METHOD FOR IMPROVING TRANSMISSION KIKUCHI DIFFRACTION PATTERN

    公开(公告)号:US20210183612A1

    公开(公告)日:2021-06-17

    申请号:US17114202

    申请日:2020-12-07

    申请人: Bruker Nano GmbH

    IPC分类号: H01J37/244 H01J37/20

    摘要: The present invention refers to a method for improving a Transmission Kikuchi Diffraction, TKD pattern, wherein the method comprises the steps of: Detecting a TKD pattern (20b) of a sample (12) in an electron microscope (60) comprising at least one active electron lens (61) focussing an electron beam (80) in z-direction on a sample (12) positioned in distance D below the electron lens (61), the detected TKD (20b) pattern comprising a plurality of image points xD, yD and mapping each of the detected image points xD, yD to an image point of an improved TKD pattern (20a) with the coordinates x0, y0 by using and inverting generalized terms of the form xD=γ*A+(1−γ)*B and yD=γ*C+(1−γ)*D wherein γ = Z D with Z being an extension in the z-direction of a cylindrically symmetric magnetic field BZ of the electron lens (61), and wherein A, B, C, D are trigonometric expressions depending on the coordinates x0, y0, with B and D defining a rotation around a symmetry axis of the magnetic field BZ, and with A and C defining a combined rotation and contraction operation with respect to the symmetry axis of the magnetic field BZ. The invention further relates to a measurement system, computer program and computer-readable medium for carrying out the method of the invention.

    PROXIMITY SENSOR FOR ELECTRON BACKSCATTER DIFFRACTION SYSTEMS

    公开(公告)号:US20240241066A1

    公开(公告)日:2024-07-18

    申请号:US18532965

    申请日:2023-12-07

    申请人: Bruker Nano GmbH

    发明人: Daniel Radu Goran

    摘要: The present invention refers to a proximity sensor for electron backscatter diffraction (EBSD) systems, particularly, a proximity sensor for collision avoidance between an EBSD sensor of an EBSD system and a stage of a scanning electron microscope (SEM) equipped with the EBSD system, and a corresponding method for proximity monitoring. The proximity sensor comprises emitter(s) to provide a light beam or light curtain which is basically directed parallel to an active area of the EBSD sensor and transmitted across the active area of the EBSD sensor at a distance selected as an alerting distance for the proximity sensor during collision monitoring; and receiver(s) located opposite to the emitter with respect to the active area of the EBSD sensor, configured to detect the light beam or light curtain and to provide a signal corresponding to the intensity of the light beam or light curtain for collision monitoring.

    Kikuchi diffraction detector
    4.
    发明授权

    公开(公告)号:US11300530B2

    公开(公告)日:2022-04-12

    申请号:US16935620

    申请日:2020-07-22

    申请人: BRUKER NANO GMBH

    发明人: Daniel Radu Goran

    摘要: A detector for Kikuchi diffraction comprising a detector body and a detector head mountable to each other. The detector body comprises a body part which is enclosing a photodetector configured for detecting incident radiation and further comprises a vacuum window arranged upstream the photodetector with respect to a propagation direction of the incident radiation, a first body mounting portion configured to be mounted to a SEM chamber port and a second body mounting portion. The detector head comprises a scintillation screen and a head mounting portion configured to be mounted to the second body mounting portion.

    Detector, methods for operating a detector and detector pixel circuit

    公开(公告)号:US11665441B2

    公开(公告)日:2023-05-30

    申请号:US17260087

    申请日:2019-07-19

    申请人: BRUKER NANO GMBH

    摘要: A pixelated sensor comprises a semiconductor substrate chip with a plurality of sensor pixels and a detector chip with a plurality of detector pixels. Each of the sensor pixels is configured as a photodiode and is electrically connected to an input node of one of the detector pixels. The detector pixels are further configured to convert and output the sensor input to an analog to digital converter. The detector chip further comprises first and second macropixels and a plurality of second macropixels, wherein each first macropixel is formed by subset of detector pixels switchably interconnected via a first conducting grid and wherein each second macropixel is formed by a subset of first macropixels switchably interconnected via a second conducting grid.

    Method for improving transmission Kikuchi diffraction pattern

    公开(公告)号:US11270867B2

    公开(公告)日:2022-03-08

    申请号:US17114202

    申请日:2020-12-07

    申请人: Bruker Nano GmbH

    摘要: The present invention refers to a method for improving a Transmission Kikuchi Diffraction, TKD pattern, wherein the method comprises the steps of: Detecting a TKD pattern (20b) of a sample (12) in an electron microscope (60) comprising at least one active electron lens (61) focusing an electron beam (80) in z-direction on a sample (12) positioned in distance D below the electron lens (61), the detected TKD (20b) pattern comprising a plurality of image points xD, yD and mapping each of the detected image points xD, yD to an image point of an improved TKD pattern (20a) with the coordinates x0, y0 by using and inverting generalized terms of the form xD=γ*A+(1−γ)*B and yD=γ*C+(1−γ)*D wherein γ = Z D with Z being an extension in the z-direction of a cylindrically symmetric magnetic field BZ of the electron lens (61), and wherein A, B, C, D are trigonometric expressions depending on the coordinates x0, y0, with B and D defining a rotation around a symmetry axis of the magnetic field BZ, and with A and C defining a combined rotation and contraction operation with respect to the symmetry axis of the magnetic field BZ. The invention further relates to a measurement system, computer program and computer-readable medium for carrying out the method of the invention.