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公开(公告)号：US09347132B2
公开(公告)日：2016-05-24
申请号：US13440564
申请日：2012-04-05
CPC分类号： B08B9/46 , B08B3/08 , B08B3/10 , C23C16/4405 , C23C16/52 , G01N21/94 , G01N2021/8416 , H01L21/67253
摘要： Methods and apparatus for determining an endpoint of a process chamber cleaning process are provided. In some embodiments, a processing system having an endpoint detection system may include a process chamber having internal surfaces requiring periodic cleaning due to processes performed in the process chamber; and an endpoint detection system that includes a light detector positioned to detect light reflected off of a first internal surface of the process chamber; and a controller coupled to the light detector and configured to determine an endpoint of a cleaning process based upon the detected reflected light.
摘要翻译： 提供了用于确定处理室清洁过程的端点的方法和装置。 在一些实施例中，具有端点检测系统的处理系统可以包括处理室，其具有由于处理室中执行的处理而需要定期清洁的内表面; 以及端点检测系统，其包括被定位成检测从所述处理室的第一内表面反射的光的光检测器; 以及耦合到光检测器并被配置为基于检测到的反射光来确定清洁处理的端点的控制器。
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2.发明授权Method and apparatus for reducing patterning effects on a substrate during radiation-based heating 有权用于在基于辐射的加热期间减少对基板的图案化影响的方法和装置公开(公告)号：US08513626B2
公开(公告)日：2013-08-20
申请号：US11622908
申请日：2007-01-12
IPC分类号： G02B5/00
CPC分类号： H01L21/67248 , H01L21/67115
摘要： Patterning effects on a substrate are reduced during radiation-based heating by filtering the radiation source or configuring the radiation source to produce radiation having different spectral characteristics. For the filtering, an optical filter may be used to truncate specific wavelengths of the radiation. The different configurations of the radiation source include a combination of one or more continuum radiation sources with one or more discrete spectrum sources, a combination of multiple discrete spectrum sources, or a combination of multiple continuum radiation sources. Furthermore, one or more of the radiation sources may be configured to have a substantially non-normal angle of incidence or polarized to reduce patterning effects on a substrate during radiation-based heating.
摘要翻译： 通过过滤辐射源或配置辐射源产生具有不同光谱特性的辐射，在基于辐射的加热过程中，对衬底的图案化效果降低。 为了滤波，可以使用滤光器来截断辐射的特定波长。 辐射源的不同配置包括一个或多个连续辐射源与一个或多个离散光谱源，多个离散光谱源的组合或多个连续辐射源的组合的组合。 此外，一个或多个辐射源可以被配置为具有基本上非正常的入射角或极化，以减少基于辐射的加热期间对衬底的图案化效应。
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公开(公告)号：US06888104B1
公开(公告)日：2005-05-03
申请号：US10773650
申请日：2004-02-05
申请人： Joseph M. Ranish , Aaron Muir Hunter , Balasubramanian Ramachandran , Jallepally Ravi , Sundar Ramamurthy , Vedapuram S. Achutharaman , Khurshed Sorabji
发明人： Joseph M. Ranish , Aaron Muir Hunter , Balasubramanian Ramachandran , Jallepally Ravi , Sundar Ramamurthy , Vedapuram S. Achutharaman , Khurshed Sorabji
CPC分类号： H01L21/68735 , F27B17/0025 , F27D5/0037 , F27D19/00 , F27D21/00 , H01L21/68757
摘要： A substrate support ring has a band having an inner perimeter that at least partially surrounds a periphery of the substrate. The band has a radiation absorption surface. A lip extends radially inwardly from the inner perimeter of the band to support the substrate. The band and lip can be formed from silicon carbide, and the radiation absorption surface can be an oxidized layer of silicon carbide. In one version, the band and lip have a combined thermal mass Tm, and the radiation absorption surface has an absorptivity A and a surface area Sa, such that the ratio (A×Sa)/Tm is from about 4×10−5 m2K/J to about 9×10−4 m2K/J.
