公开(公告)号：US10975469B2

公开(公告)日：2021-04-13

申请号：US15462718

申请日：2017-03-17

Applicant: Applied Materials, Inc.

Inventor： Vahid Firouzdor ,  Sumanth Banda ,  Rajinder Dhindsa ,  Daniel Byun ,  Dana Marie Lovell

IPC: B32B9/00 ,  C23C16/455 ,  C23C16/40 ,  C23C16/50 ,  C23C16/34 ,  C23C16/04 ,  H01J37/32

Abstract: Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a porous chamber component and onto pore walls within the porous chamber component using an atomic layer deposition (ALD) process. The porous chamber component may include a porous body comprising a plurality of pores within the porous body, the plurality of pores each comprising pore walls. The porous body is permeable to a gas. The plasma resistant coating may have a thickness of about 5 nm to about 3 μm, and may protect the pore walls from erosion. The porous body with the plasma resistant coating remains permeable to the gas.

公开(公告)号：US10745805B2

公开(公告)日：2020-08-18

申请号：US15849277

申请日：2017-12-20

Applicant: Applied Materials, Inc.

Inventor： Vahid Firouzdor ,  Sumanth Banda ,  Rajinder Dhindsa ,  Daniel Byun ,  Dana Marie Lovell

IPC: B32B9/00 ,  C23C16/455 ,  C23C16/40 ,  C23C16/50 ,  C23C16/34 ,  C23C16/04 ,  H01J37/32

Abstract: Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a porous chamber component and onto pore walls within the porous chamber component using an atomic layer deposition (ALD) process. The porous chamber component may include a porous body comprising a plurality of pores within the porous body, the plurality of pores each comprising pore walls. The porous body is permeable to a gas. The plasma resistant coating may comprise a solid solution of Y2O3—ZrO2 and may have a thickness of about 5 nm to about 3 μm, and may protect the pore walls from erosion. The porous body with the plasma resistant coating remains permeable to the gas.

公开(公告)号：US20180337026A1

公开(公告)日：2018-11-22

申请号：US15982632

申请日：2018-05-17

Applicant: Applied Materials, Inc.

Inventor： Vahid Firouzdor ,  Sumanth Banda ,  Dana Lovell ,  Daniel Byun ,  Rajinder Dhindsa

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/40 ,  H01L21/683 ,  H01L21/67

CPC classification number: H01J37/32715 ,  C23C16/40 ,  C23C16/45536 ,  H01J37/32724 ,  H01J37/32807 ,  H01J2237/002 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/67248 ,  H01L21/6833

Abstract: Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The chamber component may include an insulator material with good electrical properties. The dielectric constant of a coated insulator material may be within about ±5% of the dielectric constant of the insulator material without the plasma resistant coating.

公开(公告)号：US20180265973A1

公开(公告)日：2018-09-20

申请号：US15849277

申请日：2017-12-20

Applicant: Applied Materials, Inc.

Inventor： Vahid Firouzdor ,  Sumanth Banda ,  Rajinder Dhindsa ,  Daniel Byun ,  Dana Marie Lovell

IPC: C23C16/455 ,  C23C16/40 ,  C23C16/50 ,  C23C16/34

Abstract: Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a porous chamber component and onto pore walls within the porous chamber component using an atomic layer deposition (ALD) process. The porous chamber component may include a porous body comprising a plurality of pores within the porous body, the plurality of pores each comprising pore walls. The porous body is permeable to a gas. The plasma resistant coating may comprise a solid solution of Y2O3—ZrO2 and may have a thickness of about 5 nm to about 3 μm, and may protect the pore walls from erosion. The porous body with the plasma resistant coating remains permeable to the gas.

公开(公告)号：US20180265972A1

公开(公告)日：2018-09-20

申请号：US15462718

申请日：2017-03-17

Applicant: Applied Materials, Inc.

Inventor： Vahid Firouzdor ,  Sumanth Banda ,  Rajinder Dhindsa ,  Daniel Byun ,  Dana Marie Lovell

IPC: C23C16/455 ,  C23C16/50 ,  C23C16/40 ,  C23C16/34

CPC classification number: C23C16/45527 ,  C23C16/045 ,  C23C16/34 ,  C23C16/402 ,  C23C16/403 ,  C23C16/405 ,  C23C16/45525 ,  C23C16/45531 ,  C23C16/50 ,  H01J37/32477

Abstract: Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a porous chamber component and onto pore walls within the porous chamber component using an atomic layer deposition (ALD) process. The porous chamber component may include a porous body comprising a plurality of pores within the porous body, the plurality of pores each comprising pore walls. The porous body is permeable to a gas. The plasma resistant coating may have a thickness of about 5 nm to about 3 μm, and may protect the pore walls from erosion. The porous body with the plasma resistant coating remains permeable to the gas.