公开(公告)号：US11788967B2

公开(公告)日：2023-10-17

申请号：US16963679

申请日：2019-01-23

Applicant: DANMARKS TEKNISKE UNIVERSITET

Inventor： Oleksii Ilchenko ,  Tomas Rindzevicius ,  Anja Boisen ,  Roman Slipets

IPC: G01J3/02 ,  G01J3/44 ,  G01N21/65

CPC classification number: G01N21/65 ,  G01J3/0229 ,  G01J3/0297 ,  G01J3/44 ,  G01N2201/0612 ,  G01N2201/0631 ,  G01N2201/0633 ,  G01N2201/0635

Abstract: An apparatus for carrying out Raman spectroscopy on a sample includes a light source for providing a beam of excitation radiation, and an optical system including a spectrograph. The spectrograph includes a grating that divides a beam of scattered light into a spectrum of spatially separated wavelength components and to direct a portion of the spectrum to a detector. The spectrograph includes: 1) a first lens system for focusing the portion of the spectrum onto the detector and 2) a second lens system-configured to provide a focal plane with focal point in the optical path for focusing the beam of excitation radiation and/or the beam of scattered radiation at the focal point. The apparatus including a reference sample arranged in the focal plane, in particular at the focal point, for obtaining a reference spectrum from the reference sample.

公开(公告)号：US11815440B2

公开(公告)日：2023-11-14

申请号：US16097939

申请日：2017-05-01

Applicant: Danmarks Tekniske Universitet

Inventor： Onur Durucan ,  Michael Stenbaek Schmidt ,  Tomas Rindzevicius ,  Anja Boisen

IPC: G01N1/40 ,  B01L3/00 ,  G01N21/07 ,  G01N35/00 ,  G01N21/65 ,  G01N33/49

CPC classification number: G01N1/4077 ,  B01L3/50273 ,  B01L3/502753 ,  G01N21/07 ,  G01N21/658 ,  G01N33/491 ,  G01N35/00069 ,  B01L2200/0684 ,  B01L2300/0803 ,  B01L2300/087 ,  B01L2400/0406 ,  B01L2400/0409 ,  G01N2035/00158 ,  G01N2035/00495

Abstract: The invention relates to a method for preparing a substrate (105a) comprising a sample reception area (110) and a sensing area (111). The method comprises the steps of: 1) applying a sample on the sample reception area; 2) rotating the substrate around a predetermined axis; 3) during rotation, at least part of the liquid travels from the sample reception area to the sensing area due to capillary forces acting between the liquid and the substrate; and 4) removing the wave of particles and liquid formed at one end of the substrate. The sensing area is closer to the predetermined axis than the sample reception area. The sample comprises a liquid part and particles suspended therein.

公开(公告)号：US20220307133A1

公开(公告)日：2022-09-29

申请号：US17616165

申请日：2020-06-03

Applicant: Danmarks Tekniske Universitet ,  Slovak Academy of Sciences ,  Friedrich-Alexander-Universität Erlangen-Nürnberg

Inventor： Maksym Plakhotnyuk ,  Ole Hansen ,  Boisen Anja ,  Tomas Rindzevicius ,  Ivan Kundrata ,  Karol FRÖHLICH ,  Julien Bachmann

IPC: C23C16/455 ,  C23C16/56 ,  B33Y30/00 ,  B33Y10/00

Abstract: The invention relates to an atomic layer process printer for material deposition, etching and/or cleaning on an atomic scale in a selective area. The invention further relates to a method for material deposition, etching and/or cleaning on an atomic scale in a selective area using the atomic layer process printer.