公开(公告)号：US06862051B2

公开(公告)日：2005-03-01

申请号：US10397261

申请日：2003-03-27

申请人： Byung-Chul Ahn ,  Soon-Sung Yoo ,  Yong-Wan Kim

发明人： Byung-Chul Ahn ,  Soon-Sung Yoo ,  Yong-Wan Kim

IPC分类号： G02F1/136 ,  G02F1/1362

CPC分类号： G02F1/13458 ,  G02F1/136213 ,  G02F1/136227

摘要： A liquid crystal display, and a method of manufacturing thereof, includes providing a substrate; depositing sequentially a first metal layer and a first insulating layer on the substrate; patterning the first metal layer and the first insulating layer using a first mask to form a gate line and a first gate insulating layer; depositing sequentially a second gate insulating layer, a pure semiconductor layer, a doped semiconductor layer and a second metal layer over the whole substrate; patterning the second metal layer using a second mask to form a data line, source and drain electrodes, a capacitor electrode, the capacitor electrode overlapping a portion of the gae line; etching the doped semiconductor layer between the source and drain electrodes to form a channel region; depositing a third insulating layer over the whole substrate; patterning the third insulating layer using a third mask to form a passivation film, the passivation film having a smaller width than the data line and covering the source and drain electrodes and exposing a portion of the drain electrode and the capacitor electrode; depositing a transparent conductive material layer over the whole substrate; and patterning the transparent conductive material layer using a fourth mask to pixel electrode, the pixel electrode contacting the drain electrode.

摘要翻译： 液晶显示器及其制造方法包括提供基板; 在基板上依次沉积第一金属层和第一绝缘层; 使用第一掩模对第一金属层和第一绝缘层进行构图以形成栅极线和第一栅极绝缘层; 在整个衬底上依次沉积第二栅绝缘层，纯半导体层，掺杂半导体层和第二金属层; 使用第二掩模图案化第二金属层以形成数据线，源极和漏极，电容器电极，电容器电极与gae线的一部分重叠; 蚀刻源极和漏极之间的掺杂半导体层以形成沟道区; 在整个衬底上沉积第三绝缘层; 使用第三掩模对第三绝缘层进行图案化以形成钝化膜，所述钝化膜具有比所述数据线更小的宽度并且覆盖所述源电极和漏电极并暴露所述漏电极和所述电容器电极的一部分; 在整个基板上沉积透明导电材料层; 以及使用第四掩模到像素电极对所述透明导电材料层进行图案化，所述像素电极与所述漏极接触。

公开(公告)号：US06338989B1

公开(公告)日：2002-01-15

申请号：US09630717

申请日：2000-08-02

申请人： Byung-Chul Ahn ,  Soon-Sung Yoo ,  Young-Hoon Ha ,  Yong-Wan Kim

发明人： Byung-Chul Ahn ,  Soon-Sung Yoo ,  Young-Hoon Ha ,  Yong-Wan Kim

IPC分类号： H01L2184

CPC分类号： H01L29/66765 ,  H01L27/12

摘要： A 4-mask method of manufacturing an array substrate. First and second masks form a gate line, a gate pad, a data line and a data pad. The data line has a protrusion near a crossing of the gate and data lines. A third mask forms a transparent electrode layer, a source electrode, a drain electrode, a pixel electrode, and exposes channel area. The transparent electrode layer has a similar shape as the data line and the data pad, but a smaller area than the data line and a greater area than the data pad. A second insulating layer is formed over the structure. A fourth mask patterns the second insulating layer to cover the gate line and the gate pad, the first and second insulating layer are patterned to form a gate pad contact hole, and the first insulating layer between the data line and the pixel electrode is patterned.

摘要翻译： 一种制造阵列基板的4掩模方法。 第一和第二掩模形成栅极线，栅极焊盘，数据线和数据焊盘。 数据线在栅极和数据线的交叉点附近具有突起。 第三掩模形成透明电极层，源电极，漏电极，像素电极，并露出通道区域。 透明电极层具有与数据线和数据焊盘相似的形状，但是与数据线相比较小的面积和比数据焊盘更大的面积。 在该结构上形成第二绝缘层。 第四掩模图案化第二绝缘层以覆盖栅极线和栅极焊盘，第一和第二绝缘层被图案化以形成栅极焊盘接触孔，并且数据线和像素电极之间的第一绝缘层被图案化。

