-
公开(公告)号：US07956356B2
公开(公告)日：2011-06-07
申请号：US11963369
申请日：2007-12-21
申请人： Brahmanandam V. Tanikella , Matthew A. Simpson , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Isaac K. Cherian , Ramanujam Vedantham
发明人： Brahmanandam V. Tanikella , Matthew A. Simpson , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Isaac K. Cherian , Ramanujam Vedantham
IPC分类号： H01L29/10
CPC分类号： C30B29/20
摘要： A sapphire substrate includes a generally planar surface having a crystallographic orientation selected from the group consisting of a-plane, r-plane, m-plane, and c-plane orientations, and having a nTTV of not greater than about 0.037 μm/cm2, wherein nTTV is total thickness variation normalized for surface area of the generally planar surface, the substrate having a diameter not less than about 9.0 cm.
摘要翻译： 蓝宝石衬底包括具有选自由a面，r面，m面和c面取向组成的组的结晶取向并且具有不大于约0.037μm/ cm 2的nTTV的大致平坦表面， 其中nTTV是对于大致平坦的表面的表面积进行标准化的总厚度变化，所述基底的直径不小于约9.0cm。
-
公开(公告)号：US08197303B2
公开(公告)日：2012-06-12
申请号：US11963454
申请日：2007-12-21
申请人： Brahmanandam V. Tanikella , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Isaac K. Cherian , Ramanujam Vedantham
发明人： Brahmanandam V. Tanikella , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Isaac K. Cherian , Ramanujam Vedantham
IPC分类号： B24B1/00
摘要： A sapphire substrate includes a generally planar surface having a crystallographic orientation selected from the group consisting of a-plane, r-plane, m-plane, and c-plane orientations, and having a nTTV of not greater than about 0.037 μm/cm2, wherein nTTV is total thickness variation normalized for surface area of the generally planar surface, the substrate having a diameter not less than about 9.0 cm.
摘要翻译： 蓝宝石衬底包括具有选自由a面，r面，m面和c面取向组成的组的结晶取向并且具有不大于约0.037μm/ cm 2的nTTV的大致平坦表面， 其中nTTV是对于大致平坦的表面的表面积进行标准化的总厚度变化，所述基底的直径不小于约9.0cm。
-
公开(公告)号：US20080164578A1
公开(公告)日：2008-07-10
申请号：US11963369
申请日：2007-12-21
申请人： Brahmanandam V. Tanikella , Matthew A. Simpson , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Isaac K. Cherian , Ramanujam Vedantham
发明人： Brahmanandam V. Tanikella , Matthew A. Simpson , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Isaac K. Cherian , Ramanujam Vedantham
IPC分类号： H01L31/036
CPC分类号： C30B29/20
摘要： A sapphire substrate includes a generally planar surface having a crystallographic orientation selected from the group consisting of a-plane, r-plane, m-plane, and c-plane orientations, and having a nTTV of not greater than about 0.037 μm/cm2, wherein nTTV is total thickness variation normalized for surface area of the generally planar surface, the substrate having a diameter not less than about 9.0 cm.
-
公开(公告)号：US08740670B2
公开(公告)日：2014-06-03
申请号：US13472179
申请日：2012-05-15
申请人： Brahmanandam V. Tanikella , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Isaac K. Cherian , Ramanujam Vedantham , Matthew A. Simpson
发明人： Brahmanandam V. Tanikella , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Isaac K. Cherian , Ramanujam Vedantham , Matthew A. Simpson
IPC分类号： B24B1/00
CPC分类号： C30B29/20 , B24B7/228 , B24B27/0633 , B24D3/06 , B24D5/06 , H01L21/0242 , H01L23/15 , H01L2924/0002 , H04L29/12028 , H04L29/12594 , H04L61/103 , H04L61/3065 , H04L67/327 , Y10T428/21 , Y10T428/24355 , H01L2924/00
摘要： A sapphire substrate includes a generally planar surface having a crystallographic orientation selected from the group consisting of a-plane, r-plane, m-plane, and c-plane orientations, and having a nTTV of not greater than about 0.037 μm/cm2, wherein nTTV is total thickness variation normalized for surface area of the generally planar surface, the substrate having a diameter not less than about 9.0 cm.
