INTERFACE DEVICE WITH INTEGRATED SOLAR CELL(S) FOR POWER COLLECTION
    1.
    发明申请
    INTERFACE DEVICE WITH INTEGRATED SOLAR CELL(S) FOR POWER COLLECTION 有权
    具有用于电力收集的集成太阳能电池的界面装置

    公开(公告)号:US20110279399A1

    公开(公告)日:2011-11-17

    申请号:US12779994

    申请日:2010-05-14

    摘要: Disclosed herein are embodiments of an interface device (e.g., a display, touchpad, touchscreen display, etc.) with integrated power collection functions. In one embodiment, a solar cell or solar cell array can be located within a substrate at a first surface and an array of interface elements can also be located within the substrate at the first surface such that portions of the solar cell(s) laterally surround the individual interface elements or groups thereof. In another embodiment, a solar cell or solar cell array can be located within the substrate at a first surface and an array of interface elements can be located within the substrate at a second surface opposite the first surface (i.e., opposite the solar cell or solar cell array). In yet another embodiment, an array of diodes, which can function as either solar cells or sensing elements, can be within a substrate at a first surface and can be wired to allow for selective operation in either a power collection mode or sensing mode.

    摘要翻译: 这里公开了具有集成的功率收集功能的接口设备(例如,显示器,触摸板,触摸屏显示器等)的实施例。 在一个实施例中,太阳能电池或太阳能电池阵列可以位于第一表面的衬底内,并且界面元件阵列也可以位于第一表面的衬底内,使得太阳能电池的一部分横向包围 各个接口元件或其组合。 在另一个实施例中,太阳能电池或太阳能电池阵列可以位于第一表面的衬底内,并且界面元件的阵列可以位于衬底内的与第一表面相对的第二表面(即,与太阳能电池或太阳能 单元格阵列)。 在另一个实施例中,可以用作太阳能电池或感测元件的二极管阵列可以在第一表面的衬底内,并且可以被布线以允许在电力收集模式或感测模式中的选择性操作。

    Interface device with integrated solar cell(S) for power collection
    2.
    发明授权
    Interface device with integrated solar cell(S) for power collection 有权
    具有用于集电的集成太阳能电池(S)的接口装置

    公开(公告)号:US08384690B2

    公开(公告)日:2013-02-26

    申请号:US12779994

    申请日:2010-05-14

    摘要: Disclosed herein are embodiments of an interface device (e.g., a display, touchpad, touchscreen display, etc.) with integrated power collection functions. In one embodiment, a solar cell or solar cell array can be located within a substrate at a first surface and an array of interface elements can also be located within the substrate at the first surface such that portions of the solar cell(s) laterally surround the individual interface elements or groups thereof. In another embodiment, a solar cell or solar cell array can be located within the substrate at a first surface and an array of interface elements can be located within the substrate at a second surface opposite the first surface (i.e., opposite the solar cell or solar cell array). In yet another embodiment, an array of diodes, which can function as either solar cells or sensing elements, can be within a substrate at a first surface and can be wired to allow for selective operation in either a power collection mode or sensing mode.

    摘要翻译: 这里公开了具有集成的功率收集功能的接口设备(例如,显示器,触摸板,触摸屏显示器等)的实施例。 在一个实施例中,太阳能电池或太阳能电池阵列可以位于第一表面的衬底内,并且界面元件阵列也可以位于第一表面的衬底内,使得太阳能电池的一部分横向包围 各个接口元件或其组合。 在另一个实施例中,太阳能电池或太阳能电池阵列可以位于第一表面的衬底内,并且界面元件的阵列可以位于衬底内的与第一表面相对的第二表面(即,与太阳能电池或太阳能 单元阵列)。 在另一个实施例中,可以用作太阳能电池或感测元件的二极管阵列可以在第一表面的衬底内,并且可以被布线以允许在电力收集模式或感测模式中的选择性操作。

    Low cost solar cell manufacture method employing a reusable substrate
    3.
    发明授权
    Low cost solar cell manufacture method employing a reusable substrate 失效
    低成本太阳能电池制造方法采用可重复使用的基板

    公开(公告)号:US08609453B2

    公开(公告)日:2013-12-17

    申请号:US12951601

    申请日:2010-11-22

    IPC分类号: H01L21/00

    摘要: A reusable substrate and method for forming single crystal silicon solar cells are described. A method of forming a photovoltaic cell includes forming an intermediate layer on a monocrystalline silicon substrate, forming a monocrystalline silicon layer on the intermediate layer, and forming electrical features in the monocrystalline silicon layer. The method further includes forming openings in the monocrystalline silicon layer, and detaching the monocrystalline silicon layer from the substrate by selectively etching the intermediate layer through the openings.

