公开(公告)号：US20070030462A1

公开(公告)日：2007-02-08

申请号：US11197576

申请日：2005-08-03

申请人： Bausan Yuan ,  Martin Lee ,  Alton Phillips ,  Ping-Wei Chang ,  Akimitsu Ebihara

发明人： Bausan Yuan ,  Martin Lee ,  Alton Phillips ,  Ping-Wei Chang ,  Akimitsu Ebihara

IPC分类号： F16M1/00 ,  G03B27/00

CPC分类号： G02B7/005

摘要： Embodiments of the present invention are directed to an apparatus for providing a low spring constant, pneumatic suspension using vacuum for the lens in a projection system. In one embodiment, a pneumatic suspension system for a load comprises a frame; and a body movably disposed in the frame and spaced from a side wall of the frame by a gap to define a chamber in the frame above the body, the body being configured to be connected to the load. The frame includes an outlet to draw a gas from the chamber to lower the pressure in the chamber with respect to an ambient pressure outside the frame. An air bearing is formed in the gap between the body and the side wall of the frame to provide non-contact between the body and the frame. The pressure in the chamber is sufficiently lower than the ambient pressure to produce a lift force to lift the body and the load connected thereto with respect to the frame.

摘要翻译： 本发明的实施例涉及一种用于在投影系统中为透镜提供使用真空的低弹簧常数气动悬架的装置。 在一个实施例中，用于负载的气动悬挂系统包括框架; 以及主体，其可移动地设置在所述框架中并且通过间隙与所述框架的侧壁间隔开以在所述主体中的所述框架中限定室，所述主体被配置为连接到所述负载。 该框架包括从腔室抽出气体的出口，以相对于框架外部的环境压力降低腔室中的压力。 空气轴承形成在主体和框架的侧壁之间的间隙中，以在主体和框架之间提供非接触。 室内的压力足够低于环境压力，以产生升高力以提升主体和相对于框架连接到其上的负载。

公开(公告)号：US20060250595A1

公开(公告)日：2006-11-09

申请号：US11473967

申请日：2006-06-23

申请人： Alton Phillips

发明人： Alton Phillips

IPC分类号： H02K41/00 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/709 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70991

摘要： Techniques for transferring utilities to and from a reticle or wafer stage in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques involve transferring utilities to and from the stage without making physical contact with the stage. Alternatively, utilities are transferred by making physical contact with the stage while the stage is in a stationary position. In addition to transferring utilities to and from the stage, devices such as processing devices, buffers (storage mediums), electrical components, and mechanical components can be placed within the stage to use and/or control the transferred utilities.

公开(公告)号：US06989922B2

公开(公告)日：2006-01-24

申请号：US10373687

申请日：2003-02-27

申请人： Alton Phillips ,  Michael Sogard

发明人： Alton Phillips ,  Michael Sogard

IPC分类号： G02B26/08 ,  G02B26/00 ,  G02B27/00

CPC分类号： G03F7/70233 ,  G02B26/0825 ,  G03F7/70266 ,  G03F7/70275

摘要： Mechanical control and actuation of an adaptive optical element provides highly stable and repeatable correction of the shape of an optical element to an accuracy of a small fraction of a very short wavelength of light, responsive to a metrology source and sensor arrangement. Actuators in the form of individual set-screws or other actuators capable of axially positioning a shaft are driven by a robotic screw driver with four degrees of freedom or one or more linear actuators to exert force on the mirror. Positive or negative force may be used for outward and/or inward deflection of the mirror. When a desired force is developed on the mirror through a mechanical linkage, the linkage may be clamped by a passive clamp which may be released by an actuator such that the adjustment is maintained while the linear actuator and the clamp actuator are turned off; yielding a highly stable adjustment while effectively removing sources of actuator drift, noise, vibration and heating which may adversely affect stability.

公开(公告)号：US20050174551A1

公开(公告)日：2005-08-11

申请号：US10777515

申请日：2004-02-11

申请人： Alton Phillips

发明人： Alton Phillips

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70858 ,  G03F7/70716 ,  G03F7/70758

摘要： A photolithography system that uses a variable reluctance linear motor (VRLM) to move a reticle or wafer stage is described. In addition to moving the stage, one or more of the surfaces of the VRLM is formed on the reticle or wafer stage and serves as a heat dissipation surface. The surface(s) of the VRLM is in thermal communication with one or more heat generating devices within the stage so that the surface can collect and dissipate heat out of the stage. The VRLM can be used in combination with other types of motors such as Lorentz force linear motors.

