MULTIFUNCTIONAL MATERIALS FOR TEMPORARY BONDING

    公开(公告)号:US20210332188A1

    公开(公告)日:2021-10-28

    申请号:US17241174

    申请日:2021-04-27

    Abstract: The materials and methods disclosed can be used for applications such as temporary bond and debond of semiconductor and display substrates. These materials have sufficiently low melt rheologies to be used as a bonding layer and can crosslink/cure to allow for reduction in material flow over long periods of time. This class of materials also incorporates the ability to be used as a single-layer system for debonding purposes and typically uses laser debonding for its release mechanism. These materials also allow for solvent cleanability using very mild acidic conditions instead of the typical harsh conditions used on curable layers.

    LASER-RELEASABLE BONDING MATERIALS FOR 3-D IC APPLICATIONS

    公开(公告)号:US20200234993A1

    公开(公告)日:2020-07-23

    申请号:US16747271

    申请日:2020-01-20

    Abstract: Novel polyketanil-based compositions for use as a laser-releasable composition for temporary bonding and laser debonding processes are provided. The inventive compositions can be debonded using various UV lasers, at wavelengths from about 300 nm to about 360 nm, leaving behind little to no debris. The layers formed from these compositions possess good thermal stabilities and are resistant to common solvents used in semiconductor processing. The compositions can also be used as build-up layers for redistribution layer formation.

    Laser-releasable bonding materials for 3-D IC applications

    公开(公告)号:US11610801B2

    公开(公告)日:2023-03-21

    申请号:US16747271

    申请日:2020-01-20

    Abstract: Novel polyketanil-based compositions for use as a laser-releasable composition for temporary bonding and laser debonding processes are provided. The inventive compositions can be debonded using various UV lasers, at wavelengths from about 300 nm to about 360 nm, leaving behind little to no debris. The layers formed from these compositions possess good thermal stabilities and are resistant to common solvents used in semiconductor processing. The compositions can also be used as build-up layers for redistribution layer formation.

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