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公开(公告)号：US08363313B2
公开(公告)日：2013-01-29
申请号：US12907622
申请日：2010-10-19
Applicant: Teruno Nakaguma , Kentaro Ichii , Shoji Tanigawa
Inventor： Teruno Nakaguma , Kentaro Ichii , Shoji Tanigawa
CPC classification number: H01S3/06716 , C03C3/06 , C03C13/045 , C03C2201/10 , C03C2201/12 , C03C2201/14 , C03C2201/28 , C03C2201/31 , C03C2201/3488 , C03C2201/36 , G02B6/024 , G02B6/036 , G02B6/03605 , G02B6/03633 , G02B6/03638 , G02B6/03644 , G02B6/03661 , H01S3/06712 , H01S3/06729 , H01S3/0675 , H01S3/094007 , H01S3/1608 , H01S3/1618 , H01S3/1691 , H01S3/1693
Abstract: An ytterbium-doped optical fiber of the present invention includes: a core which contains ytterbium, aluminum, and phosphorus and does not contain germanium; and a cladding which surrounds this core. The ytterbium concentration in the core in terms of ytterbium oxide is 0.09 to 0.68 mole percent. The molar ratio between the phosphorus concentration in the core in terms of diphosphorus pentoxide and the above ytterbium concentration in terms of ytterbium oxide is 3 to 30. The molar ratio between the aluminum concentration in the core in terms of aluminum oxide and the above ytterbium concentration in terms of ytterbium oxide is 3 to 32. The molar ratio between the above aluminum concentration in terms of aluminum oxide and the above phosphorus concentration in terms of diphosphorus pentoxide is 1 to 2.5.
Abstract translation: 本发明的镱掺杂光纤包括：含有镱，铝和磷并且不含锗的芯; 以及围绕该芯的包层。 以镱氧化物计，核心中的镱浓度为0.09〜0.68摩尔％。 以氧化镱表示的核心中的磷浓度与上述镱的氧化镱浓度之间的摩尔比为3〜30。以氧化铝计的核心中的铝浓度与上述镱的浓度 氧化镱的数量为3〜32。以氧化铝计的上述铝浓度与上述磷浓度之间的摩尔比为1〜2.5。
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2.发明授权公开(公告)号：US06944380B1
公开(公告)日：2005-09-13
申请号：US10399967
申请日：2002-01-11
Applicant: Hosono Hideo , Hirano Masahiro , Oto Masanori , Tochitani Gen , Ohneda Susumu , Kikugawa Shinnya
Inventor： Hosono Hideo , Hirano Masahiro , Oto Masanori , Tochitani Gen , Ohneda Susumu , Kikugawa Shinnya
IPC: C03B37/012 , C03B37/027 , C03C4/00 , C03C13/04 , C03C23/00 , C03C25/10 , C03C25/60 , G02B6/02 , G02B6/10 , G02B6/24 , G02B6/26 , G02B1/00
CPC classification number: G02B6/02333 , C03B37/01205 , C03B37/027 , C03B37/02781 , C03B2201/10 , C03B2201/12 , C03B2201/21 , C03B2203/14 , C03B2203/42 , C03C4/0085 , C03C13/045 , C03C13/046 , C03C23/0095 , C03C25/105 , C03C25/1065 , C03C25/607 , C03C2201/10 , C03C2201/12 , C03C2201/14 , C03C2201/21 , G02B6/02033 , G02B6/02347 , G02B6/02395 , G02B6/03694 , G02B6/102 , G02B6/241 , G02B6/262
Abstract: It is an object of the present invention to provide an optical fiber for transmitting ultraviolet ray which has an improve transmittance and is prevented from deterioration by ultraviolet ray with which it is irradiated. It is another object of the present invention to provide an optical fiber probe which can propagate vacuum ultraviolet ray and deep ultraviolet ray at a high transmittance, is deteriorated only to a limited extent when irradiated with ultraviolet ray and can be etched to have a desired shape of the sharpened section at the fiber end.The present invention provides the optical fiber for transmitting ultraviolet ray which has a core 5 of silica glass containing a given content of fluorine and a clad 6a of silica glass containing a given content of fluorine or boron, a clad 6b of a resin which transmits ultraviolet ray or a clad 6c having air holes H. The clad may be coated with a protective layer and further with a covered layer for protection. In particular, the core, clad and protective layer have a high transmittance for ultraviolet ray and resistance to ultraviolet ray with which they are irradiated, when treated with hydrogen.An optical fiber probe 1 has an optical fiber 2 provided with a sharpened section 3 at the end, which is sharpened with an etchant solution, the sharpened section 3 being coated with a light-shielding metallic film 4.