摘要翻译： 描述了使用可变磁阻线性电动机（VRLM）移动掩模版或晶片台的光刻系统。 除了移动舞台之外，VRLM的一个或多个表面形成在标线片或晶片台上，并且用作散热表面。 VRLM的表面与级内的一个或多个发热装置热连通，使得表面可以收集并将热量从阶段中散出。 VRLM可以与其他类型的电机（如洛伦兹力线性电机）结合使用。

公开(公告)号：US20120090332A1

公开(公告)日：2012-04-19

申请号：US13270522

申请日：2011-10-11

申请人： Alton Phillips ,  Akio Ohta ,  Douglas C. Watson

发明人： Alton Phillips ,  Akio Ohta ,  Douglas C. Watson

IPC分类号： F25B21/02

CPC分类号： G01J5/0275 ,  G01J2005/0077 ,  G03F7/70875

摘要： According to one aspect of the present invention, an apparatus includes a surface and a first array. The surface emits radiation, and the first array is arranged over the surface and arranged to provide cooling to the surface, the first array including a plurality of TECs. At least a first sensing arrangement is substantially integrated with the first array, wherein the first sensing arrangement is arranged to make a non-contact measurement associated with the surface. The apparatus also includes a controller arranged to obtain the non-contact measurement and to use the non-contact measurement to control the cooling provided by the first array.

摘要翻译： 根据本发明的一个方面，一种装置包括表面和第一阵列。 表面发射辐射，并且第一阵列布置在表面上并且布置成向表面提供冷却，第一阵列包括多个TEC。 至少第一感测装置基本上与第一阵列一体化，其中第一感测装置布置成进行与表面相关联的非接触测量。 该装置还包括控制器，其布置成获得非接触式测量并使用非接触测量来控制第一阵列所提供的冷却。

公开(公告)号：US20070211352A1

公开(公告)日：2007-09-13

申请号：US11372824

申请日：2006-03-09

申请人： Alton Phillips ,  Douglas Watson

发明人： Alton Phillips ,  Douglas Watson

IPC分类号： G02B9/00

CPC分类号： G03F7/70825 ,  G02B5/005 ,  G03F7/70091 ,  G03F7/701 ,  G21K1/04

摘要： An apparatus for rotating apertures from a storage position not in a desired plane to a “in use” position in a desired plane. The stored position of the apertures does not interfere with a radiation beam path of an optical system. The apparatus may compactly store multiple apertures and may position a smaller aperture in a desired plane without removing a larger aperture from the desired plane.

摘要翻译： 一种用于将孔从不在所需平面的存储位置旋转到期望平面中的“使用中”位置的装置。 孔的存储位置不干涉光学系统的辐射束路径。 该设备可以紧凑地存储多个孔，并且可以在期望的平面中定位较小的孔，而不从期望的平面移除较大的孔。

公开(公告)号：US20080024749A1

公开(公告)日：2008-01-31

申请号：US11804734

申请日：2007-05-18

申请人： Mark Williams ,  Alton Phillips

发明人： Mark Williams ,  Alton Phillips

IPC分类号： G03B27/58 ,  G03B27/62 ,  H02K41/00

CPC分类号： H02K41/03 ,  G03F7/70716 ,  G03F7/70758 ,  H02K2201/18

摘要： A reticle or wafer stage mover with six degrees of freedom, a low mass coarse stage, and the ability to move an object in a scanning direction in a lithography tool. The mover includes a coarse stage and a fine stage configured to support the object and supported by the coarse stage. A set of actuators is provided to move the fine stage in six degrees of freedom. All of the actuators contribute to accelerating the object and the fine stage in the scanning direction. With all the actuators generating the necessary force to move the fine stage, a single large actuator to push the fine stage in the scanning direction is eliminated. The size or mass of the coarse stage is therefore reduced. All of the actuators are also capable of generating a second force in either the X or Z directions. The actuators therefore also enable the fine stage and the object it supports to be positioned in six degrees of freedom, as well as moved in the scanning direction.

摘要翻译： 具有六个自由度，低质量粗糙阶段的光罩或晶片台移动器，以及在光刻工具中沿扫描方向移动物体的能力。 动子包括一个粗略的阶段和一个精细的阶段，被配置成支撑物体并由粗糙的阶段支撑。 提供一组致动器以使六个自由度的精细台阶移动。 所有的执行器有助于在扫描方向上加速物体和细微的台阶。 由于所有的致动器产生必要的力以移动细小的台阶，消除了在扫描方向上推动精细台阶的单个大型致动器。 因此，粗级的尺寸或质量减小。 所有致动器还能够在X或Z方向上产生第二力。 因此，致动器也能使精细的台阶和它支撑的物体被定位在六自由度以及沿扫描方向移动。

