公开(公告)号：US20130169183A1

公开(公告)日：2013-07-04

申请号：US13562306

申请日：2012-07-30

申请人： Po-Shen CHEN ,  Chun-Kuang CHEN ,  Feng-Ling LIN ,  Hui-Ying CHEN

发明人： Po-Shen CHEN ,  Chun-Kuang CHEN ,  Feng-Ling LIN ,  Hui-Ying CHEN

IPC分类号： H05B37/02

CPC分类号： H05B33/0854 ,  H05B33/0815 ,  Y02B20/347

摘要： The invention discloses an illumination control circuit and an illumination control method. The illumination control method includes modulating an alternating current input signal and accordingly generating a dimming signal, which includes several waveform pulses each with an adjustable conduction angles; continuously sampling the waveform pulses of the dimming signal and forming an average waveform pulse from the sampled waveform pulses; extracting the average waveform pulse, which has an average conduction angle corresponding to the conduction angles of the waveform pulses; performing an integration on the sampled average waveform pulse and accordingly generating a current-controlling signal; and driving an illumination lamp according to the current-controlling signal.

摘要翻译： 本发明公开了一种照明控制电路和照明控制方法。 照明控制方法包括调制交流输入信号，并因此产生一个调光信号，该调光信号包括几个具有可调节导通角的波形脉冲; 连续采样调光信号的波形脉冲，并从取样的波形脉冲形成平均波形脉冲; 提取具有对应于波形脉冲的导通角的平均导通角的平均波形脉冲; 对所采样的平均波形脉冲执行积分，从而产生电流控制信号; 并根据电流控制信号驱动照明灯。

公开(公告)号：US20130147354A1

公开(公告)日：2013-06-13

申请号：US13531603

申请日：2012-06-25

申请人： Chun-Kuang CHEN ,  Po-Shen CHEN ,  Feng-Ling LIN ,  Hui-Ying CHEN

发明人： Chun-Kuang CHEN ,  Po-Shen CHEN ,  Feng-Ling LIN ,  Hui-Ying CHEN

IPC分类号： H05B37/00

CPC分类号： H05B39/044 ,  H05B33/0845

摘要： The invention discloses an illumination controlling circuit coupled between a household electricity input and an illumination lamp. The illumination controlling circuit includes a dimmer module, a sampling-and-holding circuit, a differential circuit, an integrator circuit and a clamping circuit. The dimmer circuit is used for generating a dimming signal which includes a plurality of waveform pulses. The sampling-and-holding circuit samples from the dimming signal, so as to obtain an average waveform pulse. The differential circuit is used for extracting a voltage difference of the average waveform pulse. The integrator circuit performs integration on the average waveform pulse according to the voltage difference, so as to generate a direct current voltage signal. When a level of the direct current voltage signal exceeds a threshold voltage level of the clamping circuit, the direct current voltage signal is used for driving the illumination lamp.

摘要翻译： 本发明公开了一种照明控制电路，其耦合在家用电力输入和照明灯之间。 照明控制电路包括调光器模块，采样保持电路，差分电路，积分器电路和钳位电路。 调光电路用于产生包括多个波形脉冲的调光信号。 采样保持电路从调光信号中采样，以获得平均波形脉冲。 差分电路用于提取平均波形脉冲的电压差。 积分器电路根据电压差对平均波形脉冲进行积分，以产生直流电压信号。 当直流电压信号的电平超过钳位电路的阈值电压电平时，直流电压信号用于驱动照明灯。

公开(公告)号：US20130135333A1

公开(公告)日：2013-05-30

申请号：US13398131

申请日：2012-02-16

申请人： Chun-Kuang CHEN ,  Yuan-Ching CHEN ,  Tung-Yu CHEN

发明人： Chun-Kuang CHEN ,  Yuan-Ching CHEN ,  Tung-Yu CHEN

IPC分类号： G06F3/041 ,  G09G5/02

CPC分类号： H05B33/0863 ,  H05B37/02 ,  H05B37/029

摘要： A light system includes a lamp, a user operation interface, a control unit and a communication unit. The user operation interface is adapted to be used by a user to select a brightness value or a color temperature value, wherein the user operation interface includes a display unit and a touch control unit. The display unit is used to output a graphical interface. The touch control unit is used to detect a touch action upon the graphical interface of the display unit. The control unit is electrically connected to the user operation interface for receiving and processing a selection of the brightness value or the color temperature value from the user operation interface. The communication unit is electrically connected to the control unit for transmitting the selection of the brightness value or the color temperature value to the lamp via a wireless protocol.