摘要翻译： 衬底支撑环具有带子，该带具有至少部分地围绕衬底周边的内周边。 带具有辐射吸收表面。 唇缘从带的内周向径向向内延伸以支撑基底。 带和唇缘可以由碳化硅形成，并且辐射吸收表面可以是碳化硅的氧化层。 在一个版本中，带和唇具有组合的热质量T m，并且辐射吸收表面具有吸收率A和表面积S SUB，使得比率 （AxS a）/ T m是约4×10 -5 / 2K / J至约9×10 9 / SUP> -4 / 2K / J。
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4.发明申请Method and Apparatus for Reducing Patterning Effects on a Substrate During Radiation-Based Heating 有权用于减少基于辐射的加热过程中衬底的图案效应的方法和装置公开(公告)号：US20080171417A1
公开(公告)日：2008-07-17
申请号：US11622908
申请日：2007-01-12
IPC分类号： H01L21/336
CPC分类号： H01L21/67248 , H01L21/67115
摘要： Patterning effects on a substrate are reduced during radiation-based heating by filtering the radiation source or configuring the radiation source to produce radiation having different spectral characteristics. For the filtering, an optical filter may be used to truncate specific wavelengths of the radiation. The different configurations of the radiation source include a combination of one or more continuum radiation sources with one or more discrete spectrum sources, a combination of multiple discrete spectrum sources, or a combination of multiple continuum radiation sources. Furthermore, one or more of the radiation sources may be configured to have a substantially non-normal angle of incidence or polarized to reduce patterning effects on a substrate during radiation-based heating.
摘要翻译： 通过过滤辐射源或配置辐射源产生具有不同光谱特性的辐射，在基于辐射的加热过程中，对衬底的图案化效果降低。 为了滤波，可以使用滤光器来截断辐射的特定波长。 辐射源的不同配置包括一个或多个连续辐射源与一个或多个离散光谱源，多个离散光谱源的组合或多个连续辐射源的组合的组合。 此外，一个或多个辐射源可以被配置为具有基本上非正常的入射角或极化，以减少基于辐射的加热期间对衬底的图案化效应。
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公开(公告)号：US10421151B2
公开(公告)日：2019-09-24
申请号：US13789982
申请日：2013-03-08
申请人： Jiping Li , Aaron Muir Hunter , Thomas Haw
发明人： Jiping Li , Aaron Muir Hunter , Thomas Haw
摘要： Apparatus and methods for measuring the temperature of a substrate are disclosed. The apparatus includes a source of temperature-indicating radiation, a detector for the temperature-indicating radiation, and a decorrelator disposed in an optical path between the source of temperature-indicating radiation and the detector for the temperature-indicating radiation. The decorrelator may be a broadband amplifier and/or a mode scrambler. A broadband amplifier may be a broadband laser, Bragg grating, a fiber Bragg grating, a Raman amplifier, a Brillouin amplifier, or combinations thereof. The decorrelator is selected to emit radiation that is transmitted, at least in part, by the substrate being monitored. The source is matched to the decorrelator such that the emission spectrum of the source is within the gain bandwidth of the decorrelator, if the decorrelator is a gain-driven device.
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公开(公告)号：US08979087B2
公开(公告)日：2015-03-17
申请号：US13486807
申请日：2012-06-01
IPC分类号： B23Q3/00 , H01L21/687 , H01L21/67
CPC分类号： H01L21/68757 , H01L21/67115 , H01L21/68735 , Y10S269/909
摘要： Embodiments of the present invention provide a substrate supporting edge ring for supporting a substrate. In one embodiment, a substrate support ring is provided. The substrate support ring comprises an annular body. The annular body comprises an outer band extending radially inward from an outer annular sidewall; and a substrate supporting region extending inward from an inner portion of the outer band, wherein the annular body comprises a first material that is exposed and at least a portion of the substrate supporting region is covered with a coating comprising a second material that is different than the first material.
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7.发明授权公开(公告)号：US08939760B2
公开(公告)日：2015-01-27
申请号：US13370164
申请日：2012-02-09
IPC分类号： F27D15/02
CPC分类号： H01L21/67109 , F27B17/0025 , H01L21/67115
摘要： The present invention generally relates to methods of cooling a substrate during rapid thermal processing. The methods generally include positioning a substrate in a chamber and applying heat to the substrate. After the temperature of the substrate is increased to a desired temperature, the substrate is rapidly cooled. Rapid cooling of the substrate is facilitated by increasing a flow rate of a gas through the chamber. Rapid cooling of the substrate is further facilitated by positioning the substrate in close proximity to a cooling plate. The cooling plate removes heat from substrate via conduction facilitated by gas located therebetween. The distance between the cooling plate and the substrate can be adjusted to create a turbulent gas flow therebetween, which further facilitates removal of heat from the substrate. After the substrate is sufficiently cooled, the substrate is removed from the chamber.
