-
公开(公告)号：US12202939B2
公开(公告)日：2025-01-21
申请号：US17485611
申请日：2021-09-27
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Tsuneo Yamashita , Hisashi Mitsuhashi , Takeshi Maehira , Yoshimi Motonari
IPC: C08G65/336 , C08G65/332 , C08G65/333 , C09D171/00
Abstract: A fluoropolyether group-containing compound of formula (1) or (2): wherein RF1, RX1, RX2 and RSi are as defined herein.
-
公开(公告)号：US09522998B2
公开(公告)日：2016-12-20
申请号：US14391064
申请日：2013-04-09
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Tsuneo Yamashita , Masamichi Morita , Yoshiko Kuwajima
IPC: C09K13/06 , C08L33/16 , B29C33/40 , G03F7/00 , B29C33/38 , B29C33/42 , B29C43/00 , B29C43/02 , B29C43/50 , B29C71/04 , C08L37/00 , H01L21/308 , B29K33/00 , B29K105/00 , B29K105/24 , B29L31/00 , C08G77/14 , C08G77/20
CPC classification number: C08L33/16 , B29C33/3857 , B29C33/40 , B29C33/424 , B29C43/003 , B29C43/02 , B29C43/50 , B29C71/04 , B29C2043/025 , B29K2033/12 , B29K2105/0014 , B29K2105/0085 , B29K2105/0088 , B29K2105/24 , B29L2031/757 , C08G77/14 , C08G77/20 , C08L37/00 , C08L2205/06 , C08L2312/06 , G03F7/0002 , H01L21/3081 , H01L21/3086 , C08F220/24 , C08F2220/1875 , C08F2220/325 , C08F220/20 , C08F230/08
Abstract: Provided are: a resin mold material and a resin replica mold material composition for imprinting having a superior mold releasability; a resin mold and a resin replica mold resulting from containing the material composition; and a method for producing them. The resin mold material or resin replica mold material composition for imprinting contains 100 parts by weight of a mold resin or replica mold resin for imprinting and 0.1 to 10 parts by weight of a curable fluoropolymer (A). Preferably, the fluoropolymer (A) has a weight-average molecular weight of 3,000 to 20,000 and results from including as repeating units (a1) an α-position substituted acrylate having a fluoroalkyl group having 4 to 6 carbon atoms and (a2) and 5 to 120 parts by weight of a high-softening-point monomer exhibiting a glass transition point or softening point of at least 50° C. in the homopolymer state.
Abstract translation: 提供：具有优异的脱模性的树脂模制材料和用于压印的树脂复制模具材料组合物; 由含有所述材料组合物得到的树脂模具和树脂复制模具; 及其制造方法。 用于压印的树脂模制材料或树脂复制模具材料组合物包含100重量份的用于压印的模制树脂或复制模制树脂和0.1至10重量份的可固化含氟聚合物（A）。 优选地，含氟聚合物（A）的重均分子量为3,000〜20,000，由（a1）含有具有4〜6个碳原子的氟代烷基和（a2）和5个碳原子的α位取代的丙烯酸酯组成的重复单元 至120重量份在均聚物状态下显示玻璃化转变点或软化点至少为50℃的高软化点单体。
-
公开(公告)号：US11634608B2
公开(公告)日：2023-04-25
申请号：US17210340
申请日：2021-03-23
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Tsuneo Yamashita , Masatoshi Nose , Hisashi Mitsuhashi , Saya Nii , Eiji Sakamoto , Kaori Ozawa
IPC: C07D251/34 , C09D171/02 , C03C17/32 , C09D5/00 , C23C14/12 , C07D251/10 , C07D405/14 , C07F7/18
Abstract: A compound represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC6F12)m11—(OC5F10)m12—(OC4F8)m13—(OC3X106)m14—(OC2F4)m15—(OCF2)m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; the repeating units are present in any order; and the sum of m11 to m16 is an integer of 10 or greater, R1 being other than those containing a urethane bond.
-
公开(公告)号：US11560485B2
公开(公告)日：2023-01-24
申请号：US16476990
申请日：2018-01-11
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Hisashi Mitsuhashi , Masatoshi Nose , Kaori Ozawa , Tsuneo Yamashita
IPC: C09D5/00 , C09D5/16 , C09D7/48 , C08G65/00 , C08G65/333 , C08G65/336 , G02B1/10
Abstract: A surface-treating agent including a perfluoro(poly)ether group-containing silane compound and a perfluoro(poly)ether group-containing compound. The perfluoro(poly)ether group-containing compound contains a radical capturing group or a UV absorbing group in the molecule.
