ION SOURCES, SYSTEMS AND METHODS
    5.
    发明申请
    ION SOURCES, SYSTEMS AND METHODS 有权
    离子源,系统和方法

    公开(公告)号:US20130256532A1

    公开(公告)日:2013-10-03

    申请号:US13892772

    申请日:2013-05-13

    IPC分类号: H01J37/304

    摘要: Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like). In certain embodiments, the ion sources, systems and methods can enhance the ability to make tips having desired physical attributes (e.g., the number of atoms on the apex of the tip). This can enhance performance (e.g., increase reliability, stability and the like).

    摘要翻译: 公开了离子源,系统和方法。 在一些实施例中,离子源,系统和方法可以表现出相对较少的不期望的振动和/或可以充分地抑制不需要的振动。 这可以提高性能(例如,增加可靠性,稳定性等)。 在某些实施方案中,离子源,系统和方法可以增强制备具有期望物理属性的尖端的能力(例如尖端顶点上的原子数)。 这可以提高性能(例如,增加可靠性,稳定性等)。