摘要翻译： 本发明一般涉及在快速热处理期间冷却衬底的方法。 所述方法通常包括将基底定位在腔室中并向基底施加热量。 在将衬底的温度升高到所需温度之后，快速冷却衬底。 通过增加通过室的气体的流速来促进衬底的快速冷却。 通过将衬底定位在靠近冷却板的方式进一步促进衬底的快速冷却。 冷却板通过由位于其间的气体促进的传导从衬底去除热量。 可以调节冷却板和基板之间的距离以在它们之间产生湍流气流，这进一步有助于从基板去除热量。 在衬底充分冷却之后，将衬底从腔室中取出。
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公开(公告)号：US08724977B2
公开(公告)日：2014-05-13
申请号：US13548858
申请日：2012-07-13
IPC分类号： A21B2/00
CPC分类号： H01L22/26 , H01L21/324 , H01L21/67115 , H01L21/67248 , H01L22/10
摘要： Embodiments of the present invention provide apparatus and method for reducing non uniformity during thermal processing. One embodiment provides an apparatus for processing a substrate comprising a chamber body defining a processing volume, a substrate support disposed in the processing volume, wherein the substrate support is configured to rotate the substrate, a sensor assembly configured to measure temperature of the substrate at a plurality of locations, and one or more pulse heating elements configured to provide pulsed energy towards the processing volume.
摘要翻译： 本发明的实施例提供了用于降低热处理期间的不均匀性的装置和方法。 一个实施例提供了一种用于处理衬底的装置，其包括限定处理体积的室主体，设置在处理容积中的衬底支撑件，其中衬底支撑件被配置为使衬底旋转;传感器组件，被配置为测量衬底的温度 多个位置，以及一个或多个脉冲加热元件，其配置成向处理体积提供脉冲能量。
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公开(公告)号：US20130163091A1
公开(公告)日：2013-06-27
申请号：US13715804
申请日：2012-12-14
申请人： STEPHEN MOFFATT , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
发明人： STEPHEN MOFFATT , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
CPC分类号： G02B27/106 , G02B17/0888 , G02B27/0025 , G02B27/10 , G02B27/1006 , G02B27/12 , G02B27/123 , G02B27/126 , G02B27/14 , G02B27/143 , G02B27/30
摘要： Apparatus and methods for combining beams of amplified radiation are disclosed. A beam combiner has a collimating optic positioned to receive a plurality of coherent radiation beams at a constant angle of incidence with respect to an optical axis of the collimating optic. The respective angles of incidence may also be different in some embodiments. The collimating optic has an optical property that collimates the beams. The optical property may be refractive or reflective, or a combination thereof. A collecting optic may also be provided to direct the plurality of beams to the collimating optic. The beam combiner may be used in a thermal processing apparatus to combine more than two beams of coherent amplified radiation, such as lasers, into a single beam.
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公开(公告)号：US20130055731A1
公开(公告)日：2013-03-07
申请号：US13601069
申请日：2012-08-31
IPC分类号： F25D31/00
CPC分类号： H01L21/02686 , H01L21/02521 , H01L21/268
摘要： Apparatus and methods of treating a substrate with an amorphous semiconductor layer, or a semiconductor layer having small crystals, to form large crystals in the substrate are described. A treatment area of the substrate is identified and melted using a progressive melting process of delivering pulsed energy to the treatment area. The treatment area is then recrystallized using a progressive crystallization process of delivering pulsed energy to the area. The pulsed energy delivered during the progressive crystallization process is selected to convert the small crystals into large crystals as the melted material freezes.
摘要翻译： 描述了用非晶半导体层或具有小晶体的半导体层处理衬底以在衬底中形成大晶体的装置和方法。 使用将脉冲能量递送到处理区域的渐进熔融方法来鉴定和熔化基底的处理区域。 然后使用将脉冲能量递送到该区域的逐步结晶过程将处理区域重结晶。 选择渐进式结晶过程中输送的脉冲能量，以使熔融材料冻结时将小晶体转化为大晶体。
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