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31 条记录 (耗时 0.019 秒)

    Interlocked zooming apparatus for use in stereoscopic cameras
    1.
    发明授权
    Interlocked zooming apparatus for use in stereoscopic cameras 失效
    用于立体摄像机的联锁变焦装置

    公开(公告)号：US4999713A

    公开(公告)日：1991-03-12

    申请号：US318634

    申请日：1989-03-03

    申请人： Atsushi Ueno ,  Takao Suzuki

    发明人： Atsushi Ueno ,  Takao Suzuki

    IPC分类号： H04N13/00 ,  H04N13/02

    CPC分类号： H04N13/0296 ,  G03B35/08 ,  H04N13/0239

    摘要： Disclosed is an improved interlocked zooming apparatus used in a two-barrel type stereo scopic camera. The improved interlocked zooming apparatus includes an adjusting apparatus for adjusting the range of movement of one of the zoom lenses and an automatic image magnification adjusting apparatus for matching the rates of the change in size of images formed by two cameras. Since the sizes of the images in each of the wide-angle end and the telephoto end are first made uniform by the adjusting apparatus before sensing an image, the sizes of the images formed by both the cameras are uniform over the entire zoom region.

    Production method for shallow trench insulation
    3.
    发明授权
    Production method for shallow trench insulation 失效
    浅沟槽隔离的生产方法

    公开(公告)号：US06703287B2

    公开(公告)日：2004-03-09

    申请号：US09791763

    申请日：2001-02-26

    申请人： Yoshitaka Fujiishi ,  Atsushi Ueno

    发明人： Yoshitaka Fujiishi ,  Atsushi Ueno

    IPC分类号： H01L2176

    CPC分类号： H01L21/76229 ,  H01L21/31053

    摘要： An improved method for producing a semiconductor device in which overpolishing is prevented at a chemical mechanical polishing time to eliminate the influence of peripheries on the object part. A plasma oxide film is formed on a semiconductor substrate so as to fill a recess and a trench. With the use of a resist film as a mask, the plasma oxide film is selectively etched to leave an overpolish-preventing support member in a neighborhood of the recess, which is a photo-related mark, for providing a support against overpolishing at a chemical mechanical polishing time. The surface of the semiconductor substrate is polished by chemical mechanical polishing. Thereafter, a nitride film and an oxide film are removed.

    摘要翻译： 一种用于制造半导体器件的改进方法，其中在化学机械抛光时间期间防止了过度抛光以消除外围对物体部分的影响。 在半导体基板上形成等离子体氧化膜，以填充凹槽和沟槽。 通过使用抗蚀剂膜作为掩模，选择性地蚀刻等离子体氧化物膜以在作为光相关标记的凹部附近留下防多余的支撑构件，以提供用于在化学品上过度抛光的支撑 机械抛光时间。 通过化学机械抛光对半导体基板的表面进行抛光。 之后，除去氮化物膜和氧化物膜。

    Rotation angle sensor
    4.
    发明授权
    Rotation angle sensor 有权
    旋转角传感器

    公开(公告)号：US07200515B2

    公开(公告)日：2007-04-03

    申请号：US11049082

    申请日：2005-02-03

    申请人： Takashi Sakabe ,  Emi Takuma ,  Atsushi Ueno

    发明人： Takashi Sakabe ,  Emi Takuma ,  Atsushi Ueno

    IPC分类号： G01D5/12

    CPC分类号： G01D5/04 ,  B62D15/0215

    摘要： A rotation angle sensor includes a first and a second detection gears rotatable with a steering shaft, a first detector configured to detect a rotation angle of the first detection gear, a second detector configured to detect a rotation angle of the second detection gear, a processor configured to calculate a rotation angle of the steering shaft based on the rotation angles detected by the first and second detectors and a discriminator configured to discriminate whether the rotational angle of the steering shaft, calculated by the processor, falls in an abnormal value, wherein a least common multiple between a cycle of the first detector and a cycle of the second detector is greater than a steering angle measurement range.

    摘要翻译： 旋转角度传感器包括可与转向轴一起旋转的第一和第二检测齿轮，被配置为检测第一检测齿轮的旋转角度的第一检测器，被配置为检测第二检测齿轮的旋转角度的第二检测器， 被配置为基于由第一和第二检测器检测的旋转角度来计算转向轴的旋转角度;以及鉴别器，其被配置为鉴别由处理器计算的转向轴的旋转角度是否处于异常值，其中 第一检测器的循环与第二检测器的循环之间的最小公倍数大于转向角测量范围。

    Photomask, semiconductor device, and method for exposing through photomask
    6.
    发明授权
    Photomask, semiconductor device, and method for exposing through photomask 失效
    光掩模，半导体器件和通过光掩模曝光的方法

    公开(公告)号：US06617080B1

    公开(公告)日：2003-09-09

    申请号：US09563953

    申请日：2000-05-02

    申请人： Toshihide Kawachi ,  Takuya Matsushita ,  Shigenori Yamashita ,  Yuki Miyamoto ,  Atsushi Ueno ,  Shinroku Maejima

    发明人： Toshihide Kawachi ,  Takuya Matsushita ,  Shigenori Yamashita ,  Yuki Miyamoto ,  Atsushi Ueno ,  Shinroku Maejima

    IPC分类号： G03F900

    CPC分类号： G03F7/70633

    摘要： The present invention provides a photomask, a semiconductor device, and a method for exposing through the photomask. The photomask comprises a photomask substrate, and an on-mask circuit area including an on-mask circuit pattern and an on-mask test mark area including an on-mask test pattern, both formed on the surface of the substrate, wherein the photomask substrate further includes an on-mask photolithography screening mark area including an on-mask comparison pattern and an on-mask screening pattern, the on-mask comparison pattern has substantially the same configuration as at least a part of the on-mask circuit pattern, and the on-mask screening pattern has substantially the same configuration as at least a part of the on-mask test pattern. The present invention allows it to measure the actual displacement generated from an overlaying (i.e. alignment) process for the purpose of eliminating of an the overlay displacement which can take place in a photolithography process.

