Oxide semiconductor thin film transistor, manufacturing method, and display device thereof
    4.
    发明授权
    Oxide semiconductor thin film transistor, manufacturing method, and display device thereof 有权
    氧化物半导体薄膜晶体管,制造方法及其显示装置

    公开(公告)号:US08987074B2

    公开(公告)日:2015-03-24

    申请号:US13983868

    申请日:2013-02-27

    Abstract: An oxide semiconductor thin film transistor, a manufacturing method and a display device thereof are disclosed. An oxide semiconductor thin film transistor comprises a gate insulating layer (22), an oxide semiconductor layer (24) and a blocking layer (25), wherein a first transition layer (23) is formed between the gate insulating layer (22) and the oxide semiconductor layer (24), the oxygen content of the first transition layer (23) is higher than the oxygen content of the oxide semiconductor layer (24). The oxide semiconductor thin film transistor enhances the interface characteristic and the lattice matching between the oxide semiconductor layer (24) and the blocking layer (25) to improve the stability of the thin film transistor better.

    Abstract translation: 公开了一种氧化物半导体薄膜晶体管,其制造方法和显示装置。 一种氧化物半导体薄膜晶体管,包括栅极绝缘层(22),氧化物半导体层(24)和阻挡层(25),其中第一过渡层(23)形成在栅极绝缘层(22)和 氧化物半导体层(24)中,第一过渡层(23)的氧含量高于氧化物半导体层(24)的氧含量。 氧化物半导体薄膜晶体管增强了氧化物半导体层(24)和阻挡层(25)之间的界面特性和晶格匹配,以更好地提高薄膜晶体管的稳定性。

    Method for fabricating sensor
    5.
    发明授权
    Method for fabricating sensor 有权
    制造传感器的方法

    公开(公告)号:US08962371B2

    公开(公告)日:2015-02-24

    申请号:US14126490

    申请日:2012-11-21

    CPC classification number: H01L27/14692 H01L27/14687 H01L31/105

    Abstract: A method for fabricating a sensor, comprises: forming, on a base substrate, a pattern of a data line (31), a pattern of a drain electrode (34), a pattern of a source electrode (33), a pattern of a receive electrode (39), a pattern of a photodiode (40) and a pattern of a transparent electrode (41); forming a pattern of an ohmic layer by using a first patterning process; forming a pattern of an active layer by using a second patterning process; forming a pattern of a gate insulating layer by using a third patterning process; and forming a pattern of a gate line (30), a pattern of a gate electrode (38) and a pattern of a bias electrode (42) by using a fourth patterning process. Such a method can reduce the number of mask as well as the production cost and simplifies the production process, thereby significantly improves the production capacity and the defect-free rate.

    Abstract translation: 一种用于制造传感器的方法,包括:在基底基板上形成数据线(31)的图案,漏电极(34)的图案,源电极(33)的图案, 接收电极(39),光电二极管(40)的图案和透明电极(41)的图案。 通过使用第一图案化工艺形成欧姆层的图案; 通过使用第二图案化工艺形成有源层的图案; 通过使用第三图案化工艺形成栅极绝缘层的图案; 以及通过使用第四图案化工艺形成栅极线(30)的图案,栅极(38)的图案和偏置电极(42)的图案。 这种方法可以减少掩模的数量和生产成本,并且简化了生产过程,从而显着提高了生产能力和无缺陷率。

    SENSOR AND METHOD FOR FABRICATING THE SAME
    6.
    发明申请
    SENSOR AND METHOD FOR FABRICATING THE SAME 有权
    传感器及其制造方法

    公开(公告)号:US20150014751A1

    公开(公告)日:2015-01-15

    申请号:US14125830

    申请日:2012-11-26

    Abstract: A sensor and its fabrication method are provided. The sensor comprises: a base substrate, a group of gate lines and a group of data lines arranged as crossing each other, and a plurality of sensing elements arranged in an array and defined by the group of gate lines and the group of data lines, each sensing element comprising a Thin Film Transistor (TFT) device and a photodiode sensing device, wherein the photodiode sensor device comprises: a bias line disposed on the base substrate; a transparent electrode disposed on the bias line and being electrically contacted with the bias line; a photodiode disposed on the transparent electrode; and a receiving electrode disposed on the photodiode; the TFT device is located above the photodiode. When the sensor is functioning, light is directly transmitted onto the photodiode sensor device through the base substrate. In comparison with conventional technologies, the light loss is largely reduced and the light absorption usage ratio is improved.

    Abstract translation: 提供传感器及其制造方法。 该传感器包括:基底基板,一组栅极线和一组布置为彼此交叉的数据线;以及多个感测元件,其排列成阵列并由栅极线组和数据线组限定, 每个感测元件包括薄膜晶体管(TFT)器件和光电二极管感测器件,其中所述光电二极管传感器器件包括:设置在所述基底衬底上的偏置线; 透明电极,设置在偏置线上并与偏置线电接触; 设置在所述透明电极上的光电二极管; 和设置在光电二极管上的接收电极; TFT器件位于光电二极管的上方。 当传感器工作时,光通过基底直接传输到光电二极管传感器装置上。 与常规技术相比,光损失大大降低,光吸收率比提高。

    Touch display substrate, fabrication method and touch display device

    公开(公告)号:US10788907B2

    公开(公告)日:2020-09-29

    申请号:US15757935

    申请日:2015-06-26

    Abstract: The technical solution provides a touch display substrate, a fabrication method thereof, and a touch display device. The touch display substrate includes a conductive bridge (9) and a touch-control signal lead (7) formed over a base substrate (1). The touch-control signal lead (7) is in contact with a first surface portion of the conductive bridge (9). A passivation layer (2) is formed over the touch-control signal lead (7) and the conductive bridge (9). The passivation layer (2) includes a via-hole (3) to expose a second surface portion of the conductive bridge (9). A touch electrode (8) is formed over the passivation layer (2) and being connected to the conductive bridge (9). Through the via-hole (3), the touch electrode (8) is connected to the conductive bridge (9) and further connected to the touch-control signal lead (7).

    Array substrate and method for manufacturing the same, display device

    公开(公告)号:US10204936B2

    公开(公告)日:2019-02-12

    申请号:US14405008

    申请日:2013-11-20

    Abstract: An array substrate includes a display region and a Gate driver On Array (GOA) region. In the GOA region, a gate metal electrode, a gate insulating layer, an active layer, a transition layer, and a source-drain metal electrode are formed in sequence from bottom to top, and a via hole is provided penetrating the transition layer, the active layer and the gate insulating layer, the source-drain metal electrode is electrically connected to the gate metal electrode through the via hole; and at an edge of the via hole, there is formed an angle opening upward at edges of the transition layer and the active layer. There are further disclosed a manufacturing method of the array substrate and a display device provided with the array substrate.

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