公开(公告)号：US20220340518A1

公开(公告)日：2022-10-27

申请号：US17766035

申请日：2020-09-22

Applicant: BASF SE

Inventor： Frank PIEPENBREIER ,  Andreas KEMPTER ,  Chee Jian CHAN ,  Rosario MAZARRO BERDONCES ,  Kerstin SCHIERLE-ARNDT ,  Bjoern KAIBEL ,  Jan SPIELMANN ,  Frieder BORGMEIER ,  Michael ZEILINGER ,  Ingo BIERTUEMPEL ,  Timo OTT

IPC: C07C303/06

Abstract: The present invention relates to an improved process for manufacturing of alkanesulfonic acids.

公开(公告)号：US20180327352A1

公开(公告)日：2018-11-15

申请号：US15774722

申请日：2016-11-08

Applicant: BASF SE

Inventor： Jan SPIELMANN ,  Michael KOCH ,  Juergen WORTMANN ,  Sabine WEIGUNY ,  Feelly RUETHER ,  Robert SENGPIEL

IPC: C07C303/44

CPC classification number: C07C303/44 ,  C07C309/04

Abstract: The invention relates to a method of reprocessing alkanesulfonic acid employed in a chemical process as an agent, catalyst or solvent and comprising the steps of: (a) removing an alkanesulfonic acid-comprising stream from a reaction mixture generated in the chemical process, (b) feeding the alkanesulfonic acid-comprising stream into a melt crystallization as the starting melt to form crystals of the alkanesulfonic acid, of hydrates of the alkanesulfonic acid or of a mixture of both suspended in mother liquor, (c) performing a solid-liquid separation to remove the crystals from the mother liquor, (d) optionally washing the crystals to remove mother liquor adhering to the crystals, (e) recycling the washed or unwashed crystals removed from the mother liquor into the chemical process.

公开(公告)号：US20180319739A1

公开(公告)日：2018-11-08

申请号：US15774847

申请日：2016-11-08

Applicant: BASF SE

Inventor： Jan SPIELMANN ,  Michael KOCH ,  Juergen WORTMANN ,  Feelly RUETHER ,  Sabine WEIGUNY ,  Frieder BORGMEIER

IPC: C07C303/44 ,  B01D9/00 ,  B01D3/00 ,  B01D3/14

Abstract: The invention relates to a process for purifying alkanesulfonic acids which comprises the steps of: (a) distilling a melt comprising crude alkanesulfonic acid (1) to completely or partly remove low boilers, wherein the low boilers are drawn off at the top of a distillation column (3) or of a one-stage evaporation apparatus and a material stream (7) comprising alkanesulfonic acid, high boilers and residual low boilers is withdrawn at the bottom of the distillation column (3) or of the one-stage evaporation apparatus, (b) sending the stream (7) comprising alkanesulfonic acid, high boilers and residual low boilers into a melt crystallization (9) as the starting melt to form crystals of the alkanesulfonic acid, of hydrates of the alkanesulfonic acid or of a mixture of both suspended in mother liquor, (c) performing a solid-liquid separation to remove the crystals from the mother liquor, (d) optionally washing the crystals to remove mother liquor adhering to the crystals.

公开(公告)号：US20200039927A1

公开(公告)日：2020-02-06

申请号：US16605973

申请日：2018-04-18

Applicant: BASF SE

Inventor： Juergen WORTMANN ,  Jan SPIELMANN ,  Katharina FEDERSEL ,  Feelly RUETHER

IPC: C07C303/44 ,  C07C303/06

Abstract: A process for purifying alkanesulfonic anhydride which includes:(a) feeding a stream containing alkanesulfonic anhydride, sulfuric acid, high boilers and residual low boilers into a melt crystallization to form crystals of the alkanesulfonic anhydride suspended in mother liquor,(b) performing a solid-liquid separation to remove the crystals from the mother liquor, and(c) optionally washing the crystals to remove mother liquor adhering to the crystals.

公开(公告)号：US20190144998A1

公开(公告)日：2019-05-16

申请号：US15779570

申请日：2016-11-29

Applicant: BASF SE

Inventor： Falko ABELS ,  David Dominique SCHWEINFURTH ,  Karl MATOS ,  Daniel LOEFFLER ,  Maraike AHLF ,  Florian BLASBERG ,  Thomas SCHAUB ,  Jan SPIELMANN ,  Axel KIRSTE ,  Boris GASPAR

IPC: C23C16/455 ,  C07F9/50 ,  C07F9/6584 ,  C23C16/06

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.

