公开(公告)号：US20070159616A1

公开(公告)日：2007-07-12

申请号：US10894367

申请日：2004-07-20

申请人： Bastiaan Lambertus Van De Ven ,  Gert-Jan Heerens ,  Robert Lansbergen ,  Martinus Leenders ,  Erik Loopstra

发明人： Bastiaan Lambertus Van De Ven ,  Gert-Jan Heerens ,  Robert Lansbergen ,  Martinus Leenders ,  Erik Loopstra

IPC分类号： G03B27/62

CPC分类号： G03F7/707 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/70783 ,  G03F7/70825 ,  G03F7/709

摘要： The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.

摘要翻译： 本发明涉及一种光刻设备，其包括用于相对于标线片台定位图案形成装置（例如掩模版）的对接系统。 光刻投影设备具有包括投影相的操作周期，其中标线片载物台承载图案形成装置和交换相，其中图案形成装置被更换，并且对接系统相对于掩模版台定位图案形成装置。 对接系统被配置为在投影阶段与图案形成装置间隔开，以便确保获得更高的投影图像精度。

公开(公告)号：US20050018154A1

公开(公告)日：2005-01-27

申请号：US10844570

申请日：2004-05-13

申请人： Wilhelmus Box ,  Antonius Van Dijsseldonk ,  Dominicus Jacobus Franken ,  Martinus Leenders ,  Erik Loopstra ,  Josephus Smits ,  Marc Van Der Wijst

发明人： Wilhelmus Box ,  Antonius Van Dijsseldonk ,  Dominicus Jacobus Franken ,  Martinus Leenders ,  Erik Loopstra ,  Josephus Smits ,  Marc Van Der Wijst

IPC分类号： G21K1/06 ,  G02B7/182 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G21K5/00

CPC分类号： G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70991

摘要： A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.

摘要翻译： 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。

公开(公告)号：US20070070315A1

公开(公告)日：2007-03-29

申请号：US11454129

申请日：2006-06-16

申请人： Johannes Jacobs ,  Igor Bouchoms ,  Nicolaas Kate ,  Nicolaas Kemper ,  Martinus Leenders ,  Erik Loopstra ,  Joost Ottens ,  Martinus Verhagen ,  Yucel Kok ,  Johannes Van Es ,  Herman Boom ,  Franciscus Janssen

发明人： Johannes Jacobs ,  Igor Bouchoms ,  Nicolaas Kate ,  Nicolaas Kemper ,  Martinus Leenders ,  Erik Loopstra ,  Joost Ottens ,  Martinus Verhagen ,  Yucel Kok ,  Johannes Van Es ,  Herman Boom ,  Franciscus Janssen

IPC分类号： G03B27/42

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.

摘要翻译： 使用或具有包括关于衬底的位置，速度和/或加速度的信息的时间表来公开用于维持衬底和浸没式光刻设备的热平衡的方法和设备; 以及响应于时间表中的信息，用于减少局部蒸发和/或增加局部冷凝的蒸发控制器和/或冷凝控制器。 从基材表面蒸发液体将其冷却下来，同时在其底部表面上冷凝液体局部加热基材。

公开(公告)号：US20050248740A1

公开(公告)日：2005-11-10

申请号：US11069058

申请日：2005-03-02

申请人： Michael Veen ,  Anastasius Bruinsma ,  Henricus Van Buel ,  Jacob Klinkhamer ,  Martinus Leenders ,  Christianus Mol ,  Hubert Mierlo

发明人： Michael Veen ,  Anastasius Bruinsma ,  Henricus Van Buel ,  Jacob Klinkhamer ,  Martinus Leenders ,  Christianus Mol ,  Hubert Mierlo

IPC分类号： G03F7/20 ,  G03B27/42 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7084 ,  G03F7/70425 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7076

摘要： The invention is directed to enabling substrate identification by comparing the measured distance between two features on an unidentified substrate with one or more stored distances. The one or more stored distances are the distances intended during the design of one or more substrates. The unidentified substrate is identified by a stored distance that corresponds to the measured distance. The two features are selected from a plurality of features that may be placed on a back side or a front side of a substrate. An optical system is provided for reading the features from the back side or a front side of the substrate.