摘要翻译： 蓝宝石衬底包括具有选自由a面，r面，m面和c面取向组成的组的结晶取向并且具有不大于约0.037μm/ cm 2的nTTV的大致平坦表面， 其中nTTV是对于大致平坦的表面的表面积进行标准化的总厚度变化，所述基底的直径不小于约9.0cm。
-
公开(公告)号：US20080166951A1
公开(公告)日：2008-07-10
申请号：US11963454
申请日：2007-12-21
申请人： Brahmanandam V. Tanikella , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Isaac K. Cherian , Ramanujam Vedantham
发明人： Brahmanandam V. Tanikella , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Isaac K. Cherian , Ramanujam Vedantham
摘要： A sapphire substrate includes a generally planar surface having a crystallographic orientation selected from the group consisting of a-plane, r-plane, m-plane, and c-plane orientations, and having a nTTV of not greater than about 0.037 μm/cm2, wherein nTTV is total thickness variation normalized for surface area of the generally planar surface, the substrate having a diameter not less than about 9.0 cm.
摘要翻译： 蓝宝石衬底包括具有选自由a面，r面，m面和c面取向组成的组的晶体取向的大致平坦的表面，并且具有不大于约0.037μm/ cm 3的nTTV， SUP> 2，其中nTTV是对于大体上平坦的表面的表面积归一化的总厚度变化，所述基底具有不小于约9.0cm的直径。
-
公开(公告)号：US08455879B2
公开(公告)日：2013-06-04
申请号：US11963420
申请日：2007-12-21
申请人： Brahmanandam V. Tanikella , Matthew A. Simpson , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Ramanujam Vedantham
发明人： Brahmanandam V. Tanikella , Matthew A. Simpson , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Ramanujam Vedantham
IPC分类号： H01L29/15
CPC分类号： B24B7/228 , Y10T428/257 , Y10T428/26
摘要： A sapphire substrate includes a generally planar surface having a crystallographic orientation selected from the group consisting of a-plane, r-plane, m-plane, and c-plane orientations, and having a nTTV of not greater than about 0.037 μm/cm2, wherein nTTV is total thickness variation normalized for surface area of the generally planar surface, the substrate having a diameter not less than about 9.0 cm.
摘要翻译： 蓝宝石衬底包括具有选自由a面，r面，m面和c面取向组成的组的结晶取向并具有不大于约0.037μm/ cm 2的nTTV的大致平坦表面， 其中nTTV是对于大致平坦的表面的表面积进行标准化的总厚度变化，所述基底的直径不小于约9.0cm。
-
公开(公告)号：US20080164458A1
公开(公告)日：2008-07-10
申请号：US11963420
申请日：2007-12-21
申请人： Brahmanandam V. Tanikella , Matthew A. Simpson , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Ramanujam Vedantham
发明人： Brahmanandam V. Tanikella , Matthew A. Simpson , Palaniappan Chinnakaruppan , Robert A. Rizzuto , Ramanujam Vedantham
CPC分类号： B24B7/228 , Y10T428/257 , Y10T428/26
摘要： A sapphire substrate includes a generally planar surface having a crystallographic orientation selected from the group consisting of a-plane, r-plane, m-plane, and c-plane orientations, and having a nTTV of not greater than about 0.037 μm/cm2, wherein nTTV is total thickness variation normalized for surface area of the generally planar surface, the substrate having a diameter not less than about 9.0 cm.
