-
公开(公告)号：US06558869B1
公开(公告)日：2003-05-06
申请号：US09558110
申请日：2000-04-25
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare , James Laurence Mulligan , John Andrew Hearson , Carole-Anne Smith , Stuart Bayes , Mark John Spowage
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare , James Laurence Mulligan , John Andrew Hearson , Carole-Anne Smith , Stuart Bayes , Mark John Spowage
IPC分类号： G03F7039
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41M5/368 , B41M5/46 , B41M5/465 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e. the “reversible insolubilizer compound”) such that the aqueous alkaline developer solubility of the composition is increased on heating and the aqueous alkaline developer solubility of the composition is not increased by incident UV radiation. The invention provides a solution to the problem of the relatively narrow solubility differential between imaged and non-imaged areas of heat sensitive positive working radiation sensitive compositions.
摘要翻译： 本发明涉及通过热模式成像来制备抗蚀剂图案的前体，前体包括热敏组合物，其热溶性在碱性显影剂的水溶液中被设置为增加加热区域， 热敏组合物的非加热区域溶解在含水碱性显影剂（“显影剂阻挡装置”）中，其中所述显影剂阻力装置包括一种或多种选自以下的化合物：（A）包括聚 （环氧烷）单元;（B）硅氧烷; 和（C）多元醇的酯，醚和酰胺，其中所述热敏组合物包含水性碱性显影剂可溶性聚合物质（即“活性聚合物”）和降低聚合物质的碱性显影剂水溶液的化合物（ 即“可逆不溶物化合物”），使得组合物的碱性显影剂水溶液在加热时增加，并且组合物的水性碱性显影剂溶解度不会因入射的紫外线辐射而增加。 本发明提供了解决热敏感正性辐射敏感组合物的成像区域和非成像区域之间相对窄的溶解度差异的问题的解决方案。
-
公开(公告)号：US06551763B1
公开(公告)日：2003-04-22
申请号：US09587224
申请日：2000-06-02
申请人： Anthony Paul Kitson , Peter Andrew Reath Bennett , Christopher David McCullough , Stuart Bayes , Kevin Barry Ray
发明人： Anthony Paul Kitson , Peter Andrew Reath Bennett , Christopher David McCullough , Stuart Bayes , Kevin Barry Ray
IPC分类号： G03F7039
CPC分类号： B41M5/368 , H05K3/0082 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/145 , Y10S430/146
摘要： A composition used as a resist in the manufacture of electronic parts, for example printed circuits, and which is rendered soluble in a developer by pattemwise delivery of heat, comprises a polymer and optionally an infrared absorbing compound. However in contrast to conventional compositions no compound is present which alters the solubility of the polymer in an aqueous developer.
摘要翻译： 在电子部件例如印刷电路的制造中用作抗蚀剂的组合物，其通过温度传递热量而变得可溶于显影剂，包括聚合物和任选的红外吸收化合物。 然而，与常规组合物不同，不存在改变聚合物在含水显影剂中的溶解度的化合物。
-
公开(公告)号：US06596469B2
公开(公告)日：2003-07-22
申请号：US09503095
申请日：2000-02-11
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare
IPC分类号： G03C176
CPC分类号： G03F7/2022 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/022 , G03F7/023 , G03F7/0233 , H05K3/0082
摘要： A method of making a mask or an electronic part, for example a printed circuit, comprises the steps of delivering heat in a desired pattern to a precursor of the mask or electronic part, the precursor comprising a surface coated with a coating, the coating comprising a heat-sensitive composition itself comprising an aqueous developer soluble polymeric substance and a compound which reduces the aqueous developer solubility of the polymeric substance, wherein the aqueous developer solubility of the composition is not increased by incident UV radiation but is increased by the delivery of heat; then developing the precursor to remove the heat-sensitive composition in regions to which the heat was delivered. In the case of a printed circuit precursor the surface may be then etched in conventional manner to yield the required printed circuit.
摘要翻译： 制造掩模或电子部件（例如印刷电路）的方法包括以期望的图案将热量输送到掩模或电子部件的前体的步骤，前体包括涂覆有涂层的表面，该涂层包含 包含显影剂可溶性水溶性聚合物的热敏组合物和降低聚合物质的显影剂水溶性的化合物，其中组合物的水性显影剂溶解度不会因入射的紫外线辐射而增加，而是通过传递热而增加 ; 然后展开该前体以在传送热量的区域中除去热敏组合物。 在印刷电路前体的情况下，可以以常规方式蚀刻表面以产生所需的印刷电路。
-
公开(公告)号：US06423456B1
公开(公告)日：2002-07-23
申请号：US09807084
申请日：2001-04-09
IPC分类号： G03F7039
CPC分类号： B41M5/368 , H05K3/0082 , Y10S430/11 , Y10S430/111 , Y10S430/12 , Y10S430/121 , Y10S430/165
摘要： A composition used as a resist in the manufacture of electronic parts, for example printed circuits, and which is rendered soluble in a developer by patternwise delivery of heat, comprises a polymer of general formula (I), wherein R1 represents a hydrogen atom or alkyl group, R2 represents a hydrogen atom or alkyl group, R3 represents a hydrogen atom or alkyl group, and R4 represents hydroxyalkyl group, and wherein the ratio n/m is in the range 10/1 to 1/10.
