公开(公告)号：US20060170934A1

公开(公告)日：2006-08-03

申请号：US11046146

申请日：2005-01-28

申请人： Carl Picciotto ,  William Tong ,  Jun Gao

发明人： Carl Picciotto ,  William Tong ,  Jun Gao

IPC分类号： G01B11/00 ,  G01B11/14

CPC分类号： G01B11/002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7003 ,  G03F9/7088 ,  G03F9/7092

摘要： Determining a dimensional change in a surface of an object is described. At a first time, a first image of the surface is acquired at a first spatial window thereon having a first known position relative to a frame of reference. At a second time, a second image of the surface is acquired at a second spatial window thereon having a second known position relative to the frame of reference. The first image and the second image are processed according to an image displacement sensing algorithm to determine a relative translation of a first point on the surface between the first and second times. The relative translation of the first point, the first known position, and the second known position are used to determine the dimensional change in the surface between the first and second times.

摘要翻译： 描述确定物体表面中的尺寸变化。 在第一时间，在其上具有相对于参照系的第一已知位置的第一空间窗口处获取表面的第一图像。 在第二时间，在其上具有相对于参考框架的第二已知位置的第二空间窗口处获取表面的第二图像。 根据图像位移检测算法处理第一图像和第二图像，以确定第一次和第二次之间表面上的第一点的相对平移。 使用第一点，第一已知位置和第二已知位置的相对平移来确定第一次和第二次之间的表面中的尺寸变化。

公开(公告)号：US20060110069A1

公开(公告)日：2006-05-25

申请号：US10995837

申请日：2004-11-23

申请人： William Tong ,  Wei Wu ,  Jun Gao ,  Carl Picciotto

发明人： William Tong ,  Wei Wu ,  Jun Gao ,  Carl Picciotto

IPC分类号： G06K9/32 ,  G06K9/36

CPC分类号： G06T7/0004

摘要： Using an imaging system in relation to a plurality of material layers in an initial alignment state is provided, a first of the plurality of material layers at least partially obscuring a second of the plurality of material layers in the initial alignment state. The first material layer is moved from a first position corresponding to the initial alignment state to a second position out of a field of view of the imaging system, and a first image of the second material layer is stored. The first material layer is moved back the first position to restore the initial alignment state. A second image of the first material layer is acquired. The second image and the stored first image are processed to determine the initial alignment state.

摘要翻译： 提供了在初始对准状态下相对于多个材料层使用成像系统，多个材料层中的第一个在初始对准状态下至少部分地遮蔽多个材料层中的第二个材料层。 第一材料层从对应于初始取向状态的第一位置移动到成像系统的视野外的第二位置，并且存储第二材料层的第一图像。 第一材料层被移回第一位置以恢复初始对准状态。 获取第一材料层的第二图像。 处理第二图像和存储的第一图像以确定初始对准状态。

公开(公告)号：US20060043626A1

公开(公告)日：2006-03-02

申请号：US10931672

申请日：2004-09-01

申请人： Wei Wu ,  William Tong ,  Jun Gao ,  Carl Picciotto

发明人： Wei Wu ,  William Tong ,  Jun Gao ,  Carl Picciotto

IPC分类号： B29C59/02

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint apparatus and method employ an effective pressure in imprint lithography. The imprint apparatus includes a compressible chamber that encloses an imprint mold having a mold pattern and a sample to be imprinted. The chamber is compressed to imprint the mold pattern on the sample. The mold is pressed against the sample with the effective pressure. The effective pressure is controlled by a selected ratio of a cavity area of the chamber to a contact area between the mold and the sample.

