摘要:
Processes for thermal transfer printing are disclosed which comprise electroerosion printing to produce an image bearing element and exposing the imaged element to irradiation so as to permit transfer of thermographic ink from an associated ink layer or ink-containing element onto an ink receiving substrate thus producing copies of the image carried by the image bearing element. Also, described are products for use in such processes.
摘要:
Photoresist compositions of improved reactive ion etching comprising polymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkylacrylate and a titanate, zirconate and/or hafnate are provided. The photoresist compositions are used for forming positive lithographic patterns.
摘要:
Solutions of graft polymers of a polymer having reactive hydrogen groups and grafted through reactive hydrogen groups an alkoxy metallic compound wherein the metal is titanium, zirconium and/or hafnium are useful as photoresist materials which are resistant to plasma. Also, compounds and graft polymers wherein the alkoxy metallic compound also contains silicon, tin or germanium are provided.
摘要:
Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.x --H wherein x is 0-20;--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.y --HE--(CH.sub.2).sub.z --H; and mixtures thereof; wherein HE is O or S; and each y and z individually is 1-18; and mixtures thereof; and then developing the polymer in an aqueous base developer. The developer can be any of the conventional or commonly used ones as well as the special developers discussed below.Positive lithographic patterns are also produced by imagewise exposing to actinic light, x-ray or e-beam a photosensitive polymeric material to provide free carboxylic acid groups; and then developing by contacting with an aqueous developer solution of about 0.001% to about 1% by weight of a compound containing at least one amino group and at least two sulfonate groups selected from the group consisting of alkali metal sulfonate group, ammonium sulfate group, and mixtures thereof; or developing by contacting with an amine in vapor form and contacting with an aqueous solvent.
摘要:
An improved resistive ribbon for thermal transfer printing is provided, where the ribbon includes a resistive layer, a metal current-return layer, a fusible ink layer, and an electric interface layer located between the resistive layer and the metal layer. The electrical interface layer is sufficiently thin so as not to impair the required mechanical properties of the ribbon (such as flexibility, stability, durability, etc.), and has as its primary function the enhancement of the electrical porperties of the ribbon. Specifically, interface resistance and/or knee voltage of the current-voltage characteristics of the ribbon are enhanced by the electrical interface layer.Preferred compositions of the interface layer include alkylalkoxy silanes of a specific formula, and especially nonsymmetrical compounds of that formula.
摘要:
An improved technique and apparatus for color-on-demand resistive ribbon printing is provided in which selected colored ink layers are transferred to a resistive printing ribbon from a color-bearing ribbon, prior to resistive ribbon printing. The color ribbon and the resistive printing ribbon both contain ink layers, the only difference being that the ink layer in the printing ribbon is preferrably uncolored. When the ink layers on the two ribbons are brought into contact with one another and heated, the ink layers will become tacky and will adhere to one another. The temperatures of these ink layers are then reduced and the printing ribbon and the color ribbon are separated from one another to cause the colored ink layer on the color ribbon to separate from that ribbon and adhere to the printing ribbon, thus causing a transfer of the colored ink layer to the printing ribbon. After this, the resistive printing ribbon can be used to print colors.
摘要:
Chemical heat amplification is provided in thermal transfer printing, wherein some of the heat necessary for melting and transferring ink from a solid fusible layer in a ribbon to a receiving medium is provided by an exothermic reaction. This chemical reaction is due to an exothermic material that is located in the ink layer, or in another layer of the ink bearing ribbon. The exothermic reaction reduces the amount of the input power which must be applied either electrically or with electromagnetic waves. Examples of suitable exothermic materials are those which will provide heat within the operative temperature range of the ink, and include nonaromatic azo compounds, peroxides, and strained valence compounds, such as monomers, dimers, trimers, of the type which change their chemical bonding when they decompose to either a valence isomer or break into a number of molecular species.
摘要:
Electronic circuits based on molecular transistors, generally used in place of semiconductors. More particularly, the invention relates to a unique method of wiring of a three-terminal molecule (or an aggregate thereof) to serve as an electronic transistor, containing a gate electrode, a source electrode, and a drain electrode. The source electrode and drain electrode are fabricated from one metal and the gate electrode is fabricated from another metal. The usage of molecular properties in this context provides significant advantages over the fabrication methods of the prior art.
摘要:
A negative resist composition, comprising: (a) silicon-containing polymer with pendant fused moieties selected from the group consisting of fused aliphatic moieties, homocyclic fused aromatic moieties, and heterocyclic fused aromatic and sites for reaction with a crosslinking agent, (b) an acid-sensitive crosslinking agent, and (c) a radiation-sensitive acid generator is provided. The resist composition is used to form a patterned material layer in a substrate.
摘要:
Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.