摘要翻译： 在电子部件例如印刷电路的制造中用作抗蚀剂的组合物通过图案方式传递热量而变得可溶于显影剂中的组合物包含通式（I）的聚合物，其中R 1表示氢原子或烷基 基团，R 2表示氢原子或烷基，R 3表示氢原子或烷基，R 4表示羟烷基，n / m比在10/1〜1/10的范围内。
-
公开(公告)号：US06461795B1
公开(公告)日：2002-10-08
申请号：US09558109
申请日：2000-04-25
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley
IPC分类号： G03F7039
CPC分类号： B41N3/00 , B41M5/368 , H05K3/0082 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： Phenolic resin compositions formulated for use in lithographic exposure processes are given a heat treatment at 40-90° C. for at least 4 hours shortly after their coating onto lithographic substrates, to produce lithographic printing forms. It is found that such a heat treatment improves later exposure processes, in particular by rendering the sensitivity of the compositions less variable, over time.
摘要翻译： 配制用于光刻曝光工艺的酚醛树脂组合物在其涂布在平版印刷基材上不久后在40-90℃下进行至少4小时的热处理，以产生平版印刷形式。 发现这种热处理改进了后续的曝光过程，特别是通过使组合物的灵敏度随时间变化而变小。
-
公开(公告)号：US06537735B1
公开(公告)日：2003-03-25
申请号：US09477893
申请日：2000-01-05
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , Stuart Bayes , Mark John Spowage
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , Stuart Bayes , Mark John Spowage
IPC分类号： G03F730
CPC分类号： G03F7/2022 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/262 , B41M5/368 , B41M5/465 , G03F7/022 , G03F7/023 , G03F7/0233 , H05K3/0082
摘要： The invention is directed to a method for producing a predetermined resist pattern on a substrate. The method includes the patternwise application of infrared radiation to a precursor which contains the substrate, having a coating thereon, wherein the coating contains a positive working composition; and the development of the pattern using a developer. The composition contains a polymeric substance having functional groups Q thereon, such that the functionalized polymeric substance has the property that it is developer insoluble prior to delivery of infrared radiation and developer soluble thereafter.
摘要翻译： 本发明涉及一种在基板上制造预定抗蚀剂图案的方法。 该方法包括将红外辐射图案化地应用于含有基材的前体，其上具有涂层，其中涂层含有正性工作组合物; 并使用开发人员开发模式。 该组合物含有其上具有官能团Q的聚合物质，使得官能化聚合物质具有在红外辐射传递之前是显影剂不溶性的特性，此后可显影剂可溶。
-
公开(公告)号：US06905812B2
公开(公告)日：2005-06-14
申请号：US10290378
申请日：2002-11-07
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/262 , Y10S430/145 , Y10S430/146
摘要： A positive working printing form precursor comprises a thermally imagable composition which includes a hydroxyl group-containing polymer, for example a novolak resin. The composition has a weight of less than 1.1 gm−2. It has been found that using a low weight of the composition on the precursor improves the properties of the precursor, in particular by rendering the sensitivity of the precursor to imaging radiation less variable over time.
摘要翻译： 正性工作印刷版前体包括可热成像的组合物，其包含含羟基的聚合物，例如酚醛清漆树脂。 该组合物的重量小于1.1gm -2。 已经发现，在前体上使用低重量的组合物改善了前体的性质，特别是通过使得前体对成像辐射的敏感性随时间变化而变小。
-
公开(公告)号：US07163777B2
公开(公告)日：2007-01-16
申请号：US10802533
申请日：2004-03-17
IPC分类号： G03F7/004
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145 , Y10S430/146
摘要： The present invention provides an imageable element including a substrate, a first layer applied to the substrate and a second layer applied to the first layer. The first layer may contain polymeric material and a radiation absorbing compound. The second layer may contain a hydroxyl group-containing polymer that includes a heat-labile moiety.
摘要翻译： 本发明提供一种可成像元件，其包括衬底，施加到衬底的第一层和施加到第一层的第二层。 第一层可以包含聚合材料和辐射吸收化合物。 第二层可以含有包含热不稳定部分的含羟基的聚合物。
-
公开(公告)号：US07094503B2
公开(公告)日：2006-08-22
申请号：US10400715
申请日：2003-03-27
CPC分类号： G03F1/68 , B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/26 , B41C2210/262 , B41C2210/264 , G03F1/54 , G03F7/0047 , G03G13/28 , G03G13/283 , G03G13/286
摘要： The present invention provides a patterned substrate and methods of forming patterns on a substrate, in which a thermally sensitive composition composed of an inorganic nanopaste is applied onto a surface of a substrate to form a layer. The layer may be imaged and developed to form a pattern area that adheres to the surface of the substrate. The patterned substrate may be used in the production of printing plates and masks.
摘要翻译： 本发明提供一种图案化衬底和在衬底上形成图案的方法，其中将由无机纳米糊膏组成的热敏组合物施加到衬底的表面上以形成层。 该层可以被成像和显影以形成粘附到基底的表面的图案区域。 图案化的衬底可以用于生产印版和掩模。
-
公开(公告)号：US07081322B2
公开(公告)日：2006-07-25
申请号：US10400959
申请日：2003-03-27
CPC分类号： B41J3/407 , B41C1/1066 , B41M5/508 , C09D11/30 , G03F1/54 , G03F1/68 , G03F7/0047 , G03F7/2018
摘要： The present invention provides a method of forming an image on a printing plate, in which a nanopaste is imagewise ink-jet applied onto a surface of a substrate. The layer is then treated to form an image area. The method is useful in the formation of printing plates and radiation opaque masks.
摘要翻译： 本发明提供了一种在印版上形成图像的方法，其中将纳米糊剂作为图像喷墨施加在基板的表面上。 然后对该层进行处理以形成图像区域。 该方法可用于形成印版和辐射不透明掩模。
-
-
-
-
-
-
-
-
-
搜索结果
38 条记录 (耗时 0.025 秒)
