Power gating schemes in SOI circuits in hybrid SOI-epitaxial CMOS structures
    1.
    发明申请
    Power gating schemes in SOI circuits in hybrid SOI-epitaxial CMOS structures 有权
    混合SOI外延CMOS结构中SOI电路中的功率门控方案

    公开(公告)号:US20070018248A1

    公开(公告)日:2007-01-25

    申请号:US11184244

    申请日:2005-07-19

    IPC分类号: H01L27/12 H01L21/84

    摘要: Disclosed are a multi-threshold CMOS circuit and a method of designing such a circuit. The preferred embodiment combines an MTCMOS scheme and a hybrid SOI-epitaxial CMOS structure. Generally, the logic transistors (both nFET and pFET) are placed in SOI, preferably in a high-performance, high density UTSOI; while the headers or footers are made of bulk epitaxial CMOS devices, with or without an adaptive well-biasing scheme. The logic transistors are based on (100) SOI devices or super HOT, the header devices are in bulk (100) or (110) pFETs with or without an adaptive well biasing scheme, and the footer devices are in bulk (100) NFET with or without an adaptive well biasing scheme.

    摘要翻译: 公开了一种多阈值CMOS电路和一种设计这种电路的方法。 优选实施例组合MTCMOS方案和混合SOI外延CMOS结构。 通常,逻辑晶体管(nFET和pFET都)放置在SOI中,优选地以高性能,高密度的UTSOI; 而集管或页脚由大量外延CMOS器件制成,具有或不具有自适应阱偏置方案。 逻辑晶体管基于(100)SOI器件或超级HOT,头部器件处于具有或不具有自适应阱偏置方案的体(100)或(110)pFET中,并且脚踏器件处于本体(100)NFET中 或没有自适应井偏置方案。

    High performance PFET header in hybrid orientation technology for leakage reduction in digital CMOS VLSI designs
    2.
    发明申请
    High performance PFET header in hybrid orientation technology for leakage reduction in digital CMOS VLSI designs 失效
    用于混合定向技术的高性能PFET接头,用于数字CMOS VLSI设计中的漏电减少

    公开(公告)号:US20060226493A1

    公开(公告)日:2006-10-12

    申请号:US11100883

    申请日:2005-04-07

    IPC分类号: H01L29/94

    摘要: Discloses are CMOS circuit designs that combine MTCMOS and hybrid orientation technology to achieve the dual objectives of high performance and low standby leakage power. The invention utilizes novel combinations of a thick-oxide high-VTH PFET header with various gate- and body-biased schemes in HOT technology to significantly reduce the performance penalty associated with conventional PFET headers. A first embodiment of the invention provides a HOT-B high-VTH thick oxide bulk PFET header scheme. This header scheme can be expanded by application of a positive gate bias VPOS (VPOS>VDD) to the HOT-B PFET header during standby mode and a negative gate bias VNEG (VNEG

    摘要翻译: 公开了结合MTCMOS和混合定向技术的CMOS电路设计,以实现高性能和低待机泄漏功率的双重目标。 本发明利用HOT技术中的厚氧化物高VTH PFET集线器的新型组合与各种栅极和体偏置方案,以显着降低与常规PFET集管相关的性能损失。 本发明的第一实施例提供了一种HOT-B高VTH厚氧化物体PFET头方案。 可以通过在待机模式期间将正栅极偏置VPOS(VPOS> VDD)施加到HOT-B PFET头并且在活动模式下使用负栅极偏置VNEG(VNEG

    Power gating schemes in SOI circuits in hybrid SOI-epitaxial CMOS structures
    3.
    发明授权
    Power gating schemes in SOI circuits in hybrid SOI-epitaxial CMOS structures 有权
    混合SOI外延CMOS结构中SOI电路中的功率门控方案