公开(公告)号：US20200216388A1

公开(公告)日：2020-07-09

申请号：US16614599

申请日：2018-05-23

Applicant: BASF SE

Inventor： Jan SPIELMANN ,  Michael ZEILINGER ,  Juergen WORTMANN ,  Frieder BORGMEIER

IPC: C07C303/06 ,  C07C309/04 ,  C07C303/44

Abstract: The present invention relates to a process for the manufacturing of methane sulfonic acid (MSA) by reaction of a radical initiator composition with methane and sulfur trioxide comprising the steps (a) preparation of the intiator composition by reacting aqueous hydrogen peroxide with the components methane sulfonic acid and methane sulfonic acid anhydride and (b) reaction of the initiator composition from step (a) with sulfur trioxide and methane to form methane sulfonic acid. The invention further relates to the use of methane sulfonic acid anhydride (MSA anhydride) in said process and to methane sulfonic acid manufactured by said process.

公开(公告)号：US20180044357A1

公开(公告)日：2018-02-15

申请号：US15557178

申请日：2016-03-02

Applicant: BASF SE

Inventor： Jan SPIELMANN ,  Falko ABELS ,  Florian BLASBERG ,  Katharina FEDERSEL ,  Christian SCHILDKNECHT ,  Daniel LOEFFLER ,  Torben ADERMANN ,  Juergen FRANK ,  Kerstin SCHIERLE-ARNDT ,  Sabine WEIGUNY

IPC: C07F7/08 ,  C23C16/455 ,  C23C16/18 ,  C09D1/00

CPC classification number: C07F7/0814 ,  C07D207/08 ,  C09D1/00 ,  C23C16/18 ,  C23C16/409 ,  C23C16/45553

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates. In particular the present invention relates to a process comprising bringing a com-pound of general formula (I) into the gaseous or aerosol state Ln-M-XmL=formula and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, R4, are independent of each other hydrogen, an alkyl group, an aryl group, or a SiA3 group with A being an alkyl or aryl group, and at least two of R1, R2, R3, R4 are a SiA3 group, n is an integer from 1 to 4, M is a metal or semimetal, X is a ligand which coordinates M, and m is an integer from 0 to 4.

公开(公告)号：US20210094908A1

公开(公告)日：2021-04-01

申请号：US16963748

申请日：2019-01-30

Applicant: BASF SE

Inventor： Frieder BORGMEIER ,  Jan SPIELMANN ,  Michael ZEILINGER ,  Juergen WORTMANN

IPC: C07C303/14 ,  C07C303/44

Abstract: A process for manufacturing of an alkanesulfonic acid, and an alkanesulfonic acid manufactured by the process. Aspects of the process may involve manufacturing an alkanesulfonic acid by reaction of an initiator composition with an alkane and sulfur trioxide by preparing an initiator composition by reacting aqueous hydrogen peroxide with alkanesulfonic acid and/or H2SO4; and reacting the initiator composition with sulfur trioxide and alkane to form an alkanesulfonic acid, wherein an alkane with a purity of at least 98.0 mol-% is used.

公开(公告)号：US20160348243A1

公开(公告)日：2016-12-01

申请号：US15114666

申请日：2015-01-22

Applicant: BASF SE

Inventor： Ke XU ,  Christian SCHILDKNECHT ,  Jan SPIELMANN ,  Juergen FRANK ,  Florian BLASBERG ,  Daniel LOEFFLER ,  Martin GAERTNER ,  Sabine WEIGUNY ,  Kerstin SCHIERLE-ARNDT ,  Katharina FEDERSEL ,  Falko ABELS

IPC: C23C16/455 ,  C07F15/06 ,  C07F15/04 ,  B01J13/00 ,  C07F3/00

CPC classification number: C23C16/45553 ,  C07F3/00 ,  C07F3/003 ,  C07F15/045 ,  C07F15/065

Abstract: The present invention relates to a process for the generation of thin inorganic films on substrates, in particular an atomic layer deposition process. This process comprises bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, R4, R5, and R6 are independent of each other hydrogen, an alkyl group, or a trialkylsilyl group, n is an integer from 1 to 3, M is a metal or semimetal, 1 X is a ligand which coordinates M, and m is an integer from 0 to 4.

公开(公告)号：US20160122296A1

公开(公告)日：2016-05-05

申请号：US14894432

申请日：2014-05-28

Applicant: BASF SE

Inventor： Andrei-Nicolae PARVULESCU ,  Ulrich MUELLER ,  Jan SPIELMANN ,  Wilfried VOGEL ,  Jun GAO

IPC: C07C315/02 ,  B01J29/89 ,  C07C315/06

CPC classification number: C07C315/02 ,  B01J29/89 ,  C07C315/06 ,  C07C317/14

Abstract: The present invention relates to a process for oxidizing a sulfoxide to the respective sulfone, said process comprising reacting the sulfoxide with hydrogen peroxide in the presence of a catalyst, obtaining a mixture (M) comprising the sulfone and the catalyst, wherein the catalyst comprises a porous titanium-containing silicate as a catalytically active material.

Abstract translation: 本发明涉及将亚砜氧化成各种砜的方法，所述方法包括在催化剂存在下使亚砜与过氧化氢反应，得到包含砜和催化剂的混合物（M），其中催化剂包含 多孔含钛硅酸盐作为催化活性材料。