公开(公告)号：US11501954B2

公开(公告)日：2022-11-15

申请号：US17324892

申请日：2021-05-19

申请人： Applied Materials, Inc.

发明人： Vishwas Kumar Pandey ,  Kartik Shah ,  Christopher S. Olsen ,  Agus Sofian Tjandra ,  Hansel Lo ,  Eric Kihara Shono ,  Hemantha Raju

IPC分类号： C23C16/50 ,  H01J37/32 ,  C23C16/455

摘要： Embodiments of the present disclosure generally relate to a processing chamber for conformal oxidation of high aspect ratio structures. The processing chamber includes a chamber body with a first side and a second side opposite the first side, and a flow assembly disposed in the first side. The flow assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the processing chamber. The flow divider includes a crescent shaped first side, a top, and a bottom. The processing chamber also includes a distributed pumping structure located adjacent to the second side. The flow assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux.

公开(公告)号：US10081036B2

公开(公告)日：2018-09-25

申请号：US15269324

申请日：2016-09-19

申请人： APPLIED MATERIALS, INC.

发明人： Sankesha Bhoyar ,  Mahesh Arcot ,  Nilesh Chimanrao Bagul ,  Hemantha Raju ,  Ravindra Patil

IPC分类号： B08B3/12 ,  B08B3/14 ,  G01N15/14 ,  G01N15/06 ,  C02F1/00 ,  C02F1/42 ,  C02F103/34

CPC分类号： B08B3/12 ,  B08B3/00 ,  B08B3/14 ,  C02F1/001 ,  C02F1/42 ,  C02F2103/346 ,  C02F2209/40 ,  C02F2301/046 ,  G01N15/0618 ,  G01N15/1436 ,  G01N15/1459 ,  G01N2015/0053 ,  G01N2015/0693 ,  G01N2015/1486

摘要： Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.

公开(公告)号：US20180078975A1

公开(公告)日：2018-03-22

申请号：US15269324

申请日：2016-09-19

申请人： APPLIED MATERIALS, INC.

发明人： Sankesha Bhoyar ,  Mahesh Arcot ,  Nilesh Chimanrao Bagul ,  Hemantha Raju ,  Ravindra Patil

IPC分类号： B08B3/12 ,  B08B3/14 ,  G01N15/14 ,  G01N15/06 ,  C02F1/00 ,  C02F1/42

CPC分类号： B08B3/12 ,  B08B3/00 ,  B08B3/14 ,  C02F1/001 ,  C02F1/42 ,  C02F2103/346 ,  C02F2209/40 ,  C02F2301/046 ,  G01N15/0618 ,  G01N15/1436 ,  G01N15/1459 ,  G01N2015/0053 ,  G01N2015/0693 ,  G01N2015/1486

摘要： Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.

公开(公告)号：US11878532B2

公开(公告)日：2024-01-23

申请号：US17647820

申请日：2022-01-12

申请人： Applied Materials, Inc.

发明人： Daihua Zhang ,  Ludovic Godet ,  Michael David-Scott Kemp ,  Kang Luo ,  Kazuya Daito ,  Kenneth S. Ledford ,  Bahubali S. Upadhye ,  Hemantha Raju ,  John Rusconi ,  Elsa Massonneau ,  Mahendran Chidambaram ,  Alexey Stepanov ,  Visweswaren Sivaramakrishnan

IPC分类号： B41J2/175 ,  H01L21/00

CPC分类号： B41J2/175 ,  H01L21/00

摘要： Embodiments described herein relate to an inkjet printing platform. The inkjet printing platform is utilized for fabrication of optical films and optical device structures. The inkjet printing platform includes a transfer chamber, one or more inkjet chambers, a plurality of auxiliary modules, a substrate flipper, and load ports. The inkjet printing platform is operable to perform an inkjet printing process on a substrate to form an optical film and/or an optical device.

公开(公告)号：US11049696B2

公开(公告)日：2021-06-29

申请号：US16823936

申请日：2020-03-19

申请人： Applied Materials, Inc.

