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    Method of making charge-coupled device with microlens
    1.
    发明授权
    Method of making charge-coupled device with microlens 失效
    用微透镜制作电荷耦合器件的方法

    公开(公告)号：US5877040A

    公开(公告)日：1999-03-02

    申请号：US852562

    申请日：1997-05-07

    申请人： Chul Ho Park ,  Kwang Bok Song

    发明人： Chul Ho Park ,  Kwang Bok Song

    IPC分类号： H01L31/0232 ,  H01L31/0352 ,  H01L31/113 ,  H01L21/339

    CPC分类号： H01L31/1133 ,  H01L27/14627 ,  H01L27/14685 ,  H01L31/0232 ,  H01L31/035281 ,  Y02E10/50

    摘要： A CCD and manufacturing method thereof is disclosed including: a first conductivity-type substrate having a convex portion; a first conductivity-type charge transmission domain formed on the substrate excluding the convex portion; a light detecting domain formed on the convex portion of the substrate and having a convex top surface; a second conductivity-type high-concentration impurity area formed on the top surface of the light detecting domain; a gate insulating layer formed on the substrate excluding the light detecting domain; a transmission gate formed on the gate insulating layer; a planarization layer formed on the substrate including the transmission gate; and a microlens formed on the planarization layer above a photodiode.

    摘要翻译： 公开了一种CCD及其制造方法，包括：具有凸部的第一导电型基板; 形成在除了凸部之外的基板上的第一导电型电荷传输区域; 形成在所述基板的凸部上并具有凸顶面的光检测区域; 形成在光检测区域的上表面上的第二导电型高浓度杂质区域; 栅极绝缘层，形成在所述衬底上，除了所述光检测区域; 形成在所述栅极绝缘层上的传输栅极; 在包括所述传输门的所述衬底上形成的平坦化层; 以及在光电二极管上方的平坦化层上形成的微透镜。

    Color charge-coupled device
    2.
    发明授权
    Color charge-coupled device 失效
    彩色电荷耦合器件

    公开(公告)号：US5895943A

    公开(公告)日：1999-04-20

    申请号：US902957

    申请日：1997-07-30

    申请人： Chul Ho Park ,  Jin Seop Shim ,  Kwang Bok Song

    发明人： Chul Ho Park ,  Jin Seop Shim ,  Kwang Bok Song

    IPC分类号： H01L27/148 ,  H01L29/768

    CPC分类号： H01L27/14868 ,  H01L27/14843

    摘要： A color charge-coupled device is disclosed including plural light detectors corresponding to first to third colors and plural charge transmission regions on a semiconductor substrate; a pad on one side of the substrate excluding a portion where the light detectors and charge transmission regions are formed; a planarizing film on the substrate excluding the pad; microlenses on the planarizing film above the light detectors; and first to third color filter layers on each microlens excluding the edge portion.

    摘要翻译： 公开了一种彩色电荷耦合器件，其包括对应于半导体衬底上的第一至第三颜色和多个电荷透射区域的多个光检测器; 除了形成光检测器和电荷传输区域的部分之外的衬底的一侧上的焊盘; 在所述衬底上的除所述衬垫之外的平坦化膜; 在光检测器上方的平坦化膜上的微透镜; 以及除了边缘部分之外的每个微透镜上的第一至第三滤色器层。

    Color charge-coupled device and method of manufacturing the same
    3.
    发明授权
    Color charge-coupled device and method of manufacturing the same 失效
    彩色电荷耦合器件及其制造方法

    公开(公告)号：US5677200A

    公开(公告)日：1997-10-14

    申请号：US442879

    申请日：1995-05-17

    申请人： Chul Ho Park ,  Jin Seop Shim ,  Kwang Bok Song

    发明人： Chul Ho Park ,  Jin Seop Shim ,  Kwang Bok Song

    IPC分类号： H01L27/148 ,  H01L31/18 ,  G02F1/29 ,  H01L21/70 ,  H01L31/232

    CPC分类号： H01L27/14685 ,  H01L27/14621 ,  H01L27/14627 ,  H01L27/14843 ,  H01L27/14868

    摘要： A method of manufacturing a color charge-coupled device is disclosed including the steps of alternately forming a plurality of light detectors corresponding to first to third colors and a plurality of charge transmission regions on a semiconductor substrate; forming a pad on one side of the substrate excluding a portion where the light detectors and charge transmission regions are formed; forming a planarizing film on the substrate excluding the pad; coating a microlens material on the planarizing film and patterning the microlens material so as to be left only on the planarizing film above the light detectors; thermally flowing the microlens material, to thereby form microlenses on the planarizing film above the light detectors; and hard-baking first to third dyeing layer, to thereby form first to third color filter layers on each microlens excluding the edge portion.