公开(公告)号：US06559920B1

公开(公告)日：2003-05-06

申请号：US09694285

申请日：2000-10-24

申请人： Byung-Chul Ahn ,  Soon-Sung Yoo ,  Yong-Wan Kim

发明人： Byung-Chul Ahn ,  Soon-Sung Yoo ,  Yong-Wan Kim

IPC分类号： G02F11343

CPC分类号： G02F1/13458 ,  G02F1/136213 ,  G02F1/136227

摘要： The present invention discloses a method of manufacturing a liquid crystal display device, including: providing a substrate; depositing sequentially a first metal layer and a first insulating layer on the substrate; patterning the first metal layer and the first insulating layer using a first mask to form a gate line and a first gate insulating layer; depositing sequentially a second gate insulating layer, a pure semiconductor layer, a doped semiconductor layer and a second metal layer over the whole substrate; patterning the second metal layer using a second mask to form a data line, source and drain electrodes, a capacitor electrode, the capacitor electrode overlapping a portion of the gate line; etching the doped semiconductor layer between the source and drain electrodes to form a channel region; depositing a third insulating layer over the whole substrate; patterning the third insulating layer using a third mask to form a passivation film, the passivation film having a smaller width than the data line and covering the source and drain electrodes and exposing a portion of the drain electrode and the capacitor electrode; depositing a transparent conductive material layer over the whole substrate; and patterning the transparent conductive material layer using a fourth mask to pixel electrode, the pixel electrode contacting the drain electrode.

摘要翻译： 本发明公开了一种制造液晶显示装置的方法，包括：提供基板; 在基板上依次沉积第一金属层和第一绝缘层; 使用第一掩模对第一金属层和第一绝缘层进行构图以形成栅极线和第一栅极绝缘层; 在整个衬底上依次沉积第二栅绝缘层，纯半导体层，掺杂半导体层和第二金属层; 使用第二掩模图案化第二金属层以形成数据线，源极和漏极，电容器电极，电容器电极与栅极线的一部分重叠; 蚀刻源极和漏极之间的掺杂半导体层以形成沟道区; 在整个衬底上沉积第三绝缘层; 使用第三掩模对第三绝缘层进行图案化以形成钝化膜，所述钝化膜具有比所述数据线更小的宽度并且覆盖所述源电极和漏电极并暴露所述漏电极和所述电容器电极的一部分; 在整个基板上沉积透明导电材料层; 以及使用第四掩模到像素电极对所述透明导电材料层进行图案化，所述像素电极与所述漏极接触。

公开(公告)号：US08021937B2

公开(公告)日：2011-09-20

申请号：US12486453

申请日：2009-06-17

申请人： Hyung-Gu Roh ,  Byung-Chul Ahn ,  Hee-Dong Choi ,  Seong-Moh Seo ,  Jun-Min Lee

发明人： Hyung-Gu Roh ,  Byung-Chul Ahn ,  Hee-Dong Choi ,  Seong-Moh Seo ,  Jun-Min Lee

IPC分类号： H01L21/336

CPC分类号： H01L27/1285 ,  H01L21/268 ,  H01L27/1288

摘要： A method of fabricating an array substrate includes: forming a gate line and a gate electrode connected to the gate line; forming a gate insulating layer on the gate line and the gate insulting layer; sequentially forming an intrinsic amorphous silicon pattern and an impurity-doped amorphous silicon pattern on the gate insulating layer over the gate electrode; forming a data line on the gate insulating layer and source and drain electrodes on the impurity-doped amorphous silicon pattern, the data line crossing the gate line to define a pixel region, and the source and drain electrodes spaced apart from each other; removing a portion of the impurity-doped amorphous silicon pattern exposed through the source and drain electrodes to define an ohmic contact layer; irradiating a first laser beam onto the intrinsic amorphous silicon pattern through the source and drain electrode to form an active layer including a first portion of polycrystalline silicon and a second portion of amorphous silicon at both sides of the first portion; forming a passivation layer on the data line, the source electrode and the drain electrode, the passivation layer having a drain contact hole exposing the drain electrode; and forming a pixel electrode on the passivation layer in the pixel region, the pixel electrode connected to the drain electrode through the drain contact hole.

摘要翻译： 制造阵列基板的方法包括：形成栅极线和连接到栅极线的栅电极; 在栅极线和栅极绝缘层上形成栅极绝缘层; 在栅电极上的栅极绝缘层上依次形成本征非晶硅图案和杂质掺杂非晶硅图案; 在栅极绝缘层上形成数据线，在掺杂杂质的非晶硅图案上的源电极和漏极之间形成数据线，该数据线与栅极线交叉以限定一个像素区域，以及源极和漏极彼此间隔开; 去除通过源极和漏极暴露的杂质掺杂非晶硅图案的一部分，以限定欧姆接触层; 通过源极和漏极将第一激光束照射到本征非晶硅图案上，以在第一部分的两侧形成包括多晶硅的第一部分和非晶硅的第二部分的有源层; 在数据线上形成钝化层，源电极和漏电极，钝化层具有暴露漏电极的漏极接触孔; 以及在所述像素区域中的钝化层上形成像素电极，所述像素电极通过所述漏极接触孔与所述漏电极连接。

