard Plechelmus Van Schoot ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan ,  Diederik Jan Maas

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70291 ,  G03F7/70208 ,  G03F7/70941

摘要： A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus.

摘要翻译： 一种光刻投影设备，包括被配置为支撑图案形成装置的支撑结构，所述图案形成装置被配置为在其横截面中赋予图案的辐射束; 衬底保持器，其构造成保持衬底; 投影系统，被配置为将所述图案化的辐射束暴露在所述基板的目标部分上; 以及被配置为通过提供待暴露在所述基板的目标部分上的另外的辐射束来补偿一个或多个扰动因子的系统，所述附加辐射束在其横截面中被赋予附加图案，所述另外的图案基于 图案形成装置的图案和光刻投影装置的属性数据，光刻投影装置的属性数据表征不同光刻装置的一个或多个系统扰动因子的水平和性质。

公开(公告)号：US07312860B2

公开(公告)日：2007-12-25

申请号：US11594075

申请日：2006-11-08

申请人： Arie Jeffrey Den Boef ,  Hans Van Der Laan ,  Antonius Johannes Josephus Van Dijsseldonk ,  Mircea Dusa ,  Antoine Gaston Marie Kiers

发明人： Arie Jeffrey Den Boef ,  Hans Van Der Laan ,  Antonius Johannes Josephus Van Dijsseldonk ,  Mircea Dusa ,  Antoine Gaston Marie Kiers

IPC分类号： G01B9/00

CPC分类号： G03F7/706

摘要： In a method according to one embodiment of the invention, aberrations in a lithographic apparatus are detected by printing a test pattern having at least one degree of symmetry and being sensitive to a particular aberration in the apparatus, and using a scatterometer to derive information concerning the aberration. The test structure may comprise a two-bar grating, in which case the inner and outer duty ratios can be reconstructed to derive information indicative of comatic aberration. Alternatively, a hexagonal array of dots can be used, such that scatterometry data can be used to reconstruct dot diameters indicative of 3-wave aberration.

摘要翻译： 在根据本发明的一个实施例的方法中，通过印刷具有至少一个对称度并对装置中的特定像差敏感的测试图案来检测光刻设备中的像差，并且使用散射仪来得到关于 像差 测试结构可以包括双杆格栅，在这种情况下，可以重建内部和外部占空比以导出指示彗形像差的信息。 或者，可以使用六边形点阵列，使得散射测量数据可以用于重建指示3波像差的点直径。

公开(公告)号：US07253880B2

公开(公告)日：2007-08-07

申请号：US10995536

申请日：2004-11-24

申请人： Erik Roelof Loopstra ,  Petrus Rutgerus Bartray ,  Antonius Johannes Josephus Van Dijsseldonk ,  Paulus Martinus Maria Liebregts

发明人： Erik Roelof Loopstra ,  Petrus Rutgerus Bartray ,  Antonius Johannes Josephus Van Dijsseldonk ,  Paulus Martinus Maria Liebregts

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70141 ,  G03F7/70091

摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.

摘要翻译： 光刻设备包括被配置为提供辐射束和投影系统的照明系统，其配置成将辐射束投影到基板的目标部分上。 照明系统和投影系统中的至少一个包括用于反射或折射光束的聚焦元件。 提供了多个止动盘，每个具有穿过其中的孔，以及配置成将止动盘中的一个邻近聚焦元件放置以控制投影系统或照明系统的数值孔径（NA）的盘定位器。 该装置还包括一个换盘器，其被配置为选择一个停止盘并将所选择的停止盘提供给盘定位器，换盘器位于投影系统或照明系统的外部。