    摘要翻译： 公开了一种制造彩色电荷耦合器件的方法，包括以下步骤：在半导体衬底上交替地形成对应于第一至第三颜色的多个光检测器和多个电荷透射区域; 在除了形成有光检测器和电荷传输区域的部分之外的基板的一侧上形成焊盘; 在除了焊盘之外的衬底上形成平坦化膜; 在平坦化膜上涂覆微透镜材料并对微透镜材料进行图案化，以仅留在光检测器上方的平坦化膜上; 使微透镜材料热流动，从而在光检测器上方的平坦化膜上形成微透镜; 和硬烘烤第一至第三染色层，从而在除了边缘部分之外的每个微透镜上形成第一至第三滤色器层。

    Charge coupled device with microlens
    4.
    发明授权
    Charge coupled device with microlens 失效
    带微透镜的电荷耦合器件

    公开(公告)号：US5693967A

    公开(公告)日：1997-12-02

    申请号：US513568

    申请日：1995-08-10

    申请人： Chul Ho Park ,  Kwang Bok Song

    发明人： Chul Ho Park ,  Kwang Bok Song

    IPC分类号： H01L31/0232 ,  H01L31/0352 ,  H01L31/113 ,  H01L27/148 ,  H01L29/768

    CPC分类号： H01L31/1133 ,  H01L27/14627 ,  H01L27/14685 ,  H01L31/0232 ,  H01L31/035281 ,  Y02E10/50

    摘要： A CCD and manufacturing method thereof is disclosed including: a first conductivity-type substrate having a convex portion; a first conductivity-type charge transmission domain formed on the substrate excluding the convex portion; a light detecting domain formed on the convex portion of the substrate and having a convex top surface; a second conductivity-type high-concentration impurity area formed on the top surface of the light detecting domain; a gate insulating layer formed on the substrate excluding the light detecting domain; a transmission gate formed on the gate insulating layer; a planarization layer formed on the substrate including the transmission gate; and a microlens formed on the planarization layer above a photodiode.

    摘要翻译： 公开了一种CCD及其制造方法，包括：具有凸部的第一导电型基板; 形成在除了凸部之外的基板上的第一导电型电荷传输区域; 形成在所述基板的凸部上并具有凸顶面的光检测区域; 形成在光检测区域的上表面上的第二导电型高浓度杂质区域; 栅极绝缘层，形成在所述衬底上，除了所述光检测区域; 形成在所述栅极绝缘层上的传输栅极; 在包括所述传输门的所述衬底上形成的平坦化层; 以及在光电二极管上方的平坦化层上形成的微透镜。

    Method of fabricating solid state image sensing elements
    5.
    发明授权
    Method of fabricating solid state image sensing elements 失效
    制作固态摄像元件的方法

    公开(公告)号：US5672519A

    公开(公告)日：1997-09-30

    申请号：US484980

    申请日：1995-06-06

    申请人： Kwang Bok Song ,  Sung Ki Kim ,  Jin Sub Shim

    发明人： Kwang Bok Song ,  Sung Ki Kim ,  Jin Sub Shim

    IPC分类号： G02B27/00 ,  H01L21/027 ,  H01L27/146 ,  H01L27/148 ,  H01L31/0216 ,  H01L31/0232 ,  H01L31/10 ,  H01L21/312 ,  H01L31/101

    CPC分类号： H01L31/02162 ,  H01L27/1462 ,  H01L27/14627 ,  H01L31/0232

    摘要： This invention relates to microlenses of the solid state image sensing element and the method for fabricating the microlenses of the solid image sensing elements, which provides a solid state image sensing element including a substrate, photo diode areas each having a plurality of photo diodes in matrix array formed on the substrate, a flat area formed over the substrate including the photo diode areas, color filter layers formed in predetermined areas on the flat area, a top coating layer formed over the substrate including the color filter areas, stripe microlenses each having a flat upper surface arranged correspond corresponding to the photo diodes arranged in one direction in the photo diode areas and formed on the top coating layer, and mosaic microlenses formed on the flat upper surface of the stripe microlens each arranged corresponding to each of the photo diodes in the photo diode area.

    摘要翻译： 本发明涉及固体摄像元件的微透镜和用于制造固体摄像元件的微透镜的方法，其提供包括衬底的固态图像感测元件，每个具有矩阵中的多个光电二极管的光电二极管区域 阵列，形成在衬底上的平坦区域，形成在包括光电二极管区域的衬底上的平坦区域，形成在平坦区域上的预定区域中的滤色器层，形成在包括滤色器区域的衬底上的顶部涂层，每个具有 平坦的上表面对应于对应于在光电二极管区域中沿一个方向布置并形成在顶部涂层上的光电二极管，并且形成在条形微透镜的平坦上表面上的镶嵌微透镜，每个排列对应于每个光电二极管布置 光电二极管面积。