    摘要翻译: 描述了可重复使用的基板和用于形成单晶硅太阳能电池的方法。 形成光伏电池的方法包括在单晶硅衬底上形成中间层,在中间层上形成单晶硅层,并在单晶硅层中形成电特征。 该方法还包括在单晶硅层中形成开口,并且通过选择性地通过开口蚀刻中间层,从而将单晶硅层从衬底上分离出来。

    Strained semiconductor devices and methods of fabricating strained semiconductor devices
    4.
    发明授权
    Strained semiconductor devices and methods of fabricating strained semiconductor devices 有权
    应变半导体器件和制造应变半导体器件的方法

    公开(公告)号:US08445965B2

    公开(公告)日:2013-05-21

    申请号:US12940115

    申请日:2010-11-05

    IPC分类号: H01L27/12

    摘要: A structure and method of fabricating the structure. The structure includes a first region of a semiconductor substrate separated from a second region of the semiconductor substrate by trench isolation formed in the substrate; a first stressed layer over the first region; a second stressed layer over second region; the first stressed layer and second stressed layer separated by a gap; and a passivation layer on the first and second stressed layers, the passivation layer extending over and sealing the gap.

    摘要翻译: 一种制造结构的结构和方法。 该结构包括半导体衬底的第一区域,其通过在衬底中形成的沟槽隔离与半导体衬底的第二区域分离; 第一个区域的第一个应力层; 在第二区域的第二个应力层; 第一应力层和第二应力层由间隙分开; 以及在第一和第二应力层上的钝化层,钝化层延伸并密封间隙。

    Method for Fabricating Field Effect Transistor Devices with High-Aspect Ratio Mask
    5.
    发明申请
    Method for Fabricating Field Effect Transistor Devices with High-Aspect Ratio Mask 失效
    制造具有高比例掩模的场效应晶体管器件的方法

    公开(公告)号:US20130065370A1

    公开(公告)日:2013-03-14

    申请号:US13229154

    申请日:2011-09-09

    IPC分类号: H01L21/336

    摘要: A method for forming feature on a substrate includes forming at least one layer of a feature material on a substrate, patterning a photolithographic resist material on the at least one layer of the feature material, removing portions of the feature material to define a feature, depositing a masking material layer over the resist material and exposed regions of the substrate, modifying a portion of the substrate, and removing the masking material layer and the resist material.

    摘要翻译: 在衬底上形成特征的方法包括在衬底上形成至少一层特征材料,在特征材料的至少一层上图案化光刻抗蚀剂材料,去除特征材料的部分以限定特征,沉积 在抗蚀剂材料上的掩模材料层和衬底的暴露区域,修改衬底的一部分,以及去除掩模材料层和抗蚀剂材料。

    Chromeless phase-shifting photomask with undercut rim-shifting element
    6.
    发明授权
    Chromeless phase-shifting photomask with undercut rim-shifting element 有权
    无铬相移光掩模与底切轮辋移动元件

    公开(公告)号:US08389183B2

    公开(公告)日:2013-03-05

    申请号:US12702787

    申请日:2010-02-09

    IPC分类号: G03F1/28 G03F1/29 G03F1/34

    CPC分类号: G03F1/29 G03F1/34

    摘要: A phase-shifting photomask with a self aligned undercut rim-shifting element and methods for its manufacture are provided. One embodiment of the invention provides a method of manufacturing a phase-shifting photomask having a self aligned rim-shifting element, the method comprising: applying a patterning film to a first portion of a transparent substrate; etching the substrate to a depth to remove a second portion of the substrate not beneath the patterning film; etching the first portion of the substrate to undercut an area beneath the patterning film; and removing the patterning film, wherein the etched substrate forms a self-aligned undercut rim-shifting element.

    摘要翻译: 提供了具有自对准底切边缘移动元件的相移光掩模及其制造方法。 本发明的一个实施例提供了一种制造具有自对准边缘移位元件的相移光掩模的方法,所述方法包括:将图案化膜施加到透明基板的第一部分; 将衬底蚀刻到深度以去除衬底的第二部分而不在图案化膜下方; 蚀刻基板的第一部分以削去图案化膜下方的区域; 并且去除所述图案化膜,其中所述蚀刻的衬底形成自对准底切轮辋移位元件。

    SIMULTANEOUS FORMATION OF FINFET AND MUGFET
    7.
    发明申请
    SIMULTANEOUS FORMATION OF FINFET AND MUGFET 有权
    同时形成FINFET和MUGFET

    公开(公告)号:US20120098066A1

    公开(公告)日:2012-04-26

    申请号:US12909917

    申请日:2010-10-22

    摘要: A method and structure comprise a field effect transistor structure that includes a first rectangular fin structure position on a substrate. The first rectangular fin structure has a bottom contacting the substrate, a top opposite the bottom, and sides between the top and the bottom. The structure additionally includes a second rectangular fin structure position on the substrate. Similarly, the second rectangular fin structure also has a bottom contacting the substrate, a top opposite the bottom, and sides between the top and the bottom. The sides of the second rectangular fin structure are parallel to the sides of the first rectangular fin structure. Further, a trench insulator is positioned on the substrate and is positioned between a side of the first rectangular fin structure and a side of the second rectangular fin structure. Additionally, a gate conductor is positioned on the trench insulator, positioned over the sides and the top of the first rectangular fin structure, and positioned over the sides and the top of the second rectangular fin structure. The gate conductor runs perpendicular to the sides of the first rectangular fin structure and the sides of the second rectangular fin structure. Also, a gate insulator is positioned between the gate conductor and the first rectangular fin structure and between the gate conductor and the second rectangular fin structure. The structure further includes a first cap on the top of the first rectangular fin structure. The first cap separates the gate conductor from the first rectangular fin structure.

