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公开(公告)号：US06978189B1
公开(公告)日：2005-12-20
申请号：US10156450
申请日：2002-05-28
CPC分类号： H01L21/67288 , H01L21/67253
摘要： A method and an apparatus for matching data related to an integrated metrology tool and a standalone metrology tool. At least one semiconductor wafer is processed. An integrated metrology tool and/or a standalone metrology tool is matched based upon a difference between metrology data relating to a processed semiconductor wafer acquired by the integrated metrology tool and metrology data acquired by the standalone metrology tool, using a controller.
摘要翻译： 一种用于匹配与综合计量工具相关的数据的方法和装置以及独立计量工具。 至少一个半导体晶片被处理。 基于与由综合计量工具获得的经处理的半导体晶片相关的度量数据与使用控制器由独立计量工具获取的度量数据之间的差异进行匹配的综合计量工具和/或独立计量工具。
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2.发明授权公开(公告)号：US06912436B1
公开(公告)日：2005-06-28
申请号：US10261156
申请日：2002-09-30
CPC分类号： G05B13/042
摘要： A method and an apparatus for selectively applying correction to a process control. Manufacturing data relating to the processing of a workpiece is acquired. The manufacturing data includes metrology data relating to the processed workpiece. An adjustment for at least a first or a second control input parameter is determined based upon the manufacturing data. The first and second control input parameters are organized to isolate the first control input parameter from the second control input parameter for adjusting at least one of the first and the second control input parameters, using a controller.
摘要翻译： 一种用于选择性地对过程控制应用校正的方法和装置。 获取与工件的处理有关的制造数据。 制造数据包括与加工的工件相关的计量数据。 基于制造数据确定至少第一或第二控制输入参数的调整。 组织第一和第二控制输入参数以将第一控制输入参数与第二控制输入参数隔离，以使用控制器调整第一和第二控制输入参数中的至少一个。
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公开(公告)号：US07069103B1
公开(公告)日：2006-06-27
申请号：US10184814
申请日：2002-06-28
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32198 , G05B2219/32201 , G05B2219/45031 , Y02P90/22
摘要： A method and apparatus provided for controlling cumulative wafer effects. The method comprises processing a workpiece, determining a cumulative effect of the processing on the workpiece and comparing the determined cumulative effect to a reference target value. The method further comprises adjusting a downstream process of the workpiece based on comparing the determined cumulative effect to the reference target value.
摘要翻译： 提供用于控制累积晶片效应的方法和装置。 该方法包括处理工件，确定处理对工件的累积效应，并将确定的累积效应与参考目标值进行比较。 该方法还包括基于将确定的累积效应与参考目标值进行比较来调整工件的下游过程。
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公开(公告)号：US06871114B1
公开(公告)日：2005-03-22
申请号：US10231713
申请日：2002-08-30
申请人： Eric O. Green , Matthew A. Purdy , Elfido Coss, Jr. , Christopher A. Bode , Robert J. Chong , Gregory A. Cherry
发明人： Eric O. Green , Matthew A. Purdy , Elfido Coss, Jr. , Christopher A. Bode , Robert J. Chong , Gregory A. Cherry
IPC分类号： G05B19/404 , G06F19/00
CPC分类号： G05B19/404 , G05B2219/37252 , G05B2219/37345 , G05B2219/45031
摘要： A method and an apparatus for adjusting a process controller based upon a fault detection analysis. A process step upon a workpiece is performed using a processing tool. Manufacturing data relating to processing of the workpiece is acquired. The manufacturing data may include metrology data relating to the processed workpiece and/or tool state data relating to the tool state of a processing tool. A metrology/tool state data integration process is performed based upon the acquired manufacturing data. The metrology/tool state data integration process includes performing an assessment of a tool health related to the processing tool and adjusting an emphasis of the metrology data based upon the assessment of the tool health.
摘要翻译： 一种基于故障检测分析调整过程控制器的方法和装置。 使用加工工具进行工件的加工步骤。 获取与工件的加工有关的制造数据。 制造数据可以包括与处理工具有关的计量学数据和/或与加工工具的工具状态有关的刀具状态数据。 基于获取的制造数据执行计量/工具状态数据集成处理。 计量/工具状态数据集成过程包括对与处理工具相关的工具健康进行评估，并且基于对工具健康的评估来调整计量数据的重点。
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公开(公告)号：US08615314B1
公开(公告)日：2013-12-24
申请号：US10932989
申请日：2004-09-02
IPC分类号： G05B13/02
CPC分类号： G05B19/41875 , G05B2219/32182 , G05B2219/45031 , Y02P90/22
摘要： A method, apparatus and a system, for performing a process control using analysis of an upstream process is provided. The method comprises performing a first process on a workpiece and performing a qualitative analysis upon the workpiece relating to the first process, the qualitative analysis comprises analyzing at least one metrology measurement relating to the first process and a workpiece feature to evaluate a characteristic of the workpiece. The method further comprises selecting a process control parameter for performing a second process upon the workpiece based upon the qualitative analysis.
