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公开(公告)号：US07423721B2
公开(公告)日：2008-09-09
申请号：US11012062
申请日：2004-12-15
申请人： Antonius Johannes Josephus Van Dijsseldonk , Mustafa Amhaouch , Wilhelmus Josephus Box , Johannes Henricus Wilhelmus Jacobs , Hernes Jacobs , Marius Ravensbergen , Martinus Arnoldus Henricus Terken , Robert Gordon Livesey , Franciscus Catharina Bernardus Marinus Van Vroonhoven
发明人： Antonius Johannes Josephus Van Dijsseldonk , Mustafa Amhaouch , Wilhelmus Josephus Box , Johannes Henricus Wilhelmus Jacobs , Hernes Jacobs , Marius Ravensbergen , Martinus Arnoldus Henricus Terken , Robert Gordon Livesey , Franciscus Catharina Bernardus Marinus Van Vroonhoven
IPC分类号： G03B27/42
CPC分类号： G03F7/70841 , G03F7/70991
摘要： A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.
摘要翻译： 真空操作的光刻设备包括真空壳体，用于为构造成支撑图案形成装置的支撑件，或衬底台，投影系统或其任何组合提供真空环境。 真空壳体的内部包括用于输送用于光刻处理的第一工艺模式的流体和/或电信号的多个输送电路。 传送电路中的至少一个适于将能量传送到真空壳体的内部，以刺激真空壳体中的除气，以用于使光刻设备进入真空操作状态的第二工艺模式。
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公开(公告)号：US20060126041A1
公开(公告)日：2006-06-15
申请号：US11012062
申请日：2004-12-15
申请人： Antonius Van Dijsseldonk , Mustafa Amhaouch , Wilhelmus Box , Johannes Jacobs , Hernes Jacobs , Marius Ravensbergen , Martinus Arnoldus Terken , Robert Livesey , Franciscus Catharina Van Vroonhoven
发明人： Antonius Van Dijsseldonk , Mustafa Amhaouch , Wilhelmus Box , Johannes Jacobs , Hernes Jacobs , Marius Ravensbergen , Martinus Arnoldus Terken , Robert Livesey , Franciscus Catharina Van Vroonhoven
IPC分类号： G03B27/42
CPC分类号： G03F7/70841 , G03F7/70991
摘要： A vacuum operated lithographic apparatus is disclosed. The apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.
摘要翻译： 公开了一种真空操作的光刻设备。 该装置包括用于向构造成支撑图案形成装置的支撑件，或衬底台，或投影系统或其任何组合提供真空环境的真空壳体。 真空壳体的内部包括用于输送用于光刻处理的第一工艺模式的流体和/或电信号的多个输送电路。 传送电路中的至少一个适于将能量传送到真空壳体的内部，以刺激真空壳体中的除气，以用于使光刻设备进入真空操作状态的第二工艺模式。
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公开(公告)号：US07375353B2
公开(公告)日：2008-05-20
申请号：US11224303
申请日：2005-09-13
CPC分类号： G03F7/70191 , G03F7/70083
摘要： An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device is provided to adjust the members in such a manner as to control the attenuation of the patterned radiation beam projected onto a target portion of a substrate across the cross-section of the patterned radiation beam. The attenuation control device includes a detector configured to provide an output indicative of the position of each member in dependence on detection of a beam of detecting radiation reaching the detector after attenuation by the member.
摘要翻译： 公开了一种衰减调节装置，其包括多个构件，所述多个构件构造成在照射光刻设备中的图案形成装置的辐射束中浇铸半圆形。 此外，提供衰减控制装置以调节构件以控制在图案化的辐射束的横截面上投射到基板的目标部分上的图案化的辐射束的衰减。 所述衰减控制装置包括检测器，其被配置为根据检测到由所述构件衰减后到达所述检测器的辐射束的检测来提供指示每个构件的位置的输出。
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公开(公告)号：US20070057201A1
公开(公告)日：2007-03-15
申请号：US11224303
申请日：2005-09-13
申请人： Hendrik Neerhof , Hako Botma , Marius Ravensbergen
发明人： Hendrik Neerhof , Hako Botma , Marius Ravensbergen
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70083
摘要： An attenuation adjustment device is disposed in a radiation system of a lithography device and includes a plurality of members for casting penumbras in the radiation beam illuminating the patterning device. Furthermore an attenuation control device is provided for adjusting the members in such a manner as to control the attenuation of the patterned radiation beam projected onto the target portion of the substrate across the cross-section of the patterned radiation beam. The attenuation control device incorporates a detector for providing an output indicative of the position of each member in dependence on detection of a beam of detecting radiation reaching the angle detector after attenuation by the member.