    摘要翻译: 一种方法和结构包括场效应晶体管结构,其包括在衬底上的第一矩形鳍结构位置。 第一矩形翅片结构具有接触基底的底部,与底部相对的顶部以及顶部和底部之间的边。 该结构还包括在基底上的第二矩形翅片结构位置。 类似地,第二矩形翅片结构还具有接触基底的底部,与底部相对的顶部以及顶部和底部之间的边。 第二矩形翅片结构的侧面平行于第一矩形翅片结构的侧面。 此外,沟槽绝缘体位于衬底上并且位于第一矩形翅片结构的侧面和第二矩形鳍结构的侧面之间。 此外,栅极导体位于沟槽绝缘体上,位于第一矩形翅片结构的侧面和顶部之上,并且位于第二矩形鳍结构的侧面和顶部之上。 栅极导体垂直于第一矩形翅片结构的侧面和第二矩形翅片结构的侧面延伸。 此外,栅极绝缘体位于栅极导体和第一矩形翅片结构之间以及栅极导体和第二矩形鳍结构之间。 该结构还包括在第一矩形翅片结构的顶部上的第一盖。 第一盖将栅极导体与第一矩形鳍结构分开。

    Systems for real-time contamination, environmental, or physical monitoring of a photomask
    8.
    发明授权
    Systems for real-time contamination, environmental, or physical monitoring of a photomask 有权
    用于光掩模的实时污染,环境或物理监测的系统

    公开(公告)号:US08136055B2

    公开(公告)日:2012-03-13

    申请号:US12182672

    申请日:2008-07-30

    IPC分类号: G06F17/50

    摘要: Systems for real-time contamination, environmental, or physical monitoring of a photomask. The system includes an electronics package physically mounted to the photomask and a processing device in communication with the electronics package. The electronics package includes a sensor configured to monitor the attribute and generate sensor data. The processing device is configured to analyze the sensor data communicated from the electronics package to the processing device.

    摘要翻译: 用于光掩模的实时污染,环境或物理监测的系统。 该系统包括物理地安装到光掩模的电子封装以及与电子封装通信的处理装置。 电子组件包括配置成监视属性并生成传感器数据的传感器。 处理装置被配置为分析从电子包装传送到处理装置的传感器数据。

    SEMICONDUCTOR STRUCTURE INCORPORATING MULTIPLE NITRIDE LAYERS TO IMPROVE THERMAL DISSIPATION AWAY FROM A DEVICE AND A METHOD OF FORMING THE STRUCTURE
    9.
    发明申请
    SEMICONDUCTOR STRUCTURE INCORPORATING MULTIPLE NITRIDE LAYERS TO IMPROVE THERMAL DISSIPATION AWAY FROM A DEVICE AND A METHOD OF FORMING THE STRUCTURE 有权
    包含多个氮化物层的半导体结构,以改善设备中的热释放和形成结构的方法

    公开(公告)号:US20110140279A1

    公开(公告)日:2011-06-16

    申请号:US12638004

    申请日:2009-12-15

    IPC分类号: H01L23/535 H01L21/768

    摘要: Disclosed are embodiments of a semiconductor structure that incorporates multiple nitride layers stacked between the center region of a device and a blanket oxide layer. These nitride layers are more thermally conductive than the blanket oxide layer and, thus provide improved heat dissipation away from the device. Also disclosed are embodiments of a method of forming such a semiconductor structure in conjunction with the formation of any of the following nitride layers during standard processing of other devices: a nitride hardmask layer (OP layer), a “sacrificial” nitride layer (SMT layer), a tensile nitride layer (WN layer) and/or a compressive nitride layer (WP layer). Optionally, the embodiments also incorporate incomplete contacts that extend through the blanket oxide layer into one or more of the nitride layers without contacting the device in order to further improve heat dissipation

    摘要翻译: 公开了一种半导体结构的实施例,该半导体结构包括堆叠在器件的中心区域和覆盖氧化物层之间的多个氮化物层。 这些氮化物层比覆盖氧化物层更具有导热性,因此提供远离器件的改进的散热。 还公开了在其它器件的标准处理期间结合形成下列氮化物层的方法的一种方法的实施例:氮化物硬掩模层(OP层),“牺牲”氮化物层(SMT层 ),拉伸氮化物层(WN层)和/或压缩氮化物层(WP层)。 可选地,实施例还包括不完全接触,其延伸穿过覆盖层氧化物层到一个或多个氮化物层中,而不接触该器件,以进一步改善散热