摘要翻译： 提供了一种使用上游处理的分析进行处理控制的方法，装置和系统。 该方法包括对工件执行第一过程并对与第一过程相关的工件执行定性分析，定性分析包括分析与第一过程有关的至少一个度量测量和工件特征以评估工件的特性 。 该方法还包括基于定性分析来选择用于对工件执行第二处理的过程控制参数。
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6.发明授权Method and apparatus for dynamic adjustment of a sampling plan based on wafer electrical test data 有权基于晶片电气测试数据的采样方案的动态调整方法和装置公开(公告)号：US07445945B1
公开(公告)日：2008-11-04
申请号：US11194843
申请日：2005-08-01
CPC分类号： H01L22/14 , H01L21/67253 , H01L21/67276 , H01L2924/0002 , H01L2924/00
摘要： The present invention provides a method and apparatus for dynamic adjustment of a sampling plan. The method includes accessing wafer electrical test data associated with at least one workpiece that has been processed by at least one processing tool. The method also includes determining, based on the wafer electrical test data, at least one sampling plan for at least one measurement device configured to measure at least one parameter associated with workpieces processed by the at least one processing tool.
摘要翻译： 本发明提供一种用于采样计划的动态调整的方法和装置。 该方法包括访问与由至少一个处理工具处理的至少一个工件相关联的晶片电测试数据。 该方法还包括基于晶片电测试数据确定至少一个测量装置的至少一个采样计划，该至少一个测量装置被配置成测量与由至少一个处理工具处理的工件相关联的至少一个参数。
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公开(公告)号：US07424392B1
公开(公告)日：2008-09-09
申请号：US10323502
申请日：2002-12-18
CPC分类号： G05B19/41875 , G05B2219/32135 , G05B2219/32182 , G05B2219/32184 , G05B2219/37224 , G05B2219/41146 , G05B2219/41147 , G05B2219/50065 , Y02P90/22
摘要： A method and an apparatus are provided for applying a self-adaptive filter to a drifting process. The method includes processing a workpiece, measuring an output characteristic of the processed workpiece and modifying a previous estimated process state based at least on the measured output characteristic. The method further includes estimating a next process state based at least on the modified previous estimated process state.
摘要翻译： 提供了一种用于将自适应滤波器应用于漂移过程的方法和装置。 该方法包括处理工件，测量被处理工件的输出特性，以及至少基于所测量的输出特性修改先前的估计过程状态。 该方法还包括至少基于修改的先前估计的处理状态来估计下一处理状态。
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8.发明授权Method and apparatus for updating control state variables of a process control model based on rework data 有权基于返工数据更新过程控制模型的控制状态变量的方法和装置公开(公告)号：US06970757B1
公开(公告)日：2005-11-29
申请号：US09838467
申请日：2001-04-19
申请人： Joyce S. Oey Hewett , Anthony J. Toprac , Christopher A. Bode , Alexander J. Pasadyn , Anastasia Oshelski Peterson , Thomas J. Sonderman , Michael L. Miller
发明人： Joyce S. Oey Hewett , Anthony J. Toprac , Christopher A. Bode , Alexander J. Pasadyn , Anastasia Oshelski Peterson , Thomas J. Sonderman , Michael L. Miller
IPC分类号： G05B19/418 , G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32179 , G05B2219/32228 , G05B2219/45031 , Y02P90/22 , Y02P90/86
摘要： A method for controlling a manufacturing process includes processing a plurality of workpieces in a tool; monitoring a rework rate associated with the workpieces processed in the tool; and initiating an automatic corrective action in response to the rework rate being greater than a predetermined threshold. A manufacturing system includes a tool adapted to process a plurality of workpieces and a rework controller adapted to monitor a rework rate associated with the workpieces processed in the tool and initiate an automatic corrective action in response to the rework rate being greater than a predetermined threshold.
