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1.发明申请Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US20070159616A1
公开(公告)日：2007-07-12
申请号：US10894367
申请日：2004-07-20
申请人： Bastiaan Lambertus Van De Ven , Gert-Jan Heerens , Robert Lansbergen , Martinus Leenders , Erik Loopstra
发明人： Bastiaan Lambertus Van De Ven , Gert-Jan Heerens , Robert Lansbergen , Martinus Leenders , Erik Loopstra
IPC分类号： G03B27/62
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70741 , G03F7/70783 , G03F7/70825 , G03F7/709
摘要： The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.
摘要翻译： 本发明涉及一种光刻设备，其包括用于相对于标线片台定位图案形成装置（例如掩模版）的对接系统。 光刻投影设备具有包括投影相的操作周期，其中标线片载物台承载图案形成装置和交换相，其中图案形成装置被更换，并且对接系统相对于掩模版台定位图案形成装置。 对接系统被配置为在投影阶段与图案形成装置间隔开，以便确保获得更高的投影图像精度。
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公开(公告)号：US20050117142A1
公开(公告)日：2005-06-02
申请号：US10962751
申请日：2004-10-13
IPC分类号： G03F1/14 , G03F7/20 , H01L21/027 , H01L21/673 , G03B27/52
CPC分类号： G03F7/707
摘要： An assembly for use in a lithographic apparatus is disclosed. The assembly includes a reticle, and a reticle holder. The reticle holder is adjustable between a form closed reticle blocking state and a reticle releasing state. The reticle holder is arranged to (1) prevent movement of the reticle with respect to the reticle holder in at least one direction without friction when the reticle holder is in the form closed reticle blocking state, and (2) release the reticle when the reticle holder is in the reticle releasing state.
摘要翻译： 公开了一种用于光刻设备的组件。 组件包括掩模版和掩模版保持器。 标线架支架在形状闭合的掩模版阻挡状态和掩模版释放状态之间是可调节的。 所述标线架保持器布置为：（1）当所述标线架保持器处于封闭掩模版阻挡状态时，防止所述掩模版相对于所述光罩保持器在至少一个方向上的移动而不产生摩擦，并且（2）当所述标线片 支架处于分划板释放状态。
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公开(公告)号：US20070247609A1
公开(公告)日：2007-10-25
申请号：US11812166
申请日：2007-06-15
CPC分类号： G03B27/42 , G03B27/62 , G03F7/707 , G03F7/70741 , G03F9/7003 , G03F9/7011 , G03F9/7088 , G03F9/7096
摘要： A system for use in a lithographic apparatus includes an assembly of a reticle and a reticle holder. The reticle includes a marker. The system also includes a position detector arranged to detect the reticle marker to position the reticle with respect to the reticle holder, and a storage container constructed and arranged to store the assembly during the positioning of the reticle with respect to the reticle holder. The reticle holder and the detector are arranged to be kinematically aligned with respect to each other.
摘要翻译： 用于光刻设备的系统包括光罩和光罩保持器的组件。 标线包括标记。 该系统还包括位置检测器，其布置成检测掩模版标记物以相对于光罩保持器定位光罩;以及存储容器，其被构造和布置成在掩模版相对于光罩保持器定位期间存储组件。 掩模版保持器和检测器被布置成相对于彼此以运动方式对准。
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4.发明申请Alignment marker and lithographic apparatus and device manufacturing method using the same 有权对准标记和光刻设备及使用其的器件制造方法公开(公告)号：US20060007442A1
公开(公告)日：2006-01-12
申请号：US11147114
申请日：2005-06-08
申请人： Gert-Jan Heerens , Anastasius Bruinsma , Jacob Klinkhamer , Bastiaan Lambertus Van De Ven , Hubert Van Mierlo , Willem Vliegenthart
发明人： Gert-Jan Heerens , Anastasius Bruinsma , Jacob Klinkhamer , Bastiaan Lambertus Van De Ven , Hubert Van Mierlo , Willem Vliegenthart
IPC分类号： G01B11/00
CPC分类号： G03F9/7065 , G03F9/7076 , G03F9/7088
摘要： An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.
摘要翻译： 一种装置包括：第一支撑结构，其构造成支撑具有设置有至少一个高度差的对准标记的元件。 该装置还包括对准传感器，该对准传感器包括被配置为提供照射对准标记的光束的光源; 以及至少一个检测器，被配置为通过分析由所述对准标记物反射的光束来检测所述对准标记的所述至少一个高度差。 可以使用这样的装置来相对于第一支撑结构对准元件。
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公开(公告)号：US20070258069A1
公开(公告)日：2007-11-08
申请号：US11417222
申请日：2006-05-04
CPC分类号： G03F7/70816 , F16C29/025 , F16C32/0603
摘要： A gas bearing has a first bearing part defining a first bearing surface and a second bearing part defining a second bearing surface. Between the first bearing surface and the second bearing surface there is a gap. A gas supply device supplies a gas to the gap. The first bearing part is at least partly ferromagnetic, and the second bearing part has at least one permanent magnet interacting with the first bearing part for pre-tensioning the gas bearing. The gas bearing may be part of a lithographic apparatus.
摘要翻译： 气体轴承具有限定第一轴承表面的第一轴承部分和限定第二轴承表面的第二轴承部件。 在第一支承面和第二支承面之间存在间隙。 气体供给装置向间隙供给气体。 第一轴承部分至少部分是铁磁性的，并且第二轴承部分具有与第一轴承部件相互作用的至少一个永磁体，用于预紧气体轴承。 气体轴承可以是光刻设备的一部分。
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