公开(公告)号：US07910414B2

公开(公告)日：2011-03-22

申请号：US12591501

申请日：2009-11-20

申请人： Hee-Dong Choi ,  Sang-Gul Lee ,  Seong-Moh Seo ,  Jun-Min Lee ,  Byung-Chul Ahn

发明人： Hee-Dong Choi ,  Sang-Gul Lee ,  Seong-Moh Seo ,  Jun-Min Lee ,  Byung-Chul Ahn

IPC分类号： H01L21/00 ,  H01L21/84

CPC分类号： H01L27/1274 ,  H01L27/1214 ,  H01L27/1288 ,  H01L29/4908

摘要： A method of fabricating an array substrate includes sequentially forming a first metal layer, a first inorganic insulating layer and an intrinsic amorphous silicon layer on a substrate, the first metal layer including a first metallic material layer and a second metallic material layer; crystallizing the intrinsic amorphous silicon; forming a gate electrode, a gate line, a gate insulating layer and an active layer; forming an interlayer insulating layer including first and second contact holes respectively exposing both sides of the active layer; forming first and second ohmic contact patterns respectively contacting the both sides of the active layers, a source electrode, a drain electrode, and a data line connecting the source electrode; forming a passivation layer on the source electrode, the drain electrode; and forming a pixel electrode on the passivation layer and contacting the drain electrode.

摘要翻译： 制造阵列基板的方法包括在基板上依次形成第一金属层，第一无机绝缘层和本征非晶硅层，所述第一金属层包括第一金属材料层和第二金属材料层; 结晶本征非晶硅; 形成栅电极，栅极线，栅绝缘层和有源层; 形成包括分别暴露有源层的两侧的第一和第二接触孔的层间绝缘层; 形成分别接触有源层的两侧的第一和第二欧姆接触图案，源电极，漏电极和连接源电极的数据线; 在源极上形成钝化层，漏电极; 以及在所述钝化层上形成像素电极并与所述漏电极接触。

公开(公告)号：US20110032277A1

公开(公告)日：2011-02-10

申请号：US12646256

申请日：2009-12-23

申请人： Se-Hee LEE ,  Byung-Chul Ahn ,  Seung-Kyu Choi ,  Nam-Yang Lee ,  Seok-Jong Lee

发明人： Se-Hee LEE ,  Byung-Chul Ahn ,  Seung-Kyu Choi ,  Nam-Yang Lee ,  Seok-Jong Lee

IPC分类号： G06F3/038 ,  G09G5/10 ,  H01J9/00

CPC分类号： H01L51/5281 ,  G09G3/3225 ,  G09G2300/0452 ,  G09G2320/0242 ,  H01L27/3244 ,  H01L2251/558

摘要： A monochrome light emitting display device and a method for fabricating the same are disclosed, in which a pixel structure of a monochrome light emitting display device is changed to improve a contrast ratio and resolution and at the same time color shift is prevented from occurring, so as to display clearer image. The monochrome light emitting display device comprises a display panel having unit pixels of first and second sub-pixels arranged in a matrix arrangement to display a monochrome image; gate and data drivers respectively driving gate lines and data lines of the display panel; and a timing controller aligning externally input RGB data to be suitable for driving of the display panel to supply the RGB data to the data driver and generating data and gate control signals to control the data and gate drivers.

摘要翻译： 公开了一种单色发光显示装置及其制造方法，其中改变单色发光显示装置的像素结构以提高对比度和分辨率，并且同时防止发生色偏。 以显示更清晰的图像。 单色发光显示装置包括：显示面板，具有排列成矩阵排列的第一和第二子像素的单位像素，以显示单色图像; 门和数据驱动器分别驱动显示面板的门线和数据线; 以及定时控制器，用于对准外部输入RGB数据以适于驱动显示面板，以将RGB数据提供给数据驱动器，并产生数据和门控制信号以控制数据和门驱动器。

公开(公告)号：US20090023254A1

公开(公告)日：2009-01-22

申请号：US11967660

申请日：2007-12-31

申请人： Joo-Soo Lim ,  Hong-Sik Kim ,  Hee-Young Kwack ,  Hyun-Seok Hong ,  Byung-Chul Ahn ,  Byoung-Ho Lim

发明人： Joo-Soo Lim ,  Hong-Sik Kim ,  Hee-Young Kwack ,  Hyun-Seok Hong ,  Byung-Chul Ahn ,  Byoung-Ho Lim

IPC分类号： H01L21/336 ,  H01L21/469

CPC分类号： C23C14/0652

摘要： A method of forming an inorganic insulating layer on a substrate comprises supplying a mixed gas between the substrate and a target, and generating a plasma between the substrate and the target. The target comprises a silicon-based material. The method further comprises depositing a plurality of ions from the plasma on the substrate.