摘要翻译： 一种用于控制制造过程的方法包括在工具中处理多个工件; 监测与工具中处理的工件相关联的返工率; 以及响应于所述返工率大于预定阈值而启动自动校正动作。 制造系统包括适于处理多个工件的工具和适于监测与工具中处理的工件相关联的返工率的返工控制器，并响应于返工率大于预定阈值而启动自动校正动作。
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9.发明授权Method and apparatus for controlling process target values based on manufacturing metrics 失效基于制造指标控制过程目标值的方法和装置公开(公告)号：US06937914B1
公开(公告)日：2005-08-30
申请号：US09789872
申请日：2001-02-21
申请人： Christopher A. Bode , Thomas J. Sonderman , Alexander J. Pasadyn , Anthony J. Toprac , Joyce S. Oey Hewett , Anastasia Oshelski Peterson , Michael L. Miller
发明人： Christopher A. Bode , Thomas J. Sonderman , Alexander J. Pasadyn , Anthony J. Toprac , Joyce S. Oey Hewett , Anastasia Oshelski Peterson , Michael L. Miller
IPC分类号： G05B19/418 , G06F19/00
CPC分类号： G05B19/41865 , G05B2219/32063 , G05B2219/45031 , Y02P90/20 , Y02P90/86
摘要： A method for controlling a tool adapted to process workpieces in accordance with an operating recipe based on a process target value is provided. The method includes collecting manufacturing characteristic data associated with the workpieces; correlating the manufacturing characteristic data with a first manufacturing metric to generate a first manufacturing metric distribution for the workpieces; and adjusting the process target value based on the first manufacturing metric distribution. A manufacturing system includes a processing tool and a target monitor. The processing tool is adapted to process workpieces in accordance with an operating recipe based on a process target value. The target monitor is adapted to collect manufacturing characteristic data associated with the workpieces, correlate the manufacturing characteristic data with a first manufacturing metric to generate a first manufacturing metric distribution for the workpieces, and adjust the process target value based on the first manufacturing metric distribution.
摘要翻译： 提供了一种用于控制适于根据基于过程目标值的操作配方来处理工件的工具的方法。 该方法包括收集与工件相关联的制造特性数据; 将所述制造特征数据与第一制造度量相关联，以产生所述工件的第一制造度量分布; 以及基于所述第一制造度量分布来调整所述过程目标值。 制造系统包括处理工具和目标监视器。 处理工具适于根据基于过程目标值的操作配方来处理工件。 目标监视器适于收集与工件相关联的制造特性数据，将制造特性数据与第一制造度量相关联，以产生工件的第一制造度量分布，并且基于第一制造度量分布来调整过程目标值。
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10.发明授权公开(公告)号：US06615098B1
公开(公告)日：2003-09-02
申请号：US09789871
申请日：2001-02-21
申请人： Christopher A. Bode , Alexander J. Pasadyn , Anthony J. Toprac , Joyce S. Oey Hewett , Anastasia Oshelski Peterson , Thomas J. Sonderman , Michael L. Miller
发明人： Christopher A. Bode , Alexander J. Pasadyn , Anthony J. Toprac , Joyce S. Oey Hewett , Anastasia Oshelski Peterson , Thomas J. Sonderman , Michael L. Miller
IPC分类号： G06F1760
CPC分类号： G05B19/41865 , G05B19/0426 , G05B2219/32129 , G05B2219/36225 , G05B2219/45031 , Y02P90/20
摘要： A method for controlling a manufacturing system includes processing workpieces in a plurality of tools; initiating a baseline control script for a selected tool of the plurality of tools; providing context information for the baseline control script; determining a tool type based on the context information; selecting a control routine for the selected tool based on the tool type; and executing the control routine to generate a control action for the selected tool. A manufacturing system includes a plurality of tools adapted to process workpieces, a control execution manager, and a control executor. The control execution manager is adapted to initiate a baseline control script for a selected tool of the plurality of tools and provide context information for the baseline control script. The control executor is adapted to execute the baseline control script, determine a tool type based on the context information, select a control routine for the selected tool based on the tool type, and execute the control routine to generate a control action for the selected tool.
摘要翻译： 一种用于控制制造系统的方法包括：处理多个工具中的工件; 为所述多个工具的所选择的工具启动基线控制脚本; 提供基线控制脚本的上下文信息; 基于上下文信息确定工具类型; 根据刀具类型选择所选刀具的控制程序; 以及执行所述控制程序以产生所选择的工具的控制动作。 制造系统包括适于处理工件的多个工具，控制执行管理器和控制执行器。 所述控制执行管理器适于启动用于所述多个工具的所选工具的基线控制脚本并提供所述基线控制脚本的上下文信息。 控制执行器适于执行基线控制脚本，基于上下文信息确定工具类型，基于工具类型选择所选刀具的控制程序，并执行控制程序以生成所选刀具的控制动作 。
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