摘要翻译： 压印设备和方法在压印光刻中采用有效压力。 压印装置包括可压缩室，其包围具有模具图案和要印刷的样品的压印模具。 压缩室以将模具图案压印在样品上。 模具以有效的压力压在样品上。 有效压力通过腔室的空腔面积与模具和样品之间的接触面积的选定比例来控制。

公开(公告)号：US20080175518A1

公开(公告)日：2008-07-24

申请号：US11625500

申请日：2007-01-22

申请人： Carl Picciotto ,  Jun Gao

发明人： Carl Picciotto ,  Jun Gao

IPC分类号： G06K9/32

CPC分类号： G06T7/30 ,  G06T2207/30148

摘要： A system including a data acquisition system and a processing system is provided. The data acquisition system has a fixed position relative to a first substrate with a first pattern. The data acquisition system is configured to capture a reference frame that includes the first pattern and capture a first comparison frame that includes a second pattern on a second substrate, where the second pattern is substantially identical to the first pattern, subsequent to a relative position between the first and the second substrates being established such that the first and the second substrates to at least partially overlap. The processing system configured to calculate a first distance between the first pattern in the reference frame and the second pattern in the first comparison frame and determine whether the first distance indicates that the first pattern is substantially aligned with the second pattern.

摘要翻译： 提供了一种包括数据采集系统和处理系统的系统。 数据采集​​系统具有相对于具有第一图案的第一基板的固定位置。 数据采集​​系统被配置为捕获包括第一图案的参考帧，并在第二基板上捕获包括第二图案的第一比较帧，其中第二图案基本上与第一图案基本相同， 第一和第二基底被建立为使得第一和第二基底至少部分重叠。 所述处理系统被配置为计算所述参考帧中的所述第一图案与所述第一比较帧中的所述第二图案之间的第一距离，并且确定所述第一距离是否指示所述第一图案基本上与所述第二图案对齐。

公开(公告)号：US07830498B2

公开(公告)日：2010-11-09

申请号：US11548216

申请日：2006-10-10

申请人： Jun Gao ,  Wei Wu ,  Carl Picciotto

发明人： Jun Gao ,  Wei Wu ,  Carl Picciotto

IPC分类号： G03B27/20 ,  G03B27/02 ,  G03B27/58 ,  G03B27/60 ,  G03B27/62 ,  G03B27/64

CPC分类号： G03F7/2014 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A contact lithography apparatus, system and method use a hydraulic deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart proximal orientation of lithographic elements, and a hydraulic force member that provides the hydraulic deformation. One or more of the lithographic elements and the spacer is deformable, such that hydraulic deformation thereof facilitates the pattern transfer.

摘要翻译： 接触式光刻设备，系统和方法使用液压变形来促进图案转印。 装置，系统和方法包括提供光刻元件的间隔开的近端取向的间隔件，以及提供液压变形的液压力构件。 一个或多个光刻元件和间隔件是可变形的，使得其液压变形有利于图案转印。

公开(公告)号：US20080095407A1

公开(公告)日：2008-04-24

申请号：US11584074

申请日：2006-10-20

申请人： Duncan Stewart ,  Carl Picciotto ,  Jun Gao

发明人： Duncan Stewart ,  Carl Picciotto ,  Jun Gao

IPC分类号： G06K9/00 ,  G06K9/36

CPC分类号： G06K9/3216 ,  G06K2009/3225 ,  G06K2209/19 ,  G06T7/33 ,  G06T2207/30148

摘要： A method for determining an offset vector. The method includes obtaining an image of a first feature. An image of a second feature is also obtained. Also, a combination image of the first feature and the second feature is obtained. A plurality of composite images is utilized to determine an accurate offset vector between the first feature and the second feature in the combination image. The plurality of composite images is based on the image of the first feature and the image of the second feature.

摘要翻译： 一种用于确定偏移矢量的方法。 该方法包括获得第一特征的图像。 还获得第二特征的图像。 此外，获得第一特征和第二特征的组合图像。 使用多个合成图像来确定组合图像中第一特征和第二特征之间的精确偏移矢量。 多个合成图像基于第一特征的图像和第二特征的图像。

公开(公告)号：US20060047473A1

公开(公告)日：2006-03-02

申请号：US10930614

申请日：2004-08-31

申请人： Carl Picciotto ,  Jun Gao ,  Wei Wu

发明人： Carl Picciotto ,  Jun Gao ,  Wei Wu

IPC分类号： G01B21/02

CPC分类号： G06T7/20 ,  G06T7/70

摘要： A displacement estimation system comprising a data acquisition system and a processing system is provided. The data acquisition system is configured to capture a first frame from a first substrate including a first pattern and a second substrate including a second pattern at a first time and capture a second frame from a third substrate including a third pattern and a fourth substrate including a fourth pattern at a second time subsequent to the first time. The first pattern and the third pattern are substantially identical, and the second pattern and the fourth pattern are substantially identical. The processing system is configured to calculate a first displacement between the first pattern and the third pattern using the first frame and the second frame and calculate a second displacement between the second pattern and the fourth pattern using the first frame and the second frame.