摘要翻译： 光系统包括灯，用户操作接口，控制单元和通信单元。 用户操作界面适于由用户使用以选择亮度值或色温值，其中用户操作界面包括显示单元和触摸控制单元。 显示单元用于输出图形界面。 触摸控制单元用于检测显示单元的图形界面上的触摸动作。 控制单元电连接到用户操作界面，用于从用户操作界面接收和处理亮度值或色温值的选择。 通信单元电连接到控制单元，用于经由无线协议将亮度值或色温值的选择发送到灯。

公开(公告)号：US20120146159A1

公开(公告)日：2012-06-14

申请号：US13293650

申请日：2011-11-10

申请人： Hsien-Cheng WANG ,  Ming-Chang WEN ,  Chun-Kuang CHEN ,  Yao-Ching KU

发明人： Hsien-Cheng WANG ,  Ming-Chang WEN ,  Chun-Kuang CHEN ,  Yao-Ching KU

IPC分类号： H01L29/78 ,  H01L21/66 ,  H01L21/336

CPC分类号： H01L22/32 ,  G03F7/70633 ,  H01L21/265 ,  H01L29/517 ,  H01L29/66545

摘要： The overlay mark and method for making the same are described. In one embodiment, a semiconductor overlay structure includes gate stack structures formed on the semiconductor substrate and configured as an overlay mark, and a doped semiconductor substrate disposed on both sides of the gate stack structure that includes at least as much dopant as the semiconductor substrate adjacent to the gate stack structure in a device region. The doped semiconductor substrate is formed by at least three ion implantation steps.

摘要翻译： 对覆盖标记及其制作方法进行说明。 在一个实施例中，半导体覆盖结构包括形成在半导体衬底上并被配置为覆盖标记的栅极叠层结构，以及设置在栅叠层结构两侧的掺杂半导体衬底，其至少包括与半导体衬底相邻的掺杂剂 到设备区域中的栅极堆栈结构。 掺杂半导体衬底通过至少三个离子注入步骤形成。

公开(公告)号：US20070258060A1

公开(公告)日：2007-11-08

申请号：US11427434

申请日：2006-06-29

申请人： Li-Jui CHEN ,  Tzung-Chi FU ,  Ching-Yu CHANG ,  Fu-Jye LIANG ,  Lin-Hung SHIU ,  Chun-Kuang CHEN ,  Tsai-Sheng GAU

发明人： Li-Jui CHEN ,  Tzung-Chi FU ,  Ching-Yu CHANG ,  Fu-Jye LIANG ,  Lin-Hung SHIU ,  Chun-Kuang CHEN ,  Tsai-Sheng GAU

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; a fluid retaining module configured to hold a fluid in a space between the imaging lens module and a substrate on the substrate stage; and a heating element configured in the fluid retaining module and adjacent to the space. The heating element includes at least one of following: a sealant insoluble to the fluid for sealing the heating element in the fluid retaining module; a sealed opening configured in one of top portion and side portion of the fluid retaining module for sealing the heating element in the fluid retaining module; and/or a non-uniform temperature compensation device configured with the heating element.

摘要翻译： 光刻设备包括成像透镜模块; 位于所述成像透镜模块下方且被配置为保持基板的基板台; 流体保持模块，被配置为将流体保持在所述成像透镜模块和所述基板载台上的基板之间的空间中; 以及配置在所述流体保持模块中且与所述空间相邻的加热元件。 所述加热元件包括以下至少一种：不溶于所述流体以密封所述流体保持模块中的所述加热元件的密封剂; 密封开口，其构造在流体保持模块的顶部和侧部之一中，用于密封流体保持模块中的加热元件; 和/或配置有加热元件的不均匀的温度补偿装置。

公开(公告)号：US20110059407A1

公开(公告)日：2011-03-10

申请号：US12871185

申请日：2010-08-30

申请人： Li-Te S. LIN ,  Yen-Shuo SU ,  Hsueh-Chang SUNG ,  Feng-Cheng HSU ,  Chun Hsiung TSAI ,  Shiang-Bau WANG ,  Chun-Kuang CHEN

发明人： Li-Te S. LIN ,  Yen-Shuo SU ,  Hsueh-Chang SUNG ,  Feng-Cheng HSU ,  Chun Hsiung TSAI ,  Shiang-Bau WANG ,  Chun-Kuang CHEN

IPC分类号： G03F7/20

CPC分类号： H01L21/0273 ,  G03F7/0035 ,  G03F7/2024 ,  G03F7/405 ,  H01L21/31144 ,  H01L21/32139

摘要： A method of lithography patterning includes forming a first resist pattern over a substrate, baking the first resist features, hardening the first resist features, forming a second resist layer within the hardened first resist features, and patterning the second resist layer to form at least one second resist feature between the hardened first features.