Abstract translation: 本发明的目的是提供一种透射紫外线的光纤，其具有提高的透射率并且防止被照射的紫外线的劣化。 本发明的另一个目的是提供一种能够以高透射率传播真空紫外线和深紫外线的光纤探针，当用紫外线照射时仅在有限程度上劣化，并且可以被蚀刻以具有期望的形状 的光纤端部的锐化部分。 本发明提供一种透射紫外线的光纤，该光纤具有含有给定含氟量的二氧化硅玻璃的核心5和含有给定含量的氟或硼的二氧化硅玻璃的包层6a，树脂的包层6b 透射紫外线或具有空气孔H的包层6c。包层可以涂覆有保护层，并且还具有用于保护的覆盖层。 特别地，当用氢处理时，芯，包层和保护层对于紫外线具有高的透射率和耐紫外线的照射。 光纤探头1具有光纤2，其端部具有锐化部分3，该蚀刻部分用蚀刻剂溶液锐化，锐化部分3涂覆有遮光金属膜4。
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公开(公告)号：US4840653A
公开(公告)日：1989-06-20
申请号：US246954
申请日：1988-09-19
Applicant: Eliezer M. Rabinovich
Inventor： Eliezer M. Rabinovich
IPC: C03B19/12 , C03B19/14 , C03B37/014 , C03B37/016 , C03C1/00 , C03C3/06
CPC classification number: C03B19/1453 , C03B19/12 , C03B37/01446 , C03B37/016 , C03C1/006 , C03C3/06 , C03B2201/12 , C03B2201/14 , C03C2201/12 , C03C2201/14 , C03C2203/20 , Y10S65/16 , Y10S65/901
Abstract: Incorporation of fluorine into a porous silica body, such as an unsintered body produced by a sol-gel method, by VAD or OVPO, reduces or eliminates bubble or pore formation upon re-heating of the glass formed by sintering of the porous material. Effective fluorine concentrations are between 0.01 and 5% by weight. The invention can be used advantageously in producing preforms and optical fiber.
Abstract translation: 通过VAD或OVPO将氟引入多孔二氧化硅体，例如通过溶胶 - 凝胶法制造的未烧结体，减少或消除了通过多孔材料烧结形成的玻璃的再加热时的气泡或孔形成。 有效氟浓度为0.01〜5重量％。 本发明可有利地用于生产预成型件和光纤。
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公开(公告)号：US20170349478A1
公开(公告)日：2017-12-07
申请号：US15686313
申请日：2017-08-25
Applicant: Corning Incorporated
IPC: C03C3/076 , C03B19/14 , C03B25/00 , C03C23/00 , C03B19/12 , C03C3/089 , C03C3/112 , C03C3/06 , C03B25/02
CPC classification number: C03C3/076 , C03B19/12 , C03B19/1453 , C03B25/00 , C03B25/02 , C03B2201/10 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C3/089 , C03C3/112 , C03C23/007 , C03C2201/10 , C03C2201/12 , C03C2201/14 , C03C2203/52
Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
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公开(公告)号：US20160168010A1
公开(公告)日：2016-06-16
申请号：US14958024
申请日：2015-12-03
Applicant: Corning Incorporated
Inventor： Sezhian Annamalai , Carlos Alberto Duran , Kenneth Edward Hrdina
CPC classification number: C03C3/06 , C03B19/1453 , C03B19/1461 , C03B25/02 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/14 , C03B2201/23 , C03B2201/32 , C03B2201/40 , C03B2201/42 , C03B2201/50 , C03B2201/54 , C03C3/112 , C03C4/00 , C03C2201/12 , C03C2201/14 , C03C2201/32 , C03C2201/40 , C03C2201/42 , C03C2201/50 , C03C2201/54 , C03C2203/52
Abstract: A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.
Abstract translation: 提供掺杂二氧化硅 - 二氧化钛玻璃制品，其包括具有玻璃组合物的玻璃制品，所述玻璃组合物包含（i）二氧化硅 - 二氧化钛基底玻璃，（ii）氟掺杂剂和（iii）第二掺杂剂。 氟掺杂剂的氟浓度高达5wt。 ％，第二掺杂剂包含一种或多种选自Al，Nb，Ta，B，Na，K，Mg，Ca和Li氧化物的氧化物，其总氧化物浓度为50ppm至6wt。 ％。 此外，玻璃制品在20℃下具有小于0.5ppb / K 2的膨胀斜率。第二掺杂剂可以是任选的。 玻璃制品的组成也可以含有小于100ppm的OH浓度。
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Patent Agency Ranking
6.发明申请DOPED SILICA-TITANIA GLASS HAVING LOW EXPANSIVITY AND METHODS OF MAKING THE SAME 有权具有低膨胀性的二氧化硅 - 钛酸钠玻璃及其制造方法公开(公告)号：US20160145147A1
公开(公告)日：2016-05-26
申请号：US14950374
申请日：2015-11-24
Applicant: CORNING INCORPORATED
Inventor： Sezhian Annamalai , Carlos Alberto Duran , Kenneth Edward Hrdina , Lisa Anne Moore
CPC classification number: C03C3/112 , C03B5/225 , C03B19/02 , C03B25/00 , C03B25/02 , C03B2201/10 , C03B2201/12 , C03B2201/14 , C03B2201/42 , C03C3/06 , C03C3/089 , C03C3/115 , C03C21/007 , C03C23/007 , C03C2201/10 , C03C2201/12 , C03C2201/14 , C03C2201/23 , C03C2201/30 , C03C2201/42 , C03C2203/10 , C03C2203/54 , G03F1/22
Abstract: A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.