发明人： Vishwas Kumar Pandey ,  Kartik Shah ,  Christopher S. Olsen ,  Agus Sofian Tjandra ,  Hansel Lo ,  Eric Kihara Shono ,  Hemantha Raju

IPC分类号： C23C16/50 ,  H01J37/32 ,  C23C16/455

摘要： Embodiments of the present disclosure generally relate to a processing chamber for conformal oxidation of high aspect ratio structures. The processing chamber includes a chamber body with a first side and a second side opposite the first side, and a flow assembly disposed in the first side. The flow assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the processing chamber. The flow divider includes a crescent shaped first side, a top, and a bottom. The processing chamber also includes a distributed pumping structure located adjacent to the second side. The flow assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux.

公开(公告)号：US11807008B2

公开(公告)日：2023-11-07

申请号：US17647780

申请日：2022-01-12

申请人： Applied Materials, Inc.

发明人： Daihua Zhang ,  Kang Luo ,  Kazuya Daito ,  Kenneth S. Ledford ,  Elsa Massonneau ,  Alexey Stepanov ,  Ludovic Godet ,  Mahendran Chidambaram ,  Visweswaren Sivaramakrishnan ,  Bahubali S. Upadhye ,  Hemantha Raju

IPC分类号： B41J2/165

CPC分类号： B41J2/1652 ,  B41J2/16547

摘要： Embodiments described herein relate to an inkjet service station and methods of servicing an inkjet printer with the inkjet service station. The inkjet service station is disposed in an inkjet printer of an inkjet chamber. The inkjet service station is operable to perform servicing operations on a processing apparatus of the inkjet printer. The servicing operations include at least one of printhead spitting, printhead purging, printhead flushing, printhead cleaning, printhead drying, or vacuum suction.

公开(公告)号：US20220363064A1

公开(公告)日：2022-11-17

申请号：US17647820

申请日：2022-01-12

申请人： Applied Materials, Inc.

发明人： Daihua ZHANG ,  Ludovic Godet ,  Michael David-Scott Kemp ,  Kang Luo ,  Kazuya Daito ,  Kenneth S. Ledford ,  Bahubali S. Upadhye ,  Hemantha Raju ,  John Rusconi ,  Elsa Massonneau ,  Mahendran Chidambaram ,  Alexey Stepanov ,  Visweswaren Sivaramakrishnan

IPC分类号： B41J2/175

摘要： Embodiments described herein relate to an inkjet printing platform. The inkjet printing platform is utilized for fabrication of optical films and optical device structures. The inkjet printing platform includes a transfer chamber, one or more inkjet chambers, a plurality of auxiliary modules, a substrate flipper, and load ports. The inkjet printing platform is operable to perform an inkjet printing process on a substrate to form an optical film and/or an optical device.

公开(公告)号：US11192153B2

公开(公告)日：2021-12-07

申请号：US16049355

申请日：2018-07-30

申请人： APPLIED MATERIALS, INC.

发明人： Sankesha Bhoyar ,  Mahesh Arcot ,  Nilesh Chimanrao Bagul ,  Hemantha Raju ,  Ravindra Patil

IPC分类号： B08B3/12 ,  B08B3/00 ,  C02F1/00 ,  G01N15/14 ,  B08B3/14 ,  C02F1/42 ,  G01N15/06 ,  G01N15/00 ,  C02F103/34

摘要： Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.

公开(公告)号：US20180339314A1

公开(公告)日：2018-11-29

申请号：US16049355

申请日：2018-07-30

申请人： APPLIED MATERIALS, INC.

发明人： Sankesha Bhoyar ,  Mahesh Arcot ,  Nilesh Chimanrao Bagul ,  Hemantha Raju ,  Ravindra Patil

IPC分类号： B08B3/12 ,  B08B3/14 ,  C02F1/00 ,  C02F1/42 ,  G01N15/06 ,  G01N15/14 ,  B08B3/00 ,  C02F103/34

摘要： Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.