摘要翻译： 一种光刻图案化方法包括在衬底上形成第一抗蚀剂图案，烘烤第一抗蚀剂特征，硬化第一抗蚀剂特征，在硬化的第一抗蚀剂特征内形成第二抗蚀剂层，以及使第二抗蚀剂层图形化以形成至少一个 硬化的第一特征之间的第二抗蚀特征。

公开(公告)号：US20120044679A1

公开(公告)日：2012-02-23

申请号：US13030636

申请日：2011-02-18

申请人： Chun-Kuang CHEN ,  Chen-Yi Su

发明人： Chun-Kuang CHEN ,  Chen-Yi Su

IPC分类号： F21V11/00 ,  F21S4/00 ,  H01J1/02

CPC分类号： F21V19/0025 ,  F21S4/20 ,  F21Y2103/10 ,  F21Y2115/10 ,  H01L33/62 ,  H01L2924/0002 ,  H01L2924/00

摘要： A point light source includes a light-emitting portion, a first lead and a second lead. The first lead and the second lead are electrically connected to the light-emitting portion. The first lead and the second lead respectively have a wedging portion. The wedging portions can be matched with each other. A light source module using the point light source is also provided. The light source module includes at least one light source assembly. Each light source assembly includes a plurality of the point light sources connected in series. Adjacent two point light sources are wedged to each other in series by a combination of the wedging portions of the adjacent first lead and second lead.

摘要翻译： 点光源包括发光部分，第一引线和第二引线。 第一引线和第二引线电连接到发光部分。 第一引线和第二引线分别具有楔形部分。 楔形部分可以彼此匹配。 还提供了使用点光源的光源模块。 光源模块包括至少一个光源组件。 每个光源组件包括串联连接的多个点光源。 相邻的两点光源通过相邻的第一引线和第二引线的楔形部分的组合彼此楔合在一起。

公开(公告)号：US20080020324A1

公开(公告)日：2008-01-24

申请号：US11458621

申请日：2006-07-19

申请人： Lin-Hung SHIU ,  Fu-Jye LIANG ,  Chun-Kuang CHEN

发明人： Lin-Hung SHIU ,  Fu-Jye LIANG ,  Chun-Kuang CHEN

IPC分类号： G03F7/26

CPC分类号： G03F7/26 ,  G03F7/11 ,  G03F7/2041

摘要： A method for photolithography processing includes providing a substrate coated with a photosensitive layer thereon and a top coater overlying the photosensitive layer; exposing the photosensitive layer to a radiation energy; removing the top coater; and baking the photosensitive layer after the removing of the top coater layer.

摘要翻译： 一种用于光刻处理的方法包括提供其上涂覆感光层的基材和覆盖在感光层上的顶涂层; 将感光层暴露于辐射能; 去除顶涂层; 并且在去除顶涂层之后烘烤感光层。

公开(公告)号：US20070285639A1

公开(公告)日：2007-12-13

申请号：US11461234

申请日：2006-07-31

申请人： Fu-Jye LIANG ,  Lin-Hung SHIU ,  Chun-Kuang CHEN ,  Tsai-Sheng GAU ,  Burn Jeng LIN

发明人： Fu-Jye LIANG ,  Lin-Hung SHIU ,  Chun-Kuang CHEN ,  Tsai-Sheng GAU ,  Burn Jeng LIN

IPC分类号： G03B27/42

CPC分类号： G03B27/42 ,  G03F7/70466

摘要： A lithography process to pattern a plurality of fields on a substrate is disclosed. The process includes scanning a first field along a first direction using a radiation beam. Thereafter, the processes steps to a second field adjacent the first field and located behind the first field when the first and second fields are viewed along the first direction. The second field is then scanned along the first direction using the radiation beam.

摘要翻译： 公开了一种用于对衬底上的多个场进行图案化的光刻工艺。 该过程包括使用辐射束沿第一方向扫描第一场。 此后，当沿着第一方向观察第一和第二场时，处理步骤到与第一场相邻并位于第一场后面的第二场。 然后使用辐射束沿着第一方向扫描第二场。