摘要翻译： 本发明旨在通过将未识别基底上的两个特征之间的测量距离与一个或多个存储的距离进行比较来实现基底识别。 一个或多个存储的距离是在一个或多个基板的设计期间的距离。 通过与测量距离对应的存储距离来识别未识别的底物。 两个特征从可以放置在基板的背面或前侧的多个特征中选择。 提供了用于从基板的背面或前侧读取特征的光学系统。

公开(公告)号：US20060250590A1

公开(公告)日：2006-11-09

申请号：US11120176

申请日：2005-05-03

申请人： Bob Streefkerk ,  Sjoerd Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Martinus Leenders ,  Jeroen Johannes Mertens ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Martinus Leenders ,  Jeroen Johannes Mertens ,  Michel Riepen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US20050018162A1

公开(公告)日：2005-01-27

申请号：US10833340

申请日：2004-04-28

申请人： Martinus Leenders ,  Hendricus Meijer ,  Engelbertus Van Der Pasch ,  Michael Renkens ,  Theo Ruijl

发明人： Martinus Leenders ,  Hendricus Meijer ,  Engelbertus Van Der Pasch ,  Michael Renkens ,  Theo Ruijl

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC分类号： G03F7/70258 ,  G03F7/7085

摘要： In a lithographic projection apparatus, a measuring system configured to measure the position of the projection system relative to a reference frame includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table position. An angular encoder which sends light from a target down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system about its optical axis.

摘要翻译： 在光刻投影设备中，被配置为测量投影系统相对于参考框架的位置的测量系统包括相对于测量衬底台位置的测量系统的对应传感器刚性地安装的传感器。 使用角度编码器，其从目标向下发射具有相对于倾斜的灵敏度的两个光路的光，以测量投影系统绕其光轴的旋转。

公开(公告)号：US20080049201A1

公开(公告)日：2008-02-28

申请号：US11802082

申请日：2007-05-18

申请人： Marco Stavenga ,  Hans Jansen ,  Peter Wanten ,  Johannes Leonardus Cuijpers ,  Raymond Beeren ,  Richard Bruls ,  Martinus Leenders ,  Anthonius Petrus De Jong

发明人： Marco Stavenga ,  Hans Jansen ,  Peter Wanten ,  Johannes Leonardus Cuijpers ,  Raymond Beeren ,  Richard Bruls ,  Martinus Leenders ,  Anthonius Petrus De Jong

IPC分类号： G03B27/52

CPC分类号： H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.

摘要翻译： 公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用兆声波清洁浸没式光刻投影设备的表面的方法。

公开(公告)号：US20070114452A1

公开(公告)日：2007-05-24

申请号：US11285774

申请日：2005-11-23

申请人： Hans Jansen ,  Sebastiaan Cornelissen ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Leenders ,  Jeroen Johannes Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Janssen ,  Michel Riepen ,  Bob Streefkerk

发明人： Hans Jansen ,  Sebastiaan Cornelissen ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Leenders ,  Jeroen Johannes Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Janssen ,  Michel Riepen ,  Bob Streefkerk

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： Lithographic Apparatus and Device Manufacturing Method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 平版印刷设备和设备制造方法在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20070146665A1

公开(公告)日：2007-06-28

申请号：US11317259

申请日：2005-12-27

申请人： Joost Ottens ,  Johannes Jacobs ,  Nicolaas Kemper ,  Martinus Leenders

发明人： Joost Ottens ,  Johannes Jacobs ,  Nicolaas Kemper ,  Martinus Leenders

IPC分类号： G01N21/86 ,  G03B27/42

CPC分类号： G03F7/70341

摘要： A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.

摘要翻译： 公开了一种有助于防止液体到达衬底的方法，其包括在衬底的底部边缘处引入气体，使得在衬底的边缘产生缓冲液，有助于保持存在于顶部的浸没液体，以及 衬底的边缘远离衬底的底表面。

公开(公告)号：US20060290909A1

公开(公告)日：2006-12-28

申请号：US11167564

申请日：2005-06-28

申请人： Sjoerd Donders ,  Bob Streefkerk ,  Martinus Leenders

发明人： Sjoerd Donders ,  Bob Streefkerk ,  Martinus Leenders

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.