    公开(公告)号:US07342287B2

    公开(公告)日:2008-03-11

    申请号:US11184244

    申请日:2005-07-19

    IPC分类号: H01L27/092

    摘要: Disclosed are a multi-threshold CMOS circuit and a method of designing such a circuit. The preferred embodiment combines an MTCMOS scheme and a hybrid SOI-epitaxial CMOS structure. Generally, the logic transistors (both nFET and pFET) are placed in SOI, preferably in a high-performance, high density UTSOI; while the headers or footers are made of bulk epitaxial CMOS devices, with or without an adaptive well-biasing scheme. The logic transistors are based on (100) SOI devices or super HOT, the header devices are in bulk (100) or (110) pFETs with or without an adaptive well biasing scheme, and the footer devices are in bulk (100) NFET with or without an adaptive well biasing scheme.

    摘要翻译: 公开了一种多阈值CMOS电路和一种设计这种电路的方法。 优选实施例组合MTCMOS方案和混合SOI外延CMOS结构。 通常,逻辑晶体管(nFET和pFET都)放置在SOI中,优选地以高性能,高密度的UTSOI; 而集管或页脚由大量外延CMOS器件制成,具有或不具有自适应阱偏置方案。 逻辑晶体管基于(100)SOI器件或超级HOT,头部器件处于具有或不具有自适应阱偏置方案的体(100)或(110)pFET中,并且脚踏器件处于本体(100)NFET中 或没有自适应井偏置方案。

    Method of reducing leakage current in sub one volt SOI circuits
    4.
    发明申请
    Method of reducing leakage current in sub one volt SOI circuits 有权
    降低亚一伏SOI电路漏电流的方法

    公开(公告)号:US20050040881A1

    公开(公告)日:2005-02-24

    申请号:US10644211

    申请日:2003-08-20

    IPC分类号: H03K19/00 H03K3/01

    CPC分类号: H03K19/0016

    摘要: A multi-threshold integrated circuit (IC) with reduced subthreshold leakage and method of reducing leakage. Selectable supply switching devices (NFETs and/or PFETS) between a logic circuit and supply connections (Vdd and Ground) for the circuit have higher thresholds than normal circuit devices. Some devices may have thresholds lowered when the supply switching devices are on. Header/footer devices with further higher threshold voltages and widths may be used to further increase off resistance and maintain/reduce on resistance. Alternatively, high threshold devices may be stacked to further reduce leakage to a point achieved for an even higher threshold. Intermediate supply connects at the devices may have decoupling capacitance and devices may be tapered for optimum stack height and an optimum taper ratio to minimize circuit leakage and circuit delay.

    摘要翻译: 具有降低的亚阈值泄漏的多阈值集成电路(IC)和减少泄漏的方法。 电路逻辑电路和电源连接(Vdd和Ground)之间的可选供电开关器件(NFET和/或PFETS)具有比正常电路器件更高的阈值。 当供电开关装置打开时,一些装置可能具有降低的阈值。 具有更高阈值电压和宽度的标题/页脚装置可用于进一步降低电阻和保持/降低电阻。 或者,可以堆叠高阈值装置以进一步将泄漏减少到达到甚至更高阈值所达到的点。 中间电源连接在器件上可能具有去耦电容,器件可以锥形化,以获得最佳堆叠高度和最佳锥度比,以最大限度地减少电路泄漏和电路延迟。

    High-density low-power data retention power gating with double-gate devices
    5.
    发明申请
    High-density low-power data retention power gating with double-gate devices 有权
    具有双栅极器件的高密度低功耗数据保持功率门控

    公开(公告)号:US20060232321A1

    公开(公告)日:2006-10-19

    申请号:US11106913

    申请日:2005-04-15

    IPC分类号: H03K17/687

    摘要: A new power gating structure with robust data retention capability using only one single double-gate device to provide both power gating switch and virtual supply/ground diode clamp functions. The scheme reduces the transistor count, area, and capacitance of the power gating structure, thus improving circuit performance, power, and leakage. The scheme is compared with the conventional power gating structure via mixed-mode physics-based two-dimensional numerical simulations. Analysis of virtual supply/ground bounce for the proposed scheme is also presented.