摘要翻译： 在衬底上形成无机绝缘层的方法包括在衬底和靶之间提供混合气体，以及在衬底和靶之间产生等离子体。 目标包括硅基材料。 所述方法还包括在所述衬底上沉积来自所述等离子体的多个离子。

公开(公告)号：US06919932B2

公开(公告)日：2005-07-19

申请号：US10885781

申请日：2004-07-08

申请人： Byung-Chul Ahn ,  Hyun-Kyu Lee

发明人： Byung-Chul Ahn ,  Hyun-Kyu Lee

IPC分类号： G02F1/133 ,  G02F1/1343 ,  G02F1/1362 ,  G02F1/136

CPC分类号： G02F1/1362 ,  G02F1/134336 ,  G02F1/13439 ,  G02F1/136286

摘要： A liquid crystal display, and a fabricating method thereof, wherein pixel electrodes are highly accurately located relative to opaque elements, such as gate lines, data lines, or auxilarly lines, beneficially by using opaque elements as masking elements when exposing a photosensitive layer through a substrate. The angle of the irradiating light through the substrate can be changed to achieve a desired relative location. A pixel electrode can be located within 1 μm of a data line. Image stain defects can be reduced.

摘要翻译： 一种液晶显示器及其制造方法，其中像素电极相对于不透明元件（例如栅极线，数据线或辅助线）高度精确地定位，有利地通过使用不透明元件作为掩模元件，当将感光层暴露于 基质。 可以改变通过基板的照射光的角度以实现所需的相对位置。 像素电极可以位于数据线的1um之内。 可以减少图像污染缺陷。

公开(公告)号：US07847289B2

公开(公告)日：2010-12-07

申请号：US11646253

申请日：2006-12-28

申请人： Hyo-Uk Kim ,  Byung-Chul Ahn ,  Byoung-Ho Lim

发明人： Hyo-Uk Kim ,  Byung-Chul Ahn ,  Byoung-Ho Lim

IPC分类号： G02F1/133

CPC分类号： H01L27/124 ,  H01L27/1214 ,  H01L27/1288 ,  H01L29/42384 ,  H01L29/78633

摘要： An array substrate for a liquid crystal display device includes a substrate, a gate line over the substrate, a data line crossing the gate line to define a pixel region and including a transparent conductive layer and an opaque conductive layer, a data pad at one end of the data line and including a transparent conductive layer, a thin film transistor connected to the gate line and the data line and including a gate electrode, an active layer, an ohmic contact layer, a buffer metallic layer, a source electrode and a drain electrode, and a pixel electrode in the pixel region and connected to the thin film transistor, the pixel electrode including a transparent conductive layer.

摘要翻译： 液晶显示装置用阵列基板包括基板，基板上的栅极线，与栅极线交叉以限定像素区域并包括透明导电层和不透明导电层的数据线，一端的数据焊盘 的数据线，并且包括透明导电层，连接到栅极线和数据线的薄膜晶体管，并且包括栅电极，有源层，欧姆接触层，缓冲金属层，源电极和漏极 电极和像素电极，并且连接到薄膜晶体管，像素电极包括透明导电层。

公开(公告)号：US07710526B2

公开(公告)日：2010-05-04

申请号：US11644716

申请日：2006-12-22

申请人： Do-Sung Kim ,  Byung-Chul Ahn

发明人： Do-Sung Kim ,  Byung-Chul Ahn

IPC分类号： G02F1/1343

CPC分类号： G02F1/13439 ,  G02F1/133345 ,  G02F2001/134372 ,  G02F2001/13629

摘要： An array substrate for an IPS mode LCD device comprises a substrate; a gate line along a first direction; a data line along a second direction; a TFT connected to the gate and data lines; a common electrode having a plate shape on the substrate and formed of a first transparent conductive material; and a pixel electrode formed of a second transparent conductive material on the common electrode and including first and second portions and a plurality of third portions combining the first portion with the second portion. The first and second portions are parallel to the second direction and separated from each other and the plurality of third portions are oblique to the first and second portions and separated from one another.

摘要翻译： 用于IPS模式LCD器件的阵列衬底包括衬底; 沿着第一方向的栅极线; 沿着第二方向的数据线; 连接到门和数据线的TFT; 在基板上具有板状的公共电极，由第一透明导电材料形成; 以及由公共电极上的第二透明导电材料形成并包括第一和第二部分的像素电极和将第一部分与第二部分组合的多个第三部分。 第一和第二部分平行于第二方向并且彼此分离，并且多个第三部分相对于第一和第二部分倾斜并且彼此分离。