公开(公告)号：US5599747A

公开(公告)日：1997-02-04

申请号：US495248

申请日：1995-06-27

申请人： Ashwinkumar C. Bhatt ,  Thomas P. Duffy ,  David E. Houser ,  Gerald W. Jones ,  Jeffrey McKeveny ,  Kenneth L. Potter

发明人： Ashwinkumar C. Bhatt ,  Thomas P. Duffy ,  David E. Houser ,  Gerald W. Jones ,  Jeffrey McKeveny ,  Kenneth L. Potter

IPC分类号： H01L23/12 ,  H01L23/14 ,  H01L23/367 ,  H01L23/498 ,  H05K1/02 ,  H05K1/03 ,  H05K1/18 ,  H05K3/00 ,  H05K7/02 ,  H01L21/60

CPC分类号： H05K1/021 ,  H01L23/145 ,  H01L23/3677 ,  H01L23/49822 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L24/45 ,  H01L24/48 ,  H01L2924/00014 ,  H01L2924/01046 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/15153 ,  H01L2924/15165 ,  H01L2924/15311 ,  H01L2924/1532 ,  H05K1/182 ,  H05K2201/09127 ,  H05K2201/09981 ,  H05K2203/049 ,  H05K3/0061 ,  Y10T29/4913 ,  Y10T29/49155

摘要： A method of making a circuitized substrate which may be utilized as a chip carrier structure. The method involves the steps of providing a dielectric member and partially routing this member to define a temporary support portion therein. Metallization and circuitization may then occur, following which the temporary support portion is removed. This temporary support thus assures effective support for the photoresist used as part of the circuitization process. Thus, the photoresist is capable of being applied in sheetlike form for spanning the relatively small openings of the dielectric without sagging, bowing, etc., which may adversely impact subsequent processing steps.

摘要翻译： 制造可用作芯片载体结构的电路化衬底的方法。 该方法包括提供电介质构件并部分地布置该构件以在其中限定临时支撑部分的步骤。 然后可以发生金属化和电路化，随后移除临时支撑部分。 因此，这种临时支撑物确保了作为电路化过程的一部分使用的光致抗蚀剂的有效支撑。 因此，光致抗蚀剂能够以片状形式施加以跨越电介质的相对小的开口而不会下垂，弯曲等，这可能不利地影响随后的处理步骤。