摘要翻译： 提供一种包括数据采集系统和处理系统的位移估计系统。 数据采集​​系统被配置为在第一时间从包括第一图案的第一基板和包括第二图案的第二基板捕获第一帧，并从包括第三图案的第三基板和包括第三图案的第四基板捕获第二帧 第四模式在第一次之后的第二时间。 第一图案和第三图案基本相同，第二图案和第四图案基本相同。 处理系统被配置为使用第一帧和第二帧来计算第一图案和第三图案之间的第一位移，并且使用第一帧和第二帧计算第二图案和第四图案之间的第二位移。

公开(公告)号：US20060045313A1

公开(公告)日：2006-03-02

申请号：US10931414

申请日：2004-08-31

申请人： Jun Gao ,  Carl Picciotto

发明人： Jun Gao ,  Carl Picciotto

IPC分类号： G06K9/00

CPC分类号： G01B11/002 ,  G06T7/262 ,  G06T7/37

摘要： A measurement process or system transforms image data corresponding to images of an object to the frequency domain and analyzes the frequency domain data to determine a displacement of the object occurring between first and second images. Analysis in the frequency domain simplifies identification and handling of data expected to be noisy. In particular, frequencies corresponding to modes of vibration, lighting variation, or sensor error characteristic of a measurement system or frequencies corresponding to small magnitude frequency-domain data can be given little or no weighting in analysis that provides the displacement measurement. In one embodiment, Fourier transforms of shifted and unshifted images differ by a phase delay. A least square fit slope of the phase values associated with the phase delay can indicate displacements to accuracies less than 1% of a pixel width, thereby providing nanometer scale precision using imaging systems having a pixel width of about 1 μm.

公开(公告)号：US07641468B2

公开(公告)日：2010-01-05

申请号：US10931672

申请日：2004-09-01

申请人： Wei Wu ,  William M. Tong ,  Jun Gao ,  Carl Picciotto

发明人： Wei Wu ,  William M. Tong ,  Jun Gao ,  Carl Picciotto

IPC分类号： B29D17/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint apparatus and method employ an effective pressure in imprint lithography. The imprint apparatus includes a compressible chamber that encloses an imprint mold having a mold pattern and a sample to be imprinted. The chamber is compressed to imprint the mold pattern on the sample. The mold is pressed against the sample with the effective pressure. The effective pressure is controlled by a selected ratio of a cavity area of the chamber to a contact area between the mold and the sample.

摘要翻译： 压印设备和方法在压印光刻中采用有效压力。 压印装置包括可压缩室，其包围具有模具图案和要印刷的样品的压印模具。 压缩室以将模具图案压印在样品上。 模具以有效的压力压在样品上。 有效压力通过腔室的空腔面积与模具和样品之间的接触面积的选定比例来控制。

公开(公告)号：US20070043465A1

公开(公告)日：2007-02-22

申请号：US11209134

申请日：2005-08-22

申请人： Carl Picciotto ,  Jun Gao ,  Ronald Hellekson ,  Judson Leiser

发明人： Carl Picciotto ,  Jun Gao ,  Ronald Hellekson ,  Judson Leiser

IPC分类号： G06F19/00

CPC分类号： G03F9/7003 ,  G03F7/70616 ,  G03F7/70725 ,  Y10S438/975

摘要： A method comprising adjusting a first relative position between a substrate and a fabrication unit by a first shift value, forming a first pattern relative to a first pattern instance on the substrate subsequent to adjusting the first relative position by the first shift value, and calculating a second shift value using a first displacement between the first pattern and the first pattern instance and a second displacement between a second relative position of the first pattern instance with respect to a second pattern instance is provided.