    摘要翻译: 具有强大数据保持能力的新型电源门控结构,仅使用一个单栅极器件来提供电源门控开关和虚拟电源/接地二极管钳位功能。 该方案降低了电源门控结构的晶体管数量,面积和电容,从而提高了电路性能,功率和泄漏。 该方案通过基于混合模式物理的二维数值模拟与常规电力门控结构进行比较。 还提出了拟议方案的虚拟供应/地面反弹分析。

    Gate oxide breakdown-withstanding power switch structure
    6.
    发明授权
    Gate oxide breakdown-withstanding power switch structure 有权
    栅极氧化物击穿电源开关结构

    公开(公告)号:US08385149B2

    公开(公告)日:2013-02-26

    申请号:US13075682

    申请日:2011-03-30

    IPC分类号: G11C5/14

    CPC分类号: G11C11/417

    摘要: The present invention proposes a gate oxide breakdown-withstanding power switch structure, which is connected with an SRAM and comprises a first CMOS switch and a second CMOS switch respectively having different gate-oxide thicknesses or different threshold voltages. The CMOS switch, which has a normal gate-oxide thickness or a normal threshold voltage, provides current for the SRAM to wake up the SRAM from a standby or sleep mode to an active mode. The CMOS switch, which has a thicker gate-oxide thickness or a higher threshold voltage, provides current for the SRAM to work in an active mode. The present invention prevents a power switch from gate-oxide breakdown lest noise margin, stabilization and performance of SRAM be affected.

    摘要翻译: 本发明提出一种栅极氧化物击穿电源开关结构,其与SRAM连接,并且包括分别具有不同栅极氧化物厚度或不同阈值电压的第一CMOS开关和第二CMOS开关。 具有正常栅极氧化物厚度或正常阈值电压的CMOS开关为SRAM提供电流,以将SRAM从待机或睡眠模式唤醒至活动模式。 具有更厚栅极氧化物厚度或更高阈值电压的CMOS开关为SRAM提供工作在主动模式的电流。 本发明防止电源开关从栅极氧化层击穿,以免噪声容限,SRAM的稳定性和性能受到影响。

    Data-aware dynamic supply random access memory
    7.
    发明授权
    Data-aware dynamic supply random access memory 有权
    数据感知动态供应随机存取存储器

    公开(公告)号:US08345504B2

    公开(公告)日:2013-01-01

    申请号:US13009240

    申请日:2011-01-19

    IPC分类号: G11C11/40

    CPC分类号: G11C11/413 G11C11/412

    摘要: A Random Access Memory (RAM) with a plurality of cells is provided. In an embodiment, the cells of a same column are coupled to a same pair of bit-lines and are associated to a same power controller. Each cell has two inverters; the power controller has two power-switches. For the cells of the same column, the two power-switches respectively perform independent supply voltage controls for the two inverters in each cell according to data-in voltages of the bit-lines during Write operation.

    摘要翻译: 提供具有多个单元的随机存取存储器(RAM)。 在一个实施例中,同一列的单元耦合到同一对位线并且与相同的功率控制器相关联。 每个电池有两个逆变器; 电源控制器有两个电源开关。 对于同一列的单元,两个电源开关根据写操作期间位线的数据输入电压分别对每个单元中的两个反相器执行独立的电源电压控制。

    Schmitt trigger-based finFET SRAM cell
    8.
    发明授权
    Schmitt trigger-based finFET SRAM cell 有权
    施密特触发器finFET SRAM单元

    公开(公告)号:US08169814B2

    公开(公告)日:2012-05-01

    申请号:US12876582

    申请日:2010-09-07

    IPC分类号: G11C11/00

    CPC分类号: G11C11/412 H01L29/785

    摘要: The present invention provides a Schmitt trigger-based FinFET static random access memory (SRAM) cell, which is an 8-FinFET structure. A FinFET has the functions of two independent gates. The new SRAM cell uses only 8 FinFET per cell, compared with the 10-FinFET structure in previous works. As a result, the cell structure of the present invention can save chip area and raise chip density. Furthermore, this new SRAM cell can effectively solve the conventional problem that the 6T SRAM cell is likely to have read errors at a low operating voltage.