    摘要翻译： 本发明提供了一种光掩模，半导体器件和用于曝光光掩模的方法。 光掩模包括光掩模基板和包括掩模电路图案的掩模电路区域和包括掩模测试图案的掩模测试标记区域，二者都形成在基板的表面上，其中光掩模基板 进一步包括包括掩膜比较图案和掩模屏蔽图案的掩模光刻掩模标记区域，掩模比较图案具有与至少一部分屏蔽电路图案基本相同的配置，以及 掩模掩模图案具有与掩模测试图案的至少一部分基本相同的构造。 本发明允许它测量从重叠（即对准）过程产生的实际位移，以消除可能在光刻工艺中发生的覆盖位移。

    Game device and image displaying method which displays a game proceeding in virtual space, and computer-readable recording medium
    7.
    发明授权
    Game device and image displaying method which displays a game proceeding in virtual space, and computer-readable recording medium 有权
    显示在虚拟空间中进行的游戏的游戏装置和图像显示方法以及计算机可读记录介质

    公开(公告)号：US06409596B1

    公开(公告)日：2002-06-25

    申请号：US09150595

    申请日：1998-09-10

    申请人： Yasuhiro Hayashida ,  Atsushi Ueno ,  Taishi Yasuda

    发明人： Yasuhiro Hayashida ,  Atsushi Ueno ,  Taishi Yasuda

    IPC分类号： A63F1300

    CPC分类号： A63F13/53 ,  A63F13/005 ,  A63F13/10 ,  A63F13/245 ,  A63F13/5378 ,  A63F13/803 ,  A63F2300/1062 ,  A63F2300/303 ,  A63F2300/307 ,  A63F2300/64 ,  A63F2300/6661 ,  A63F2300/6676 ,  A63F2300/6684 ,  A63F2300/8017

    摘要： A small screen which enables a player to easily grasp the situation of a game field as well as the positional relationship between the game objects is displayed on a game screen in a game device. A game device which displays on a monitor screen a picture of a game being proceeded in a virtual space by a first object controlled by a player and a second object controlled by a computer comprises a supplementary screen forming means (S210) for forming on the monitor screen a small screen showing the surrounding condition with the first object in the center, a distance calculating means (S202) for calculating the distance between the first object and the second object in the virtual space, and a display magnification setting means (S208) for setting the display magnification on the small screen in correspondence with the distance between the above objects.

    摘要翻译： 在游戏装置的游戏画面上显示能够使玩家轻松掌握游戏场地的状况以及游戏对象之间的位置关系的小屏幕。 一种在监视器屏幕上显示由玩家控制的第一对象在虚拟空间中进行的游戏的图片和由计算机控制的第二对象的游戏装置，包括用于在监视器上形成的辅助屏幕形成装置（S210） 屏幕显示中心的第一物体的周围状况的小屏幕，用于计算虚拟空间中的第一物体与第二物体之间的距离的距离计算装置（S202）和显示倍率设定装置（S208），用于 根据上述物体之间的距离设定小屏幕上的显示倍率。

    Method of reducing registration error in exposure step of semiconductor device
    8.
    发明授权
    Method of reducing registration error in exposure step of semiconductor device 失效
    降低半导体器件曝光步骤中的配准误差的方法

    公开(公告)号：US5879843A

    公开(公告)日：1999-03-09

    申请号：US7362

    申请日：1998-01-15

    申请人： Atsushi Ueno

    发明人： Atsushi Ueno

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

    CPC分类号： G03F7/70633 ,  G03F7/70425 ,  G03F7/70458 ,  G03F9/70

    摘要： A method of reducing a registration error is provided in which the registration error can be uniformly distributed even if an amount of displacement is larger than others at only one of a plurality of measuring points. According to the method, amounts of displacement are measured first at a plurality of measuring points, then one half the sum of the maximum value and the minimum value of the measured amounts of displacement is calculated to obtain a correction value. The correction value is fed back to an exposure apparatus as a correction value for an exposure condition setting file within the exposure apparatus used in an exposure step. The registration error can be distributed uniformly even if amounts of displacement at a plurality of measuring points are considerably different from each other.

    摘要翻译： 提供了一种降低配准误差的方法，其中即使在仅多个测量点中的一个测量点处的位移量大于其他位置时，配准误差也可以均匀分布。 根据该方法，首先在多个测量点测量位移量，然后计算测量的位移量的最大值和最小值之和的一半以获得校正值。 将校正值反馈到曝光装置，作为曝光步骤中使用的曝光装置内的曝光条件设定文件的校正值。 即使在多个测量点处的位移量彼此大不相同，也可以均匀地分布配准误差。