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    Thermoplastic roofing membranes
    3.
    发明申请
    Thermoplastic roofing membranes 审中-公开
    热塑性屋顶膜

    公开(公告)号：US20100167013A1

    公开(公告)日：2010-07-01

    申请号：US12456487

    申请日：2009-06-17

    申请人： Carlos A. Cruz ,  Willi Lau ,  Joseph M. Rokowski

    发明人： Carlos A. Cruz ,  Willi Lau ,  Joseph M. Rokowski

    IPC分类号： B32B3/00

    CPC分类号： B32B27/08 ,  B32B27/304 ,  B32B27/308 ,  B32B2255/24 ,  B32B2272/00 ,  B32B2307/7265 ,  B32B2419/06 ,  E04D5/10 ,  Y10T428/24405

    摘要： The present invention provides thermoplastic roofing membranes comprising particles of crosslinked rubber and an aqueous (co)polymer dispersion. The thermoplastic roofing membranes are formed by combining particles of crosslinked rubber and a suspension polymer dispersion, or a coagulated aqueous latex (co)polymer dispersion, to form a mixture in aqueous dispersion, which aqueous dispersion mixture is subjected to solid state shear pulverization to form materials that can be processed as thermoplastics at crosslinked rubber concentrations of from 10 wt.% to as high as 95 wt.%, based on the total solids of the material. The method may further comprise kneading the pulverized product, followed by extrusion to form roofing membranes.

    摘要翻译： 本发明提供了包含交联橡胶颗粒和含水（共））聚合物分散体的热塑性屋顶膜。 热塑性屋顶膜通过将交联橡胶和悬浮聚合物分散体的颗粒或凝固的水性胶乳（共）聚合物分散体组合以形成水分散体中的混合物而形成，该水性分散体混合物进行固态剪切粉碎以形成 基于材料的总固体，可以以10重量％至高达95重量％的交联橡胶浓度加工成热塑性塑料的材料。 该方法可以进一步包括捏合粉碎产物，然后挤出以形成屋顶膜。

    Elastomer-modified chemical mechanical polishing pad
    4.
    发明授权
    Elastomer-modified chemical mechanical polishing pad 有权
    弹性体改性化学机械抛光垫

    公开(公告)号：US07371160B1

    公开(公告)日：2008-05-13

    申请号：US11644478

    申请日：2006-12-21

    申请人： Carlos A. Cruz ,  David B. James ,  Mary Jo Kulp

    发明人： Carlos A. Cruz ,  David B. James ,  Mary Jo Kulp

    IPC分类号： B24B11/00

    CPC分类号： B24B37/24

    摘要： The chemical mechanical polishing pad is suitable for polishing at least one of semiconductor, optical and magnetic substrates. The polishing pad includes a polymeric matrix with an elastomeric polymer distributed within the polymeric matrix. The polymeric matrix has a glass transition above room temperature; and the elastomeric polymer has an average length of at least 0.1 μm in at least one direction, represents 1 to 45 volume percent of polishing pad and has a glass transition temperature below room temperature. The polishing pad has an increased diamond conditioner cut rate in comparison to a polishing pad formed from the polymeric matrix without the elastomeric polymer.

    摘要翻译： 化学机械抛光垫适用于抛光半导体，光学和磁性基板中的至少一种。 抛光垫包括聚合物基体，其中弹性体聚合物分布在聚合物基质内。 聚合物基体具有高于室温的玻璃化转变; 并且弹性体聚合物在至少一个方向上具有至少0.1μm的平均长度，表示抛光垫的1至45体积％，并且玻璃化转变温度低于室温。 与没有弹性体聚合物的聚合物基质形成的抛光垫相比，抛光垫具有增加的金刚石调节剂切割速率。