公开(公告)号：US20070268476A1

公开(公告)日：2007-11-22

申请号：US11749706

申请日：2007-05-16

申请人： Alton Phillips ,  Douglas Watson ,  W. Novak

发明人： Alton Phillips ,  Douglas Watson ,  W. Novak

IPC分类号： G03B27/62

CPC分类号： G03F7/70783 ,  G03F7/707

摘要： Devices are disclosed for holding and moving a planar body such as a reticle as used, for example, in microlithography. An exemplary device includes a stage and a body chuck. The stage has a movable support surface. A proximal region of a first membrane is mounted to the support surface. A distal region of the first membrane extends from the support surface and is coupled to the chuck such that the first membrane at least partially supports the chuck. The chuck includes a surface from which multiple pins extend. The surface is situated at the distal region. The pins are arrayed to contact and support a respective region of the body. The pin arrangement is configured such that, during movements of the chuck imparted by the support surface, body slippage relative to the pins due to forces caused by the movement is substantially uniform at each pin.

摘要翻译： 公开了用于保持和移动例如在微光刻中使用的诸如掩模版的平面体的装置。 示例性装置包括台架和车身卡盘。 舞台具有可移动的支撑表面。 第一膜的近侧区域安装到支撑表面。 第一膜的远侧区域从支撑表面延伸并且联接到卡盘，使得第一膜至少部分地支撑卡盘。 卡盘包括多个销延伸的表面。 表面位于远端区域。 引脚被排列成接触和支撑身体的相应区域。 销配置被构造成使得在由支撑表面赋予的卡盘的移动期间，由于由运动引起的力，相对于销的主体滑动在每个销处基本均匀。

公开(公告)号：US20070211232A1

公开(公告)日：2007-09-13

申请号：US10578752

申请日：2004-11-10

申请人： Alton Phillips ,  Michael Sogard ,  Douglas Watson ,  Keiichi Tanaka

发明人： Alton Phillips ,  Michael Sogard ,  Douglas Watson ,  Keiichi Tanaka

IPC分类号： G03B27/52

CPC分类号： G03F7/70741 ,  G03B27/52 ,  G03F1/82 ,  G03F7/70875 ,  G03F7/70916

摘要： Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a higher temperature than its surrounding environment. Thermophoretic protection can be maintained throughout a reticle's use in a lithography system. For example, a reticle can be thermophoretically protected while in storage, through various stages of transportation via a reticle handler (also referred to as an end-effector), to its period of use while attached to a reticle chuck.

摘要翻译： 在光刻系统内进行热电泳以保护掩模版免受污染物（例如浮动颗粒）的影响。 通常，通过将掩模版保持在比周围环境更高的温度下来实现热保护。 在光刻系统中使用的掩模版可以保持热保护。 例如，在通过分划板处理器（也称为末端执行器）的各种运输阶段到存储期间，在将光罩保持在其使用期间，同时附着于标线盘卡盘上，可以对掩模版进行热保护。

公开(公告)号：US20070170379A1

公开(公告)日：2007-07-26

申请号：US11338951

申请日：2006-01-24

申请人： Douglas Watson ,  Alton Phillips ,  Michael Sogard

发明人： Douglas Watson ,  Alton Phillips ,  Michael Sogard

IPC分类号： G21F3/00

CPC分类号： G02B5/22 ,  G02B7/008 ,  G02B26/007 ,  G03F7/70575

摘要： An exemplary apparatus for filtering electromagnetic radiation includes a filter element, an actuator, and a filter-cooler. The filter element has multiple selectable regions situated so that electromagnetic radiation impinges on a selected filter region to transmit therethrough a first wavelength while limiting transmission of a second wavelength. Absorption of impinging radiation heats the filter element, but the actuator moves the filter element to select a particular filter region for impingement by the radiation while moving another region away from impingement by the radiation. The filter-cooler directs a heat-conduction medium (e.g., a gas) at, and thus cools, the moved-away region. By such ongoing refreshment of portions of the filter element being irradiated and portions being cooled, the filter element can be irradiated for extended periods without thermal damage. An important use is in optical systems for EUV lithography.

摘要翻译： 用于过滤电磁辐射的示例性装置包括过滤元件，致动器和过滤器 - 冷却器。 滤波器元件具有多个可选择区域，其位置使得电磁辐射照射到所选择的滤波器区域上，以便透射第一波长，同时限制第二波长的透射。 冲击辐射的吸收加热过滤元件，但是致动器移动过滤器元件以选择特定的过滤器区域，以便通过辐射冲击另一区域而远离辐射的冲击。 过滤器 - 冷却器将导热介质（例如，气体）引导到移动的区域，并且因此冷却移动的区域。 通过正在照射的过滤元件的部分和正在冷却的部分的这种持续更新，可以长时间地对过滤元件进行照射，而不会发生热损伤。 一个重要的用途是用于EUV光刻的光学系统。