-
公开(公告)号：US20220010062A1
公开(公告)日：2022-01-13
申请号：US17483072
申请日：2021-09-23
Applicant: Daikin Industries, Ltd.
Inventor： Tsuneo Yamashita , Hisashi Mitsuhashi , Kenichi Katsukawa , Takeshi Maehira , Yoshimi Motonari
IPC: C08G65/336 , C09D171/02 , C09D5/00
Abstract: A fluoropolyether group-containing compound of formula (1) or (2) below: RF1—X—RSi (1) RSi—X—RF2—X—RSi (2) wherein RF1, RSi and RF2 are as defined herein.
-
Patent Agency Ranking
公开(公告)号：US12071511B2
公开(公告)日：2024-08-27
申请号：US17331096
申请日：2021-05-26
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Tsuneo Yamashita , Takashi Nomura , Kaori Ozawa , Hisashi Mitsuhashi
IPC: C07D251/46 , C07D251/52 , C07F7/18 , C08G65/333 , C08G65/334 , C08G65/336 , C08G77/46 , C07F7/08
CPC classification number: C08G65/336 , C07D251/46 , C07D251/52 , C07F7/1876 , C08G65/333 , C08G65/3348 , C08G77/46 , C07F7/0812
Abstract: A polyether group-containing compound of the formula (I). In each of the compound of the formula (I), one or two R— are represented by (Rf-Xf1-PE-Xf2)α—X1—, and one or two R— are represented by RSi—. The symbols are as defined in the description.
-
公开(公告)号：US11912888B2
公开(公告)日：2024-02-27
申请号：US17448133
申请日：2021-09-20
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Tsuneo Yamashita , Hisashi Mitsuhashi , Kenichi Katsukawa , Takeshi Maehira , Yoshimi Motonari
IPC: C09D171/02 , C08G65/00 , C08G65/336 , C08G77/46 , C09D5/00 , C09D183/12 , C09D171/00
CPC classification number: C09D171/02 , C08G65/007 , C08G65/336 , C08G77/46 , C09D5/00 , C09D171/00 , C09D183/12
Abstract: A fluoropolyether group-containing compound represented by formula (1) or (2) below:
wherein RSi is represented by formula (Si), and the symbols are as defined in the description
—X1—SiRa1p1Rb1q1Rc1r1 (S1).-
公开(公告)号：US11135761B2
公开(公告)日：2021-10-05
申请号：US16309319
申请日：2017-06-14
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Tsuneo Yamashita , Eiji Sakamoto , Kakeru Hanabusa , Saya Nil , Takayuki Araki
IPC: B29C59/04 , B29C33/62 , B29C35/08 , C08G65/00 , C08G65/336 , H01L21/027 , B29C59/02 , B29K71/00
Abstract: The invention provides a method for producing a transfer target which is less likely to separate from a substrate or adhere to a mold even when transfer is repeated. The production method includes the steps of: (1) applying a composition containing a fluoropolyether to a release layer of a mold having an uneven pattern on a surface thereof; (2) pressing the mold to a transfer target and transferring the uneven pattern; and (3) releasing the mold from the transfer target, thereby providing the transfer target having a transferred pattern.
-
公开(公告)号：US10781335B2
公开(公告)日：2020-09-22
申请号：US16344555
申请日：2017-10-24
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Tsuneo Yamashita , Eiji Sakamoto , Saya Nii , Atsushi Sakakura
Abstract: A functional film includes layer (A) containing a resin and layer (B) containing a compound containing a perfluoropolyether group. Layer (B) has a microrelief pattern structure on a surface remote from layer (A). In elemental analysis by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (1): D1
-
公开(公告)号：US10731048B2
公开(公告)日：2020-08-04
申请号：US16344555
申请日：2017-10-24
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Tsuneo Yamashita , Eiji Sakamoto , Saya Nii , Atsushi Sakakura
Abstract: A functional film includes layer (A) containing a resin and layer (B) containing a compound containing a perfluoropolyether group. Layer (B) has a microrelief pattern structure on a surface remote from layer (A). In elemental analysis by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (1): D1
-
-
-
-
-
-
-
-
-
Search Results
21
records
(took 0.015 seconds)
