Abstract:
The invention relates to a radiation detection device including a silicon substrate and an infrared photodiode made of a material optimized for infrared detection. The substrate comprises a photosensitive area, readout circuits, and interconnects formed in an electrically-insulating material. The interconnects and the metal contact connect the readout circuits, the photosensitive areas, and the infrared photodiode. The detection device also comprises an infrared radiation filtering structure which covers the photosensitive area without covering the infrared photodiode.
Abstract:
A microelectronic structure with a low voltage part and high voltage part, such that the low voltage part is protected against the high voltage part and process of obtaining this protection. The structure includes at least one low-voltage element (2) and at least high-voltage element (4) formed on a semi-conductor substrate (6). According to the invention, at least one channel (18) is formed, passing through the low-voltage element and one semi-conductor zone is formed with doping opposite to that of the substrate, at least around the walls of the channel or channels and a contact point (24) is established in this zone. Application to smart power integrated circuits.
Abstract:
Device for the protection of an electrical load. A branch (4) connects an input terminal (1) to an output terminal (2). The branch includes in series:a channel of a first transistor (10) of the "normally on" type anda channel of a second transistor (20) of the "normally on" type of a second conductivity type. A gate (10g) of the first transistor (10) is connected to the output terminal (2) and a gate (20g) of the second transistor (20) is connected to the input terminal (1) by means of a third "normally on" transistor (30) of the first conductivity type. A gate (30g) is connected to a node (6) between the channels of the first and second transistors. The device has application to the protection of electronic components.
Abstract:
The detector of visible and near-infrared radiation comprises a near-infrared photosensitive element, a readout circuit for reading the near-infrared photosensitive element, four visible photosensitive elements, one of which being placed facing the near-infrared photosensitive element, and four pigmented resin filters to define a pixel quadruplet. A first pixel, including the near-infrared photosensitive element and one of the visible photosensitive elements, is provided with a resin filter opaque to visible radiation. The three other pixels, respectively including the three other visible photosensitive elements, are respectively provided with filters associated with the three primary colors.
Abstract:
A photo-detecting device including a plurality of pixels, each including at least one alternate stack of photodiodes and electrically conducting electrodes. Each photodiode includes one intrinsic amorphous semiconductor layer in contact with one doped amorphous semiconductor layer distinct from the amorphous semiconductor layers in other photodiodes, and is arranged between two electrodes. Each pair of photodiodes includes one of the electrodes arranged between photodiodes. In each pixel: each electrode includes an electrically conducting portion not superposed on other electrodes of the pixel and electrically connected to one interconnection hole filled with an electrically conducting material; and portions of an electrically conducting material are superposed approximately on each of non-superposed portions of electrodes.
Abstract:
The visible and near-infrared radiation detector includes a near-infrared photosensitive element, a readout circuit for reading the near-infrared photosensitive element, four visible photosensitive elements, one of which being placed facing the near-infrared photosensitive element, and three interference filters to define a pixel quadruplet. A first pixel, including the near-infrared photosensitive element and one of the visible photosensitive elements, has no filter. The three other pixels, respectively including the three other visible photosensitive elements, are respectively provided with filters associated with the three primary colors. Each interference filter includes an alternation of metal layers and of dielectric layers.
Abstract:
The invention relates to a radiation detection device including a silicon substrate and an infrared photodiode made of a material optimized for infrared detection. The substrate comprises a photosensitive area, readout circuits, and interconnects formed in an electrically-insulating material. The interconnects and the metal contact connect the readout circuits, the photosensitive areas, and the infrared photodiode. The detection device also comprises an infrared radiation filtering structure which covers the photosensitive area without covering the infrared photodiode.
Abstract:
The visible and near-infrared radiation detector includes a near-infrared photosensitive element, a readout circuit for reading the near-infrared photosensitive element, four visible photosensitive elements, one of which being placed facing the near-infrared photosensitive element, and three interference filters to define a pixel quadruplet. A first pixel, including the near-infrared photosensitive element and one of the visible photosensitive elements, has no filter. The three other pixels, respectively including the three other visible photosensitive elements, are respectively provided with filters associated with the three primary colors. Each interference filter includes an alternation of metal layers and of dielectric layers.
Abstract:
A static memory cell of the metal-insulator-semiconductor type, which can be used in the microelectronics field for producing random access memories for storing binary information. This MIS type memory cell is a random access static memory cell known under the abbreviation SRAM. A bistable flip-flop is formed by a MIS transistor and a parasitic bipolar transistor. The source and drain of the MIS transistor respectively formed by constituting the emitter and collector of the bipolar transistor. The region of the channel of the MIS transistor located between the source and drain serves as the base for the bipolar transistor. The base is completely isolated from the outside of the memory cell. The gate electrode of the MIS transistor is electrically isolated from the region of the channel. There is an addressing circuit for the flip-flop for storing binary information in the form of the absence or presence of current.
Abstract:
A photo-detecting device including a plurality of pixels, each including at least one alternate stack of photodiodes and electrically conducting electrodes. Each photodiode includes one intrinsic amorphous semiconductor layer in contact with one doped amorphous semiconductor layer distinct from the amorphous semiconductor layers in other photodiodes, and is arranged between two electrodes. Each pair of photodiodes includes one of the electrodes arranged between photodiodes. In each pixel: each electrode includes an electrically conducting portion not superposed on other electrodes of the pixel and electrically connected to one interconnection hole filled with an electrically conducting material; and portions of an electrically conducting material are superposed approximately on each of non-superposed portions of electrodes.