公开(公告)号：US08432529B2

公开(公告)日：2013-04-30

申请号：US12822447

申请日：2010-06-24

申请人： Bert Jan Claessens ,  Paul Van Der Veen ,  Herman Philip Godfried

发明人： Bert Jan Claessens ,  Paul Van Der Veen ,  Herman Philip Godfried

IPC分类号： G03B27/72 ,  G03B27/52

CPC分类号： G03F7/7085

摘要： A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of the radiation beam.

摘要翻译： 一种包括辐射束监测装置的光刻设备，所述辐射束监视装置包括被配置为产生衍射图案的光学元件和位于所述光学元件之后而不在所述光学元件的焦平面中的成像检测器，使得所述成像检测器 能够检测辐射束的空间相干性和发散性的混合。

公开(公告)号：US20110026001A1

公开(公告)日：2011-02-03

申请号：US12822447

申请日：2010-06-24

申请人： Bert Jan CLAESSENS ,  Paul Van Der Veen ,  Herman Philip Godfried

发明人： Bert Jan CLAESSENS ,  Paul Van Der Veen ,  Herman Philip Godfried

IPC分类号： G03B27/52

CPC分类号： G03F7/7085

摘要： A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of the radiation beam.

摘要翻译： 一种包括辐射束监测装置的光刻设备，所述辐射束监视装置包括被配置为产生衍射图案的光学元件和位于所述光学元件之后而不在所述光学元件的焦平面中的成像检测器，使得所述成像检测器 能够检测辐射束的空间相干性和发散性的混合。

公开(公告)号：US08885144B2

公开(公告)日：2014-11-11

申请号：US13114652

申请日：2011-05-24

申请人： Bert Jan Claessens ,  Heine Melle Mulder ,  Paul Van Der Veen ,  Wilfred Edward Endendijk ,  Willem Jan Bouman ,  Bert Pieter Van Drieënhuizen ,  Jozef Ferdinand Dymphna Verbeeck ,  Marc Hendricus Margaretha Dassen ,  Thijs Johan Henry Hollink

发明人： Bert Jan Claessens ,  Heine Melle Mulder ,  Paul Van Der Veen ,  Wilfred Edward Endendijk ,  Willem Jan Bouman ,  Bert Pieter Van Drieënhuizen ,  Jozef Ferdinand Dymphna Verbeeck ,  Marc Hendricus Margaretha Dassen ,  Thijs Johan Henry Hollink

IPC分类号： G02B5/08 ,  G03B27/32 ,  G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70116 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70516

摘要： An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.

摘要翻译： 公开了一种具有独立可控光学元件阵列的照明系统，其中每个元件可在选择多个取向之间移动，以形成所需的照明模式。 照明系统包括控制器，用于控制一个或多个元件的取向，该控制器被配置为向一个或多个元件施加力，该至少一个或多个元件至少部分地补偿通过入射的辐射突发施加到一个或多个元件上的力 一个或多个元素。

公开(公告)号：US09250536B2

公开(公告)日：2016-02-02

申请号：US12076732

申请日：2008-03-21

申请人： Heine Melle Mulder ,  Johannes Jacobus Matheus Baselmans ,  Adrianus Franciscus Petrus Engelen ,  Markus Franciscus Antonius Eurlings ,  Hendrikus Robertus Marie Greevenbroek ,  Patricius Aloysius Jacobus Tinnemans ,  Paul Van Der Veen ,  Wilfred Edward Endendijk

发明人： Heine Melle Mulder ,  Johannes Jacobus Matheus Baselmans ,  Adrianus Franciscus Petrus Engelen ,  Markus Franciscus Antonius Eurlings ,  Hendrikus Robertus Marie Greevenbroek ,  Patricius Aloysius Jacobus Tinnemans ,  Paul Van Der Veen ,  Wilfred Edward Endendijk

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70216

摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

公开(公告)号：US08625199B2

公开(公告)日：2014-01-07

申请号：US13173905

申请日：2011-06-30

申请人： Adel Joobeur ,  Oscar Franciscus Jozephus Noordman ,  Paul Van Der Veen ,  Arun Mahadevan Venkataraman

发明人： Adel Joobeur ,  Oscar Franciscus Jozephus Noordman ,  Paul Van Der Veen ,  Arun Mahadevan Venkataraman

IPC分类号： G02B27/14

CPC分类号： G03F7/70583 ,  G02B27/144 ,  G02B27/145 ,  H01S3/0057

摘要： A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

摘要翻译： 光束修改单元增加照明光束的时间脉冲长度和延迟。 脉冲修改单元接收辐射的输入脉冲并发射一个或多个对应的辐射输出脉冲。 分束器将输入脉冲分成第一和第二脉冲部分，并且沿着第二光路引导第一脉冲部分，并且沿着作为输出光束的一部分的第一光路引导第二部分。 第二光路包括发散光学元件。 具有曲率半径的第一和第二反射镜以预定间隔彼此面对地布置，并且接收第二脉冲部分以重定向第二部分，使得通过脉冲修正器的第二部分的光路是 比第一部分长，分离度小于曲率半径。

公开(公告)号：US20060055900A1

公开(公告)日：2006-03-16

申请号：US10941017

申请日：2004-09-15

申请人： Antonius Van Der Net ,  Paul Van Der Veen ,  Yuri Van De Vijver

发明人： Antonius Van Der Net ,  Paul Van Der Veen ,  Yuri Van De Vijver

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70925

摘要： A lithographic apparatus includes an illumination system for providing beam of radiation, and a support structure for supporting a patterning device. The patterning device imparts the beam of radiation with a pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a gas supply system for supplying a purge gas including oxygen to a plurality of spaces in the apparatus. The gas supply system is arranged so that the purge gas supplied to each of the plurality of spaces is a premixed purge gas mixture composed by the gas supply system for each of the plurality of spaces on the basis of a predetermined relationship that relates a desired amount of oxygen in the premixed purge gas mixture to the respective space to which that premixed purge gas mixture is supplied.