    摘要翻译: 本发明提供了一种基于施密特触发器的FinFET静态随机存取存储器(SRAM)单元,其是8-FinFET结构。 FinFET具有两个独立门的功能。 与之前的工作中的10-FinFET结构相比,新的SRAM单元仅使用8个FinFET。 结果,本发明的电池结构可以节省芯片面积并且提高芯片密度。 此外,这种新的SRAM单元可以有效地解决6T SRAM单元在低工作电压下可能具有读出错误的常规问题。

    Methods and apparatus for varying a supply voltage or reference voltage using independent control of diode voltage in asymmetrical double-gate devices
    9.
    发明授权
    Methods and apparatus for varying a supply voltage or reference voltage using independent control of diode voltage in asymmetrical double-gate devices 有权
    使用不对称双栅极器件中二极管电压的独立控制来改变电源电压或参考电压的方法和装置

    公开(公告)号:US07952422B2

    公开(公告)日:2011-05-31

    申请号:US12511658

    申请日:2009-07-29

    IPC分类号: H03K3/01

    摘要: Methods and apparatus are provided for varying one or more of a supply voltage and reference voltage in an integrated circuit, using independent control of a diode voltage in an asymmetrical double-gate device. An integrated circuit is provided that is controlled by one or more of a supply voltage and a reference voltage. The integrated circuit comprises an independently controlled asymmetrical double-gate device to adjust one or more of the supply voltage and the reference voltage. The independent control may comprise, for example, a back gate bias. The independently controlled asymmetrical double-gate device may be employed in a number of applications, including voltage islands, static RAM, and to improve the power and performance of a processing unit.

    摘要翻译: 提供了用于在集成电路中改变电源电压和参考电压中的一个或多个的方法和装置,使用对不对称双栅极器件中的二极管电压的独立控制。 提供由电源电压和参考电压中的一个或多个控制的集成电路。 集成电路包括独立控制的非对称双栅极器件,用于调节电源电压和参考电压中的一个或多个。 独立控制可以包括例如背栅偏置。 独立控制的非对称双栅极器件可以用于包括电压岛,静态RAM在内的许多应用中,并且用于改善处理单元的功率和性能。

    Independent-gate controlled asymmetrical memory cell and memory using the cell
    10.
    发明授权
    Independent-gate controlled asymmetrical memory cell and memory using the cell 失效
    独立门控制的非对称存储单元和使用单元的存储器

    公开(公告)号:US07787285B2

    公开(公告)日:2010-08-31

    申请号:US12140366

    申请日:2008-06-17

    IPC分类号: G11C11/00

    CPC分类号: G11C11/412

    摘要: Techniques are provided for employing independent gate control in asymmetrical memory cells. A memory circuit, such as an SRAM circuit, can include a number of bit line structures, a number of word line structures that intersect the bit line structures to form a number of cell locations, and a number of asymmetrical memory cells located at the cell locations. Each of the asymmetrical cells can be selectively coupled to a corresponding one of the bit line structures under control of a corresponding one of the word line structures. Each of the cells can include a number of field effect transistors (FETS), and at least one of the FETS can be configured with separately biased front and back gates. One gate can be biased separately from the other gate in a predetermined manner to enhance read stability of the asymmetrical cell.

    摘要翻译: 提供了在不对称存储单元中采用独立门控制的技术。 诸如SRAM电路的存储器电路可以包括多个位线结构,与位线结构相交以形成多个单元位置的多个字线结构以及位于单元的多个非对称存储单元 位置。 在对应的一个字线结构的控制下,每个非对称单元可以选择性地耦合到位线结构中的对应的一个。 每个单元可以包括多个场效应晶体管(FETS),并且FETS中的至少一个可以被配置为单独偏置的前门和后门。 一个栅极可以以预定的方式与另一个栅极分开偏置,以增强不对称单元的读取稳定性。