摘要翻译： 衰减调节装置设置在光刻装置的辐射系统中，并且包括多个用于在照射图案形成装置的辐射束中铸造半圆形的构件。 此外，提供衰减控制装置，用于以这样的方式调节构件，以便控制在图案化的辐射束的横截面上投射到基板的目标部分上的图案化的辐射束的衰减。 该衰减控制装置包括一个检测器，用于根据检测到被成员衰减后到达角度检测器的辐射束的检测，提供指示每个构件的位置的输出。
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公开(公告)号：US20060139585A1
公开(公告)日：2006-06-29
申请号：US11022936
申请日：2004-12-28
IPC分类号： G03B27/68
CPC分类号： G03F7/70266 , G03F7/70825
摘要： A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
摘要翻译： 公开了一种光刻设备，其具有可变形透镜元件，图案化的辐射束通过该可变形透镜元件布置成在到达基板之前通过，并且具有被配置为透射基本上平行于投影系统的光轴的力的组合的可变形透镜致动器，以及 围绕可变形透镜元件上的多个子区域处于基本上垂直于光轴的轴线的局部扭矩。
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公开(公告)号：US06819400B2
公开(公告)日：2004-11-16
申请号：US10386932
申请日：2003-03-13
申请人： Marius Ravensbergen
发明人： Marius Ravensbergen
IPC分类号： G03B2752
CPC分类号： G03F7/70258 , G01D5/38 , G03F7/70833 , G03F7/709
摘要： A displacement measurement system constructed and arranged to measure the position of optical elements in a projection system of a lithographic projection apparatus makes use of the interferential measurement principle which involves use of a first diffraction grating mounted on the optical element and a second diffraction grating mounted on a reference frame.
摘要翻译： 构造和布置为测量光刻投影设备的投影系统中的光学元件的位置的位移测量系统利用了干涉测量原理，其包括使用安装在光学元件上的第一衍射光栅和安装在光学元件上的第二衍射光栅 参考框架。
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公开(公告)号：US08089672B2
公开(公告)日：2012-01-03
申请号：US12318034
申请日：2008-12-19
申请人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
发明人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
IPC分类号： G02B26/08
CPC分类号： G03F7/70291 , G02B26/0841 , G03F7/70508 , G09G3/006 , G09G3/346
摘要： A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.
摘要翻译： 一种控制单独可控元件阵列的元件的方法。 该方法包括改变驱动元件的驱动电压的频率。
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公开(公告)号：US07436484B2
公开(公告)日：2008-10-14
申请号：US11022936
申请日：2004-12-28
申请人： Marc Wilhelmus Maria Van Der Wijst , Dominicus Jacobus Petrus Adrianus Franken , Erik Roelof Loopstra , Marius Ravensbergen
发明人： Marc Wilhelmus Maria Van Der Wijst , Dominicus Jacobus Petrus Adrianus Franken , Erik Roelof Loopstra , Marius Ravensbergen
CPC分类号： G03F7/70266 , G03F7/70825
摘要： A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
摘要翻译： 公开了一种光刻设备，其具有可变形透镜元件，图案化的辐射束通过该可变形透镜元件布置成在到达基板之前通过，并且具有被配置为透射基本上平行于投影系统的光轴的力的组合的可变形透镜致动器，以及 围绕可变形透镜元件上的多个子区域处于基本垂直于光轴的轴的局部扭矩。
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公开(公告)号：US20070170376A1
公开(公告)日：2007-07-26
申请号：US11591673
申请日：2006-11-02
IPC分类号： G01J3/10
CPC分类号： G03F7/70191 , G03F7/70083
摘要： An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device may be provided to adjust the members in such a manner as to control attenuation of a radiation beam projected onto a target portion of a substrate across the cross-section of the radiation beam.
摘要翻译： 公开了一种衰减调节装置，其包括多个构件，所述多个构件构造成在照射光刻设备中的图案形成装置的辐射束中浇铸半圆形。 此外，可以提供衰减控制装置以调节部件，以便控制在辐射束的横截面上投影到基板的目标部分上的辐射束的衰减。
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10.发明申请Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method 失效用于检测光学部件的辐射通量和污染的组件，包括这种组件的光刻设备和器件制造方法公开(公告)号：US20050133727A1
公开(公告)日：2005-06-23
申请号：US10740829
申请日：2003-12-22
申请人： Vadim Banine , Levinus Bakker , Johannes Hubertus Moors , Lucas Henricus Johannes Stevens , Yurii Sidelnikov , Marcel Mathijs Dierichs , Marius Ravensbergen
发明人： Vadim Banine , Levinus Bakker , Johannes Hubertus Moors , Lucas Henricus Johannes Stevens , Yurii Sidelnikov , Marcel Mathijs Dierichs , Marius Ravensbergen
CPC分类号： G03F7/70916 , G03F7/7085
摘要： An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.
摘要翻译： 用于检测光学部件上的辐射通量和污染物中的至少一种的组件包括被配置为接收辐射通量和污染物中的至少一种的检测器，并且当使用该组件时，生成与至少相关的检测器信号 辐射通量和部件污染之一。 仪表被配置为测量检测器信号。 检测器包括至少一根线。
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