公开(公告)号：US09140999B2

公开(公告)日：2015-09-22

申请号：US13679662

申请日：2012-11-16

申请人： Paul Van Der Veen

发明人： Paul Van Der Veen

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/62 ,  G03F7/20 ,  H01L21/68

CPC分类号： G03F7/70633 ,  G03F7/70425 ,  G03F7/70716 ,  H01L21/682

摘要： A reticle assembly for use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second target portion on a substrate, the reticle assembly being arranged to hold a first reticle having the first image field and a second reticle having the second image field such that a distance between the first and second image fields substantially corresponds to a distance between the first and the second target portions. Embodiments also relate to a lithographic apparatus including the reticle assembly, the use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second portion on a substrate, of a first reticle having the first image field and a second reticle having the second image field, wherein a distance between the first and second image fields substantially corresponds to a distance between the first and second target portions.

摘要翻译： 一种用于光刻工艺的掩模版组件，其中第一图像场和第二图像场投影到基板上的第一目标部分和第二目标部分上，所述标线组件被布置成保持具有第一图像的第一掩模版 场和第二掩模版具有第二图像场，使得第一和第二图像场之间的距离基本上对应于第一和第二目标部分之间的距离。 实施例还涉及包括光罩组件的光刻设备，在光刻工艺中使用其中第一图像场和第二图像场投射到基板上的第一目标部分和第二部分上，第一掩模版具有 第一图像场和第二掩模版具有第二图像场，其中第一和第二图像场之间的距离基本上对应于第一和第二目标部分之间的距离。

公开(公告)号：US20110255173A1

公开(公告)日：2011-10-20

申请号：US13173905

申请日：2011-06-30

申请人： Adel JOOBEUR ,  Oscar Franciscus Jozephus Noordman ,  Paul Van Der Veen ,  Arun Mahadevan Venkataraman

发明人： Adel JOOBEUR ,  Oscar Franciscus Jozephus Noordman ,  Paul Van Der Veen ,  Arun Mahadevan Venkataraman

IPC分类号： G02B27/14

CPC分类号： G03F7/70583 ,  G02B27/144 ,  G02B27/145 ,  H01S3/0057

摘要： A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

摘要翻译： 光束修改单元增加照明光束的时间脉冲长度和延迟。 脉冲修改单元接收辐射的输入脉冲并发射一个或多个对应的辐射输出脉冲。 分束器将输入脉冲分成第一和第二脉冲部分，并且沿着第二光路引导第一脉冲部分，并且沿着作为输出光束的一部分的第一光路引导第二部分。 第二光路包括发散光学元件。 具有曲率半径的第一和第二反射镜以预定间隔彼此面对地布置，并且接收第二脉冲部分以重定向第二部分，使得通过脉冲修正器的第二部分的光路是 比第一部分长，分离度小于曲率半径。

公开(公告)号：US20090033902A1

公开(公告)日：2009-02-05

申请号：US12076732

申请日：2008-03-21

申请人： Heine Melle Mulder ,  Johannes Jacobus, Matheus Baselmans ,  Adrianus Franciscus, Petrus Engelen ,  Markus Franciscus, Antonius Eurlings ,  Hendrikus Robertus, Marie Greevenbroek ,  Patricius Aloysius, Jacobus Tinnemans ,  Paul Van Der Veen ,  Wilfred Edward Endendijk

发明人： Heine Melle Mulder ,  Johannes Jacobus, Matheus Baselmans ,  Adrianus Franciscus, Petrus Engelen ,  Markus Franciscus, Antonius Eurlings ,  Hendrikus Robertus, Marie Greevenbroek ,  Patricius Aloysius, Jacobus Tinnemans ,  Paul Van Der Veen ,  Wilfred Edward Endendijk

IPC分类号： G03B27/54 ,  G03B27/70

CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70216

摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

摘要翻译： 装置制造方法包括使用照明系统来调节辐射束。 调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分 ，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。 该方法还包括以具有图案的横截面图案化具有所需照明模式的辐射束，以形成图案化的辐射束，并将图案化的辐射束投射到基板的目标部分上。

公开(公告)号：US07476491B2

公开(公告)日：2009-01-13

申请号：US10941017

申请日：2004-09-15

申请人： Antonius Johannes Van Der Net ,  Paul Van Der Veen ,  Yuri Johannes Gabriel Van De Vijver

发明人： Antonius Johannes Van Der Net ,  Paul Van Der Veen ,  Yuri Johannes Gabriel Van De Vijver

IPC分类号： G03F7/20

CPC分类号： G03F7/70933 ,  G03F7/70925

摘要： A lithographic apparatus includes an illumination system for providing beam of radiation, and a support structure for supporting a patterning device. The patterning device imparts the beam of radiation with a pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a gas supply system for supplying a purge gas including oxygen to a plurality of spaces in the apparatus. The gas supply system is arranged so that the purge gas supplied to each of the plurality of spaces is a premixed purge gas mixture composed by the gas supply system for each of the plurality of spaces on the basis of a predetermined relationship that relates a desired amount of oxygen in the premixed purge gas mixture to the respective space to which that premixed purge gas mixture is supplied.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用图案赋予辐射束。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，以及用于将包括氧的吹扫气体供应到设备中的多个空间的气体供应系统。 气体供给系统被布置成使得供应到多个空间中的每一个的吹扫气体是由多个空间中的每一个的气体供应系统组成的预混吹扫气体混合物，其基于预定的关系， 的预混吹扫气体混合物中的氧气供应到提供预混吹扫气体混合物的相应空间。