-
8.发明授权Corrosion-resistant CMP conditioning tools and methods for making and using same 有权耐腐蚀CMP调理工具及其制造和使用方法公开(公告)号：US08905823B2
公开(公告)日：2014-12-09
申请号：US12791391
申请日：2010-06-01
申请人： Jianhui Wu , Taewook Hwang , Ramanujam Vedantham , Charles Dinh-Ngoc , Thomas K. Puthanangady , Eric M. Schulz , Srinivasan Ramanath
发明人： Jianhui Wu , Taewook Hwang , Ramanujam Vedantham , Charles Dinh-Ngoc , Thomas K. Puthanangady , Eric M. Schulz , Srinivasan Ramanath
IPC分类号： B24B53/12 , B24B53/017 , B24D3/08 , B24D18/00
CPC分类号： B24B53/017 , B24B53/12 , B24D3/08 , B24D18/00
摘要： An abrasive tool for conditioning CMP pads includes abrasive grains coupled to a substrate through a metal bond and a coating, e.g., a fluorine-doped nanocomposite coating. The abrasive grains can be arranged in a self-avoiding random distribution. In one implementation, an abrasive tool includes a coated plate and a coated abrasive article that has two abrading surfaces. Other implementations related to a process for producing an abrasive tool that includes a coating at one or more of its surfaces. Also described are methods for dressing a CMP pad.
摘要翻译： 用于调节CMP垫的研磨工具包括通过金属键和涂层（例如氟掺杂的纳米复合涂层）与基底相连的磨料颗粒。 磨粒可以以自回避的随机分布布置。 在一个实施方案中，研磨工具包括涂覆的板和具有两个研磨表面的涂覆的磨料制品。 涉及用于生产研磨工具的方法的其它实施方式，其包括在其一个或多个表面上的涂层。 还描述了用于修整CMP垫的方法。
-
公开(公告)号：US09266220B2
公开(公告)日：2016-02-23
申请号：US13731326
申请日：2012-12-31
申请人： Shivshankar Sivasubramanian , Srinivasan Ramanath , Ramanujam Vedantham , Rachana Upadhyay , Signo Reis
发明人： Shivshankar Sivasubramanian , Srinivasan Ramanath , Ramanujam Vedantham , Rachana Upadhyay , Signo Reis
CPC分类号： B24D3/18 , B24D18/0009
摘要： An abrasive article including a bonded abrasive body having a bond material made of a vitrified material, abrasive particles comprising a first type of superabrasive material contained in the bond material, a porosity of at least about 50 vol % of the total volume of the bonded abrasive body, and a ΔCTE of not greater than about 5.5 ppm/° C., wherein ΔCTE is defined as a difference between a CTE of the bond material and a CTE of the abrasive particles.
摘要翻译： 一种磨料制品，包括具有由玻璃化材料制成的粘合材料的粘结研磨体，包含在所述粘结材料中的第一类型的超级磨料的磨料颗粒，所述粘结磨料总体积的至少约50vol％ 身体和CTE不大于约5.5ppm /℃，其中＆Dgr; CTE被定义为粘合材料的CTE和磨料颗粒的CTE之间的差。
-
公开(公告)号：US20140182214A1
公开(公告)日：2014-07-03
申请号：US13731326
申请日：2012-12-31
申请人： Shivshankar Sivasubramanian , Srinivasan Ramanath , Ramanujam Vedantham , Rachana Upadhyay , Signo Reis
发明人： Shivshankar Sivasubramanian , Srinivasan Ramanath , Ramanujam Vedantham , Rachana Upadhyay , Signo Reis
CPC分类号： B24D3/18 , B24D18/0009
摘要： An abrasive article including a bonded abrasive body having a bond material made of a vitrified material, abrasive particles comprising a first type of superabrasive material contained in the bond material, a porosity of at least about 50 vol % of the total volume of the bonded abrasive body, and a ΔCTE of not greater than about 5.5 ppm/° C., wherein ΔCTE is defined as a difference between a CTE of the bond material and a CTE of the abrasive particles.
摘要翻译： 一种磨料制品，包括具有由玻璃化材料制成的粘合材料的粘结研磨体，包含在所述粘结材料中的第一类型的超级磨料的磨料颗粒，所述粘结磨料总体积的至少约50vol％ 身体和CTE不大于约5.5ppm /℃，其中＆Dgr; CTE被定义为粘合材料的CTE和磨料颗粒的CTE之间的差。
-
-
-
-
-
-
-
-
-
搜索结果
19 条记录 (耗时 0.025 秒)
