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    Light pipe window structure for thermal chamber applications and processes
    1.
    发明授权
    Light pipe window structure for thermal chamber applications and processes 有权

    公开(公告)号：US11495479B2

    公开(公告)日：2022-11-08

    申请号：US16553778

    申请日：2019-08-28

    Applicant: Applied Materials, Inc.

    Inventor： Joseph M. Ranish ,  Aaron Muir Hunter ,  Anzhong Chang

    IPC: H01L21/67 ,  G02B6/08 ,  G02B6/42 ,  G02B6/00

    Abstract: A processing chamber is described. The processing chamber includes a chamber having an interior volume, a light pipe window structure coupled to the chamber, the light pipe window structure having a first transparent plate disposed within the interior volume of the chamber, and a radiant heat source coupled to a second transparent plate of the light pipe window structure in a position outside of the interior volume of the chamber, wherein the light pipe window structure includes a plurality of light pipe structures disposed between the first transparent plate and the second transparent plate.

    EPI base ring
    2.
    发明授权
    EPI base ring 有权

    公开(公告)号：US10119192B2

    公开(公告)日：2018-11-06

    申请号：US15136119

    申请日：2016-04-22

    Applicant: Applied Materials, Inc.

    Inventor： Steve Aboagye ,  Paul Brillhart ,  Surajit Kumar ,  Anzhong Chang ,  Satheesh Kuppurao ,  Mehmet Tugrul Samir ,  David K. Carlson

    IPC: C23C16/455 ,  C23C16/44 ,  C23C16/458 ,  C23C16/48

    Abstract: Embodiments described herein relate to a base ring assembly for use in a substrate processing chamber. In one embodiment, the base ring assembly comprises a ring body sized to be received within an inner circumference of the substrate processing chamber, the ring body comprising a loading port for passage of the substrate, a gas inlet, and a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body, and an upper ring configured to dispose on a top surface of the ring body, and a lower ring configured to dispose on a bottom surface of the ring body, wherein the upper ring, the lower ring, and the ring body, once assembled, are generally concentric or coaxial.

    EPI base ring
    3.
    发明授权
    EPI base ring 有权
    EPI基圈

    公开(公告)号：US09322097B2

    公开(公告)日：2016-04-26

    申请号：US13846355

    申请日：2013-03-18

    Applicant: Applied Materials, Inc.

    Inventor： Steve Aboagye ,  Paul Brillhart ,  Surajit Kumar ,  Anzhong Chang ,  Satheesh Kuppurao ,  Mehmet Tugrul Samir ,  David K. Carlson

    IPC: C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/48

    CPC classification number: C23C16/45502 ,  C23C16/4411 ,  C23C16/45504 ,  C23C16/45563 ,  C23C16/458 ,  C23C16/4584 ,  C23C16/481

    Abstract: Embodiments described herein relate to a base ring assembly for use in a substrate processing chamber. In one embodiment, the base ring assembly comprises a ring body sized to be received within an inner circumference of the substrate processing chamber, the ring body comprising a loading port for passage of the substrate, a gas inlet, and a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body, and an upper ring configured to dispose on a top surface of the ring body, and a lower ring configured to dispose on a bottom surface of the ring body, wherein the upper ring, the lower ring, and the ring body, once assembled, are generally concentric or coaxial.

    Abstract translation: 本文所述的实施例涉及用于衬底处理室中的基座环组件。 在一个实施例中，基环组件包括尺寸适于容纳在基板处理室的内圆周内的环体，环体包括用于通过基板的装载口，气体入口和气体出口，其中， 气体入口和气体出口设置在环体的相对端，并且配置成设置在环体的顶表面上的上环和被配置为设置在环体的底表面上的下环，其中， 一旦组装，上环，下环和环体大致同心或同轴。

    EPI BASE RING
    6.
    发明申请
    EPI BASE RING 有权
    EPI基座

    公开(公告)号：US20140261185A1

    公开(公告)日：2014-09-18

    申请号：US13846355

    申请日：2013-03-18

    Applicant: Applied Materials, Inc.

    Inventor： STEVE ABOAGYE ,  Paul Brillhart ,  Surajit Kumar ,  Anzhong Chang ,  Satheesh Kuppurao ,  Mehmet Tugrul Samir ,  David K. Carlson

    IPC: C23C16/455

    CPC classification number: C23C16/45502 ,  C23C16/4411 ,  C23C16/45504 ,  C23C16/45563 ,  C23C16/458 ,  C23C16/4584 ,  C23C16/481

    Abstract: Embodiments described herein relate to a base ring assembly for use in a substrate processing chamber. In one embodiment, the base ring assembly comprises a ring body sized to be received within an inner circumference of the substrate processing chamber, the ring body comprising a loading port for passage of the substrate, a gas inlet, and a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body, and an upper ring configured to dispose on a top surface of the ring body, and a lower ring configured to dispose on a bottom surface of the ring body, wherein the upper ring, the lower ring, and the ring body, once assembled, are generally concentric or coaxial.

    Abstract translation: 本文所述的实施例涉及用于衬底处理室中的基座环组件。 在一个实施例中，基环组件包括尺寸适于容纳在基板处理室的内圆周内的环体，环体包括用于通过基板的装载口，气体入口和气体出口，其中， 气体入口和气体出口设置在环体的相对端，并且配置成设置在环体的顶表面上的上环和被配置为设置在环体的底表面上的下环，其中， 一旦组装，上环，下环和环体大致同心或同轴。

    Multiple precursor showerhead with by-pass ports
    7.
    发明授权
    Multiple precursor showerhead with by-pass ports 有权
    带有旁路端口的多个前身淋浴头

    公开(公告)号：US08679956B2

    公开(公告)日：2014-03-25

    申请号：US13751889

    申请日：2013-01-28

    Applicant: Applied Materials, Inc.

    Inventor： Alexander Tam ,  Anzhong Chang ,  Sumedh Acharya

    IPC: H01L21/36 ,  C23C16/00

    CPC classification number: B05B1/18 ,  C23C16/45519 ,  C23C16/45565 ,  C23C16/52 ,  C30B25/14 ,  H01L21/67115

    Abstract: A method and apparatus that includes a processing chamber that includes a showerhead with separate inlets and channels for delivering separate processing gases into a processing volume of the chamber without mixing the gases prior to entering the processing volume is provided. The showerhead includes one or more cleaning gas conduits configured to deliver a cleaning gas directly into the processing volume of the chamber while by-passing the processing gas channels. The showerhead may include a plurality of metrology ports configured to deliver a cleaning gas directly into the processing volume of the chamber while by-passing the processing gas channels. As a result, the processing chamber components can be cleaned more efficiently and effectively than by introducing cleaning gas into the chamber only through the processing gas channels.

    Abstract translation: 提供了一种包括处理室的方法和装置，该处理室包括具有单独的入口和通道的喷头，用于将不同的处理气体输送到室的处理容积中，而不会在进入处理容积之前混合气体。 淋浴头包括一个或多个清洁气体管道，其配置成在旁路处理气体通道的同时将清洁气体直接输送到室的处理容积中。 淋浴头可以包括多个计量端口，其配置成在旁路处理气体通道的同时将清洁气体直接输送到室的处理容积中。 结果，与仅通过处理气体通道将清洁气体引入室中相比，可以更有效和有效地清洁处理室部件。

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