摘要:
An umbrella includes a shaft, a top cap and a runner. Multiple rib units and multiple stretchers are pivotably connected to the top cap and the runner. The rib units each have a first rib, a second rib and a third rib. The first, second and third ribs are pivotably connected in sequence. A canopy is mounted to the rib units. The second ribs each have a first connection portion on one end thereof, and the first connection portion has a seat which is connected to a link unit. The link unit has a joint which is connected to the third rib. The third rib has a positioning member to position the joint. The third rib and the joint are connected with each other to bear wind force applied to the second rib and the third rib, such that the second and third ribs do not deform.
摘要:
This description relates to a plasma treatment apparatus including a vapor chamber, a gas supply and an upper electrode assembly. The upper electrode assembly includes a gas distribution plate having a plurality of holes in a bottom surface thereof and an upper electrode having at least one gas nozzle and at least one controllable valve connected to the at least one gas nozzle. The plasma treatment apparatus further includes a controller configured to generate a control signal. The at least one controllable valve is configured to be adjusted based on the control signal. A control system and a method of controlling a controllable valve are also described.
摘要:
The present disclosure relates to a semiconductor body etching apparatus having a multi-zone end point detection system. In some embodiments, the multi-zone end point detection system has a processing chamber that houses a workpiece that is etched according to an etching process. A plurality of end point detector (EPD) probes are located within the processing chamber. Respective EPD probes are located within different zones in the processing chamber, thereby enabling the detection of end point signals from multiple zones within the processing chamber. The detected end point signals are provided from the plurality of EPD probes to an advanced process control (APC) unit. The APC unit is configured to make a tuning knob adjustment to etching process parameters based upon the detected end point signals and to thereby account for etching non-uniformities.
摘要:
The present disclosure relates to a semiconductor body etching apparatus having a multi-zone end point detection system. In some embodiments, the multi-zone end point detection system has a processing chamber that houses a workpiece that is etched according to an etching process. A plurality of end point detector (EPD) probes are located within the processing chamber. Respective EPD probes are located within different zones in the processing chamber, thereby enabling the detection of end point signals from multiple zones within the processing chamber. The detected end point signals are provided from the plurality of EPD probes to an advanced process control (APC) unit. The APC unit is configured to make a tuning knob adjustment to etching process parameters based upon the detected end point signals and to thereby account for etching non-uniformities.
摘要:
An umbrella includes a shaft, a top cap and a runner. Multiple rib units and multiple stretchers are pivotably connected to the top cap and the runner. The rib units each have a first rib, a second rib and a third rib. The first, second and third ribs are pivotably connected in sequence. A canopy is mounted to the rib units. The second ribs each have a first connection portion on one end thereof, and the first connection portion has a seat which is connected to a link unit. The link unit has a joint which is connected to the third rib. The third rib has a positioning member to position the joint. The third rib and the joint are connected with each other to bear wind force applied to the second rib and the third rib, such that the second and third ribs do not deform.
摘要:
A capacitor having an electrically/conductive plate, an electrically conductive segmented plate defining a first plurality of electrically conductive plate segments and a second plurality of electrically conductive plate segments, a first capacitor dielectric disposed between the plate and the segmented plate, at least one electrically conductive interconnect coupling each of the plate segments of one of the first and second plurality of plate segments to the plate, and a second capacitor dielectric disposed between the plate segments.
摘要:
A tableware device includes a main body and multiple tableware members. The main body has a lower cover and an upper cover. The upper cover has a first fastener. A receiving space is formed between the upper cover and the lower cover. An end of the lower cover is rotatably connected to an end of the upper cover by a pivoting portion, and free ends thereof jointly form an opening. The lower cover is formed with a first connecting portion and a second fastener corresponding to the first fastener to fasten the upper and lower covers. The tableware members are removably disposed on the main body. Each is provided with a second connecting portion corresponding to the first connecting portion to connect the tableware member with the main body.
摘要:
A method of lithography patterning includes forming a first resist pattern over a substrate, baking the first resist features, hardening the first resist features, forming a second resist layer within the hardened first resist features, and patterning the second resist layer to form at least one second resist feature between the hardened first features.
摘要:
A capacitor having an electrically/conductive plate, an electrically conductive segmented electrically conductive plate segments and a second plurality of electrically conductive plate segments, a first capacitor dielectric disposed between the plate and the segment plate, at least one electrically conductive interconnect coupling each of the plate segment of one of the first and second plurality of plate segments to the plate, and a second capacitor dieletric disposed between the plate segments.
摘要:
A tableware device includes a main body and multiple tableware members. The main body has a lower cover and an upper cover. The upper cover has a first fastener. A receiving space is formed between the upper cover and the lower cover. An end of the lower cover is rotatably connected to an end of the upper cover by a pivoting portion, and free ends thereof jointly form an opening. The lower cover is formed with a first connecting portion and a second fastener corresponding to the first fastener to fasten the upper and lower covers. The tableware members are removably disposed on the main body. Each is provided with a second connecting portion corresponding to the first connecting portion to connect the tableware member with the main body.