Abstract translation: 提供了形成掺杂二氧化硅 - 二氧化钛玻璃的方法。 该方法包括混合包含二氧化硅，二氧化钛和至少一种掺杂剂的批料。 该方法还包括加热批料以形成玻璃熔体。 该方法还包括固化玻璃熔体以形成玻璃制品，并对玻璃制品进行退火。
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公开(公告)号：US08012653B2
公开(公告)日：2011-09-06
申请号：US12490833
申请日：2009-06-24
Applicant: Akio Koike , Ken Ebihara
Inventor： Akio Koike , Ken Ebihara
IPC: G03F1/00
CPC classification number: G03F1/24 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B19/1453 , C03B19/1469 , C03B19/1492 , C03B2201/21 , C03B2201/42 , C03C3/06 , C03C2201/14 , C03C2201/21 , C03C2201/23 , C03C2201/42 , Y02P40/57
Abstract: A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided.A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12 mass % of TiO2, wherein the surface roughness (rms) in a surface quality area of the substrate is at most 2 nm, and the maximum variation (PV) of the stress in the surface quality area of the substrate is at most 0.2 MPa.
Abstract translation: 提供了适用于EUV掩模或EUV掩模坯料并且具有优异的平面度的基板。 由含有1〜12质量％的TiO 2的二氧化硅玻璃构成的EUV掩模坯的基板，其中，所述基板的表面质量区域的表面粗糙度（rms）为2nm以下，最大变化量 基板的表面质量区域的应力的最大值（PV）为0.2MPa以下。
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公开(公告)号：US20190248696A1
公开(公告)日：2019-08-15
申请号：US16390139
申请日：2019-04-22
Applicant: Corning Incorporated
IPC: C03C3/076 , C03C3/06 , C03C3/112 , C03B19/12 , C03C3/089 , C03C23/00 , C03B19/14 , C03B25/00 , C03B25/02
CPC classification number: C03C3/076 , C03B19/12 , C03B19/1453 , C03B25/00 , C03B25/02 , C03B2201/10 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C3/089 , C03C3/112 , C03C23/007 , C03C2201/10 , C03C2201/12 , C03C2201/14 , C03C2203/52
Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
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公开(公告)号：US09611169B2
公开(公告)日：2017-04-04
申请号：US14958024
申请日：2015-12-03
Applicant: Corning Incorporated
Inventor： Sezhian Annamalai , Carlos Alberto Duran , Kenneth Edward Hrdina
CPC classification number: C03C3/06 , C03B19/1453 , C03B19/1461 , C03B25/02 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/14 , C03B2201/23 , C03B2201/32 , C03B2201/40 , C03B2201/42 , C03B2201/50 , C03B2201/54 , C03C3/112 , C03C4/00 , C03C2201/12 , C03C2201/14 , C03C2201/32 , C03C2201/40 , C03C2201/42 , C03C2201/50 , C03C2201/54 , C03C2203/52
Abstract: A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.
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公开(公告)号：US20160236965A1
公开(公告)日：2016-08-18
申请号：US15003115
申请日：2016-01-21
Applicant: Corning Incorporated
CPC classification number: C03C3/076 , C03B19/12 , C03B19/1453 , C03B25/00 , C03B25/02 , C03B2201/10 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C3/089 , C03C3/112 , C03C23/007 , C03C2201/10 , C03C2201/12 , C03C2201/14 , C03C2203/52
Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
Abstract translation: 改性二氧化钛 - 二氧化硅玻璃和通过退火处理制备的玻璃的退火处理。 退火处理包括促进由玻璃中改性剂浓度不均匀引起的虚构温度不均匀性均衡的等温保持。 退火处理还可以包括在等温保持之后将玻璃加热到更高的温度，并将玻璃保持在该温度下几个小时。 通过退火处理产生的玻璃表现出CTE，CTE斜率和假想温度的高空间均匀性，包括在存在空间不均匀的改性剂浓度的情况下。
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